GaInP/GaAs/Ge三结太阳电池的电子辐照损伤效应

研究了1 MeV和1.8 MeV电子辐照下GaInP/GaAs/Ge三结太阳电池的辐照损伤效应.电学性能研究结果表明,GaInP/GaAs/Ge三结太阳电池的开路电压、短路电流和最大功率随辐照剂量的增加发生明显衰降,在1 MeV电子辐照下剂量为1×10¹⁵cm^-2时,与辐照前相比最大功率衰降了17.7%.暗I-V特性分析表明,高能电子辐照下三结电池串、并联电阻的变化是引起太阳电池电学性能衰降的重要原因.光谱响应分析结果表明,GaInP 关键词： GaInP/GaAs/Ge太阳电池 电子辐照 电学性能 光谱响应     

晶格失配对GaInP/In_xGa_(1-x)As/In_yGa_(1-y)As倒装三结太阳电池性能影响的分析

传统GaInP/(In)GaAs/Ge三结太阳电池因受其带隙组合的限制,转换效率再提升空间不大.倒装结构三结太阳电池因其更优的带隙组合期望可以得到更高的效率.基于细致平衡原理,结合P-N结形成机理,应用MATLAB语言对双晶格失配GaInP(1.90 eV)/In_xGa_(1-x)As/In_yGa_(1-y)As倒装结构三结太阳电池底、中电池的不同带隙组合进行模拟优化.模拟结果表明在AM1.5D,500倍聚光(500 suns)下,禁带宽度组合为1.90/1.38/0.94 eV的带隙最优,综合材料成本与试验条件,当顶、中电池最优厚度组合为4μm和3.2μm时理论转化效率高达51.22%,此时两个异质结的晶格失配度分别为0.17%和2.36%.忽略渐变缓冲层生长后底电池位错的影响,通过计算0.17%的晶格失配引入1.70×105cm~(-2)的插入位错密度,对比单晶格失配GaInP/GaAs/In_(0.32)Ga_(0.68)As(0.99 eV)倒装结构三结太阳电池光电转化效率仍提高了0.3%.     

空间用GaInP/GaAs/In0.3Ga0.7 As(1 eV)倒装三结太阳电池研制

采用阶变缓冲层技术 (step-graded) 外延生长了具有更优带隙组合的倒装GaInP/GaAs/In_0.3Ga_0.7As(1.0 eV) 三结太阳电池材料, TEM和HRXRD测试表明晶格失配度为2%的In_0.3Ga_0.7As 底电池具有较低的穿透位错密度和较高的晶体质量, 达到太阳电池的制备要求. 通过键合、剥离等工艺制备了太阳电池芯片. 面积为 10.922 cm² 的太阳电池芯片在空间光谱条件下转换效率达到32.64% (AM0, 25 ℃), 比传统晶格匹配的 GaInP/GaAs/Ge(0.67 eV) 三结太阳电池的转换效率提高3个百分点. 关键词： 太阳电池 三结 倒装结构     

p-n 型GaInP2/GaAs叠层太阳电池研究

报道了对p-n型 GaInP2/GaAs叠层太阳电池的研究结果.采用低压金属有机物化学气相沉积工艺制备电池样品.通过对GaInP2顶电池中场助收集效应的计算机模拟，提出用p+p-n-n+结构取代常用的p+n 结构，显著改善了GaInP2顶电池和GaInP2/GaAs叠层太阳电池的光伏性能，使其光电转换效率(Eff)分别达到14.26% 和23.82% (AM0, 25℃, 2×2cm2). 关键词： 场助收集效应 镓铟磷 砷化镓 叠层太阳电池     

溶胶-凝胶法制备GaInP/GaAs/Ge三结太阳能电池梯度折射率减反膜

为了减少太阳能电池表面反射,提高多结太阳能电池效率,针对GaInP/GaAs/Ge三结太阳能电池和AM0光谱,设计了折射率梯度排列的四层减反膜系结构.利用溶胶-凝胶技术,通过对材料折射率的定向调节,制备了折射率梯度排列的TiO_2/ZrO_2/酸性SiO_2/碱性SiO_2四层减反膜.实验结果表明,镀膜后的三结太阳能电池在300~1 700 nm波长范围内的加权平均反射率由原先的28.58%降低至4.86%,最高反射率由46.35%降低至15.45%.     

p-n型GaInP_2/GaAs叠层太阳电池研究

报道了对p n型GaInP2 GaAs叠层太阳电池的研究结果 .采用低压金属有机物化学气相沉积工艺制备电池样品 .通过对GaInP2 顶电池中场助收集效应的计算机模拟 ,提出用p p- n- n 结构取代常用的p n结构 ,显著改善了GaInP2 顶电池和GaInP2 GaAs叠层太阳电池的光伏性能 ,使其光电转换效率 (Eff)分别达到 14 2 6 %和 2 3 82 %(AM0 ,2 5℃ ,2× 2cm2 )     

不同能量质子辐照诱发子电池GaAs退化模拟研究

为了研究空间辐照诱发的子电池GaAs相关参数的退化行为,以三结太阳电池的子电池GaAs为研究对象,开展了不同辐照条件下的质子辐照模拟研究,建立了子电池GaAs结构模型,得到了不同辐照能量和注量下短路电流、开路电压、转化因子、最大功率的退化结果。利用现有实验数据,验证了不同能量质子辐照诱发的子电池GaAs的归一化最大功率随质子注量的退化。结合子电池GaAs在不同辐照条件下的最大功率退化结果,得到了归一化最大功率随位移损伤剂量的退化方程。研究结果表明:质子辐照诱发的辐照缺陷是导致子电池退化的直接原因,子电池GaAs的短路电流、开路电压、转化因子和最大功率随质子注量的增加而逐渐退化。当质子注量大于1×10~(11) cm~(-2)时,子电池GaAs的归一化电学参数的退化幅度与质子注量的对数值近似成正比,电学参数的退化随质子辐照能量的减小而逐渐增加。质子辐照诱发的子电池GaAs的外量子效率在长波长范围内的退化情况比其在短波长范围内的退化情况更严重。     

GaAs纳米线阵列太阳能电池的设计与优化

为了得到纳米线阵列太阳能电池的最优转换效率,通过仿真计算对GaAs轴向pin结纳米线阵列进行了结构优化.首先利用三维有限时域差分法分析了GaAs纳米线阵列的光吸收特性,并对其直径、密度等结构参量进行优化,优化后的GaAs纳米线阵列的光吸收率可达87.4%.在此基础上,利用Sentaurus软件包中的电学仿真模块分析了电池的电学性能,并根据光生载流子在纳米线中的分布,对轴向pin结结构进行优化,最终优化过的太阳能电池功率转换效率可达到17.6%.分析结果表明,通过钝化处理以降低GaAs纳米线的表面复合速率,可显著提升电池的功率转换效率,而通过减小纳米线顶端高掺杂区域的体积,可减少载流子复合损耗,从而提高电池效率.该研究可为制作高性能的纳米线太阳能电池提供参考.     

单晶六方SiC和多晶化学气相沉积SiC的常温辐照肿胀差异性

SiC具有耐辐射、低感生放射性、耐高温等特点,在先进核能系统中具有重要的应用.用1.5 MeV的Si离子在常温下注入单晶六方SiC和多晶化学气相沉积SiC,注量分别为1×10~(14)—2×10~(16)cm~(-2)和1×10~(15)—2×10~(16)cm~(-2),利用X射线衍射(XRD)仪和白光干涉仪测量材料的晶格常数和辐照肿胀随着注量增大的变化规律.结果显示:在1.5 MeV Si离子常温辐照下,注量达到2×10~(15)cm~(-2)时,单晶六方SiC完全非晶化;注量在1×10~(15)—5×10~(15)cm~(-2),单晶六方SiC的辐照肿胀明显高于多晶化学气相沉积SiC的辐照肿胀;注量达到1×10~(16)cm~(-2)时,单晶六方SiC和多晶化学气相沉积SiC的辐照肿胀达到饱和并趋于一致,肿胀结果表明常温辐照环境下多晶化学气相沉积SiC的非晶化阈值剂量大于单晶六方SiC.通过分析单晶六方SiC和多晶化学气相沉积SiC常温辐照肿胀差异的原因,研究了晶界对SiC材料非晶化肿胀规律的影响,并对XRD辐照肿胀测量方法的适用范围进行了讨论.     

GaInP/GaAs/Ge三结太阳电池不同能量质子辐照损伤模拟

以GaInP/GaAs/Ge三结太阳电池为研究对象,开展了能量为0.7, 1, 3, 5, 10 MeV的质子辐照损伤模拟研究,建立了三结太阳电池结构模型和不同能量质子辐照模型,获得了不同质子辐照条件下的I-V曲线,光谱响应曲线,结合已有实验结果验证了本文模拟结果,分析了三结太阳电池短路电流、开路电压、最大功率、光谱响应随质子能量的变化规律,利用不同辐照条件下三结太阳电池最大输出功率退化结果,拟合得到了三结太阳电池最大输出功率随位移损伤剂量的退化曲线.研究结果表明,质子辐照会在三结太阳电池中引入位移损伤缺陷,使得少数载流子扩散长度退化幅度随质子能量的减小而增大,从而导致三结太阳电池相关电学参数的退化随质子能量的减小而增大.相同辐照条件下,中电池光谱响应退化幅度远大于顶电池光谱响应退化幅度,中电池抗辐照性能较差,同时中电池长波范围内光谱响应的退化幅度比短波范围更大,表明中电池相关电学参数的退化主要来源于基区损伤.     

Control of symmetric properties of metamorphic In_(0.27)Ga_(0.73)As layers by substrate misorientation

Asymmetry in dislocation density and strain relaxation has a significant impact on device performance since it leads to anisotropic electron transport in metamorphic materials. So it is preferred to obtain metamorphic materials with symmetric properties. In this paper, we grew metamorphic In_(0.27)Ga_(0.73) As epilayers with symmetric low threading dislocation density and symmetric strain relaxation in two (110) directions using In Al Ga As buffer layers on 7°misoriented Ga As(001)substrates. To understand the control mechanism of symmetric properties of In_(0.27)Ga_(0.73) As layers by the substrate miscut angles, In_(0.27)Ga_(0.73) As grown on 2°and 15°misoriented substrates were also characterized as reference by atomic force microscopy, transmission electron microscopy, and high resolution triple axis x-ray diffraction. The phase separation and interaction of 60°misfit dislocations were found to be the reasons for asymmetry properties of In_(0.27)Ga_90.73 As grown on 2and 15°substrates, respectively. Photoluminescence results proved that the In_(0.27)Ga_(0.73) As with symmetric properties has better optical properties than the In_(0.27)Ga_(0.73) As with asymmetric properties at room temperature. These results imply that high quality metamorphic In_(0.27)Ga_(0.73) As can be achieved with controllable isotropic electron transport property.     

Radiation Damage Analysis of Individual Subcells for GaInP/GaAs/Ge Solar Cells Using Photoluminescence Measurements

The radiation damage of three individual subcells for GaInP/GaAs/Ge triple-junction solar cells irradiated with electrons and protons is investigated using photoluminescence(PL) measurements. The PL spectra of each subcell are obtained using different excitation lasers. The PL intensity has a fast degradation after irradiation,and decreases as the displacement damage dose increases. Furthermore, the normalized PL intensity varying with the displacement damage dose is analyzed in detail, and then the lifetime damage coefficients of the recombination centers for GaInP top-cell, GaAs mid-cell and Ge bottom-cell of the triple-junction solar cells are determined from the PL radiative efficiency.     

Growth condition optimization and mobility enhancement through inserting AlAs monolayer in the InP-based In_xGa_(1-x)As/In_(0.52)Al_(0.48)As HEMT structures

The structure of In P-based In_xGa_(1-x) As/In0.52Al0.48 As pseudomorphic high electron mobility transistor(PHEMT)was optimized in detail.Effects of growth temperature,growth interruption time,Si δ-doping condition,channel thickness and In content,and inserted Al As monolayer(ML) on the two-dimensional electron gas(2DEG) performance were investigated carefully.It was found that the use of the inserted Al As monolayer has an enhancement effect on the mobility due to the reduction of interface roughness and the suppression of Si movement.With optimization of the growth parameters,the structures composed of a 10 nm thick In0.75Ga0.25 As channel layer and a 3 nm thick Al As/In0.52Al0.48 As superlattices spacer layer exhibited electron mobilities as high as 12500 cm~2·V-1·s~(-1)(300 K) and 53500 cm~2·V~(-1_·s~(-1)(77 K) and the corresponding sheet carrier concentrations(Ns) of 2.8×10~(12)cm~(-2)and 2.9×1012cm~(-2),respectively.To the best of the authors' knowledge,this is the highest reported room temperature mobility for In P-based HEMTs with a spacer of 3 nm to date.     

基于分布式布拉格反射器结构的空间三结砷化镓太阳能电池抗辐照研究

根据电子辐照条件下的常规三结砷化镓太阳能电池光谱响应以及电池电流的损伤特征, 确定电池衰减的物理机理: 中电池在电子辐照后形成的辐照损伤缺陷, 使得基区少子扩散长度被大幅缩短, 影响了光生载流子的收集. 针对中电池衰减的物理机理, 设计不同的基区厚度, 验证辐照后扩散长度缩短至1.5 μm左右. 为提升中电池抗辐照性能, 消除辐照后扩散长度缩减带来的影响, 对中电池外延结构进行设计, 将中电池基区减薄至1.5 μm, 并在其下方嵌入分布式布拉格反射器, 对特定波段光反射进行二次吸收, 弥补中电池减薄的影响. 通过TFCalc光学模系设计软件模拟出的中心波长为850 nm, 15对Al_0.9Ga_0.1As/Al_0.1Ga_0.9As的分布式布拉格反射器, 实际测试最高反射率大于97%, 高反带宽94 nm, 能够满足设计要求. 此基础上进行了新结构电池的外延生长与辐照测试对比. 实验结果表明: 新结构太阳能电池辐照后短路电流衰减比原结构降低了50%, 效率的剩余因子提升2.3%.     

利用In0.82Ga0.18As与InP衬底之间的应力制作结构材料的缓冲层

采用低压金属有机化学气相淀积(LP-MOCVD)技术,在InP(100)衬底上生长In0.82Ga0.18As,研究生长温度对In0.82Ga0.18As材料表面形貌、结晶质量和电学性能的影响.利用InP(100)衬底与In0.82Ga0.18As材料晶格失配所产生的应变,在不同的生长温度下应变释放程度不同,进而在In...     

Improved thermal property of strained InGaAlAs/AlGaAs quantum wells for 808-nm vertical cavity surface emitting lasers

The 808-nm vertical cavity surface emitting laser (VCSEL) with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is designed and fabricated. Compared with the VCSELs with Al_0.05Ga_0.95As/Al_0.3Ga_0.7As quantum wells, the VCSEL with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is demonstrated to possess higher power conversion efficiency (PCE) and better temperature stability. The maximum PCE of 43.8% for 10-μm VCSEL is achieved at an ambient temperature of 30 ℃. The size-dependent thermal characteristics are also analyzed by characterizing the spectral power and output power. It demonstrates that small oxide-aperture VCSELs are advantageous for temperature-stable performance.     

1 MeV电子辐照下晶格匹配与晶格失配GaInP/GaInAs/Ge三结太阳电池辐射效应研究

对采用MOCVD方法制备的晶格匹配(LM)与晶格失配(UMM)GaInP/GaInAs/Ge三结太阳电池进行了1MeV电子辐射效应研究。结果表明:在电子辐照下,两种电池的I-V特性参数(开路电压Voc,短路电流Isc,最大输出功率Pmax)均发生衰降,且晶格失配电池的I-V特性参数衰降均大于晶格匹配电池。在光谱响应方面,对于顶电池,晶格匹配电池的衰降大于晶格失配电池;而中间电池则前者衰降小于后者;另外,Ge底电池的光谱响应表现特殊,辐照后光谱响应变强。