行星夹具膜厚均匀性计算

 建立了平板型和球面型行星夹具膜厚均匀性的计算模型。利用根据这些模型编制的计算程序计算了基板表面膜层厚度分布与蒸发源位置、蒸发源发射特性、夹具高度、行星轨半径以及行星夹具的倾角之间的关系。并得到了一组典型结果。     

超半球透镜减反射膜

本文简单地介绍了超半球透镜减反射膜膜厚分布的理论计算结果。通过调节蒸发源与基片间的相对位置和“散乱”淀积技术获得了与理论要求基本一致的膜厚分布。通过离子轰击、基板烘烤和热处理获得了满意的膜层牢固度。     

凹球面涂布光刻胶均匀性研究

通过对离心法在凹球面上涂布光刻胶过程进行分析,阐明了离心状态下光刻胶在凹球面基底上的流动机理,结合试验提出影响凹球面涂布光刻胶膜厚均匀性的主要因素有胶液粘度、旋涂速度、旋涂时间,列举了以上因素引起的各种现象,并进行了理论分析。引用凹球面旋涂光刻胶的膜厚公式,建立了膜厚与速度关系数学模型;利用流体力学原理解释了有限圆形空间中流体速度对膜层均匀性的影响,从而解决了大曲率凹球面上制备微细图形结构的关键工艺问题,对非球面上制备微细图形具有借鉴作用。     

单液滴正碰球面动态行为特性实验研究

在考虑空气阻力影响,确定液滴撞击球面速度的基础上,对较高韦伯数液滴撞击干燥球面动态行为过程进行了实验研究,分析了球面曲率与韦伯数对液滴撞击行为和铺展因子的影响,并与前人撞击平面结果进行了对比.实验表明,靠近撞击球面时,液滴降落速度出现明显波动;球面曲率对液滴撞击后行为影响明显,曲率较大时,液滴撞击后铺展液膜会超出球面直径并滑落,曲率较小时,液滴撞击后在球面上呈现明显的铺展、回缩、震荡、着附动态变化行为,此时最大铺展因子受曲率影响小,随曲率减小,逐渐趋向于撞击平面时的最大铺展因子;韦伯数对液膜铺展速率影响较小,但对液膜回缩时间影响明显,最大铺展因子随韦伯数增加逐渐增大,获得的关联式呈指数变化.     

大口径镀膜机膜厚均匀性分析

以2.2m镀机为例分析大口径镀膜机膜厚分布情况，考虑旋转球面的情况，建立平板型和球面型行星夹具膜厚均匀性的计算模型，给出计算结果。     

热蒸发制备大口径铝膜的膜厚均匀性分析

研究了1.1m大口径镀膜机热蒸发制备金属铝膜的膜厚均匀性问题,针对旋转平面夹具分析了夹具高度H以及蒸发源与真空室中心轴距离L对铝膜膜厚均匀性的影响.当L=400mm,H/L=1.10时,膜厚均匀性最好,不均匀性为9.614％,不均匀性随H/L的值增大而增大.当H=500 mm,H/L=1.47时,膜厚均匀性最好,不均匀...     

平面型三级行星夹具膜厚均匀性仿真研究

建立了平面型三级行星夹具膜厚均匀性数学模型,根据该模型编写计算机仿真程序,研究了1.8 m大口径镀膜机使用平面型三级行星夹具的膜厚均匀性问题。以光驰OTFC-1800-DCI型镀膜机为仿真对象,分析了蒸发源特性、行星夹具倾角和行星轨半径对膜厚均匀性的影响。仿真计算结果表明：行星夹具倾角是影响平面型三级行星夹具膜厚均匀性的主要因素,当行星夹具倾角α=64°时,膜厚分布最为均匀,不均匀性为0.1%。行星轨半径对膜厚均匀性也存在影响,当行星轨半径在665 mm时,膜厚分布最为均匀,膜厚不均匀性控制在1%以内。平面型三级行星夹具膜厚分布理论模型对实际镀膜工作有一定的指导意义。     

球面光学零件气囊抛光工艺参数优化的研究

针对球面光学零件,采用气囊抛光方法对其进行加工,以正交实验为实验方法,以球面光学零件材料去除率和表面粗糙度为目标,研究了5个主要影响因素(气囊压缩量、气囊转速、内部压力、抛光液浓度和工件曲率半径)对材料去除率和表面粗糙度的影响程度,并根据实验结果优选工艺参数,找出影响材料去除率和表面粗糙度的工艺参数优化组合。以去除率和表面粗糙度为目标工艺参数,在优选后的结果指导下,根据优选后的工艺参数,以控制表面粗糙度为目标,采用离散进动方式抛光球面光学零件,可获得超精密的光滑表面。     

不等厚薄膜的应用和镀制

在光学零件表面镀制特殊要求的不等厚薄膜可使其面形满足特定的函数关系,这对改善光学系统的成象质量具有重要的意义。因此,不等厚薄膜技术颇有实用价值。本文着重介绍使用真空蒸镀工艺获得不等厚薄膜所采用的遮板切口形状的设计方法,作为特例,叙述了航空摄影机光学系统照度补偿板——滤光玻璃不等厚透射膜的制作工艺和测试方法。使用真空蒸镀工艺获得不等厚薄膜,实质上就是有效地控制被镀表面各处所接收的蒸发物质分子的流量。为此,被镀表面与蒸发源之间应置一具有特殊形状切口的遮板,而切口形状与所要求的不等厚薄膜的面形函数相对应。所以,切口形状的设计     

具有大面积均匀性、高质量的大尺寸中阶梯光栅铝膜的研究

大尺寸中阶梯光栅具有大孔径和极高的衍射级次,可以实现普通光栅难以达到的极高光谱分辨率,而制备大面积均匀性的高质量铝膜是实现高性能大尺寸中阶梯光栅的关键因素.本文首次详细报道了具有大面积均匀性、高质量的大尺寸中阶梯光栅铝膜的制备工艺.首先通过理论计算模拟了蒸镀过程中蒸发源的位置、发射特性以及夹具高度对铝膜均匀性的影响,然后研究了关键的蒸发工艺参数,例如蒸发速率、蒸发高度等对铝膜均匀性和铝膜质量的影响,最后在最佳化的蒸发工艺条件下,成功制备出满足大尺寸中阶梯光栅用的在直径700 mm范围内的均匀性小于1%、厚度大于10μm的高质量铝膜.     

不同类型蒸发源对平面夹具薄膜均匀性的影响

 分析了几种可能的实际蒸发源与薄膜均匀性的关系,其中包括扩展的平面蒸发源和曲面蒸发源。通过实验论证了薄膜均匀性对蒸发源尺寸和蒸发特性的依赖关系。得到的分析结果表明：当蒸发源半径和夹具高度的比值小于1/17时,蒸发源可以被视为一个点面源;大于 1/10时,应当把蒸发源视为面面源进行考虑。当挖坑深度和蒸发源半径的比值介于0和0.5之间时,挖坑对薄膜均匀性造成的影响基本可以忽略;大于0.6时,挖坑效应明显影响薄膜的均匀性。     

曲线坐标系下孔隙介质圆柱纵向表面波的传播特性

为了研究孔隙介质圆柱纵向表面波的传播规律,分析其频散和衰减特性,在正交曲线坐标系下建立了表面波的频散方程,通过数值计算得到频散曲线,将纵向导波最低模态与表面波进行对比,并分析了曲率半径及孔隙参数对表面波频散和衰减的影响。结果表明,当频率足够大时,导波最低模态的频散曲线与表面波近似;在同一频率下,表面波的相速度随曲率半径的增大而增大,随孔隙度的增大而减小;表面波的衰减随孔隙度的增大而增大。研究结果为开展孔隙介质圆柱结构的超声无损评价提供了一定的理论参考。     

Physical spherical phase compensation in reflection digital holographic microscopy

Reflection configured digital holographic microscopy (DHM) can perform accurate optical topography measurements of reflecting objects, such as MEMs, MOEMs, and semiconductor wafer. It can provide non-destructive quantitative measurements of surface roughness and geometric pattern characterization with nanometric axial resolution in real-time. However, the measurement results may be affected by an additional phase curvature introduced by the microscope objective (MO) used in DHM. It needs to be removed either by numerical compensation or by physical compensation.We present a method of physical spherical phase compensation for reflection DHM in the Michelson configuration. In the object arm, collimated light is used for illumination. Due to the use of the MO, the object wavefront may have a spherical phase curvature. In the reference arm, a lens and mirror combination is used to generate a spherical recording reference wave in order to physically compensate the spherical phase curvature of the object wavefront. By controlling the position of the mirror and the sample stage, the compensation process has been demonstrated. The relative positions of the test specimen and the reference mirror must be fixed for the physical spherical phase to be totally compensated. A numerical plane reference wave is preferred for the numerical reconstruction of the phase introduced by the test specimen. Experimental results on wafer pattern recognition are also given.     

空气源热泵蒸发器结霜过程数值模拟

建立了一个空气源热泵蒸发器结霜过程的动态分布参数模型,该模型考虑了翅片温度的不均匀分布、水蒸气在霜层中的扩散以及霜层参数动态变化等影响因素。理论计算结果与实验数据吻合较好。与常规模型相比,该模型对翅片表面霜层厚度的预测精度有很大程度提高,此研究为进一步完善多排翅片管式换热器结霜模型奠定了良好基础。     

Effect of acoustic field parameters on arc acoustic binding during ultrasonic wave-assisted arc welding

As a newly developed arc welding method, power ultrasound has been successfully introduced into arc and weld pool during ultrasonic wave-assisted arc welding process. The advanced process for molten metals can be realized by utilizing additional ultrasonic field. Under the action of the acoustic wave, the plasma arc as weld heat source is regulated and its characteristics make an obvious change. Compared with the conventional arc, the ultrasonic wave-assisted arc plasma is bound significantly and becomes brighter. To reveal the dependence of the acoustic binding force on acoustic field parameters, a two-dimensional acoustic field model for ultrasonic wave-assisted arc welding device is established. The influences of the radiator height, the central pore radius, the radiator radius, and curvature radius or depth of concave radiator surface are discussed using the boundary element method. Then the authors analyze the resonant mode by this relationship curve between acoustic radiation power and radiator height. Furthermore, the best acoustic binding ability is obtained by optimizing the geometric parameters of acoustic radiator. In addition, three concave radiator surfaces including spherical cap surface, paraboloid of revolution, and rotating single curved surface are investigated systematically. Finally, both the calculation and experiment suggest that, to obtain the best acoustic binding ability, the ultrasonic wave-assisted arc welding setup should be operated under the first resonant mode using a radiator with a spherical cap surface, a small central pore, a large section radius and an appropriate curvature radius.     

小型平板CPL蒸发器耦合计算及优化设计研究

本文建立了小型平板CPL蒸发器毛细多孔芯内汽液两相流动与传热的模型以及金属外壁和工质区的导热模型,并进行耦合求解.分析了金属侧壁效应对蒸发器性能的影响,提出小型平板CPL存在着侧壁效应传热极限.数值结果表明,工质蒸发发生在多孔芯加热表面附近,蒸发器采用单一金属外壁时由于侧壁效应导致系统传热极限低,而上壁采用导热系数大,侧壁及下壁采用导热系数小的新型结构能够明显的提高系统的传热能力,同时使加热表面的温度维持在较低的水平.     

柯恩达表面形状对环量控制涡轮叶型性能影响

采用商业软件ANSYS CFX研究了具有圆形和椭圆形柯恩达表面的环量控制叶型在不同射流速度下的流场和性能。结果表明:小的射流速度和大的柯恩达表面型线曲率是导致射流分离的主要因素,采用高速射流绕流大曲率柯恩达表面能够获得较大气流角和膨胀比,但同时带来较大的能量损失,叶栅气动性能与柯恩达表面形状和射流条件密切相关。     

光学元件表面的数字全息检测

针对球形光学元件的表面质量检测,开发了一种基于数字全息的表面曲率参数及疵病的同步检测方法。利用最小二乘法对再现波前进行参数拟合和计算,解决了再现过程中倾斜因子补偿对测量可靠性造成的影响。通过将原始数据与生成的虚拟曲面相减实现了表面疵病信息的同步提取。实验证明,该方法的测量结果与白光干涉仪的测量差异小于1.5%,在不同倾斜因子补偿系数作用下的测量结果误差小于1%。     

A novel compensation method for the measurement of radius of curvature

A test method for spherical mirrors with super-long radius of curvature that only one compensator is employed to measure the radii of curvature of both concave and convex mirrors is presented. With this testing system, the surface figure and radius of curvature of spherical mirrors can be measured simultaneously. Using the ABCD matrix method, a precise formula for radius of curvature calculation is deduced. Experimental results show that the relative measurement error of this method is less than 4.2×10⁻⁴.     

The boiling up model for highly superheated liquid with formation of evaporation front

Boiling up of metastable liquid on the surface of a cylindrical heater is studied at high superheating, when the evaporation front is formed. Boiling up begins with formation of a spherical bubble on the heater wall. Evaporation fronts propagating along the heater with the constant velocity are formed due to development of interfacial instability. The mathematical model describing the growth of a spherical bubble and vapor cavity behind the evaporation front is developed. Results of numerical simulation agree with available experimental data.