共查询到19条相似文献,搜索用时 125 毫秒
1.
采用脉冲激光沉积技术制备出无氢钨掺杂非晶态类金刚石膜.膜中的钨含量与靶材中的钨含量保持稳定的线性关系,显示了脉冲激光沉积在难熔金属掺杂技术方面的亮点.由于碳-钨结构的形成和表面粗糙度影响,膜层的干摩擦系数随着钨含量的增加显现出先减后增的趋势,钨含量为9.67 at.%时达到最低值0.091.钨含量的增大降低了类金刚石膜纳米硬度和杨氏模量,但最佳的膜层耐磨性参数并非表现在硬度最大(52.2 GPa)的纯类金刚石膜中,而是出现在低掺杂含量(6.28 at.%)的类金刚石膜中.研究为脉冲激光沉积技术制备低摩擦、高硬度无氢钨掺杂类金刚石膜的应用提供了技术实践. 相似文献
2.
利用脉冲高能量密度等离子体法在光学玻璃衬底上、在室温下成功的制备了光滑、致密、均匀的纳米类金刚石膜.工艺研究表明:放电电压和放电距离以及工作气体种类对纳米类金刚石膜的沉积起着关键作用.利用拉曼光谱、扫描电镜以及电子能量损失谱分析薄膜的形态结构表明:薄膜具有典型的类金刚石特征;纳米类金刚石膜的晶粒尺寸小于20nm甚至为非晶态;类金刚石膜中含有一定量的氮原子,随着沉积能量的升高,氮的含量增大.纳米类金刚石膜的薄膜电阻超过109Ω/cm2.对放电溅射过程进行了理论分析,结果与工艺研究的结论吻合. 相似文献
3.
4.
利用脉冲辉光放电的方法,在硅片上采用不同的沉积工艺制备了含氢类金刚石膜层,并采用Raman光谱和X射线光电子能谱(XPS)对膜层进行表征.用Raman光谱仪在波长为325 nm的紫外光源的激励下观察膜层的键结构.紫外Raman光谱对含氢类金刚石膜是非常有用的,它能有效避免可见光Raman光谱测量时的荧光干扰,清晰地得到膜层的D峰和G峰.同时利用XPS分析得到膜层的sp3键含量,并与Raman光谱所得数据进行比较.通过Raman光谱和XPS分析可以发现,在紫外光源的激励下,膜层的G峰峰位向高频移方向移动,G峰峰位、I(D)/I(G),G峰半高宽和sp3键含量之间存在一定的关系. 相似文献
5.
6.
7.
8.
9.
采用飞秒激光(800 nm,120 fs,3 W,1 000 Hz)制备类金刚石膜,研究了不同偏压、生长温度和氧气氛等辅助手段对激光沉积类金刚石膜的影响,实验发现在室温(25℃)、无偏压和低气压氧气氛(2 Pa)条件下沉积的类金刚石膜性能最优。在单面预镀普通增透膜的硅红外窗口材料上镀制出了无氢类金刚石膜,3~5μm波段平均透过率达到90%以上,纳米硬度高达40 GPa,用压力为9.8 N的橡皮磨头,摩擦105次,膜层未见磨损,并且通过了军标规定的高温、低温、湿热、盐雾等环境试验,所制类金刚石膜可对红外窗口起到较好的增透保护作用。 相似文献
10.
11.
This paper reports that DLC (diamond like carbon)/Ti and DLC films were prepared by
using pulsed laser arc deposition. R-ray diffraction, Auger electron spectroscopy,
Raman spectroscopy, atomic force microscopy, nanoindenter, spectroscopic
ellipsometer, surface profiler and micro-tribometer were employed to study the
structure and tribological properties of DLC/Ti and DLC films. The results show that
DLC/Ti film, with $I(D)/I(G)$ 0.28 and corresponding to 76{\%} sp$^{3}$ content
calculated by Raman spectroscopy, uniform chemical composition along depth
direction, 98 at{\%} content of carbon, hardness 8.2 GPa and Young's modulus 110.5
GPa, compressive stress 6.579 GPa, thickness 46~nm, coefficient of friction 0.08,
and critical load 95mN, exhibits excellent mechanical and tribological properties. 相似文献
12.
采用基于第一性原理的赝势平面波方法,对3个不同密度(2.6,2.9和3.2 g·cm-3)非晶碳结构的振动态密度和振动拉曼光谱进行了研究。结构模型由快速“液体-淬火”方法模拟得到,振动频率和本征模由线性响应理论决定,拉曼耦合张量由有限电场方法计算。计算结果表明:当密度从2.6增加到3.2 g·cm-3时,sp3碳含量从50%增加到84.4%,G峰向高频区偏移,D峰和G峰的强度之比ID/IG减小,T峰向低频区偏移且T峰和G峰的强度之比IT/IG增大。该结果与实验结果显示出很好的一致性。依据原子振动的分析结果证实:拉曼光谱的G峰和D峰均来自于sp2碳原子的振动贡献,且G峰是由任何成对的sp2碳原子的伸缩振动产生的,T峰来自于sp3杂化碳原子的振动贡献,G峰和T峰峰位随结构的色散是由键长变化导致的。 相似文献
13.
分别采用具有和不具有弯曲弧磁过滤器的两种真空阴极弧离子镀方法,在不同工艺参量下制备了类金刚石碳膜.采用Raman光谱和X射线光电子能谱(XPS),分析了不同工艺参量下的类金刚石碳膜的键结构,通过对Raman光谱的D峰、G峰和C1s电子结合能峰位、强度的对比,详细讨论了沉积工艺参量对类金刚石碳膜结构的影响.研究发现,不同工艺下具有高强度D峰Raman光谱的类金刚石碳膜,其C1s电子结合能却分别位于284.15,285.50eV,表明高度石墨化和高度金刚石化两种状态类金刚石碳膜,都可以形成具有高强度D峰Raman光谱曲线
关键词:
类金刚石碳膜
Raman光谱
X射线光电子能谱 相似文献
14.
在工作气体采用氩气和甲烷混合气体(4:1)的直流辉光放电中,在工作气压分别为10、20、30和40Pa以及沉积时间分别为10、20和30min下利用等离子体化学气相沉积法在内径10mm长100mm的304不锈钢管内表面制备了类金刚石薄膜,并利用喇曼光谱研究了沉积的工作气压和时间对薄膜微观结构的影响。通过对喇曼谱图进行定量解析发现:随着压强的增加,D峰、G峰位置、两峰峰宽以及其强度比值ID/IG都呈先减小后增大趋势,20Pa时达到最低点;随着沉积时间的增加,D峰、G峰位置向低波数端减小,半峰宽减小;D峰、G峰的强度比ID/IG减小。定量解析的结果表明,随沉积时间的增加,DLC薄膜中的sp3含量会增多,结构会相对更有序,薄膜中石墨团簇的尺寸会更大。 相似文献
15.
采用脉冲激光沉积方法在不同衬底温度下制备了最高硬度与弹性模量分别达45 GPa和290 GPa,且表面十分光滑的类金刚石薄膜。在相对湿度为80%的条件下,薄膜最低的摩擦系数与磨损率分别为0.045与5.74×10-10 mm3·N-1·m-1。实验结果表明,硬度与弹性模量随衬底温度升高而降低,摩擦系数与磨损率随衬底温度升高而增大。拉曼光谱表明:在室温下制备的薄膜为典型类金刚石结构,sp3含量高达76.8%,而随温度升高,薄膜结构逐渐经无定形碳结构向纳米晶石墨结构方向发展,sp3含量也随之降低,力学性能变差。 相似文献
16.
Te-Hua Fang 《Applied Surface Science》2006,252(18):6243-6248
Amorphous hydrogenated carbon (a-C:H) thin films deposited on a silicon substrate under various mixtures of methane-hydrogen gas by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) was investigated. Microstructure, surface morphology and mechanical characterizations of the a-C:H films were analyzed using Raman spectroscopy, atomic force microscopy (AFM) and nanoindentation technique, respectively. The results indicated there was an increase of the hydrogen content, the ratio of the D-peak to the G-peak (ID/IG) increased but the surface roughness of the films was reduced. Both hardness and Young's modulus increased as the hydrogen content was increased. In addition, the contact stress-strain analysis is reported. The results confirmed that the mechanical properties of the amorphous hydrogenated carbon thin films improved using a higher H2 content in the source gas. 相似文献
17.
Fe纳米颗粒嵌埋对类金刚石薄膜结构及电学性能的影响 总被引:1,自引:0,他引:1
采用脉冲激光气相沉积方法制备了不同Fe嵌埋浓度的Fe: DLC多层纳米复合薄膜。用X射线光电子能谱仪(XPS)对薄膜的组成成分进行分析。利用透射电子显微镜(TEM)、拉曼光谱、电流-电压曲线研究Fe纳米颗粒嵌埋对薄膜的微观结构及电学性能的影响。XPS和TEM表明,Fe纳米颗粒周期性地均匀地嵌埋在碳薄膜中。拉曼光谱表明薄膜中的C为典型的类金刚石结构,Fe纳米颗粒促进芳香环式结构的形成,薄膜结构的有序度提高。电流 电压曲线表明,Fe纳米颗粒的嵌埋导致薄膜的室温电导率增加。 相似文献
18.
Diamond-like carbon (DLC) films were deposited on Si (1 0 0) substrate using a low energy (219 J) repetitive (1 Hz) miniature plasma focus device. DLC thin film samples were deposited using 10, 20, 50, 100 and 200 focus shots with hydrogen as filling gas at 0.25 mbar. The deposited samples were analyzed by XRD, Raman Spectroscopy, SEM and XPS. XRD results exhibited the diffraction peaks related to SiO2, carbon and SiC. Raman studies verified the formation amorphous carbon with D and G peaks. Corresponding variation in the line width (FWHM) of the D and G positions along with change in intensity ratio (ID/IG) in DLC films was investigated as a function of number of deposition shots. XPS confirmed the formation sp2 (graphite like) and sp3 (diamond like) carbon. The cross-sectional SEM images establish the 220 W repetitive miniature plasma focus device as the high deposition rate facility for DLC with average deposition rate of about 250 nm/min. 相似文献
19.
A novel hybrid technique for diamond-like carbon (DLC) film deposition has been developed. This technique combines the electron cyclotron resonance chemical vapor deposition (ECRCVD) of C2H2 and metallic magnetron sputtering. Here we described how DLC film is used for a variety of applications such as stamper, PCB micro-tools, and threading form-tools by taking advantage of hybrid ECRCVD system. The structure of the DLC films is delineated by a function of bias voltages by Raman spectroscopy. This function includes parameters such as dependence of G peak positions and the intensity ratio (ID/IG). Atomic force microscope (AFM) examines the root-mean-square (R.M.S.) roughness and the surface morphology. Excellent adhesion and lower friction coefficients of a DLC film were also assessed. 相似文献