近红外波段InAs量子点结构与光学特性

采用分子束外延技术,分别在480,520℃的生长温度下,制备了淀积厚度2.7ML的InAs/GaAs量子点。用原子力显微镜对样品进行形貌测试和统计分布。结果表明,在相应的生长温度下,量子点密度分别为8.0×10¹⁰,5.0×10⁹cm^-2,提高生长温度有利于获得大尺寸的量子点,并且量子点按高度呈双模分布。结合光致发光谱的分析,在480℃的生长条件下,最近邻量子点之间的合并导致了量子点尺寸的双模分布;而在525℃的生长温度下,In偏析和InAs解析是形成双模分布的主要原因。     

利用InAs/GaAs数字合金超晶格改进InAs量子点有源区的结构设计

利用分子束外延技术,通过InAs/GaAs数字合金超晶格代替传统的直接生长InGaAs层的方式,在GaAs(100)衬底上生长了InAs量子点结构并成功制备了1.3μm InAs量子点激光器.通过原子力显微镜和光致荧光谱测试手段,对传统生长模式和数字合金超晶格生长模式的两种样品进行了表征,研究发现采用32周期InAs/GaAs数字合金超晶格样品的量子点密度非常高,发光性能良好.通过与常规生长方式所制备激光器的性能对比,发现采用InAs/GaAs数字合金超晶格生长InAs量子点的有源区也可以得到高质量的激光器.利用该方式生长的InAs量子点激光器的阈值电流为24 mA,相应的阈值电流密度仅为75 A/cm2,最高工作温度达到120℃.InAs/GaAs数字合金超晶格既可以保证生长过程中源炉的温度保持不变,还可以对InGaAs层的组分实现灵活调控.不需要改变生长速度,通过改变InAs/GaAs数字合金超晶格的周期数以及InAs层和GaAs层的厚度,便可以获得任意组分的InGaAs,从而得到不同发光波长的激光器.这种生长方式对量子点有源区的结构设计和外延生长提供了新思路.     

ZnCdSe量子点的激子行为研究

用金属有机化学气相沉积(MOCVD)的方法在晶格失配较小的情况下制备了ZnCdSe量子点。并用原子力显微镜(AFM)和极低温度下的发光光谱确认了量子点的形成。原子力显微镜观测的形貌变化发现。随着生长后时间的增加,量子点的尺寸逐渐增大。而密度减小,这是由于熟化过程作用的结果。随着量子点生长完毕与加盖层之间间隔时间的增加,量子点的发光峰位明显红移,且由变温光谱得到的激子束缚能逐渐变小。这可以解释为随着间隔时间的增加,量子点的熟化过程导致量子点的尺寸增大,量子限域效应减弱所致。     

带有InGaAs覆盖层的InAs量子点红外探测器材料的发光与光电响应

利用分子束外延技术(MBE),在GaAs(001)衬底上自组织生长了不同结构的InAs量子点样品,并制备了量子点红外探测器件。利用原子力显微镜(AFM)和光致发光(PL)光谱研究了量子点的表面结构、形貌和光学性质。渐变InGaAs层的插入有效地释放了InAs量子点所受的应力,抑制了量子点中In组分的偏析,提高了外延层的生长质量,降低了势垒高度,使InAs量子点荧光波长红移。伏安特性曲线和光电流(PC)谱结果表明,生长条件的优化提高了器件的红外响应,具有组分渐变的InGaAs层的探测器响应波长发生明显红移。     

高温液滴外延生长先进光电材料

分子束液滴外延生长三维纳米结构不仅适用于晶格失配,也适用于晶格匹配材料系统。在高温条件时,这种技术制备的结构具有相对高的光学和电学性能,也表现出丰富多彩的形貌特征,包括量子环、量子点分子和纳米孔等。将着重介绍高温液滴外延生长技术的最新进展,同时讨论这种技术应用在光电材料领域的前景和挑战。     

液滴外延下生长参数对InAs纳米结构形貌的影响

利用液滴外延法在GaAs(001)衬底表面制备InAs量子点，通过控制变量分别研究沉积速率、沉积量对In液滴在GaAs表面生长过程中的影响.使用原子力显微镜(Atomic Force Microscope, AFM)表征InAs纳米结构形貌，得出结论：(1)沉积速率主要通过影响In液滴成核率来控制液滴的密度，即随着沉积速率的增大，In原子在衬底表面的成核率增加，InAs量子点密度增加，实验符合生长动力学经典成核理论.(2)沉积量的改变主要影响液滴的熟化过程，即随着沉积量的增大，可参与生长的活跃的In原子增加，促进了液滴熟化，使得扩散坍塌的原子数量增加，导致在InAs纳米结构中出现多量子点现象.     

In液滴在GaAs(001)表面扩散行为的研究

量子点的物理与光电性质主要依赖于其尺寸及密度参数,而量子点的密度、高度等参数又控制着原子在衬底上的成核行为。本文采用液滴外延法在GaAs(001)表面生长金属In液滴,研究了In液滴的扩散运动与衬底温度和沉积速率之间的关系,研究发现,随着衬底温度的升高和沉积速率的降低,In液滴尺寸增大密度却降低。通过得到的实验数据,拟合关于In液滴密度与衬底温度和沉积速率的曲线,分析了量子环的生长机制,并根据原子的表面迁移行为,进一步分析其表面原子扩散机理。     

高In组分InGaNAs/GaAs量子阱的生长及发光特性

采用分子束外延技术(MBE)在Ga As衬底上外延生长高In组分(40%)In Ga NAs/Ga As量子阱材料,工作波长覆盖1.3~1.55μm光纤通信波段。利用室温光致发光(PL)光谱研究了N原子并入的生长机制和In Ga NAs/Ga As量子阱的生长特性。结果表明:N组分增加会引入大量非辐射复合中心;随着生长温度从480℃升高到580℃,N摩尔分数从2%迅速下降到0.2%;N并入组分几乎不受In组分和As压的影响,黏附系数接近1;生长温度在410℃、Ⅴ/Ⅲ束流比在25左右时,In_(0.4)Ga_(0.6)N_(0.01)As_(0.99)/Ga As量子阱PL发光强度最大,缺陷和位错最少;高生长速率可以获得较短的表面迁移长度和较好的晶体质量。     

碳泡沫衬底上氮化铝纳米线的生长及其光致发光特性研究

为了简化了AlN/C复合泡沫材料的制备流程, 本文采用复分解反应法制备AlN纳米材料, 并通过800℃退火处理使其在碳泡沫衬底上重结晶为六方相AlN纳米线. 通过形貌表征测试, 纳米线为表面光滑的长直形圆柱体, 直径约50 nm, 长度10 μm以上, 在碳微球表面沿[001]方向生长. 同时, 采用VLS生长机理对纳米线的生长进行了解释. 对样品光致发光谱的研究表明, 中心波长423 nm处存在一尖锐发光峰且随温度升高发生明显的红移现象, 系C替N杂质能级跃迁发光所致. 样品在紫光波段具有良好的光致发光特性, 有望应用于光探测器领域.     

温度对p-InN薄膜光电导灵敏度的影响

研究了p型InN的光电导效应。利用分子束外延技术(MBE)法生长出高质量的InN薄膜,在此基础上利用Mg掺杂获得了p-InN。原位反射高能电子衍射(RHEED)表明样品在生长过程中保持二维生长模式,原子力显微镜(AFM)测试结果显示台阶流的生长模式。实验发现,p型InN的光电导灵敏度随温度的升高而降低。其主要原因是当温度升高时,光生载流子浓度降低和样品背景浓度升高共同造成的。     

InAs/GaAs量子点1.3 μm单光子发射特性

采用双层耦合量子点的分子束外延生长技术生长了InAs/GaAs量子点样品,把量子点的发光波长成功地拓展到1.3 μm.采用光刻的工艺制备了直径为3 μm的柱状微腔,提高了量子点荧光的提取效率.在低温5 K下,测量得到量子点激子的荧光寿命约为1 ns;单量子点荧光二阶关联函数为0.015,显示单量子点荧光具有非常好的单光子特性;利用迈克耳孙干涉装置测量得到单光子的相干时间为22 ps,对应的谱线半高全宽度为30 μeV,且荧光谱线的线型为非均匀展宽的高斯线型.     

Kinetics of self-assembled InN quantum dots grown on Si (111) by plasma-assisted MBE

One of the scientific challenges of growing InN quantum dots (QDs), using Molecular beam epitaxy (MBE), is to understand the fundamental processes that control the morphology and distribution of QDs. A systematic manipulation of the morphology, optical emission, and structural properties of InN/Si (111) QDs is demonstrated by changing the growth kinetics parameters such as flux rate and growth time. Due to the large lattice mismatch, between InN and Si (~8%), the dots formed from the Strannski–Krastanow (S–K) growth mode are dislocated. Despite the variations in strain (residual) and the shape, both the dot size and pair separation distribution show the scaling behavior. We observed that the distribution of dot sizes, for samples grown under varying conditions, follow the scaling function.     

Growth and time-resolved photoluminescence study of self-organized CdSe quantum dots in ZnSe

Employing two different growth methods: standard molecular beam epitaxy (MBE) and low-temperature atomic layer epitaxy (ALE) with subsequent annealing, we have obtained high-quality quantum dot structures consisting of CdSe embedded in ZnSe. Single dot emission lines are observed in micro-luminescence. The samples have been investigated by further optical methods including time-resolved photoluminescence under resonant excitation at 4.2 K. Distinct properties of systems with three-dimensional confinement are observed such as the suppression of the interaction between isolated quantum dots (QDs). In standard quantum wells tunneling/hopping processes generally lead to a pronounced red shift of the luminescence over time due to a lateral localization of excitons in potential fluctuations. A much less pronounced red shift is observed for the QDs reflecting only the different lifetimes of single dots and higher excited states. The red shift completely vanishes under resonant excitation that selectively excites only a few QDs of the ensemble in the layer. Typical behaviour is also observed from the halfwidth of the quantum dot emission.     

Molecular beam epitaxy growth and characterization of self-assembled InAs quantum dots on (1 0 0) InAlAs/InP substrates

Self-assembled InAs quantum dots (QDs) on In_0.52Al_0.48As layer lattice matched to (1 0 0) InP substrates have been grown by molecular beam epitaxy (MBE) and evaluated by transmission electron microscopy (TEM) and photoluminescence (PL). TEM observations indicate that defect-free InAs QDs can be grown to obtain emissions over the technologically important 1.3–1.55 μm region. The PL peak positions for the QDs shift to low energy as the InAs coverage increases, corresponding to increase in QD size. The room temperature PL peak at 1.58 μm was observed from defect-free InAs QDs with average dot height of 3.6 nm.     

InAs/GaAs quantum dot infrared photodetectors with different growth temperatures

InAs/GaAs quantum dot infrared photodetectors were fabricated with quantum dots grown at three different temperatures. Large detection wavelength shift (5–14.5 μm) was demonstrated by changing 40 degrees of the epitaxy temperature. The smaller quantum dots grown at lower temperature generate 14.5 μm responses. The detectivity of the normal incident 15 μm QDIP at 77 K is 3 × 10⁸ cm Hz^1/2/W. A three-color detector was also demonstrated with quantum dots grown at medium temperature. The three-color detection comes from two groups of different sizes of dots within one QD layer. This new type of multicolor detector shows unique temperature tuning behavior that was never reported before.     

水溶性CdTe量子点的稳态和纳秒时间分辨光致发光光谱

报道了以飞秒脉冲激光为激发光源的水溶性CdTe量子点(QDs)的稳态荧光光谱和纳秒时间分辨荧光光谱.实验发现CdTe量子点的荧光光谱峰值位置随激发波长变化发生明显移动，激发脉冲波长越长，荧光峰位红移越大.荧光动力学实验数据显示，在400nm和800nm脉冲激光激发下，水溶性CdTe量子点的荧光光谱中均含有激子态和诱捕态两个衰减成分，两者的发射峰相距很近，诱捕态的发射峰波长较长.在800nm脉冲激光激发下的诱捕态成分占总荧光强度的比重比400nm激发下的约高3倍，其相对强度的这种变化导致了稳态荧光发射峰位的红移. 关键词： CdTe 量子点 时间分辨 荧光光谱 上转换荧光     

Comparison of single-layer and bilayer InAs/GaAs quantum dots with a higher InAs coverage

Epitaxially grown self-assembled InAs quantum dots (QDs) have found applications in optoelectronics. Efforts are being made to obtain efficient quantum-dot lasers operating at longer telecommunication wavelengths, specifically 1.3 μm and 1.55 μm. This requires narrow emission linewidth from the quantum dots at these wavelengths. In InAs/GaAs single layer quantum dot (SQD) structure, higher InAs monolayer coverage for the QDs gives rise to larger dots emitting at longer wavelengths but results in inhomogeneous dot-size distribution. The bilayer quantum dot (BQD) can be used as an alternative to SQDs, which can emit at longer wavelengths (1.229 μm at 8 K) with significantly narrow linewidth (∼16.7 meV). Here, we compare the properties of single layer and bilayer quantum dots grown with higher InAs monolayer coverage. In the BQD structure, only the top QD layer is covered with increased (3.2 ML) InAs monolayer coverage. The emission line width of our BQD sample is found to be insensitive towards post growth treatments.     

The effect of post‐growth thermal annealing on the emission spectra of GaAs/AlGaAs quantum dots grown by droplet epitaxy

We fabricated GaAs/AlGaAs quantum dots by droplet epitaxy, and obtained the geometries of the dots by scanning transmission electron microscopy. Post‐growth thermal annealing is essential for the optical activation of quantum dots grown by droplet epitaxy. We measured the emission energy shifts of the dots and the underlying superlattice by post‐ growth thermal annealing, and specified the emission from dots by selectively etching the structure down to a low layer of quantum dots. We studied the influence of the degree of annealing on the optical properties of the dots from the peak shifts of the superlattice, since the superlattice has a uniform and well‐defined geometry. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Continuous wavelength tuning of InAs quantum dots on InP (1 0 0) and (3 1 1)A substrates by chemical-beam epitaxy

The growth of InAs quantum dots (QDs) on InP (1 0 0) and (3 1 1)A substrates by chemical-beam epitaxy is studied. The InAs QDs are embedded in a GaInAsP layer lattice-matched to InP. We demonstrate an effective way to continuously tune the emission wavelength of InAs QDs grown on InP (1 0 0). With an ultra-thin GaAs layer inserted between the QD layer and the GaInAsP buffer, the peak wavelength from the InAs QDs can be continuously tuned from above 1.6 μm down to 1.5 μm at room temperature. The major role of the thin GaAs layer is to greatly suppress the As/P exchange during the deposition of InAs and subsequent growth interruption under arsenic flux, as well as to consume the segregated In layer floating on the GaInAsP buffer. Moreover, it is found that InP (3 1 1)A substrates are particularly promising for formation of uniform InAs QDs. The growth of InAs on InP (3 1 1)A consists of two stages: nanowire formation due to strain-driven growth instability and subsequent QD formation on top of the wires. The excellent size uniformity of the InAs QDs obtained on InP (3 1 1)A manifests itself in the narrow photoluminescence line width of 26 meV at 4.8 K.