包含硅量子点的富硅SiNx 薄膜结构与发光特性

采用等离子体增强化学气相沉积法, 以NH₃与SiH₄为反应气体, n型单晶硅为衬底, 低温(220 ℃)沉积了富硅氮化硅(SiN_x)薄膜. 在N₂氛围中, 于500–1100 ℃ 范围内对样品进行了热退火处理. 采用Raman 光谱技术分析了薄膜内硅量子点的结晶情况, 结果表明, 当退火温度低于950 ℃时, 样品的晶化率低于18%, 而当退火温度升为1100 ℃, 晶化率增加至53%, 说明大部分硅量子点都由非晶态转变为晶态. 实验通过Fourier 变换红外吸收(FTIR)光谱检测了样品中各键的键合结构演变, 发现Si–N键和Si–H键随退火温度升高向高波数方向移动, 说明了薄膜内近化学计量比的氮化硅逐渐形成. 实验还通过光致发光(PL)光谱分析了各样品的发光特性, 发现各样品中均有5个发光峰, 讨论了它们的发光来源, 结合Raman光谱与FTIR光谱表明波长位于500–560 nm的绿光来源于硅量子点, 其他峰则来源于薄膜内的缺陷态. 研究了硅量子点的分布和尺寸对发光带移动的影响, 并根据PL峰位计算了硅量子点的尺寸, 其大小为1.6–3 nm, 具有良好的限域效应. 这些结果有助于制备尺寸不同的硅量子点和基于硅量子点光电器件的实现. 关键词： 硅量子点 氮化硅薄膜 光致发光 Fourier 变换红外吸收     

脉冲溅射功率对含硅量子点SiC_x薄膜的结构和光学特性的影响

采用射频和脉冲磁控共溅射法并结合快速光热退火法制备了含硅量子点的SiC_x薄膜.采用掠入射X射线衍射、喇曼光谱、紫外-可见-近红外分光光度计和透射电子显微镜对薄膜进行表征.研究了脉冲溅射功率对薄膜中硅量子点数量、尺寸、晶化率和薄膜光学带隙的影响.结果表明:当溅射功率从70 W增至100 W时,硅量子点数量增多,尺寸增至5.33nm,晶化率增至68.67%,而光学带隙则减至1.62eV;随着溅射功率进一步增至110 W时,硅量子点数量减少,尺寸减至5.12nm,晶化率降至55.13%,而光学带隙却增至2.23eV.在本实验条件下,最佳溅射功率为100 W.     

磁控共溅射法沉积的硅量子点SiN_x薄膜的光谱特性

采用双极脉冲和射频磁控共溅射沉积法在不同温度的Si(100)衬底和石英衬底上制备了富硅SiNx薄膜。在氮气氛中,于1 050℃下采用快速光热退火热处理,获得了包含硅量子点的SiNx薄膜。采用Fourier变换红外光谱、Raman光谱、掠入射X射线衍射和光致发光光谱对退火后的薄膜样品进行了表征。结果显示:Fourier变换红外光谱中出现了富硅Si—N键,表明薄膜为富硅SiNx薄膜;当衬底温度不低于200℃时,薄膜样品的拉曼光谱中出现了硅纳米晶的Si—Si振动横光学模,掠入射X射线衍射中出现了明显的Si(111)和Si(311)的衍射峰,证实了硅量子点的形成;发现存在一最佳衬底温度(300℃),该条件下获得的硅量子点的数量和晶化率最高;衬底温度为300和400℃的样品的光致发光光谱中均有3个可见荧光峰,结合拉曼光谱结果,用纳米晶硅的量子限域效应和辐射复合缺陷态对荧光峰进行了合理解释;由光致发光光谱计算出的衬底温度为300和400℃的样品的硅量子点平均尺寸分别为3.5和3.4nm。这些结果有助于优化含硅量子点的SiNx薄膜的制备参数,在硅基光电子器件的应用方面有重要意义。     

退火工艺对含硅量子点SiC_x薄膜光谱特性的影响

采用磁控共溅射法并结合微波退火和快速光热退火工艺,在不同退火温度下制备了含硅量子点的富硅SiC_x薄膜。采用掠入射X射线衍射(GIXRD)、拉曼光谱和光致发光(PL)光谱技术对薄膜进行了表征,研究了退火工艺对薄膜中硅量子点数量、尺寸、晶化率以及发光峰的影响。结果表明:与快速光热退火相比,微波退火不但能降低硅量子点的形成温度(降低200℃),而且还能降低β-SiC量子点的形成温度(降低100℃);在相同退火温度下,微波退火制备的硅量子点的数量更多、晶化率更高、光致发光峰更强;采用1000℃温度的微波退火样品的硅量子点数量最多、尺寸最大(5.26nm)、晶化率最高(74.25%)、发光峰最强,说明微波退火能凝析出高质量的硅量子点。     

ZnCuInS/ZnS量子点与Poly-TPD补偿发光光谱的研究

ZnCuInS/ZnS量子点是一种无重金属、“绿色”半导体纳米材料。在研究中,制备出尺寸为3.2 nm的ZnCuInS/ZnS核壳量子点,并说明它是施主-受主对复合发光。通过测量ZnCuInS/ZnS量子点的光致发光光谱,其发射峰值波长为620 nm、半宽度是95 nm的红光。同时,还制备出Poly-TPD有机薄膜,其发光光谱是峰值波长为480 nm的蓝光。所以,ZnCuInS/ZnS量子点和Poly-TPD发光颜色具有互补性。在ZnCuInS/ZnS量子点薄膜层上包覆一层poly-TPD薄膜后,二者发光颜色互补。在恰当的偏置电压下,可以得到较好的白光光谱。计算表明,其色坐标是(0.336,0.339),颜色指数是92。     

富硅氮化硅薄膜的制备及其光学带隙研究

采用双极脉冲磁控反应溅射法在不同参数条件下制备了一系列氮化硅薄膜。利用数字式显微镜和紫外-可见光光谱仪研究了沉积薄膜的表面形貌及其光学带隙,利用共焦显微拉曼光谱仪比较了硅衬底、氮化硅薄膜退火前后的拉曼光谱。结果表明,氮气流量对薄膜的光学带隙影响较大,制备的薄膜主要为富硅氮化硅薄膜。原沉积薄膜的拉曼光谱存在明显的非晶硅和单晶硅峰,退火处理后非晶硅峰减弱或消失,表明薄膜出现明显的结晶化;单晶硅峰出现频移现象,表明薄膜中出现硅纳米颗粒,平均尺寸约为6.6 nm。     

氧化锌量子点和碳量子点及其复合物的制备与发光性能的研究

采用溶胶凝胶方法和水热法制备了水溶性荧光氧化锌量子点(Zn O-QDs)和碳量子点(C-QDs),其量子效率分别达到38%和61%。基于所合成的Zn O-QDs和C-QDs制备了氧化锌和碳量子点复合物(Zn O/CQDs),并分别对其发光特性进行了研究。透射电镜(TEM)图像表明,所合成的Zn O-QDs和碳量子点尺寸分布在3~6 nm之间,分散均匀。光致发光光谱表明,Zn O-QDs和碳量子点的发光峰中心分别位于540 nm和450 nm,两者发光峰的最佳激发波长为370 nm和350 nm。通过调整Zn O-QDs和C-QDs的体积比,所制备的Zn O/C-QDs能够实现荧光光谱的连续可调,并产生了白色荧光。     

纳米ZnO镶嵌SiO2薄膜的磁控溅射制备和发光性质的研究

采用射频磁控反应溅射方法在SiO衬底上制备了纳米ZnO镶嵌SiO2薄膜.在室温下利用吸收光谱和光致发光光谱研究了样品的光学性质.发现吸收光谱随纳米ZnO尺寸的减小发生了明显的蓝移,表明随着ZnO尺寸的减小,量子尺寸效应增强,导致带隙展宽,吸收峰蓝移.光致发光光谱在387和441 nm附近出现了两个发光带,分析认为紫外发光来源于自由激子的辐射复合,而蓝色发光带来自于氧空位的电子到价带的跃迁,并用时间分辨光谱和发光衰减证实了上述观点.     

蓝光发射多孔硅RTO过程中的尺寸分离效应

对用水热腐蚀技术制备的、具有蓝光发射的多孔硅样品在快速热氧化(RTO)处理前后其光致发光谱、硅纳米颗粒的大小及尺寸分布变化进行了研究.实验发现,新鲜多孔硅样品经过RTO处理后,其光致发光谱整体蓝移并由单发光峰分裂为两个发光峰;与此对应,样品中的硅纳米颗粒在整体减小的同时出现尺寸分离现象.这一结果表明,多孔硅中的短波长发射也具有强烈的尺寸相关性. 关键词：     

硅量子点发光的激活及其物理模型研究

在真空或惰性气体中制备的硅量子点发光很弱,硅量子点表面被氢较好钝化后的发光也不强.硅量子点表面的硅氧键或硅氮键能破坏这种钝化并在带隙中形成局域电子态,在局域电子态对应的激活中心有很强的发光.可以用这种方式构建发光物质,控制硅量子点表面的键合可获得不同波长的发光.在硅量子点的发光激活处理过程中,退火是很重要的环节.对于硅量子点发光激活的机理,本文给出了相应的物理模型.实验证明,在600和700 nm波长附近观察到了激活硅量子点的受激发光,在1500 nm到1600 nm波长范围观察到了激活硅量子点的较强发光.     

溅射功率对Mo薄膜微结构和性能的影响

 实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1～17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。     

射频磁控溅射法制备ZnO薄膜的发光特性

利用射频磁控溅射法在硅衬底上制备出具有（002）择优取向的氧化锌薄膜，用波长为300nm的光激发，观察到在446nm处有一强的光致发光峰，它来自于氧空位浅施主能级上的电子到价带上的跃迁。并讨论了发光峰与氧压的关系以及退火对它的影响，且给出了解释。     

Write-Once Medium with Fe-Doped BiOx Thin Films for Blue Laser Recording

Fe：BiOx films are fabricated on K9 glass substrates by rf-magnetron sputtering of a BiFeO target under argon atmosphere with increasing sputtering power from 80 to 200 W at room temperature. It is found that the thin films grown at the sputtering power of 160 W can be formed at an appropriate deposition rate and have an improved surface morphology. The XPS result reveals that the films investigated are comprised of Bi, Fe and O elements. A typical XRD pattern shows that no phase transition occurs in the films up to 400℃. The results of the blue laser recording test demonstrate that the Fe：BiOx films have good writing sensitivity for blue laser beam （406.7nm） and good stability after reading 10000 times. The recording marks of 200nm or less are obtained. These results indicate that the introduction of Fe into BiOx films can reduce the mark size and improve the stability of the films.     

Optical and hydrophobic properties of co-sputtered chromium and titanium oxynitride films

The chromium and titanium oxynitride films on glass substrate were deposited by using reactive RF magnetron sputtering in the present work. The structural and optical properties of the chromium and titanium oxynitride films as a function of power variations are investigated. The chromium oxynitride films are crystalline even at low power of Cr target (≥60 W) but the titanium oxynitride films are amorphous at low target power of Ti target (≤90 W) as observed from glancing incidence X-ray diffraction (GIXRD) patterns. The residual stress and strain of the chromium oxynitride films are calculated by sin² ψ method, as the average crystallite size decreases with the increase in sputtering power of the Cr target, higher stress and strain values are observed. The chromium oxynitride films changes from hydrophilic to hydrophobic with the increase of contact angle value from 86.4° to 94.1°, but the deposited titanium oxynitride films are hydrophilic as observed from contact angle measurements. The changes in surface energy were calculated using contact angle measurements to substantiate the hydrophobic properties of the films. UV-vis and NIR spectrophotometer were used to obtain the transmission and absorption spectra, and the later was used for determining band gap values of the films, respectively. The refractive index of chromium and titanium oxynitride films increases with film packing density due to formation of crystalline chromium and titanium oxynitride films with the gradual rise in deposition rate as a result of increase in target powers.     

Effect of sputtering power on surface topography of dc magnetron sputtered Ti thin films observed by AFM

Titanium films were deposited on glass substrates at room temperature by direct current (dc) magnetron sputtering at fixed Ar pressure of 1.7 Pa and sputtering time of 4 min with different sputtering power ranging from 100 to 300 W. Atomic force microscopy (AFM) was used to study topographic characteristics of the films, including crystalline feature, grain size, clustering and roughening. The amorphous-like microstructure feature has been observed at 100-150 W and the transition of crystal microstructure from amorphous-like to crystalline state occurs at 200 W. The increase in grain size of Ti films with the sputtering power (from 200 to 300 W) has been confirmed by AFM characterization. In addition, higher sputtering power (300 W) leads to the transformation of crystal texture from globular-like to hexagonal type. The study has shown that higher sputtering power results in the non-linear increase in deposition rate of Ti films. Good correlativity between the surface roughness parameters including root mean square (RMS) roughness, surface mean height (Ra) and maximum peak to valley height (P-V) for evaluating the lateral feature of the films has been manifested. Surface roughness has an increasing trend at 100-250 W, and then drops up to 300 W.     

Structural and optical characterization of wurtzite type ZnS

ZnS films were grown on (001) GaAs substrates at different temperatures by RF magnetron sputtering. The ZnS chemical stoichiometry was determined by Energy-dispersive X-ray spectroscopy (EDS), besides it allowed to find the residual impurities, mainly oxygen. The X-ray diffraction (XRD) analysis and Raman scattering reveal that ZnS deposited thin films showed hexagonal wurtzite crystalline phase. The films average crystallite size range was from 8.15 to 31.95 nm, which was determined using the Debye–Scherrer equation for the peak W(101). Besides an experimental study of first- and second-order Raman scattering of ZnS films is made. An energy level diagram involving oxygen traps and interstitial sulphur ions is used to explain the origin of the radiative transitions observed in the room temperature photoluminescence (PL) spectra.     

Effect of amorphous C films deposited by RF magnetron sputtering on smoothing K9 glass substrate

Soft X-ray multilayer reflectors must be deposited on super-smooth surface such as super-polished silicon wafers or glasses, which are complicate, time-consuming and expensive to produce. To overcome this shortage, C films deposited by RF magnetron sputtering were considered to smooth the K9 glass substrates’ surface in the present paper. The structure of C films was systematically studied by XRD and Raman spectrum. The surface morphology and rms-roughness were obtained by AFM. Then, we calculated the impact of the C layers on the reflectivity curve of Mo/Si soft X-ray multilayer reflector around 13.5 nm. The C films exhibit typical amorphous state. With the increasing of power and thickness, the content of sp3 hybrid bonding decreases while the amount or size of well-organized graphite clusters increases. The surface rms-roughness decreases from 2.4 nm to 0.62 nm after smoothed by an 80 nm thick C layer deposited in 500 W, which is the smoothest C layer surface we have obtained. The calculation results show that the theoretical normal incidence reflectivity of Mo/Si multilayer at 13.5 nm increases from 7% to 63%.