InAs/AlSb/GaSb量子阱中的双色光吸收

为了降低噪声对InAs/GaSb量子阱作为双色电探测器性能的影响,设计性能优良的光电探测器,在InAs/GaSb量子阱中加入AlSb夹层,以减少电子和空穴在界面处的复合,从而抑制由于电子和空穴复合引起的噪声。首先应用转移矩阵方法求解薛定谔方程得到量子阱中电子和空穴的能级和波函数,研究AlSb夹层对电子和空穴波函数的影响。应用平衡方程方法求解外加光场条件下的玻尔兹曼方程,研究所有电子和空穴跃迁通道对光吸收系数的贡献,重点研究了AlSb夹层厚度对光吸收系数的影响。结果表明:基于In As/GaSb的量子阱体系可以实现双色光吸收,加入AlSb夹层可以有效抑制电子和空穴在界面处的隧穿,从而降低复合噪声,同时AlSb夹层的加入也对吸收峰有影响。AlSb夹层的厚度达到2 nm即可有效降低电子和空穴复合噪声,双色光吸收峰在中远红外波段,为该量子阱作为性能良好的中远红外光电探测器提供理论支撑。     

调制掺杂的应变In_(0.60)Ga_(0.40)As/In_(0.52)Al_(0.48)As多量子阱结构的光致发光谱研究

报道了调制掺杂的应变In_(0.60)Ga_(0.40)As/In_(0.52)Al_(0.48)As多量子阱中室温光致发光光谱.观察到n=1和2电子子带到n=1重空穴子带的强发光峰.在低温下可以观察到n=1电子子带到n=1轻空穴弱发光肩胛.通过对发光强度随激发功率及温度依赖关系以及理论模型的分析研究,认为该调制掺杂量子阱中辐射复合效率降低的主要机制是应变失配位错对载流子的陷阱作用.界面上的失配位错是陷阱的主要来源.并用静态的光致发光理论模型对实验结果进行了解释.     

调制掺杂的应变In0.60Ga0.40As/In0.52Al0.48As多量子阱结构的光致发光谱研究

报道了调制掺杂的应变In_0.60Ga_0.40As/In_0.52Al_0.48As多量子阱中室温光致发光光谱.观察到n=1和2电子子带到n=1重空穴子带的强发光峰.在低温下可以观察到n=1电子子带到n=1轻空穴弱发光肩胛.通过对发光强度随激发功率及温度依赖关系以及理论模型的分析研究,认为该调制掺杂量子阱中辐射复合效率降低的主要机制是应变失配位错对载流子的陷阱作用.界面上的失配位错是陷阱的主要来源.并用静态的光致发光理论模型 关键词：     

选择性p型量子阱垒层掺杂在双波长发光二极管光谱调控中的作用

采用软件理论分析的方法对选择性p型掺杂量子阱垒层在InGaN双波长发光 二极管(LED)中的光谱调控作用进行模拟分析.分析结果表明, 选择性p型掺杂对量子阱中电子和空穴浓度分布的均衡性起到一定的调控作用, 在适当选择p型掺杂量子阱垒层层数的条件下,能够改善量子阱中载流子的 辐射复合速率, 降低溢出电子浓度,从而有效提高芯片内量子效率,并减缓内量子效率随驱动 电流增大而快速下降的趋势.随着活性层量子阱增加到特定数量, 选择性p型掺杂的调控效果更加明显, LED芯片的双波长发光峰强度达到基本均衡.     

用Ξ形四能级模型研究非对称耦合量子阱非定域激子复合发光

基于Ξ形四能级模型运用密度矩阵方程研究了非对称量子阱中非定域激子复合发光特性.理论结果表明：非定域激子复合发光具有双峰特征，两峰相对于中心跃迁频率的红移和蓝移量与电子和空穴的振荡频率密切相关.与单量子阱相比，这种频率移动对外加电场相当敏感，即当外加反向电场作小的变化时，两峰有较大的移动，表现强量子限域斯塔克效应.这意味着利用非对称量子阱在新一代高速调制器和光开关中具有潜在的应用价值. 关键词： 非对称耦合量子阱 共振隧穿 非定域激子 量子限域斯塔克效应     

GaN基LED量子阱内量子点发光性质的模拟分析

采用模拟计算的方法,运用量子点模型对GaN基LED器件中不同尺寸量子点的电致发光光谱进行模拟分析,并对器件结构中电子空穴浓度,辐射复合强度进行了研究．分析结果显示,随着量子点尺寸的增大,量子点发光波长存在红移,当圆柱状量子点半径从1．8nm增长到13nm时,波长红移309．6meV,在量子阱中生长单一尺寸的量子点可以达到不同波长的单色发光器件,而在不同量子阱中生长不同尺寸的量子点可以实现多波长发光,以及单颗LED的白色显示,并通过调节量子点的分布密度达到调节各发光波长强度的目的．结果表明,量子点分布密度调节之后多波长发光均匀性得到有效改善．     

V形GaAs/AlGaAs量子线结构的微区光致发光谱研究

在室温下用显微光致发光的方法对单根V形GaAs/AlGaAs量子线进行了沿垂直于量子线方向的 空间分辨扫描测试,观察到各种量子结构的光致发光谱随空间位置的变化.在量子线区域附 近观察到来自量子线(QWR)、颈部量子阱(NQWL)和垂直量子阱(VQWL)等各种结构的发光,而 在距离量子线约1μm以远的发光光谱表现出侧面量子阱(SQWL)的发光.对全部发光光谱用高 斯线形进行了拟合,发现QWR和SQWL的发光包含了两个荧光峰,将它们分别归诸为电子到轻 、重空穴的跃迁.拟合后发光强度的空间变化直接确定了与量子线 关键词： V形GaAs/AlGaAs量子线 显微光致发光 空间分辨扫描     

δ掺杂的赝形高电子迁移率晶体管AlGaAs/InGaAs/GaAs结构的光谱研究

报道δ掺杂赝形高电子迁移率晶体管结构Al(?)Ga(?)As/In(?)Ga(?),As/GaAs的综合光谱研究结果。采用光致发光光谱,平面光电流谱和光致发光激发光谱方法,并与理论计算相对比,确认了光致发光谱上n=1电子子带n=2电子子带到n=1重空穴子带间的强发光峰,对弱峰C的研究表明它是n=1电子子带到n=1轻空穴子带复合跃迁的发光峰。由于费密能级高于第二电子子带,没有发现文献中曾报道过的属于费密边的发光峰;平面光电流谱和光致发光激发光谱观察到n=1重空穴子带到n=1,2,3电子子带的三个激子跃迁峰。 关键词：     

量子阱垒层掺杂变化对双波长LED调控作用研究

采用APSYS软件研究了InGaN/GaN量子阱垒层掺杂变化对双波长 发光二极管发光光谱的调控问题. 在不同掺杂类型和浓度下对器件电子空穴浓度分布、 载流子复合速率、 能带结构、 发光光谱进行分析, 结果表明, 调节量子阱垒层n型和p型的掺杂浓度可以精确而有效地根据需要调控发光光谱, 解决发光光谱调控难的问题. 这些现象归因于掺杂的量子阱垒层对电子空穴分布的调控作用.     

量子阱结构对有机电致发光器件效率的影响

实验中共制备了五种有机量子阱结构电致发光器件,分别对这五种量子阱结构器件的电致发光特性进行了研究,分析了量子阱结构的周期数和势垒层的厚度对器件电学性能的影响.实验结果表明适当周期数的量子阱结构器件的亮度和电流效率比传统的三层结构器件的要大,主要原因是量子阱结构对电子和空穴的限制作用,这种限制作用提高了电子和空穴在发光层中形成激子和复合的概率,从而提高了发光的亮度和效率.当改变阱结构器件中势阱层的厚度时,也会对器件的亮度和效率产生影响,采用适当的势阱层厚度能够提高器件的亮度和效率. 关键词： 量子阱结构 电致发光 电流效率 光谱     

Two-carrier transition in radiative recombination of two-dimensional electrons in GaAs/AlGaAs

We observed photoluminescence (PL) and photoluminescence excitation (PLE) spectra due to shake-up processes of recombination of two-dimensional electrons and free excitons in a modulation-doped GaAs quantum well at He temperatures. One of the processes is that when an electron recombines with a hole, another electron is excited from the conduction band in GaAs to that in AlGaAs. The other process is that a hole is excited from an acceptor level or the valence band in GaAs to the valence band in AlGaAs during recombination. The electron process is observed in both PL and PLE spectra while the hole process only in the PL spectra. The excitation-intensity dependence of the peak intensity of hole-excited PL is almost quadratic, indicating three-carrier process in the shake-up process. The band offsets of the conduction and valence bands are estimated to be 220 and 146 meV, respectively.     

On the origin of photoluminescence in heavily-doped silicon

The origin of the photoluminescence in heavily-doped silicon is examined. Transient photoluminescence data for Si(P) are presented and used to identify the “Low Level” emission bands in terms of recombination of impurity band electrons with holes bound to acceptor sites. The “High Level” bands are attributed to recombination of impurity band electrons with free holes. The energies of the band gap and optical band gap in heavily-doped silicon are determined from the photoluminescence measurements.     

Photoluminescence of InAs Self-Organized Quantum Dots Formation on InP Substrate by MOCVD

In this letter, we present results of photoluminescence (PL) emission from single-layer and multilayer InAs self-organized quantum dots (QDs), which were grown on (001) InP substrate. The room temperature PL peak of the single-layer QDs locates at 1608 nm, and full width at half-maximum (FWHM) of the PL peak is 71 meV. The PL peak of the multilayer QDs locates at 1478 nm, PL intensity of which is stronger than that of single-layer QDs. The single-layer QD PL spectra also display excited state emission and state filling as the excitation intensity is increased. Low temperature PL spectra show a weak peak between the peaks of QDs and wetting layer (WL), which suggests the recombination between electrons in the WL and holes in the dots.     

Optical spin injection and spin lifetime in Ge heterostructures

We demonstrate optical orientation in Ge/SiGe quantum wells and study their spin properties. The ultrafast electron transfer from the center of the Brillouin zone to its edge allows us to achieve high spin polarizations and to resolve the spin dynamics of holes and electrons. The circular polarization degree of the direct gap photoluminescence exceeds the theoretical bulk limit, yielding ～37% and ～85% for transitions with heavy and light holes states, respectively. The spin lifetime of holes at the top of the valence band is estimated to be ～0.5 ps and it is governed by transitions between light and heavy hole states. Electrons at the bottom of the conduction band, on the other hand, have a spin lifetime that exceeds 5?ns below 150?K. Theoretical analysis of the spin relaxation indicates that phonon-induced intervalley scattering dictates the spin lifetime of electrons.     

Photoluminescence of ZnO films prepared by r.f. sputtering on different substrates

Polycrystalline ZnO films with good orientation were deposited on sapphire, quartz, Si and 7059 glass substrates by r.f. magnetron sputtering. A strong UV photoluminescence (PL) peak (located at 356 nm) and a weak blue emission peak (located at 446 nm) were observed at room temperature (RT) for the films deposited on sapphire, quartz and Si substrates when excited with 270 nm light. For the films prepared on Corning 7059 glass, only a strong 446 nm blue emission peak was found, and the PL intensity decreased with increasing oxygen pressure during films deposition. The intensity of the UV emission increased 7 and 14 times, respectively, for the films on sapphire and quartz substrates after high temperature annealing in vacuum. The UV emission originates from the inter-band transition of electrons and the blue emission is due to transition of electrons from the shallow donor level of the oxygen vacancies to the valence band.     

Visible photoluminescence from silicon nanopowders produced by silicon evaporation in a high-power electron beam

Silicon nanopowders produced by electron-beam-induced evaporation of a bulk silicon sample in an argon atmosphere are studied by the photoluminescence technique and Raman scattering spectroscopy. A photoluminescence peak in the visible region of the spectrum has been detected at room temperature in powders consisting of silicon nanocrystals. The strong short-wavelength shift of the photoluminescence peak can be attributed to the quantum size effect of electrons and holes in small silicon nanocrystals (about 2 nm). The size of silicon nanocrystals is determined by analyzing Raman spectra, and it is consistent with estimates obtained from photoluminescence data.     

High-Density Effects on the Exciton Systems and Their Dynamical Behavior in Al x Ga 1− x As/AlAs Quantum Wires

In Al x Ga 1 m x As/AlAs quantum wire (QWR) structures, the lower lying indirect exciton (IE) photoluminescence (PL) peak shows remarkable blue-shift under intense light-excitation contrary to the higher lying direct exciton (DE) PL band with very small blue-shift, although the two kinds of exciton states consist of the common hole state. In time-resolved PL spectra in the type-II QWR of x = 0.4, the DE PL band appears at an earlier stage without peak-shift and the excitons relax to the IE state making the IE PL peak dominant with time evolution. The blue-shift of the IE peak in a quasi equilibrium after the relaxation seriously depends on the excitation density. The origin of the blue-shift is explained in terms of many-body effects including band-bending effect due to the electric field induced by spatially separated electrons and holes in the QWR structures.     

Influence of material design parameters on radiative recombination in GaAs doping superlattices grown by MBE

The specific luminescence process in GaAs doping superlattices arises from recombination of electrons populating low-index conduction subbands with holes in the acceptor impurity band across the indirect gap in real space. The luminescence peak energy thus directly reflects the actual value of the tunable gap for the photoexcited state of the superlattice. We have studied the tunability of the effective gap, the recombination rate, and the relative quantum efficiency on superlattice specimen of different material design parameters by means of low-temperature photoluminescence measurements. For optimized design parameters the ratio between luminescence and excitation intensity remains nearly constant over the entire tunability range of the effective gap.     

原位等离子体逐层氧化a-Si:H/SiO2多层膜的光致发光研究

采用在等离子体增强化学汽相沉积系统中沉积a-Si:H和原位等离子体逐层氧化的方法制备a-Si:H/SiO2多层膜.改变a-Si:H层的厚度，首次在室温下观察到来自a-Si:H/SiO2多层膜较强的蓝色光致发光和从465到435nm的蓝移.x射线能谱证明，SiO2层是化学配比的SiO2；C-V特性表明，a-Si:H/SiO2界面得到了很好的钝化；透射电子显微镜表明，样品形成了界面陡峭的多层结构.结合光吸收谱和光致发光谱的研究，对其发光机理进行了讨论.用一维量子限制模型对光致发光峰随着a-Si:H层厚度的减小 关键词： a-Si:H/SiO2多层膜 光致发光