空穴注入层对蓝色有机电致发光器件性能的影响

以DPVBi为发光层,NPB为空穴传输层,在阳极ITO和NPB之间分别插入不同的空穴注入层CuPc和PEDOT:PSS,制备了两种结构的蓝色有机电致发光器件(OLEDs):ITO/CuPc/NPB/DPVBi/BCP/Alq3/Al和ITO/PEDOT:PSS/NPB/DPVBi/BCP/Alq3/Al,研究了不同空穴注入材料对蓝色OLEDs发光性能的影响,并与没有空穴注入层的器件进行了比较.其中CuPc分别采用旋涂和真空蒸镀两种丁艺,比较了不同成膜工艺对器件发光特性的影响.结果表明:加入空穴注入层的器件比没有空穴注入层器件性能要好,其中插入水溶性CuPc的器件,其发光亮度和效率虽然比蒸镀CuPc器件要低,但比插入PEDOT:PSS 器件发光性能要好.又由于水溶性CuPc采用旋涂工艺成膜,与传统CuPc相比,制备工艺简单,所以为一种不错的空穴注入材料.     

同时掺杂磷光和荧光染料的白色有机电致发光器件性能研究

以磷光染料Ir(piq)₂(acac)作为发光掺杂剂,掺入空穴传输性主体材料NPB中得到红色发光层,荧光材料TBP掺入到主体CBP中作为蓝色发光层,制备了结构为ITO/NPB/NPB：Ir(piq)₂(acac)/CBP/CBP：TBPe/BCP/ALq/Mg：Ag的双发光层白色有机电致发光器件.其中ALq₃、未掺杂的NPB和CBP及BCP层分别作为电子传输层、空穴传输层和激子阻挡层.实验中通过调节发光层厚度及Ir(piq)_{2关键词： 磷光 激子阻挡层 有机电致发光}     

一种多层白色磷光有机电致发光器件的制备及性能研究

制备了一种结构为ITO/NPB/NPB:Ir(piq)₂(acac)/CBP:TBPe/BAlq:rubrene/BAlq/Alq₃/Mg:Ag的白色磷光有机电致发光器件.其中空穴传输型主体NPB掺杂磷光染料Ir(piq)₂(acac)作为红色发光层,双载流子传输型主体4,4′-N,N′-dicarbazole-biphenyl (CBP)掺杂TBPe作为蓝色发光层,电子传输型主体材料BAlq掺杂rubrene作为绿色发光层.以上发光层夹于 关键词： 电致发光 磷光染料 异质结 白光     

有机/有机界面污染对有机电致发光器件稳定性的影响(英文)

有机电致发光器件的稳定性是其实用化面临的主要难题之一。为了研究有机/有机界面性质对有机电致发光器件稳定性的影响,采用溶液旋涂的NPB(NPBSC)作为器件的空穴传输层制备了两种异质结电致发光器件:ITO/NPBSC/Alq3/LiF/Al和ITO/NPBSC/NPB/Alq3/LiF/Al,对比研究了器件的发光性能和工作稳定性。研究结果表明:完全使用NPBSC作为空穴传输层的器件性能和稳定性都较差,这归因于不稳定的NPBSC/Alq3界面,在空气中旋涂制备NPB层时,空气中的水蒸气和氧气分子会粘附在空穴传输层表面,这样就会引起界面处Alq3分子的发光猝灭。插入10 nm真空蒸镀的NPB层可以显著地提高器件的发光性能和稳定性,10 nm的NPB层把污染界面与激子复合区界面分开,避免了水蒸气和氧气分子对Alq3分子的发光猝灭,器件的效率增加了1.15 cd/A,半衰期寿命提高了4倍。     

不同主体双发光层白色有机电致发光器件的性能研究

制备了结构为ITO/NPB/CBP:TBPe:rubrene/BAlq:Ir(piq)₂(acac)/BAlq/Alq₃/Mg:Ag的白色磷光有机电致发光器件.利用两种不同的主体材料,即用双载流子传输型主体材料CBP掺杂荧光染料TBPe及rubrene作为蓝光和橙黄光发光层;用电子传输型主体材料BAlq掺杂磷光染料Ir(piq)₂(acac)作为红色发光层.以上双发光层夹于空穴传输层NPB与具有电子传输性的阻挡层BALq之间.讨论了如何控制 关键词： 有机电致发光 磷光染料 掺杂 白光     

空穴传输层对有机电致发光器件性能的影响

制备了结构为ITO/MoO₃(40 nm)/空穴传输层/CBP:Ir(ppy)₂acac(8%)(30 nm)/BCP(10 nm)/Alq₃(40 nm)/LiF(1 nm)/Al(100 nm)的器件,其中Ir(ppy)₂acac为绿色磷光染料,空穴传输层分别为TAPC(50 nm)、TAPC(40 nm)/TCTA(10 nm)、NPB(50 nm)、NPB(40 nm)/TCTA(10 nm)。通过使用4种不同结构的空穴传输层,对器件的发光性能进行了研究。结果表明,空穴传输层对器件的发光性能有较大影响。在电压为6 V、电流密度为2 mA/cm²的条件下,4种结构的器件的电流效率分别为52.5,67.8,35.6,56.6 cd/A。其原因是TAPC/TCTA及NPB/TCTA能级结构更有利于空穴对发光层的注入而且TAPC拥有较高的空穴迁移率;另外,TAPC及TCTA拥有较高的LUMO和三线态能量,可以有效地将电子和三线态激子束缚在发光层内,增加绿光染料的复合发光几率。所制备的器件均表现出良好的色坐标稳定性。     

PVK空穴传输层对有机电致发光器件性能的影响

以聚乙烯基咔唑poly(N-vinylcarbazole)(PVK)旋涂层为空穴传输层,着重研究了PVK层厚度对双层器件氧化铟锡(ITO)/PVK/tris-(8-hydroxyquinoline)aluminum(Alq₃)/Mg:Ag/Al器件性能的影响。测试结果表明,当Alq₃层厚度一定时(50nm),只有PVK层为适当厚度(18nm)时双层器件才有最优良的器件性能,即最低的起亮电压,最高的发光亮度和效率。同时对比了不同PVK层厚度的PVK/Alq₃双层器件之间以及PVK/Alq₃与N,N′-bis-(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine(NPB)/Alq₃双层器件寿命的差异。测试结果表明,尽管越厚的PVK层对应的PVK/Alq₃双层器件发光性能并不是越好,但器件寿命越长。原因是器件Alq₃层内形成的Alq³⁺越少,因此器件稳定性越好;而PVK/Alq₃与NPB/Alq₃双层器件寿命的差异来自不同空穴传输层的制备工艺和能级结构的不同。     

NPB厚度对异质结OLED载流子复合区域的调控

通过调控p型半导体N,N′-bis(naphthalen-1-y)-N,N′-bis(phenyl)benzidine(NPB)层的厚度,制备了结构为ITO/NPB/aluminum(Ⅲ)bis(2-methyl-8-quinolinato)-4-phenylphenolate(BAlq)/NPB(0~18nm)/tri-(8-hydroxyquinoline)-aluminum(Alq₃)/Mg:Ag的多层有机电致发光器件.分析结果表明,在该类异质结器件中,NPB不仅可以作为空穴传输材料,在适当的厚度范围内,它还可以起到调控载流子复合区域的作用;当NPB厚度在0~18nm之间变化时,随着其厚度增加器件发光颜色可由蓝色变为绿色.通过器件发光光谱的表征可以得知,器件的载流子复合区域相应地由BAlq层转移至Alq₃层.     

采用复合空穴注入层提高有机电致发光器件的性能

制备了以Ag/SAM/m-MTDATA为复合空穴注入层的NPB/Alq₃双层异质结发光器件,研究了器件的性能并与传统的器件进行了对比。考察了银膜厚度的变化对器件性能的影响。研究了光谱窄化以及微腔效应对器件的影响。研究结果表明:在ITO表面制备4-FTP自组装单分子膜修饰的5 nm厚的金属银膜,可以在保持阳极透明性的基础上,增强空穴的注入,改善界面的形貌,进而提高器件性能。制备的ITO/Ag/SAM/m-MTDATA/NPB/Alq₃/LiF/Al器件的启亮电压为4 V,最 大电流效率为6.9 cd/A, 最大亮度为34 680 cd/m²(12 V);优于以ITO为阳极的对比器件(25 300 cd/m² @12 V)。     

室温下磁场对基于Alq3的有机电致发光器件的影响

制备了ITO/NPB/LiF/Alq₃/LiF/Al的器件,测量了该组器件效率和亮度的磁效应.结果表明,在50 mT磁场中,当LiF缓冲层厚度为0.8 nm时,器件的效率最大增加了12.4%,磁致亮度最大变化率17%.同时,制备的磷光器件ITO/NPB/LiF/CBP:6 wt% Ir(ppy)₃/BCP/Alq₃/ LiF/Al,在50mT磁场作用下,当LiF缓冲层的厚度为0.8 nm时,器件的效率最大增加12.1%.在Alq_{3 关键词： 有机发光 磁场 效率 磁致亮度}     

n-type ZnS used as electron transport material in organic light-emitting diodes

This paper reports on the n-type ZnS used as electron transport layer for the organic light-emitting diodes (OLEDs). The naphthyl-substituted benzidine derivative (NPB) and tris (8-hydroxyquinoline) aluminium (AlqOLEDs n型ZnS 电子运输层 亮度 效率 功能发光二极管OLEDs, n-type ZnS, electron transport layer, luminance, efficiencyProject supported by the National Natural Science Foundation of China (Grant No 60476005), the Scientific Research Foundation for Returned Overseas Chinese Scholars, the State Education Ministry, the State Key Program for Basic Research of the Ministry of Science and Technology of China (Grant No 2003CB314707), and the Key Project of National Natural Science Foundation of China (Grant No 50532090).2005-11-211/9/2006 12:00:00 AMThis paper reports on the n-type ZnS used as electron transport layer for the organic light-emitting diodes （OLEDs）. The naphthyl-substituted benzidine derivative （NPB） and tris （8-hydroxyquinoline） aluminium （Alq3） are used as the hole transport layer and the emitting layer respectively. The insertion of the n-type ZnS layer enhances the electron injection in the OLEDs. The study was carried out on OLEDs of structures： indium-tin-oxide （ITO）/NPB/Alq3/ZnS/LiF/AL, ITO/NPB/Alq3/LiF/AL and ITO/NPB/Alq3/AL. The luminance and efficiency of the device containing this electron transport layer are increased significantly over those obtained from conventional devices due to better carrier balance.     

富勒烯掺杂NPB空穴传输层的有机电致发光器件

报道了不同掺杂浓度NPB：C₆₀（富勒烯）作为空穴传输层对有机电致发光器件性能的影响.采用真空热蒸镀方法,制作了ITO/ NPB：C₆₀ （x % ）/Alq₃/LiF/Mg:Ag结构的四种有机电致发光器件.当NPB：C₆₀的掺杂浓度是15％时,器件的启亮电压是4 V,最大亮度是11000 cd/m².然而,当NPB：C₆₀的掺杂浓度是20％时,器件的最大亮度降     

DPVBi空穴阻挡层对OLED性能的优化

研究了宽带隙有机小分子材料DPVBi作为空穴阻挡层对OLED器件效率和亮度的优化作用.DPVBi的引入有效地改善了以PEDOT:PSS做空穴注入层的OLED器件的空穴过剩问题.实验结果表明:通过优化DPVBi的厚度,插入30 nm厚的DPVBi空穴阻拦层可以有效地平衡OLED器件的电子和空穴浓度,降低器件的工作电压,优...     

水溶性酞菁化合物对有机电致发光器件亮度和效率的影响

以水溶性酞菁铜(CuTcPc)为空穴注入层制备多层有机电致发光器件.ITO表面经过CuTcPc溶液修饰,能够提高空穴的注入能力,增加器件的电流密度和亮度.在有机电致发光器件中,空穴传输材料的空穴迁移率一般大于电子传输材料的电子迁移率,空穴是多数载流子;但是,CuTcPc修饰处理不仅提高了器件的电流密度和亮度,也提高了器...     

基于器件结构提高TADF-OLED器件的发光性能

为了提高以TADF材料作为主体、天蓝色荧光材料作为客体的混合薄膜的OLED器件光电性能,我们调整了器件结构,使主体材料发挥其优势。制备了基本结构为ITO/NPB(40 nm)/DMAC-DPS∶x%BUBD-1(40 nm)/Bphen(30 nm)/LiF(0.5 nm)/Al的OLED器件。研究了主-客体材料在不同掺杂浓度下的OLED器件的光电特性。为了提高主体材料的利用率,在空穴传输层和发光层之间加入10 nm的DMAC-DPS作为间隔层;然后,在阳极和空穴传输层之间加入HAT-CN作为空穴注入层,形成HAT-CN/NPB结构的PN结,有效降低了器件的启亮电压(2.7 V)。测量了有无HAT-CN的单空穴器件的阻抗谱。结果表明,在最佳掺杂比例(2%)下,器件的外量子效率(EQE)达到4.92%,接近荧光OLED的EQE理论极限值;加入10 nm的DMAC-DPS作为间隔层,使得器件的EQE达到5.37%;HAT-CN/NPB结构的PN结有效地降低了器件的启亮电压(2.7 V),将OLED器件的EQE提高到5.76%;HAT-CN的加入提高了器件的空穴迁移率,降低了单空穴器件的阻抗。TADF材料作为主体材料在提高OLED器件的光电性能方面具有很大的潜力。     

Co50Fe50-xSix合金的结构相变和磁性

利用实验测量和理论计算相结合的方法,研究了介于B2结构CoFe低有序合金和L2₁结构Co₂FeSi高有序合金之间的Co₅₀Fe_50-xSi_x合金的结构相变、磁相变、分子磁矩和居里温度.采用考虑Coulomb相互作用的广义梯度近似(GGA+U)方法计算了合金的能带结构.研究发现,合金出现较强的原子有序倾向,表现出较强的共价成相作用.合金的晶格常数、磁矩、居里温度随Si含量的增加而线性地降低,极限成分Co₂FeSi合金的分子磁矩和居里温度分别达到5.92μ_B和777 ℃.原子尺寸效应导致合金晶格发生变化,但并未成为居里温度和分子磁矩变化的主导因素.分子磁矩的变化符合Slater-Pauling原理,但发现原子磁矩的变化并非线性,据此提出了共价成相对磁性影响的观点.采用Stearns理论解释了居里温度的变化趋势,排除了原子间距对居里温度的主导影响作用.能带计算的结果还表明,Co₂FeSi作为半金属材料并非十分完美,可能在实际应用中会出现自旋极化率降低的问题.发现该系列合金的结构相变和磁相变随着成分的变化聚集在窄小的成分和温度范围内. 关键词： 磁性 Heusler合金 结构相变     

Color-tunable organic light-emitting devices using a thin N,N′-bis-(1-naphthyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine layer at heterojunction interface

Novel types of multilayer color-tunable organic light-emitting devices (OLEDs) with the structure of indium tin oxide (ITO)/N,N′-bis-(1-naphthyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine (NPB)/aluminum (III)bis(2-methyl-8-quinolinato)4-phenylphenolato (BAlq)/tris-(8-hydroxyquinolate)-aluminum (Alq₃)/Mg:Ag were fabricated. By inserting a thin layer with different thickness of a second NPB layer at the heterojunction interface of BAlq/Alq₃, the emission zone of devices shifted greatly and optoelectronic characteristics underwent large variation. Although BAlq was reported as a very good hole-blocking and blue-light-emission material, results of measurements in this paper suggested that a certain thickness of NPB layer between BAlq and Alq₃ plays an important role to modify device characteristics, which can act as recombination-controlling layer in the multilayer devices. It also provides a simple way to fabricate color-tunable OLEDs by just changing the thickness of this “recombination-controlling” layer rather than doping by co-evaporation.     

Optimization of microcavity OLED by varying the thickness of multi-layered mirror

We optimized the emission efficiency from a microcavity OLEDs consisting of widely used organic materials, N,N′-di(naphthalene-1-yl)-N,N′-diphenylbenzidine (NPB) as a hole transport layer and tris (8-hydroxyquinoline) (Alq₃) as emitting and electron transporting layer. LiF/Al was used as a cathode, while metallic Ag was used as an anode material. A LiF/NPB bi-layer or NPB layer on top of the cathode was considered to alter the optical properties of the top mirror. The electroluminescence emission spectra, electric field distribution inside the device, carrier density, recombination rate and exciton density were calculated as a function of the position of the emission layer. The results show that for optimal capping layers thicknesses, light output is enhanced as a result of the increase in both the reflectance and transmittance of the top mirror. Once the optimum structure has been determined, the microcavity OLED devices were fabricated and characterized. The experimental results have been compared to the simulations and the influence of the thickness of the mirror layers, emission region width and position on the performance of microcavity OLEDs was discussed.     

Ultraviolet photoelectron spectroscopy investigation of interface formation in an indium-tin oxide/fluorocarbon/organic semiconductor contact

It has been demonstrated that hole-injection in organic light-emitting devices (OLEDs) can be enhanced by inserting a UV-illuminated fluorocarbon (CF_x) layer between indium-tin oxide (ITO) and organic hole-transporting layer (HTL). In this work, the process of interface formation and electronic properties of the ITO/CF_x/HTL interface were investigated with ultraviolet photoelectron spectroscopy. It was found that UV-illuminated fluorocarbon layer decreases the hole-injection barrier from ITO to α-napthylphenylbiphenyl diamine (NPB). Energy level diagrams deduced from the ultraviolet photoelectron spectroscopy (UPS) spectra show that the hole-injection barrier in ITO/UV-treated CF_x/NPB is the smallest (0.46 eV), compared to that in the ITO/untreated CF_x/NPB (0.60 eV) and the standard ITO/NPB interface (0.68 eV). The improved current density-voltage (I-V) characteristics in the UV-treated CF_x-coated ITO contact are consistent with its smallest barrier height.