衬底对原位氧化制备的ZnO薄膜结构和光学性质的影响

 采用射频反应溅射法在不同衬底上制备Zn₃N₂薄膜,然后对其原位氧化制备ZnO薄膜。利用X射线衍射分析(XRD)、扫描电子显微镜(SEM)和光致发光谱(PL)等表征技术研究了不同衬底对ZnO薄膜的结晶特性和发光性能的影响。XRD研究结果显示:Zn₃N₂薄膜在500 ℃原位氧化3 h后完全转变为ZnO薄膜,在玻璃和熔融石英衬底上制备的多晶ZnO薄膜无择优取向,而单晶硅（100）衬底上的多晶ZnO薄膜具有较好的沿（002）方向的择优取向。PL测试结果显示:硅和熔融石英衬底上的多晶ZnO薄膜发光性能良好,激子复合产生的紫外发光峰很强,且半高宽较窄,而来自于深能级发射的绿色发光峰很弱;而玻璃衬底上的多晶ZnO薄膜发光性能较差。     

纤维状TiO2/Bi2O3光催化剂的制备及其光催化性能

以C₁₆H₃₆O₄Ti和Bi(NO₃)·5H₂O为原料,以棉花纤维为生物模板,合成了系列纤维状TiO₂/Bi₂O₃光催化剂．采用XRD、SEM、UV-Vis等测试技术对样品的相结构、形貌和吸光性能等进行了表征分析．结果表明,样品中的Bi₂O₃为单斜相和四方相共存的混晶,纤维长度达到毫米级,     

镧掺杂介孔TiO2光催化剂的制备、表征及其光催化性能

以钛酸四正丁酯和硝酸镧为原料, 以P123为模板剂,采用模板法合成了La掺杂型介孔TiO₂光催化剂, 借助TGA-DSC、BET、XRD及UV-Vis等测试手段对样品进行了表征,并以苯酚为模型污染物考察了镧掺杂量对样品光催化活性的影响．结果表明: La掺杂介孔TiO₂光催化剂孔径分布较均匀(～10 nm),比表面积可达165 m²/g．与纯介孔TiO₂相比,经掺杂改性后的样品在紫外光区及可见光区的吸收显著增强,对光具有更高的利用率,La掺杂可显著提高介孔TiO₂的光催化活性.     

热压制备(AgSbTe2)100-x-(GeTe)x合金的热电性能

以Pb粉、Te粉、Ag粉、Ge粉为原材料,在真空气氛下合成(AgSbTe₂)_100-x-(GeTe)_x (x=80---90) (TAGS)合金热电材料, X射线衍射(XRD)分析表明,热压烧结后合金具有低温菱形结构. 通过热压烧结法将TAGS粉末制备成块体材料,运用XRD和扫描电子显微镜对材料的物相成分、 晶体结构和形貌进行了表征.采用直流四探针法测定样品的电导率,当样品两端的温差为1---4℃ 的情况下测量Seebeck系数.通过材料热电性能测试,研究了30---500℃温度范围内不同组分 样品性能参数的变化.结果表明,所制备的TAGS热电材料具有纳米结构, 其性能随着组分的变化而变化, TAGS-80具有较好的热电性能,在530℃时具有最高热电优值(ZT=1.80).     

金属间化合物Cu4Al纳米微粉的热稳定性研究

 对采用自悬浮定向流法制备的Cu4Al纳米微粉进行了差热分析(DTA)，发现在258,423和537 ℃存在不同量值的吸热峰。参照DTA曲线上吸热峰所对应的温度，分别对粉末样品进行了模拟退火实验，热处理后样品的X射线衍射（XRD）分析证实258和423 ℃处无结构相变发生，537 ℃处的吸热峰则对应于从Cu4Al向Cu₃Al的相转变，并且伴随着Cu₃Al晶粒的长大。对比实验结果表明，Cu₄Al纳米微粉在440 ℃以下具有非常好的热稳定性，超过537 ℃将发生结构相变。     

电子束在VO2薄膜中引起的价态、相结构和光学性能的改变

 利用能量为1.7MeV, 注量分别为1.25×10¹³/cm², 1.25×10¹⁴/cm², 1.25×10¹⁵/cm²的电子束辐照VO₂薄膜,采用XPS, XRD等测试手段对电子辐照前后的样品进行分析,并研究了电子辐照对样品相变过程中光透射特性的影响。结果表明电子辐照引起VO₂薄膜中V离子出现价态变化现象,并使薄膜的X射线衍射峰发生变化。电子辐照在样品中产生的这些变化显著改变了VO₂薄膜的热致相变光学特性。     

纳米YPO4:Eu3+的合成及发光性质研究

采用水热法合成了纳米Y_1-xPO₄:xEu³⁺（005≤x≤030）系列荧光粉,并对样品进行了热处理.通过X射线衍射（XRD）、扫描电镜（SEM）等手段分析了合成样品的结构及形貌,结果表明合成的样品均为四方磷钇矿结构,在酸性和碱性条件下分别为球状和细棒状,且均在纳米尺度.研究其在真空紫外（VUV）激发下的发光性质发现,样品的激发峰最大值位于142 nm左右;与固相法的样品相比,PO^3-     

BiVO4空心微球的合成及其光催化降解亚甲基蓝的性能研究

以BiNO₃·5H₂O和NH₄VO₃为原料,柠檬酸为络合剂,成功合成了BiVO₄空心纳米球．采用TEM、XRD、UV-Vis等测试技术对样品的形貌、相结构以及光吸收性能等进行了表征．结果表明,所制备的BiVO₄空心微球在紫外区和可见区均有较强的光吸收,空心球平均粒径为160 nm,空腔直径为10～80 nm．以亚甲基蓝染料溶液的脱色降解实验为模型反应研究了样品的光催化性能．光催化实验结果表明,在可见光照射下,反应150 min后,样品对亚甲基蓝溶液的脱色率可达到95%以上．此外,考察了柠檬酸添加量对空心球形貌的影响,并提出了BiVO₄空心纳米球的可能形成机理．     

脉冲激光沉积制备的Co80Cr20/Ti90Cr10薄膜的结构与磁性

用脉冲激光沉积(PLD)的方法在硅单晶基片上制备了Ti₉₀Cr₁₀和Co₈₀Cr₂₀/Ti₉₀Cr₁₀薄膜，用XRD研究了Ti₉₀Cr₁₀薄膜的晶体结构与制备温度的关系，结果表明随着温度升高，薄膜从非晶态逐步向晶态转化，并且计算了Ti₉₀Cr₁₀薄膜的晶粒大小以及晶格常数. 利用透射电镜对Ti₉₀Cr₁₀薄膜进行了表面和截面形貌的表征. 采用纳米压痕仪对Ti₉₀Cr₁₀薄膜的硬度和膜基界面结合力进行了分析，表明薄膜的硬度和膜基结合力随制备条件改变有所变化，制备温度增加，薄膜的硬度和膜基结合力随之增加. 利用Ti₉₀Cr₁₀薄膜作为中间层，用PLD制备了Co₈₀Cr₂₀磁性层，获得了很好的垂直磁化性质，膜厚减小，矫顽力和矩形比有所增加，600℃真空条件下制备的Co₈₀Cr₂₀(8 nm)/Ti₉₀Cr₁₀(14 nm)薄膜的矫顽力为65.25 kA/m，矩形比为0.86，并且讨论了Co₈₀Cr₂₀/Ti₉₀Cr₁₀薄膜的磁化性质.     

蓝宝石衬底SnO2:Sb薄膜的制备及结构和光致发光性质

用射频磁控溅射法在蓝宝石(0001)衬底上制备出锑掺杂的氧化锡(SnO₂:Sb)薄膜.对制备薄膜的结构和发光性质进行了研究.制备样品为多晶薄膜，具有纯SnO₂的四方金红石结构.室温条件下对样品进行光致发光测量，在334 nm附近观测到紫外发射峰，并对SnO₂:Sb的光致发光机制进行了研究.     

Preparation of CuIn(S,Se)2 thin films by thermal crystallization in sulfur and selenium atmosphere

Thin films of CuIn(S,Se)₂ were prepared by thermal crystallization process for photovoltaic device applications and their properties were investigated. From EPMA analysis, S/(S+Se) atomic ratio in the thin films was changed from 0.18 to 1.0 with increasing the S/(S+Se) vapor ratio in the quartz ampoule. X-ray diffraction studies revealed that the thin films had a chalcopyrite CuIn(S,Se)₂ structure and the preferred orientation to the 112 plane. The SEM images showed that the grain sizes in CuIn(S,Se)₂ thin films decreased with the increase in the S/(S+Se) atomic ratio.     

Band gap tunable and improved microstructure characteristics of Cu2ZnSn(S1−x,Sex)4 thin films by annealing under atmosphere containing S and Se

Cu₂ZnSn(S_xS_1?x)₄ (CZTSSe) thin films were prepared by annealing a stacked precursor prepared on Mo coated glass substrates by the sputtering technique. The stacked precursor thin films were prepared from Cu, SnS₂, and ZnS targets at room temperature with stacking orders of Cu/SnS₂/ZnS. The stacked precursor thin films were annealed using a tubular two zone furnace system under a mixed N₂ (95%) + H₂S (5%) + Se vaporization atmosphere at 580 °C for 2 h. The effects of different Se vaporization temperature from 250 °C to 500 °C on the structural, morphological, chemical, and optical properties of the CZTSSe thin films were investigated. X-ray diffraction patterns, Raman spectroscopy, and X-ray photoelectron spectroscopy results showed that the annealed thin films had a single kesterite crystal structure without a secondary phase. The 2θ angle position for the peaks from the (112) plane in the annealed thin films decreased with increasing Se vaporization temperature. Energy dispersive X-ray results showed that the presence of Se in annealed thin films increased from 0 at% to 42.7 at% with increasing Se vaporization temperatures. UV–VIS spectroscopy results showed that the absorption coefficient of all the annealed thin films was over 10⁴ cm^?1 and that the optical band gap energy decreased from 1.5 eV to 1.05 eV with increasing Se vaporization temperature.     

电沉积－退火工艺制备铜铟硒太阳能电池薄膜及表征

利用电沉积硒气氛下后续退火的工艺制备出了高结晶质量的铜铟硒薄膜．通过X射线衍射、扫描电子显微镜、拉曼光谱、紫外-可见-近红外光谱和阻抗谱技术对退火后的铜铟硒薄膜进行表征,结果表明530 oC硒化退火后的铜铟硒薄膜具有四方的黄铜矿晶体结构,晶粒尺寸达到微米量级,光学带隙为0.98 eV,经过KCN溶液去除表面高导电性的铜硒化合物后铜铟硒薄膜的载流子浓度在10¹⁶ cm^-3量级．利用硒化退火的铜铟硒薄膜作为光吸收层制备了结构为AZO/i-ZnO/CdS/CIS/Mo/glass的太阳能电池,在AM1.5光照条件下对其电流-电压特性测试后发现面积为0.2 cm²的电池可以达到0.96％的能量转换效率,并对限制电池效率的原因做出了初步的分析和讨论.     

AgSbSe2 and AgSb(S,Se)2 thin films for photovoltaic applications

Silver antimony selenide (AgSbSe₂) thin films were prepared by heating sequentially deposited multilayers of antimony sulphide (Sb₂S₃), silver selenide (Ag₂Se), selenium (Se) and silver (Ag). Sb₂S₃ thin film was prepared from a chemical bath containing SbCl₃ and Na₂S₂O₃, Ag₂Se from a solution containing AgNO₃ and Na₂SeSO₃ and Se thin films from an acidified solution of Na₂SeSO₃, at room temperature on glass substrates. Ag thin film was deposited by thermal evaporation. The annealing temperature was 350 °C in vacuum (10⁻³ Torr) for 1 h. X-ray diffraction analysis showed that the thin films formed were polycrystalline AgSbSe₂ or AgSb(S,Se)₂ depending on selenium content in the precursor films. Morphology and elemental analysis of these films were done using scanning electron microscopy and energy dispersive X-ray spectroscopy. Optical band gap was evaluated from the UV-visible absorption spectra of these films. Electrical characterizations were done using Hall effect and photocurrent measurements. A photovoltaic structure: glass/ITO/CdS/AgSbSe₂/Al was formed, in which CdS was deposited by chemical bath deposition. J-V characteristics of this structure showed V_oc = 435 mV and J_sc = 0.08 mA/cm² under illumination using a tungsten halogen lamp. Preparation of a photovoltaic structure using AgSbSe₂ as an absorber material by a non-toxic selenization process is achieved.     

Influence of annealing temperature on properties of Cu(In,Ga)(Se,S)2 thin films prepared by co-sputtering from quaternary alloy and In2S3 targets

Pentanary Cu(In,Ga)(Se,S)₂ (CIGSS) thin films were deposited on soda-lime glass substrate by co-sputtering quaternary alloy, and In₂S₃ targets. In this study, we investigated the influence of post-annealing temperature on structural, compositional, electrical, and optical properties of CIGSS films. Our experimental results show that the CIGS quaternary target had chalcopyrite characteristics. All CIGSS films annealed above 733 K exhibited a polycrystalline tetragonal chalcopyrite structure, with (1 1 2) preferred orientation. The carrier concentration and resistivity of the resultant CIGSS layer annealed above 763 K was 4.86×10¹⁶ cm⁻³ and 32 Ω cm, respectively, and the optical band-gap of the CIGSS absorber layer was 1.18 eV. Raman spectral analysis demonstrated the existence of many different phases, including CuInSe₂, CuGaSe₂, and CuInS₂. This may be because the vibration frequencies of In-Se, In-S bonds are similar to the Ga-Se and Ga-S bonds, causing their absorption bands overlap.     

Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation

Transparent Si-doped TiO₂ thin films (Si-TiO₂) were deposited on quartz glasses using electron beam evaporation (EBE) and annealed at different temperature in an air atmosphere. The structure and morphology of these films were analyzed by X-ray diffraction (XRD), Raman microscopy (Raman), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Meanwhile the photocatalytic activity of the films has also been evaluated on the basis of the degradation degree of rhodamine B in aqueous solution. Our experimental results suggest that the annealing temperature impact a strong effect on the structure, morphology and photocatalytic activity of Si-TiO₂ thin films. Furthermore the enhanced thermal stability of Si-TiO₂ films enabled them to elevate the phase transformation temperature of TiO₂ from anatase to rutile and enhanced the photocatalytic efficiency.     

Influence of heating rate on the crystalline properties of 0.7BiFeO3-0.3PbTiO3 thin films prepared by sol-gel process

0.7BiFeO₃-0.3PbTiO₃ (BFPT7030) thin films were deposited on SiO₂/Si substrates by sol-gel process. The influence of heating rate on the crystalline properties of BFPT7030 thin films were studied by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). XRD patterns of the films showed that a pure perovskite phase exists in BFPT7030 films annealed by rapid thermal annealing (RTA) technique. SEM and AFM observations demonstrated that the BFPT7030 films annealed by RTA at 700 °C for 90 s with the heating rate of 1 °C s⁻¹ could show a dense, crack-free surface morphology, and the films’ grains grow better than those of the films annealed by RTA at the same temperature with other heating rates. XPS results of the films indicated that the ratio of Fe³⁺:Fe²⁺ is about 21:10 and 9:5 for the films annealed by RTA at 700 °C for 90 s with the heating rate of 1 and 20 °C s⁻¹, respectively. That means the higher the heating rate, the higher the concentration of Fe²⁺ in the BFPT7030 thin films.     

共溅射和离子注入制备的SiO2(Eu)薄膜中Eu3+到Eu2+的转变

采用共溅射方法和Eu离子注入热生长的SiO₂方法得到SiO₂(Eu)薄膜,Eu离子的浓度为4%和0.5%.对样品X射线吸收近边结构(XANES)的研究和分析表明,在高温氮气中发生了Eu³⁺向Eu²⁺的转变.SiO₂(Eu)薄膜高温氮气退火下蓝光的发射证明了这一结论 关键词： 2(Eu)薄膜')" href="#">SiO₂(Eu)薄膜 XANES     

磁控共溅射法制备的Zn2GeO4多晶薄膜结构及其光致发光研究

用射频磁控共溅射方法在不同温度的单晶硅基片上生长薄膜,然后在800℃真空环境下对薄膜进行退火处理,成功获得了结晶状态良好的Zn₂GeO₄多晶薄膜.利用X射线衍射(XRD),X射线光电子能谱(XPS)和原子力显微镜(AFM)对薄膜进行了结构、成分和形貌分析,研究了基片温度对三者的影响. 结果显示,当基片温度升高到400℃以上时,薄膜中的Zn₂GeO₄晶粒在(220)方向上显示出了明显的择优取向. 当基片温度在500—600℃范围内,有利于GeO₂结晶相的形成. XPS显示薄膜中存在着Zn₂GeO₄,GeO₂,GeO,ZnO四种化合态. 同时,随着基片温度的升高,晶粒尺寸增大且薄膜表面趋于平整. 薄膜的光致发光在绿光带存在中心波长为530和550nm两个峰,应该归因于主体材料Zn₂GeO₄中两个不同的Ge²⁺的发光中心. 关键词： 射频磁控溅射 2GeO₄')" href="#">Zn₂GeO₄ 荧光体     

Effects of annealing on structural and morphological properties of e-beam evaporated AgGaSe2 thin films

Polycrystalline AgGaSe₂ thin films were deposited by using single crystalline powder of AgGaSe₂ grown by vertical Bridgman-Stockbarger technique. Post-annealing effect on the structural and morphological properties of the deposited films were studied by means of X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) with energy dispersive X-ray analysis (EDXA) measurements. XRD analysis showed that as-grown films were in amorphous structure, whereas annealing between 300 and 600 °C resulted in polycrystalline structure. At low annealing temperature, they were composed of Ag, Ga₂Se₃, GaSe, and AgGaSe₂ phases but with increasing annealing temperature AgGaSe₂ was becoming the dominant phase. In the as-grown form, the film surface had large agglomerations of Ag as determined by EDXA analysis and they disappeared because of the triggered segregation of constituent elements with increasing annealing temperature. Detail analyses of chemical composition and bonding nature of the films were carried out by XPS survey. The phases of AgO, Ag, Ag₂Se, AgGaSe₂, Ga, Ga₂O₃, Ga₂Se₃, Se and SeO₂ were identified at the surface (or near the surface) of AgGaSe₂ thin films depending on the annealing temperature, and considerable changes in the phases were observed.