Optical characterization of thin thermal oxide films on copper by ellipsometry

A complete optical characterization in the visible region of thin copper oxide films has been performed by ellipsometry. Copper oxide films of various thicknesses were grown on thick copper films by low temperature thermal oxidation at 125 °C in air for different time intervals. The thickness and optical constants of the copper oxide films were determined in the visible region by ellipsometric measurements. It was found that a linear time law is valid for the oxide growth in air at 125 °C. The spectral behaviour of the optical constants and the value of the band gap in the oxide films determined by ellipsometry in this study are in agreement with the behaviour of those of Cu₂O, which have been obtained elsewhere through reflectance and transmittance methods. The band gap of copper oxide, determined from the spectral behaviour of the absorption coefficient was about 2 eV, which is the generally accepted value for Cu₂O. It was therefore concluded that the oxide composition of the surface film grown on copper is in the form of Cu₂O (cuprous oxide). It was also shown that the reflectance spectra of the copper oxide–copper structures exhibit behaviour expected from a single layer antireflection coating of Cu₂O on Cu. Received: 19 July 2001 / Accepted: 27 July 2001 / Published online: 17 October 2001     

Electrical,optical and structural properties of pure and gold-coated VO2 thin films on quartz substrate

In the present study, vanadium dioxide films were grown on quartz glass substrate by reactive KrF laser ablation technique using a vanadium dioxide target. The gold films of various thicknesses were then deposited on the VO₂ film by sputtering technique. Films were characterized by X-ray diffraction to determine crystallography, by four-point probe to determine the electrical property and by double-beam spectrophotometry to determine optical reflection and transmission behaviour in the 200–2500 nm spectral region. The resistance per square of VO₂ thin film decreases by two orders of magnitude across the metal insulator transition (MIT). The optical transmittance and reflectance exhibits, strong temperature dependence in the infrared region without a significant change in the visible region for VO₂ thin films. The presence of gold layer on VO₂ films significantly reduces the resistance per square, the critical temperature and percentage transmittance of the materials.     

Effects of different deposition conditions on the properties of Cu2S thin films

Cu₂S thin films deposited on glass substrate by chemical bath deposition were studied at different deposition temperatures and times. The results of X-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive X-ray analysis (EDX), the Hall Effect measurement system and UV-Vis absorption spectroscopy indicate that both deposition temperature and time are important to obtain polycrystalline thin films. XRD showed that the polycrystalline Cu₂S thin films have monoclinic structure. Meanwhile, the structural variations were analyzed using SEM. EDX analysis results of the thin film showed that the atomic ratio of Cu/S was close to 2:1. It was found from the Hall Effect measurement that the resistivity varied from 4.59?×?10^?3 to 13.8?×?10^?3 (Ω?cm). The mobility values of the Cu₂S thin films having p-type conductivity varied from 15.16 to 134.6?cm²/V.s. The dark electrical resistivity measurements were studied at temperatures in the range 303–423?K. The electrical activation energies of Cu₂S thin films were calculated by using Arrhenius plots, from which two different activation energy values are estimated for each thin film. Using UV-Vis absorption spectroscopy (Ultraviolet/visible), the direct and indirect allowed optical band gap values were determined to lie between 2.16 and 2.37?eV and 1.79 and 1.99?eV, respectively. In addition, the values of the refractive index (n) and the extinction coefficient (k) were determined.     

Preparation and characterization of patterned copper sulfide thin films on n-type TiO2 film surfaces

Micro-arrayed patterns of p-type copper sulfide (Cu_xS) thin films with positive and negative features were deposited onto the surfaces of n-type TiO₂ semiconductor films via a selective nucleation and growth process from aqueous solution. The surface functional molecules of the UV photo-oxidised patterned SAMs were utilized to direct the nucleation and growth of Cu_xS crystallites. The resultant Cu_xS/TiO₂ composite films with negative and positive Cu_xS patterns on the TiO₂ film surface were investigated using SEM, XRD, XPS and a 3D Surface Profiler. It is demonstrated that regular and compact patterned films of Cu₂S crystallites had been deposited onto the n-type TiO₂ surface, with sharp edges demarcating the boundaries between the patterned Cu₂S region and the TiO₂ film region. The UV-vis spectra for three Cu₂S/TiO₂ films exhibit a wide absorption between 300 nm and 450 nm. The maximum wavelength differences in the spectra of Cu₂S/TiO₂ films and TiO₂ film were attributed to the added absorption of Cu₂S films at 302 nm and the unchanged adsorption of TiO₂ films. The absorption intensities of the Cu₂S/TiO₂ films could be varied in the UV-vis range using the Cu₂S patterned features (positive, negative).     

Enhanced Fröhlich interaction of semiconductor cuprous oxide films determined by temperature‐dependent Raman scattering and spectral transmittance

Anomalous low temperature behaviors in cuprous oxide (Cu₂O) film grown on quartz substrate have been investigated by temperature‐dependent Raman and transmittance spectra. The longitudinal optical components of two Γ₁₅‐ phonon modes become sharper and more intense at a low temperature. It can be found that the highest‐order electronic transition located at 6.4 eV exhibits a minimum transmittance near 200 K. Correspondingly, the variations from phonon intensity ratios reveal obvious anomalies with the decreasing temperature, indicating the existence of strong electron–phonon coupling mediated by Fröhlich interaction in the Cu₂O films below the temperature of 200 K. Copyright © 2012 John Wiley & Sons, Ltd.     

Optical characteristics of transparent samarium oxide thin films deposited by the radio-frequency sputtering technique

Transparent metal oxide thin films of samarium oxide (Sm₂O₃) were prepared on pre-cleaned fused optically flat quartz substrates by radio-frequency (RF) sputtering technique. The as-deposited thin films were annealed at different temperatures (873, 973 and 1073 K) for 4 h in air under normal atmospheric pressure. The topological morphology of the film surface was characterized by using atomic force microscopy (AFM). The optical properties of the as-prepared and annealed thin films were studied using their reflectance and transmittance spectra at nearly normal incident light. The estimated direct optical band gap energy (\(E_{\mathrm {g}}^{\mathrm {d}}\)) values were found to increase by increasing the annealing temperatures. The dispersion curves of the refractive index of Sm₂O₃ thin films were found to obey the single oscillator model.     

Sulfurization temperature effects on the growth of Cu2ZnSnS4 thin film

We made Cu₂ZnSnS₄ (CZTS) thin films by sulfurization of Cu/Sn/Cu/Zn metallic films. Sulfurizations were carried out under different thermal annealing conditions, where maximum temperatures were 440 °C (LT-CZTS) and 550 °C (HT-CZTS). For LT-CZTS films, secondary phases such as SnS₂ and Cu_2?xS were observed, whereas for HT-CZTS films secondary impurities were not detected. Chemical composition of LT-CZTS film was observed to be very non-uniform. Highly Sn-rich and Zn-rich regions were found on the film surface of LT-CZTS. However, averaged chemical composition for larger area was close to stoichiometry. The HT-CZTS film showed homogeneous structural and chemical composition features. But, for HT-CZTS film, the Sn composition was observed to be decreased, which was due to the Sn-loss. By UV–Visible spectroscopy, optical band gaps of LT- and HT-CZTS films were measured to be ～1.33 eV and ～1.42 eV, respectively. The band gap of LT-CZTS film was also observed to be smaller by photoluminescence measurement. The depressed band gap of LT-CZTS film may be ascribed to some defects and low band gap impurities such as Cu₂SnS₃ and Cu_2-xS in the LT-CZTS film.     

Structural and optical properties of amorphous Sb2S3 thin films deposited by vacuum thermal evaporation method

Sb₂S₃ thin films have been deposited by vacuum thermal evaporation onto glass substrates at various substrate temperatures in the range of 30–240 °C. Crushed powder of the synthesized Sb₂S₃ was used as raw material for the vacuum thermal evaporation. The structural investigation performed by means of X-ray diffraction (XRD) showed that the all as-deposited films present an amorphous structure and all the films were highly resistive. The reflectance and transmittance of the films are measured in the incident wavelength range 300–1800 nm. The absorption coefficient spectral analysis revealed the existence of long and wide band tails of the localized states in the low absorption region. The band tails width is calculated and found to be varying between 0.024 and 0.032 eV. The analysis of the absorption coefficient in the high absorption region revealed two direct forbidden band gaps between 1.78–1.98 eV and 1.86–2.08 eV.     

Preparation of Cu2ZnSnS4 thin films by hybrid sputtering

In order to fabricate Cu₂ZnSnS₄ thin films, hybrid sputtering system with two sputter sources and two effusion cells is used. The Cu₂ZnSnS₄ films are fabricated by the sequential deposition of metal elements and annealing in S flux, varying the substrate temperature. The Cu₂ZnSnS₄ films with stoichiometric composition are obtained at the substrate temperature up to 400 °C, whereas the film composition becomes quite Zn-pool at the substrate temperature above 450 °C. The Cu₂ZnSnS₄ film shows p-type conductivity, and the optical absorption coefficient and the band gap of the Cu₂ZnSnS₄ film prepared in this experiment are suitable for fabricating a thin film solar cell.     

Effect of annealing temperature on the microstructure and optical–electrical properties of Cu–Al–O thin films

We have successfully prepared Cu–Al–O thin films on silicon (100) and quartz substrates by radio frequency (RF) magnetron sputtering method. The as-deposited Cu–Al–O film is amorphous in nature and post-annealing treatment in argon ambience results in crystallization of the films and the formation of CuAlO₂. The annealing temperature plays an important role in the surface morphology, phase constitution and preferred growth orientation of CuAlO₂ phase, thus affecting the properties of the film. The film annealed at 900 °C is mainly composed of CuAlO₂ phase and shows smooth surface morphology with well-defined grain boundaries, thus exhibiting the optimum optical–electrical properties with electrical resistivity being 79.7 Ω·cm at room temperature and optical transmittance being 80% in visible region. The direct optical band gaps of the films are found in the range of 3.3–3.8 eV depending on the annealing temperature.     

Influence of the molecular structure of copper phthalocyanines on their ordering in thin films and photoluminescence and absorption spectra

Thin films consisting of copper phthalocyanine (CuPc) molecules and copper phthalocyanine molecular complexes with different structures on glass and glass-ceramic substrates are studied using reflectance anisotropy, photoluminescence, and photoconductivity (constant photocurrent method) spectroscopies. It is established that, in the studied films, the CuPc molecules and CuPc molecules containing peripheral phthalimide substituents are located in planes virtually parallel to the surface of the substrate. In thin films consisting of μ-peroxo dimer complexes, the angle between the CuPc molecular planes and the surface of the substrate is close to 90°. The thin films formed by CuPc molecules containing peripheral phthalimide substituents are characterized by the highest luminescence intensity in the range of ～ 1.12 eV and the lowest absorption intensity in the range of energies less than the band gap. These properties are explained by the lower concentration of non-radiative recombination centers in the film.     

Role of surface defects and microstructure in infrared optical properties of thermochromic VO2 materials

Thermochromic vanadium dioxide VO₂ exhibits a semi-conducting to metallic phase transition at T_c=68 °C, involving strong variations in optical transmittance, reflectance and emissivity. However, the optical contrasts observed in thin films or nanostructured compacted samples seem to depend on both surface microstructure and surface crystal texture. In the case of opaque materials, surface defects might play a drastic role in optical reflectivity. As the high temperature metallic phase of VO₂ is opaque for infrared radiations, we used aluminum samples as standards allowing us to correlate reflectivity responses with porosity and surface defects. Then, various polycrystalline and nanostructured VO₂ samples compacted at various pressures and presenting variable surface roughness were prepared. Thin films were deposited by radio frequency sputtering process. The samples were characterized using X-ray diffraction, scanning electron microscopy and transmission electron microscopy. Optical properties (reflectance and emissivity) were analyzed above and below the transition temperature, making use of specific FTIR equipments. In thin films, the deposited VO₂ phase was systematically oriented and surface porosity was very weak. In polycrystalline samples, as the compaction pressure increased, surface porosity decreased, and infrared optical contrast increased. In such samples, preferred orientations were favored for low applied pressures. These features clearly show that the main parameters conditioning the optical contrast should be the surface defects and porosity, not the preferred crystal orientations. As an additional interesting result, the surfaces formed from compacted nanocrystalline VO₂ powders present improved optical contrast for reflectance and emissivity properties.     

Optical and photoelectric properties of pure and cadmium-and lead-doped neodymium sesquisulfide thin films

A technique for preparing γ-Nd₂S₃ crystalline thin films through discrete vacuum thermal evaporation of a presynthesized bulk material is developed. The films deposited are doped with cadmium and lead. The reflectance and transmittance spectra of the films are measured in the photon energy range 0.2–3.0 eV at a temperature of 300 K. The frequency analysis of the absorption coefficient demonstrates that the γ-Nd₂S₃ films are characterized by an exponential absorption edge. The photoconductivity spectra and temperature dependences of the photoconductivity for the γ-Nd₂S₃ films doped with cadmium and lead are measured in the photon energy range 0.2–3.3 eV at temperatures varying from 115 to 380 K. The experimental data obtained are interpreted under the assumption that the acceptor levels formed by vacancies in the cation sublattice and compensated for by cadmium and lead donor dopants play a crucial role in the photoconduction. The ionization energy at the lead donor level is determined.     

Etude de l'absorption optique du vanadium en couches minces interpretation par la theorie des bandes d'energie

Optical absorption of vanadium thin films has been determinated from 0.32 to 5.5 eV from reflectance and transmittance data. The films have been deposited in ultra high vacuum and the measurements have been realised in situ. Between 1 to 5.5 eV, we note a large absorption band which is independant of the photons angle of incidence and polarisation; with an important maximum and a shoulder respectively at 3.1 and 2 eV. We explain this absorption band by direct interband transitions deduced from theorical bands calculated by Yasui et al. From 0.32 to 1 eV, the observed absorption is principally due to intraband transitions.     

高活性氧化亚铜薄膜材料的绿色合成研究

本文采用一步脉冲雾化化学气相沉积法在250℃下制备了氧化亚铜薄膜催化剂.实验研究了前驱体中掺杂水对氧化铜薄膜表面形貌、拓扑结构、表面成分和光学特性的影响规律.结果表明所制得的催化剂为纯相的氧化亚铜.前驱体溶液中掺杂水会导致氧化亚铜的晶粒变小,从而使得共光学能隙从2.16 eV降至2.04 eV.原子力显微镜结果表明随着水的加入,氧化亚铜的表面粗糙度降低,表面更加均匀.此外,利用密度泛函理论计算得到了水和乙醇在氧化亚铜薄膜表面的吸附和反应特性,并提出了氧化亚铜的形成机理.本文开发了一种低成本且实际可行的薄膜制造方法,该方法在太阳能电池和半导体等领域具有潜在应用.     

Effect of environment and heat treatment on the optical properties of RF-sputtered SnO2 thin films

Thin films of SnO₂ were deposited by RF-magnetron sputtering on quartz substrates at room temperature in an environment of Ar and O₂. The XRD pattern shows amorphous nature of the as-deposited films. The optical properties were studied using the reflectance and transmittance spectra. The estimated optical band gap (E_g) values increase from 4.15 to 4.3 eV as the Ar gas content decreases in the process gas environment. The refractive index exhibits an oscillatory behavior that is strongly dependent on the sputtering gas environment. The Urbach energy is found to decrease with increase in band gap. The band gap is found to decrease on annealing the film. The role of oxygen defects is explored in explaining the variation of optical parameters.     

膜厚对射频磁控溅射法制备的SnS薄膜结构和光学性质的影响

利用射频磁控溅射法在玻璃衬底上制备SnS薄膜,用X射线衍射(XRD)、能谱仪(EDS)、原子力显微镜(AFM)、场发射扫描电镜(FE-SEM)和紫外-可见-近红外分光光度计(UV-Vis-NIR)分别对所制备的薄膜晶体结构、组分、表面形貌、厚度、反射率和透过率进行表征分析。研究结果表明:薄膜厚度的增加有利于改善薄膜的结晶质量和组分配比,晶粒尺寸和颗粒尺寸随着厚度的增加而变大。样品的折射率在1 500~2 500 nm波长范围内随着薄膜厚度的增加而增大。样品在可见光区域吸收强烈,吸收系数达10⁵ cm^-1量级。禁带宽度在薄膜厚度增加到1 042 nm时为1.57 eV,接近于太阳电池材料的的最佳光学带隙(1.5 eV)。     

Deposition and characterization of layer-by-layer sputtered AgGaSe2 thin films

Sputtering technique has been used for the deposition of AgGaSe₂ thin films onto soda-lime glass substrates using sequential layer-by-layer deposition of GaSe and Ag thin films. The analysis of energy dispersive analysis of X-ray (EDXA) indicated a Ga-rich composition for as-grown samples and there was a pronounce effect of post-annealing on chemical composition of AgGaSe₂ thin film. X-ray diffraction (XRD) measurements revealed that Ag metallic phase exists in the amorphous AgGaSe₂ structure up to annealing temperature 450 °C and then the structure turned to the single phase AgGaSe₂ with the preferred orientation along (1 1 2) direction with the annealing temperature at 600 °C. The surface morphology of the samples was analyzed by scanning electron microscopy (SEM) measurements. The structural parameters related to chalcopyrite compounds have been calculated. Optical properties of AgGaSe₂ thin films were studied by carrying out transmittance and reflectance measurements in the wavelength range of 325-1100 nm at room temperature. The absorption coefficient and the band gap values for as-grown and annealed samples were evaluated as 1.55 and 1.77 eV, respectively. The crystal-field and spin-orbit splitting levels were resolved. These levels (2.03 and 2.30 eV) were also detected from the photoresponse measurements almost at the same energy values. As a result of the temperature dependent resistivity and mobility measurements in the temperature range of 100-430 K, it was found that the decrease in mobility and the increase in carrier concentration following to the increasing annealing temperature attributed to the structural defects (tetragonal distortion, vacancies and interstitials).     

Structural and optoelectronic properties of amorphous GaN thin films

Amorphous gallium nitride (a-GaN) thin films were deposited on glass substrate by electron beam evaporation technique at room temperature and high vacuum using N ₂ as carrier gas. The structural properties of the films was studied by X-ray diffraction (XRD) and scanning electron microscope (SEM). It was clear from XRD spectra and SEM study that the GaN thin films were amorphous. The absorbance, transmittance and reflectance spectra of these films were measured in the wavelength range of 300–2200 nm. The absorption coefficient spectral analysis in the sharp absorption region revealed a direct band gap of E _g = 3:1 eV. The data analysis allowed the determination of the dispersive optical parameters by calculating the refractive index. The oscillator energy E ₀ and the dispersion energy E _d, which is a measure of the average strength of inter-band optical transition or the oscillator strength, were determined. Electrical conductivity of a-GaN was measured in a different range of temperatures. Then, activation energy of a-GaN thin films was calculated which equalled E _a = 0:434 eV.     

The electrical, optical properties of AlSb polycrystalline thin films deposited by magnetron co-sputtering without annealing

In order to fabricate AlSb polycrystalline thin films without post annealing, this paper studies a technology of magnetron co-sputtering onto intentionally heated substrate. It compares the structural characteristics and electrical properties of AlSb films which are deposited at different substrate temperatures. It finds that the films prepared at a substrate temperature of 450 oC exhibit an enhanced grain growth with an average grain size of 21 nm and the lattice constant is 0.61562 nm that goes well with unstained lattice constant (0.61355 nm). The ln(σ_dark) ～1/T curves show that the conductivity activation energy is about 0.38 eV when the film is deposited at 450 oC without an annealing. The transmittance and reflectance spectra show that the film deposited at 450 oC has an optical band gap of 1.6 eV. These results indicate that we have prepared AlSb polycrystalline films which do not need a post annealing.