包含布拉格反射器的空间用GaInP/(In)GaAs/Ge三结太阳电池性能

利用光学膜系设计软件(TFCalc),设计出空间用GaInP/(In)GaAs/Ge三结太阳电池的分布式布拉格反射器(DBR)。实验结果表明由15对Al0.2Ga0.8As/Al0.9Ga0.1As组成的DBR在中心波长850nm处的反射率高达96%,使800~900nm波段内红外光被有效反射后又被二次吸收,提高了GaInAs中间电池的抗辐照能力。基于细致平衡原理,结合p-n结形成机理,对原电池结构和包含DBR的新电池结构进行厚度优化。通过对比中电池厚度为2.93μm的原电池结构和中电池厚度为1.2,1.6,2.0μm的新电池结构的辐照前外量子效率(EQE),发现新电池结构基本弥补了基区减薄对短路电流的影响。通过分析两种结构电池辐照前后的电学性能,发现DBR结构的存在明显改善了辐照后电池电流的衰减,并且中电池厚度为1.6μm的新电池结构辐照后效率高达24.87%,较原电池结构提升了近2%,基本接近中电池厚度为2.0μm的新电池结构,且明显高于1.2μm中电池厚度的新电池结构。     

具有非均匀渐变界面DBR的光学特性分析

应用特征矩阵法研究了非均匀渐变界面Al_0.9Ga_0.1As/Al_yGa_1-yAs/GaAs/Al_xGa_1-xAs DBR的光学特性.建立了非均匀渐变界面Al_yGa_1-yAs的折射率模型，并得到了渐变界面特征矩阵的解析解，通过特征矩阵法分别计算了突变GaAs/Al_0.9Ga_0.1As DBR和渐变DBR的反射谱和反射相移，分析了非均匀渐变层对DBR光学特性的影响，对渐变DBR，需要在DBR前面再增加一定厚度的非均匀渐变相位匹配层才能使整个DBR满足中心波长相位匹配条件，并通过光学厚度近似方法求出相位匹配层厚度. 关键词： DBR 反射谱 反射相移 特征矩阵法     

AlxGa1-xAs(100)表面性质的研究

用紫外光电子能谱研究了Al_0.7Ga_0.3As的表面态结构,观察到Al_0.7Ga_0.3As在价带中的两个表面态结构。在1500L原子氢吸附后消失。研究了这两个表面态结构在热退火消除表面损伤过程中的变化。结合LEED和XPS的实验结果,确定在450℃左右的热退火可以有效地消除损伤,获得一个完整的Al_0.7Ga_0.3As(100)表面。 关键词：     

氮化物抛物量子阱中类氢杂质态能量

采用变分方法研究氮化物抛物量子阱(GaN/Al_xGa_1-xN)材料中类氢杂质态的能级,给出基态能量、第一激发态能量、结合能和跃迁能量等物理量随抛物量子阱宽度变化的函数关系.研究结果表明,基态能量、第一激发态能量、基态结合能和1s→2p±跃迁能量随着阱宽L的增大而减小,最后接近于GaN中3D值.GaN/Al_0.3Ga_0.7N抛物量子阱对杂质态的束缚程度比GaAs/Al_0.3Ga_0.7As抛物量子阱强,因此,在GaN/Al_0.3-Ga_0.7N抛物量子阱中束缚于杂质中心处的电子比在GaAs/Al_0.3Ga_0.7As抛物量子阱中束缚于杂质中心处的电子稳定.     

新型复合盖层延伸波长InGaAs红外探测器结构优化设计

设计并模拟计算了延伸波长至2.6 μm的复合盖层材料PIN结构In_0.82Ga_0.18As红外探测器,即PNN型盖层、PIN结构的In_0.82Ga_0.18As红外探测器。研究了不同厚度及载流子浓度的PNN盖层对探测器性能的影响。研究结果表明:在In_0.82Al_0.18As厚度为200 nm且载流子浓度为2E18、InAs_0.6P_0.4 厚度为50 nm且载流子浓度为2E17、In_0.82Ga_0.18As厚度为50 nm且载流子浓度为2E16时,探测器表现出最佳的性能。与传统PIN结构探测器相比,其相对光谱响应度仅降低10%,暗电流降低了1个数量级。计算分析了不同工作温度下的暗电流,结果显示:在120~250 K时,暗电流主要为缺陷隧穿电流;在250~300 K时,暗电流主要为带间隧穿电流;当温度大于300 K时,暗电流主要为产生-复合电流和扩散电流。     

应力导致InAs/In0.15Ga0.85As量子点结构中In0.15Ga0.85As阱层的合金分解效应研究

利用固源分子束外延技术，在In_0.15Ga_0.85As/GaAs量子阱生长了两个InAs/In_0.15Ga_0.85As量子点(DWELL)样品.通过改变其中一个InAs DWELL样品中的In_0.15Ga_0.85As阱层的厚度和生长温度，获得了量子点尺寸增大而且尺寸分布更均匀的结果.结合光致发光光谱(PL)和压电调制光谱(PzR)实验结果，发现该样品量子点的光学性质也同时得到 关键词： 合金分解效应 0.15Ga_0.85As量子点')" href="#">InAs/In_0.15Ga_0.85As量子点 光致发光光谱 压电调制光谱     

不同散射机理对 Al2O3/InxGa1-xAs nMOSFET 反型沟道电子迁移率的影响

通过考虑体散射、界面电荷的库仑散射以及 Al₂O₃/In_xGa_1-xAs 界面粗糙散射等主要散射机理, 建立了以 Al₂O₃为栅介质In_xGa_1-xAs n 沟金属-氧化物-半导体场效应晶体管 (nMOSFETs) 反型沟道电子迁移率模型, 模拟结果与实验数据有好的符合. 利用该模型分析表明, 在低至中等有效电场下, 电子迁移率主要受界面电荷库仑散射的影响; 而在强场下, 电子迁移率则取决于界面粗糙度散射. 降低界面态密度, 减小 Al₂O₃/In_xGa_1-xAs 界面粗糙度, 适当提高In含量并控制沟道掺杂在合适值是提高 InGaAs nMOSFETs 反型沟道电子迁移率的主要途径. 关键词： InGaAs MOSFET 反型沟道电子迁移率 散射机理     

缓冲层InxGa1-xAs组分对In0.82Ga0.18As结晶质量和表面形貌的影响

采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In_0.82Ga_0.18As材料.研究缓冲层In_xGa_1-xAs的In组分对In_0.82Ga_0.18As结晶质量和表面形貌的影响.X射线衍射(XRD)用于表征材料的组分和结晶质量.用扫描电子显微镜(SEM)观察样品的表面形貌.实验结果表明,低温生长的缓冲层In_xGa_1-xAs的In组分影响高温生长的外延层In_0.82Ga_0.18As的结晶质量和表面形貌.测量得到四个样品的外延层In_0.82Ga_0.18As的X射线衍射谱峰半峰全宽(FWHM)为0.596°,0.68°,0.362°和0.391°,分别对应缓冲层In组分x=0.28,0.53,0.82,0.88,当缓冲层In组分是0.82时,FWHM最窄,表明样品的结晶质量最好.SEM观察四个样品的表面形貌,当缓冲层In组分是0.82时,样品的表面平整,没有出现交叉平行线或蚀坑等缺陷,表面形貌最佳.     

空间用GaInP/GaAs/In0.3Ga0.7 As(1 eV)倒装三结太阳电池研制

采用阶变缓冲层技术 (step-graded) 外延生长了具有更优带隙组合的倒装GaInP/GaAs/In_0.3Ga_0.7As(1.0 eV) 三结太阳电池材料, TEM和HRXRD测试表明晶格失配度为2%的In_0.3Ga_0.7As 底电池具有较低的穿透位错密度和较高的晶体质量, 达到太阳电池的制备要求. 通过键合、剥离等工艺制备了太阳电池芯片. 面积为 10.922 cm² 的太阳电池芯片在空间光谱条件下转换效率达到32.64% (AM0, 25 ℃), 比传统晶格匹配的 GaInP/GaAs/Ge(0.67 eV) 三结太阳电池的转换效率提高3个百分点. 关键词： 太阳电池 三结 倒装结构     

高迁移率In0.6Ga0.4As沟道MOSHEMT与MOSFET器件特性的研究

从模拟和实验两个方面对高迁移率In_0.6Ga_0.4As沟道金属氧化物半导体高电子迁移率晶体管（MOSHEMT）和金属氧化物半导体场效应晶体管（MOSFET）器件开展研究工作.研宄发现InAlAs势垒层对Ino_0.6Ga_0.4AsMOSHEMT的特性具有重要影响.与Ino_0.6Ga_0.4As MOSFET相比,Ino_0.6Ga_0.4As MOSHEMT表现出优异的电学特性.实验结果表明,In_0.6Ga_0.4As MOSHEMT的有效沟道迁移率达到2812 cm²/V.s^-1,是In_0.6Ga_0.4As MOSFET的3.2倍.0.02 mm栅长的MOSHEMT器件较相同栅长的MOSFET器件具有更高的驱动电流、更大的跨导峰值、更大的开关比、更高的击穿电压和更小的亚阈值摆幅.     

空间用倒装三结太阳能电池及其抗辐射性能研究

使用金属有机化学气相沉积技术,在4英寸GaAs衬底上获得了空间用GaInP/GaAs/In_(0.3)Ga_(0.7)As倒装三结太阳能电池.高分辨X射线衍射和阴极射线发光测试结果表明AlInGaAs应力渐变缓冲层的晶格弛豫度约100%,其整面平均穿透位错密度约5.4×10~6/cm~2.与GaInP/InGaAs/Ge常规三结太阳能电池相比,在AM0光谱、25℃测试条件下,面积24 cm~2的倒装三结太阳能电池转换效率达到32%,输出功率提高了5%.采用1 MeV高能电子对倒装三结电池进行粒子辐照测试,电池各项性能参数随不同辐照剂量发生改变,在1×10~(15)/cm~2辐照总剂量下电池转换效率衰降比例达到15%.     

分布布喇格反射镜的反射特性

采用等效法布里珀罗(FP)腔方法对分布布喇格反射镜(DBR)的特性进行了研究,计算并讨论了上下两层DBR结构非对称模型反射率的变化.设计了DBR反射镜的反射谱中心波长为850nm的结构.随着DBR周期数的增加,腔反射率峰值逐渐增加.上下两层DBR反射镜的厚度由反射率和中心波长决定.实验表明,下DBR的周期数为30对左右,上DBR的周期数为20对左右,易实现激光输出.非对称的双层DBR的反射特性表明理论计算与实验结果基本一致.     

Improved thermal property of strained InGaAlAs/AlGaAs quantum wells for 808-nm vertical cavity surface emitting lasers

The 808-nm vertical cavity surface emitting laser (VCSEL) with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is designed and fabricated. Compared with the VCSELs with Al_0.05Ga_0.95As/Al_0.3Ga_0.7As quantum wells, the VCSEL with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is demonstrated to possess higher power conversion efficiency (PCE) and better temperature stability. The maximum PCE of 43.8% for 10-μm VCSEL is achieved at an ambient temperature of 30 ℃. The size-dependent thermal characteristics are also analyzed by characterizing the spectral power and output power. It demonstrates that small oxide-aperture VCSELs are advantageous for temperature-stable performance.     

Radiation Damage Analysis of Individual Subcells for GaInP/GaAs/Ge Solar Cells Using Photoluminescence Measurements

The radiation damage of three individual subcells for GaInP/GaAs/Ge triple-junction solar cells irradiated with electrons and protons is investigated using photoluminescence(PL) measurements. The PL spectra of each subcell are obtained using different excitation lasers. The PL intensity has a fast degradation after irradiation,and decreases as the displacement damage dose increases. Furthermore, the normalized PL intensity varying with the displacement damage dose is analyzed in detail, and then the lifetime damage coefficients of the recombination centers for GaInP top-cell, GaAs mid-cell and Ge bottom-cell of the triple-junction solar cells are determined from the PL radiative efficiency.     

Non-destructive characterisation of (Ga,In,Al,As,P)-based ternary multilayer structures using spectroscopic ellipsometry

Spectroscopic ellipsometry has been used to measure compositions and layer thicknesses of two-, three- and four-layer structures consisting of Al_0.2Ga_0.8As/GaAs and In_0.53Ga_0.47As/Al_0.48In_0.52As/InP materials. A simple procedure has been developed to obtain Al_0.48In_0.52As dielectric functions by scaling InP values. Very good agreement has been obtained with destructive techniques.     

1 eV吸收带边GaInAs/GaNAs超晶格太阳能电池的阱层设计

使用In, N分离的GaInAs/GaNAs超晶格作为有源区是实现高质量1eV带隙 GaInNAs基太阳能电池的重要方案之一. 为在实验上生长出高质量相应吸收带边的超晶格结构, 本文采用计算超晶格电子态常用的Kronig-Penney模型比较了不同阱层材料选择下, 吸收带边为1 eV的GaInAs/GaNAs超晶格相关参数的对应关系以及超晶格应变状态. 结果表明: GaNAs与GaInAs作为超晶格阱层材料在实现1 eV的吸收带边时具有不同的考虑和要求; 在固定1 eV的吸收带边时, GaNAs材料作为阱层可获得较好的超晶格应变补偿, 将有利于生长高质量且充分吸收的太阳能电池有源区. 关键词： GaInAs/GaNAs超晶格 Kronig-Penney模型 太阳能电池     

In-situ thin film growth/etch measurement and control by laser light reflectance analysis

In this article, I report in-situ thin film growth and etching measurement and control with ultra high precision. A stack of thin film layers of AlAs/Al_0.1Ga_0.9As to form Bragg reflector for the surface emitting semi-conductor laser was grown by gas source molecular beam epitaxy on a rotating wafer and the growth process was monitored with inclined incident polarized He–Ne laser light reflectance measurement. The multiple thin film layers were preferred to increase the visibility of the oscillating intensity variation signal for feasibility experiments. The inferred growth rate from the reflectance analysis was found to be 0.15 nm/s which remained in agreement with set growth parameters. The laser light reflectance analysis method was also employed for in-situ control and measurement of thin film etching process. The inferred etching rate was found to be 0.75 nm/s by the chemical etchant H₃PO₄:H₂O₂:H₂O::3:1:100. Calibrated optical reflectance signal for growth and etching process is proposed for measuring and control their respective thickness and depth with very high accuracy and precision.     

First-principles study of stability of point defects and their effects on electronic properties of GaAs/AlGaAs superlattice

When the GaAs/AlGaAs superlattice-based devices are used under irradiation environments, point defects may be created and ultimately deteriorate their electronic and transport properties. Thus, understanding the properties of point defects like vacancies and interstitials is essential for the successful application of semiconductor materials. In the present study, first-principles calculations are carried out to explore the stability of point defects in GaAs/Al_0.5Ga_0.5As superlattice and their effects on electronic properties. The results show that the interstitial defects and Frenkel pair defects are relatively difficult to form, while the antisite defects are favorably created generally. Besides, the existence of point defects generally modifies the electronic structure of GaAs/Al_0.5Ga_0.5As superlattice significantly, and most of the defective SL structures possess metallic characteristics. Considering the stability of point defects and carrier mobility of defective states, we propose an effective strategy that Al_As, Ga_As, and Al_Ga antisite defects are introduced to improve the hole or electron mobility of GaAs/Al_0.5Ga_0.5As superlattice. The obtained results will contribute to the understanding of the radiation damage effects of the GaAs/AlGaAs superlattice, and provide a guidance for designing highly stable and durable semiconductor superlattice-based electronics and optoelectronics for extreme environment applications.