Accumulation effect of SiO_2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO_2/SiO_2 coatings

The accumulation effects in high-reflectivity(HR) HfO2/SiO2 coatings under laser irradiation are investigated.The HR HfO2/SiO2 coatings are prepared by electron beam evaporation at 1 064 nm.The laser-induced damage threshold(LIDT) are measured at 1 064 nm and at a pulse duration of 12 ns,in 1-on-1 and S-on-1 modes.Multi-shot LIDT is lower than single-shot LIDT.The laser-induced and native defects play an important role in the multi-shot mode.A correlative theory model based on critical conduction band electron density is constructed to elucidate the experimental phenomena.     

Study on high-reflective coatings of different designs at 532 nm

Conventional HfO2/SiO2 and Al2O3/HfO2/SiO2 double stack high reflective （HR） coatings at 532 nm are deposited by electron beam evaporation onto BK7 substrates. The laser-induced damage threshold （LIDT） of two kinds of HR coatings is tested, showing that the laser damage resistance of the double stack HR coatings （16 J/cm2） is better than that of the conventional HR coatings （12.8 J/cm2）. Besides, the optical properties, surface conditions, and damage morphologies of each group samples are characterized. The results show that laser damage resistance of conventional HR coatings is determined by absorptive defect, while nodular defect is responsible for the LIDT of double stack HR coatings.     

Impact of organic contamination in vacuum on laser-induced damage threshold of TiO2/SiO2 dielectric mirrors

The influence of organic contamination in vacuum on the laser-induced damage threshold (LIDT) of coatings is studied. TiO2/SiO2 dielectric mirrors with high reflection at 1064 nm are deposited by the electronbeam evaporation method and their LIDTs are measured in vacuum and atmosphere, respectively.It is found that the contamination in vacuum is easily attracted to optical surfaces because of the low pressure and becomes the source of damage, O2 molecules in vacuum with contamination can accelerate the laser-induced damage by observing LIDT and damage morphologies. LIDTs of mirrors have a little change in vacuum compared with in atmosphere when the organic contamination is wiped off. The results indicate that organic contamination is a significant reason to decrease the LIDT in vacuum.     

Effect of standing-wave field distribution on femosecond laser-induced damage of HfO_2/SiO_2 mirror coating

Single-pulse and multi-pulse damage behaviors of "standard"(with λ/4 stack structure) and "modified"(with reduced standing-wave field) HfO2/SiO2 mirror coatings are investigated using a commercial 50-fs,800-nm Ti:sapphire laser system.Precise morphologies of damaged sites display strikingly different features when the samples are subjected to various number of incident pulses,which are explained reasonably by the standing-wave field distribution within the coatings.Meanwhile,the single-pulse laser-induced damage threshold of the "standard" mirror is improved by about 14% while suppressing the normalized electric field intensity at the outmost interface of the HfO2 and SiO2 layers by 37%.To discuss the damage mechanism,a theoretical model based on photoionization,avalanche ionization,and decays of electrons is adopted to simulate the evolution curves of the conduction-band electron density during pulse duration.     

Damage on HfO2/SiO2 high-reflecting coatings under single and multiple Nd:YAG laser pulse irradiation

The single- and multi-shot damage behaviors of HfO2/SiO2 high-reflecting (HR) coatings under Nd:YAG laser exposure were investigated. Fundamental aspects of multi-shot laser damage, such as the instability due to pulse-to-pulse accumulation of absorption defect and structural defect effect, and the mechanism of laser induced defect generation, are considered. It was found in multi-shot damage, the main factors influencing laser-induced damage threshold (LIDT) are accumulation of irreversible changes of structural defects and thermal stress that induced by thermal density fluctuations.     

Effect of λ/2 SiO_2 overcoat on the laser damage of HfO_2/SiO_2 high-reflector coatings

The effect of λ/2 SiO2 overcoat on the laser damage characteristics of HfO2/SiO2 high-reflector (HR) coatings is investigated with 1-on-l and N-on-1 laser damage test methods. The laser damage surface of 1-on-l is analyzed by a step analyzer. The surface morphologies show that laser damage makes the coating damaged area protrudent and rough for HR coating without λ/2 silica overcoat, but concave and smooth for HR coating with A/2 silica overcoat. The result of 10-on-l multi-pulse irradiation on the same point of the coating shows that there is an energy density stage on the damage curve. If the laser energy density is within the range of the stage, HfO2/SiO2 HR coatings with λ/2 silica overcoat will not be damaged more than 2 times for multi-shots, and the surface damages are very slight so that there is no impact on the coating performance. Another interesting result is that the energy density stage extends from the damage threshold to the point of about 3 times of threshold, which is similar to the     

Influence of APS bias voltage on properties of HfO_2 and SiO_2 single layer deposited by plasma ion-assisted deposition

HfO2 and SiO2 single layer is deposited on glass substrate with plasma ion assistance provided by Leybold advanced plasma source (APS). The deposition is performed with a bias voltage in the range of 70-130 V for HfO2, and 70-170 V for SiO2. Optical, structural, mechanical properties, as well as absorption and laser induced damage threshold at 1064 nm of HfO2 and SiO2 single layer deposited with the plasma ion assistance are systematically investigated. With the increase of APS bias voltage, coatings with higher refractive index, reduced surface roughness, and higher laser-induced damage threshold (LIDT) are obtained, and no significant change of the absorption at 1064 nm is observed. For HfO2, a bias voltage can be identified to achieve coatings without any stress. However, too-high bias voltage can cause the increase of surface roughness and stress, and decrease the LIDT. The bias voltage can be properly identified to achieve coatings with desired properties.     

He-Ne散射光检测光学薄膜激光损伤阈值

准确测定光学薄膜的激光损伤阈值可以衡量光学薄膜的抗激光损伤能力,测定损伤阈值的关键是准确地判定损伤的发生与否。建立了He-Ne散射光检测光学薄膜激光损伤阈值系统。通过测量同一样品点的He-Ne散射光能量变化来判断薄膜表面发生的损伤,并对制备的类金刚石薄膜与HfO₂/SiO₂反射膜进行了阈值测试。与等离子体闪光法的阈值测试结果进行比较,具有较好的一致性。分析表明：He-Ne散射光测试系统能有效地判断出激光诱导损伤,易于实现在线检测。     

Study on Laser Conditioning of Optical Coatings

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基于分数泰伯效应的激光损伤阈值测量

 介绍了一种基于分数泰伯效应的单脉冲激光损伤阈值测量方法。该方法是根据六角相位光栅的分数泰伯效应，将激光光束整形成许多不同能量密度的高斯形状光斑，通过比较光斑分布图和损伤分布图即可统计计算得到各个能量密度区间的损伤概率。根据角谱传输理论数值模拟得到了六角相位光栅的分数泰伯像并得到实验验证。用该方法和传统的1on1测得HfO₂/SiO₂高反介质膜的激光零损伤阈值分别为7.9和8.0 J/cm²，并进行了误差分析。     

Intrinsic ZnO films fabricated by DC sputtering from oxygen-deficient targets for Cu（In,Ga）Se2 solar cell application

Samples with nodular defects grown from gold nanoparticles are prepared,and laser-induced damage tests are conducted on them.Nodular defects,which are in critical state of damage,are cross-sectioned by focusing on the ion beam and by imaging using a field emission scanning electron microscope.The crosssectional profile shows that cracks are generated and propagated along the nodular boundaries and the HfO2/SiO2 interface,or are even melted.The thermomechanical process induced by the heated seed region is analyzed based on the calculations of temperature increase and thermal stress.The numerical results give the critical temperature of the seed region and the thermal stress for crack generation,irradiated with threshold fluence.The numerical results are in good agreement with the experimental ones.     

Impact of organic contamination on laser-induced damage threshold of high reflectance coatings in vacuum

The influence of organic contamination in vacuum on the laser-induced damage threshold (LIDT) of coatings is studied. TiO₂/SiO₂ dielectric mirrors with high reflection at 1064 nm are deposited by the electron beam evaporation method. The LIDTs of mirrors are measured in vacuum and atmosphere, respectively. It is found that the contamination in vacuum is easily attracted to optical surfaces because of the low pressure and becomes the source of damage. LIDTs of mirrors have a little change in vacuum compared with in atmosphere when the organic contamination is wiped off. The results indicate that organic contamination is a significant reason to decrease the LIDT. N₂ molecules in vacuum can reduce the influence of the organic contaminations and prtectect high reflectance coatings.     

Effects of water vapor in high vacuum chamber on the properties of HfO2 films

The influence of water vapor content in high vacuum chamber during the coating process on physical properties of HfO2 films was investigated. Coatings were deposited on BK7 substrates by electron beam evaporation and photoelectric maximum control method. An in situ residual gas analyzer (RGA) was used to monitor the residual gas composition in the vacuum chamber. The optical properties, microstructure,absorption and laser-induced damage threshold (LIDT) of the samples were characterized by Lambda 900 spectrophotometer, X-ray diffraction (XRD), surface thermal lensing (STL) technique and 1064-nm Qswitched pulsed laser at a pulse duration of 12 ns respectively. It was found that a cold trap is an effective equipment to suppress water vapor in the vacuum chamber during the pumping process, and the coatings deposited in the vacuum atmosphere with relatively low water vapor composition show higher refractive index and smaller grain size. Meanwhile, the higher LIDT value is corresponding to lower absorbance.     

大气常压等离子射流清洗溶胶-凝胶SiO_2膜表面油脂污染物

采用大气常压等离子射流技术对溶胶-凝胶SiO2膜表面的油脂污染物进行清洗。利用分光光度计、扫描电子显微镜、红外光谱仪对溶胶-凝胶SiO2膜透过率、表面形貌、化学结构进行表征,并分析清洗前后溶胶-凝胶SiO2膜的激光损伤阈值变化。损伤阈值测试表明,1064nm波长的激光损伤阈值由污染后的16.08J/cm2上升到24.41J/cm2,与污染前24.72J/cm2的损伤阈值相当。同时还获取清洗的最佳时间为10s。清洗前后,溶胶-凝胶SiO2膜保持完好,且未产生新的有机污染物。研究结果表明:大气常压等离子射流技术可对溶胶-凝胶SiO2膜表面的油脂污染物进行有效地清洗,从而提高溶胶-凝胶SiO2膜的透过率和激光损伤阈值,为高功率激光装置的稳定运行提供保障。     

双离子束溅射沉积HfO­­2光学薄膜的研究

 用双离子束溅射沉积氧化铪光学薄膜，并对此工艺下制备的氧化铪薄膜进行了光学性质、残余应力、结构特性以及激光损伤特性的研究。实验结果表明，用双离子束溅射沉积的氧化铪薄膜不仅结构均匀,膜层致密,无定形结构，而且具有极低的散射和吸收,均匀的非晶结构,杂质缺陷少,激光损伤阈值高。     

用1064nm激光增强HfO2/SiO2薄膜的抗激光损伤能力的实验研究

 用1 064nm激光实验研究了HfO₂/SiO₂薄膜的激光损伤增强效应，实验以薄膜激光损伤阈值70%的激光能量开始，采用N-ON-1方式处理薄膜，激光脉冲的能量增量为5J/cm²。实验结果表明，激光处理薄膜表面能使激光损伤阈值平均提高到3倍左右，并且薄膜的损伤尺度也明显减小。对有缺陷的薄膜，其缺陷经低能量激光后熔和消除，其抗激光损伤能力得到增强，但增强得并不显著，而薄膜本身的激光预处理，可以使其激光损伤阈值大大提高。     

Effect of native defects and laser-induced defects on multi-shot laser-induced damage in multilayer mirrors

The roles of laser-induced defects and native defects in multilayer mirrors under multi-shot irradiation condition are investigated. The HfO 2 /SiO 2 dielectric mirrors are deposited by electron beam evaporation(EBE) . Laser damage testing is carried out on both the 1-on-1 and S-on-1 regimes using 355-nm pulsed laser at a duration of 8 ns. It is found that the single-shot laser-induced damage threshold(LIDT) is much higher than the multi-shot LIDT. In the multi-shot mode,the main factor influencing LIDT is the accumulation of irreversible laser-induced defects and native defects. The surface morphologies of the samples are observed by optical microscopy. Moreover,the number of laser-induced defects affects the damage probability of the samples. A correlative model based on critical conduction band(CB) electron density(ED) is presented to simulate the multi-shot damage behavior.     

SiO2半波覆盖层对HfO2/SiO2高反膜激光损伤的影响

 研究了SiO₂半波覆盖层对HfO₂/SiO₂高反射膜1064nm激光损伤的影响,分析薄膜的激光损伤特性及图貌得出, 对于单脉冲（1-ON-1）激光损伤,SiO₂半波覆盖层能提高HfO₂/SiO₂高反膜的激光损伤阈值;可显著降低激光损伤程度,减小灾难性损伤发生的概率;可大幅度提高HfO₂/SiO₂高反膜膜的抗激光损伤能力。     

HfO2中ZrO2含量对266nm HfO2/SiO2多层膜反射率的影响

用两种不同纯度的HfO2材料与同一纯度的SiO2材料组合,沉积Λ／4规整膜系(HL)^11H形成266nm的紫外反射镜,发现反射率相差0．7％左右。用X光电子能谱法分析了高反膜中表层HfO2中的成分,发现ZrO2的含量相差一个数量级左右。为确定形成这种差别的原因,用辉光放电质谱法测定了这两种HfO2材料中锆(Zr)及其钛(Ti)、铁(Fe)的含量,发现Zr是其中的最主要的杂质,两种HfO2材料中Zr含量有一个数量级的差别。说明在266nm波段,HfO2中ZrO2的含量会对HfO2／SiO2高反膜的反射率造成影响。根据HfO2单层膜的光谱曲线,推算出了这两种材料的消光系数的差别,并用Tfcalc膜系设计软件进行理论和镀制结果的模拟,得到与实验测试一致的结果。     

高损伤阈值三倍频分离膜

 设计了Nd：YAG激光用三倍频分离膜,膜层材料为SiO₂和HfO₂。经过优化,膜系在355 nm处的反射率在99%以上,在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术,在熔融石英基底上制备了样品,经测量,制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm²,并用微分干涉显微镜表征了薄膜损伤形貌。