ZnTe(ZnTe∶Cu)多晶薄膜的XPS研究

用共蒸发法在室温下制备了ZnTe及ZnTe∶Cu多晶薄膜,测量了电导率温度曲线,发现不掺杂的ZnTe薄膜的暗电导随温度的增加而线形增加,呈常规的半导体材料特征;掺Cu的ZnTe薄膜在温度较低时,lnσ随温度升高而缓慢增加,随后缓慢降低,达到一极小值,当温度继续升高时又陡然增加,呈现异常现象。用XPS研究了N₂气氛下退火前后表面状态,发现不掺Cu的ZnTe薄膜呈现富Te现象。掺Cu后Te氧化明显,以ZnTe形式存在的Te明显减少;ZnTe∶Cu薄膜中Zn的含量在退火前后变化明显,退火前,Zn主要以ZnTe形式存在,退火后Zn原子向表面扩散,使表面成分更加均匀,谱峰变宽;退火时,部分Cu原子进入晶格形成Cu_xTe相,引起载流子浓度变化,导致ZnTe∶Cu多晶薄膜的电导温度关系异常。     

ZnTe（ZnTe：Cu）多晶薄膜的XPS研究

用共蒸发法在室温下制备了ZnTe及ZnTe：Cu多晶薄膜，测量了电导率温度曲线，发现不掺杂的ZnTe薄膜的暗电导随温度的增加而线形增加，呈常规的半导体材料特征；掺Cu的ZnTe薄膜在温度较低时，lnσ随温度升高而缓慢增加，随后缓慢降低，达到一极小值，当温度继续升高时又陡然增加，呈现异常现象。用XPS研究了N2气氛下退火前后表面状态，发现不掺Cu的ZnTe薄膜呈现富Te现象。掺Cu后Te氧化明显，以ZnTe形式存在的Te明显减少；ZnTe：Cu薄膜中Zn的含量在退火前后变化明显，退火前，Zn主要以ZnTe形式存在，退火后Zn原子向表面扩散，使表面成分更加均匀，谱峰变宽；退火时，部分Cu原子进入晶格形成CuxTe相，引起载流子浓度变化，导致ZnTe：Cu多晶薄膜的电导温度关系异常。     

CdTe太阳电池背接触层的XPS研究

采用共蒸发法在不同条件下制备了ZnTe和ZnTe∶Cu多晶薄膜,通过XRD和XPS研究了它们的结构和各元素的浓度分布。结果表明,不同衬底温度下沉积的薄膜,结构无明显变化,利用XPS溅射剖析获得了薄膜中各成分浓度随溅射时间变化的分布图,发现不同条件下制备的薄膜,溅射速率不同,各成分随溅射时间的变化也不相同。薄膜中Cu的浓度随溅射时间增加而快速增加,并达到一极大值,然后快速下降。根据Cu浓度的变化研究了ZnTe层对Cu原子的阻挡作用,通过对Cu浓度随时间变化分布图的比较,作者认为,用70 ℃制备ZnTe,而后在常温下制备ZnTe∶Cu的复合膜作为CdTe太阳电池的背接触层,能有效阻挡Cu原子的扩散,提高电池效率。     

不同温度下制备的CdTe薄膜对太阳电池光电性能的影响

在不同温度下用近空间升华法（CSS）制备了CdTe多晶薄膜,结合I-V,C-V特性及深能级瞬态谱研究了不同温度制备的CdTe薄膜对CdS/CdTe太阳电池性能的影响.结果表明,制备温度对电池组件的开路电压影响不大,对短路电流和填充因子有影响,CdTe薄膜的深中心对温度和频率的响应基本一致.580℃制备的样品暗饱和电流密度最小,载流子浓度较高,光电特性较好,而且空穴陷阱浓度较低,深中心复合作用较小.在此研究基础上制备出了面积为300 mm×400 mm 关键词： 制备温度 CdTe薄膜 深能级瞬态谱（DLTS） CdS/CdTe太阳电池     

CdTe薄膜太阳电池背接触的研究

用近空间升华法制备了CdTe多晶薄膜，用硝酸-磷酸(NP)混合液对薄膜表面进行了腐蚀.经SEM观测，腐蚀后的CdTe薄膜晶界变宽，XRD测试发现，经NP腐蚀后，在CdTe薄膜表面生成了一层高电导的富Te层.在腐蚀后的CdTe薄膜上分别制备了Cu，Cu/ZnTe：Cu，ZnTe：Cu，ZnTe/ZnTe：Cu四种背接触层，比较了它们对太阳电池性能的影响.结果表明，用ZnTe/ZnTe：Cu复合层作为背接触层的效果较好，获得了面积为0.5cm²，转换效率为13.38%的CdTe多晶薄膜太 关键词： 硝磷酸腐蚀 背接触层 CdTe太阳电池     

CHx掺杂SiCOH 低介电常数薄膜的物性热稳定性分析

研究了真空热处理对掺CH₄的SiCOH低介电常数薄膜的电流-电压(I-V)特性、电容-电压(C-V)特性、疏水性能以及微结构的影响. 结果表明：在热处理过程中,热稳定性较差的碳氢基团发生了热解吸,使薄膜的漏电流减小、绝缘性能改善,并使薄膜的导电行为更趋于空间电荷限流过程. 碳氢基团的热解吸使SiCOH/Si界面的界面态发生改变,导致SiCOH薄膜MIS结构的平带电压V_FB发生漂移. 封端的碳氢 关键词： SiCOH薄膜 热处理 结构与性能     

CdTe太阳电池的不同背电极和背接触层的特性研究

用Ni替代Au来作为CdTe太阳电池的背电极，比较了Ni,Ni/Au,Au/Ni及Au背电极对电池性能的影响.发现Ni作为背电极和ZnTe/ZnTe:Cu复合层接触，电池的开路电压V_oc略有降低，填充因子FF有增有减，变化幅度不大，但因短路电流I_sc有较大的提高，转换效率η平均增长4％.测试了不同背电极的CdTe太阳电池的暗I-V和C-V特性，对背电极剥离后的样品进行了XPS测试分析.结果表明，Ni扩散到ZnTe/ZnTe:Cu复合层的深度比Au多，且大多呈离子态，与ZnTe/ZnTe:Cu复合层中的富Te离子形成Ni_xTe，提高了掺杂浓度，使电池性能获得改善. 关键词： 金属背电极 复合背接触层 转换效率 CdTe太阳电池     

光谱分析气体状态对近空间升华沉积CdTe多晶薄膜的影响

在CdTe多晶薄膜太阳电池制备中用近空间升华法生长了CdTe多晶薄膜,沉积工作气体的状态决定了薄膜的结构、性质。文章首先分析了近空间沉积的物理机制,测量了近空间沉积装置内的温度分布,使用氩氧混合气体为工作气体,其中重点讨论了该气体状态(包括气氛和气压)与薄膜的初期成核的关系,即择优取向程度和光能隙与气氛和气压的关系。结果表明,(1)不同气氛下沉积的CdTe薄膜均为立方相结构。随氧浓度的增加,σ增加,氧浓度为6%时,σ最大,之后随氧浓度增加,σ降低,在12%达到最小,然后随氧浓度的增加而增加, 在氧浓度为9%时沉积的结晶更完整。CdTe薄膜的光能隙为1.50～1.51 eV;(2)在氩氧气氛下氧浓度为9%,不同气压下制备的样品,均有立方相CdTe, 此外, 还有CdS和SnO₂:F衍射峰。CdTe晶粒随气压增加有减小趋势,随气压的增加,透过率呈下降趋势,相应的CdTe吸收边向短波方向移动;(3)在氩氧气氛下氧浓度为9%,采用衬底温度550 ℃,源温度620 ℃,沉积时间4 min时制备的CdTe多晶薄膜获得了转换效率优良的结构为SnO₂:F/CdS/CdTe/Au的集成电池。     

多晶薄膜表面粗化与生长方式转变

采用原子力显微镜研究了磁控溅射多晶薄膜表面粗化行为对归一化沉积温度T_s/T_m(T_s是沉积温度，T_m是材料熔点)的依赖性与薄膜生长方式转变行为.随着T_s/T_m增加，薄膜表面粗糙度增加，而表征粗糙度随时间演化特征的生长指数β历经了先减小再增加的过程.β对T_s/T_m的依赖关系反映了薄膜生长方式的转变行为，即薄膜生长依次由随机生长方式向表面扩散驱动生长方式与异常标度行为生长方式转变.在低于体扩散控制薄膜生长的温度时，晶界扩散机理导致多晶薄膜的表面粗化的异常标度行为. 关键词： 多晶薄膜 表面粗化 温度 生长     

离子束增强沉积VO2多晶薄膜的温度系数

用改进的离子束增强沉积方法和恰当的退火从V2O5粉末直接制备了VO2多晶薄膜.实验测试表明，薄膜的取向单一、相变特性显著、结构致密、界面结合牢固、工艺性能良好，薄膜的电阻温度系数（TCR）最高可达4.23%/K.从成膜机理出发，较详细地讨论了离子束增强沉积 VO2多晶薄膜的TCR高于VOx薄膜的TCR的原因.分析认为，单一取向的VO2结构使薄膜晶粒具有较高的电导激活能，致密的薄膜结构减少了氧空位和晶界宽度，使离子束增强沉积 VO2多晶薄膜结构比其他方法制备的VOx薄膜更接近于单晶VO2是其具有高TCR的原 关键词： VO2多晶薄膜 离子束增强沉积 热电阻温度系数     

Effects of metal doping on the physical properties of ZnTe thin films

Zinc telluride (ZnTe) thin films were sublimated on a glass substrate using closed space sublimation (CSS) technique. ZnTe thin films of same thickness were tailored with copper (Cu) & silver (Ag) doping, considered for comparative study. X-ray diffraction (XRD) patterns of as-deposited ZnTe thin film and doped ZnTe samples exhibited polycrystalline behavior. The preferred orientation of (111) having cubic phase was observed. XRD patterns indicated that the crystallite size had increased after silver and copper immersion in as-deposited ZnTe thin films. Scanning electron microscopy (SEM) was used to observe the change of as-deposited and doped sample's grains sizes. EDX confirmed the presence of Cu and Ag in the ZnTe thin films after doping respectively. The optical studies showed the decreasing trend in energy band gap after Cu and Ag-doping. Transmission also decreased after doping. Resistivity of as-deposited ZnTe thin film was about 10⁶ Ω cm. The resistivity was reduced to 68.97 Ω cm after Cu immersion, and 10⁴ Ω cm after Ag immersion. Raman spectra were used to check the crystallinity of as-deposited, Cu and Ag-doped ZnTe thin film samples.     

Development of ZnTe film with high copper doping efficiency for solar cells

Since a hole barrier was formed in back contact due to mismatch of work function, the back contact material for CdTe cell has been a significant research direction. The ZnTe:Cu is an ideal back contact material, which reduces the valence band discontinuity and can be used as the electron back reflection layer to inhibit interface recombination. The conductivity of ZnTe:Cu film is improved by applying RF-coupled DC sputtering and post-deposition heat treatment. The doping efficiency is computed as the ratio of free hole density and copper concentration, which can be correlated with performance for CdTe-based solar cell. The higher doping efficiency means that more copper atoms substitute for Zn sites in ZnTe lattices and less mobilized copper atoms remain which can enter into the CdTe absorber layer. Copper atoms are suspected as dominant element for CdTe-based cell degradation. After optimizing the ZnTe:Cu films, a systematic study is carried out to incorporate ZnTe:Cu film into CdTe solar cell. The EQE spectrum is kept relatively stable over the long wavelength range without decreasing. It is proved that the conduction band barrier of device with ZnTe:Cu/Au contact material has an effect on the EQE response, which works as free electron barrier and reduces the recombination rate of free carrier. According to the dark J—V data or the light J—V data in the linear region, the current indicates that the intercept gives the diode reverse saturation current. The results of ideality factor indicate that the dominant recombination occurs in the space charge region. In addition, the space charge density and depletion width of solar cell can be estimated by C—V profiling.     

Impact of ZnTe buffer on the electrical properties of n-type GaSb:Te films

We have investigated on the molecular beam epitaxy (MBE) of Te-doped GaSb films on ZnTe buffer. Te-doped GaSb (GaSb:Te) films with and without ZnTe buffer were grown on (0 0 1) GaAs substrates. GaSb:Te/ZnTe/GaAs film revealed higher mobility (=631 cm²/V s) in comparison to GaSb:Te/GaAs film (=249 cm²/V s). To explain the higher mobility of GaSb:Te on ZnTe buffer, dislocation density and temperature dependence of Hall measurement results were analyzed. Temperature dependence of Hall measurement shows strong influence of the dislocation scattering, which indicates that dislocation reduction by the ZnTe buffer enhances the carrier mobility of GaSb films.     

Influence of P<Superscript>+</Superscript>-ZnTe back surface contact on photovoltaic performance of ZnTe based solar cells

In order to improve photovoltaic performance of solar cells based on ZnTe thin films two device structures have been proposed and its photovoltaic parameters have been numerically simulated using Solar Cell Capacitance Simulator software. The first one is the ZnO/CdS/ZnTe conventional structure and the second one is the ZnO/CdS/ZnTe/P⁺-ZnTe structure with a P⁺-ZnTe layer inserted at the back surface of ZnTe active layer to produce a back surface field effect which could reduce back carrier recombination and thus increase the photovoltaic conversion efficiency of cells. The effect of ZnO, CdS and ZnTe layer thicknesses and the P⁺-ZnTe added layer and its thickness have been optimized for producing maximum working parameters such as: open-circuit voltage V_oc, short-circuit current density J_sc, fill factor FF, photovoltaic conversion efficiency η. The solar cell with ZnTe/P⁺-ZnTe junction showed remarkably higher conversion efficiency over the conventional solar cell based on ZnTe layer and the conversion efficiency of the ZnO/CdS/ZnTe/P⁺-ZnTe solar cell was found to be dependent on ZnTe and P⁺-ZnTe layer thicknesses. The optimization of ZnTe, CdS and ZnTe layers and the inserting of P⁺-ZnTe back surface layer results in an enhancement of the energy conversion efficiency since its maximum has increased from 10% for ZnO, CdS and ZnTe layer thicknesses of 0.05, 0.08 and 2 µm, respectively to 13.37% when ZnO, CdS, ZnTe and P⁺-ZnTe layer thicknesses are closed to 0.03, 0.03, 0.5 and 0.1 µm, respectively. Furthermore, the highest calculated output parameters have been J_sc?=?9.35 mA/cm², V_oc?=?1.81 V, η?=?13.37% and FF?=?79.05% achieved with ZnO, CdS, ZnTe, and P⁺-ZnTe layer thicknesses about 0.03, 0.03, 0.5 and 0.1 µm, respectively. Finally, the spectral response in the long-wavelength region for ZnO/CdS/ZnTe solar cells has decreased at the increase of back surface recombination velocity. However, it has exhibited a red shift and showed no dependence of back surface recombination velocity for ZnO/CdS/ZnTe/P?+?-ZnTe solar cells.     

Oxygen incorporation in ZnTe thin films grown by plasma-assisted pulsed laser deposition

We studied oxygen incorporation into ZnTe thin films with nitrogen and oxygen plasma during a plasma-assisted pulsed laser deposition (PA-PLD). It was shown that ZnTe:O layer formed with oxygen plasma exhibits an enhancement of optical transparency in visible spectral region due to the formation of amorphous TeO_x. Especially, the ZnTe:NO deposited by PA-PLD under nitrogen and oxygen partial pressures with N₂:O₂ of 10:3 sccm showed p-type semiconducting characteristics and the formation of intermediate band at about 0.5–0.8 eV below the ZnTe band edge. These results for oxygen incorporation in ZnTe thin film such as the enhancement of optical transparency in visible spectral region and the intermediate band formation will be useful for optoelectronic devices or intermediate band solar cells.     

点接触金属/Pr$lt;sub$gt;0.7$lt;/sub$gt;Ca$lt;sub$gt;0.3$lt;/sub$gt;MnO$lt;sub$gt;3$lt;/sub$gt;/Pt结构稳定的低电流电阻开关特性

利用自主开发的导电原子力显微镜控制Pt,W探针构成点接触金属/Pr_0.7Ca_0.3MnO₃（PCMO）/Pt三明治结构,对其电流-电压（I-V）及脉冲诱导电阻开关（EPIR）特性进行了研究.研究发现,在10 nA限流下两种电极对应结构的I-V都表现出相当稳定的双极性电阻开关特性,以及大于100的电阻开关比.进一步测试发现,点接触W/PCMO/Pt器件具有在10 nA限流下稳定的EPIR特性以及100 pA限流下重复的双极性电阻开关特性.此电流比已报道的电流低3个数量级,表明此结构在低功耗存储器件方面的潜在应用.通过对比样品不同位置、不同限流、不同接触面积点接触Pt/PCMO/Pt的I-V回滞特性,把点接触器件在低电流下稳定、显著的电阻开关效应归结于小的器件面积导致强的局域电场加强了O离子迁移效应. 关键词： 脉冲诱导电阻开关 电场下氧离子迁移 电阻开关     

Dielectric properties of ferroelectric/DMS heterointerface using YMnO3 and Ce doped Si

Bottom gate type Al/Si:8.2 at%Ce/YMnO₃/Pt capacitor was fabricated. Although it was polycrystalline, we successfully obtained Si:8.2 at%Ce film on ferroelectric YMnO₃. The dielectric properties of the capacitor were carefully investigated. Although the capacitance shows frequency dispersion, the capacitor exhibits a ferroelectric type C-V hysteresis loop. From the PUND and P-V measurements, ferroelectric polarization was distinguished from the another polarization, Based on these dielectric measurements, effect of polarization induced by the ferroelectric YMnO₃ on the carrier modulation in the diluted magnetic semiconductor, Ce doped Si film was discussed.     

Al2O3介质层厚度对AlGaN/GaN金属氧化物半导体-高电子迁移率晶体管性能的影响

在蓝宝石衬底上采用原子层淀积法制作了三种不同Al₂O₃介质层厚度的绝缘栅高电子迁移率晶体管.通过对三种器件的栅电容、栅泄漏电流、输出和转移特性的测试表明：随着Al₂O₃介质层厚度的增加,器件的栅控能力逐渐减弱,但是其栅泄漏电流明显降低,击穿电压相应提高.通过分析认为薄的绝缘层能够提供大的栅电容,因此其阈值电压较小,但是绝缘性能较差,并不能很好地抑制栅电流的泄漏;其次随着介质厚度的增加,可以对栅极施加更高的正偏压,因此获 关键词： 2O₃')" href="#">Al₂O₃ 金属氧化物半导体-高电子迁移率晶体管 介质层厚度 钝化     

Manifestation of magnetically induced spatial dispersion in the cubic semiconductors ZnTe, CdTe, and GaAs

Nonreciprocal birefringence due to magnetically induced spatial dispersion was observed in the T _d-class cubic semiconductors ZnTe, CdTe, and GaAs near the fundamental absorption edge. The dispersion of the parameters A and g, describing the contributions from terms of the type B _ik_j to the diagonal and off-diagonal components of the permittivity tensor ε _ij(ω,B,k), is determined for ZnTe and CdTe. Analysis of the dispersion and anisotropy of the nonreciprocal birefringence shows that in ZnTe, CdTe, and GaAs, in contrast to magnetic semiconductors of the type Cd_1−x Mn_xTe, it is due excitonic mechanisms. Pis’ma Zh. éksp. Teor. Fiz. 69, No. 7, 514–519 (10 April 1999)