退火温度对富硅氮化硅薄膜发光特性和结构的影响

采用直流等离子体增强化学气相沉积(PECVD)法在(100)单晶硅片表面生长富硅氮化硅薄膜,研究了不同的退火温度对氮化硅薄膜发光性质和结构的影响。研究发现,随着退火温度的升高,氮化硅薄膜的发光强度逐渐减弱,发光是由缺陷能级引起的,在900 ℃时荧光基本消失。XPS测试表明,在N₂氛围900 ℃下退火,氮化硅薄膜中未有硅相析出,故未表现出硅量子点的发光。FTIR测试也为PL结论提供了一定的证据。     

Use of porous silicon for double- and triple-layer antireflection coatings in silicon photovoltaic converters

Reflectance spectrum calculations of double- and triple-layer antireflection coatings made of porous silicon layer are performed, using the optical matrix approach method. Obtained results are compared with the reflectance spectrum of other type antireflection coatings. Lower reflectance value of both double- and triple-layer antireflection coatings made of porous silicon is obtained in comparison to that of SiO₂/TiO₂ antireflection coating. These results can be used in photovoltaic converters.     

488 nm连续激光晶化本征非晶硅薄膜的喇曼光谱研究

利用等离子增强化学气相沉积系统制备了本征非晶硅薄膜,并选用488 nm波长的连续激光进行晶化.采用喇曼测试技术对本征非晶硅薄膜在不同激光功率密度和扫描时间下的晶化状态进行了表征,并用514 nm波长与488 nm波长对样品的晶化效果进行了比较.测试结果显示:激光照射时间60 s, 激光功率密度在1.57×10⁵ W/cm²时,能实现非晶硅向多晶硅的转变,在功率密度达到2.7 56×10⁵ W/cm²时,有非晶开始向单晶转变,随着激光功率密度的继续增加,晶化结果仍为单晶;在功率密度为2.362×10⁵ W/cm²下,60 s照射时间晶化效果较好;在功率密度为2.756×10⁵ W/cm²和照射时间为60 s的条件下,用488 nm波长比514 nm波长的激光晶化本征非晶硅薄膜效果较好,并均为单晶态.     

Silicon nitride/silicon oxide interlayers for solar cell passivating contacts based on PECVD amorphous silicon

This Letter demonstrates improved passivating contacts for silicon solar cells consisting of doped silicon films together with tunnelling dielectric layers. An improvement is demonstrated by replacing the commonly used silicon oxide interfacial layer with a silicon nitride/silicon oxide double interfacial layer. The paper describes the optimization of such contacts, including doping of a PECVD intrinsic a‐Si:H film by means of a thermal POCl₃ diffusion process and an exploration of the effect of the refractive index of the SiN_x. The n⁺ silicon passivating contact with SiN_x /SiO_x double layer achieves a better result than a single SiN_x or SiO_x layer, giving a recombination current parameter of ～7 fA/cm² and a contact resistivity of ～0.005 Ω cm², respectively. These self‐passivating electron‐selective contacts open the way to high efficiency silicon solar cells. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Irreversible quenching of luminescence in porous silicon

The influence of applied voltage on photoluminescence (PL) in porous silicon was studied. A strong PL band around 680 nm was observed when excited by a 300 nm ultraviolet light with no voltage applied, but upon increasing the bias voltage, a strong and progressive decrease of the PL intensity was observed leading finally to a complete quenching of the emitted light at 1.80 V. The peak position of the emission appears to be stable. This effect is completely irreversible, and the spectra depend on the increased voltage to the sample and corresponding temperature increase. Nonradiative recombination resulting from the thermal oxidation was suggested to be responsible for the quenching.     

Nickel induced lateral crystallization behavior of amorphous silicon films

Nickel induced lateral crystallization of amorphous silicon with and without electric field has been studied. Dendritic silicon growth behavior is observed, with crystallites of a few hundred nanometers in width and up to a few microns in length. The behavior can be understood from the preferential epitaxial growth of silicon from the (1 1 1) facets of the NiSi₂ precipitate, which forms during the early stage of the annealing process. The dendritic growth fronts are different with and without electric field in the nickel induced lateral crystallization process. Electric field is found to be beneficial in increasing the lateral crystallization rate and improving the film crystallinity. Joule heating plays an important role as well to enhance the lateral crystallization.     

DAMPE silicon tracker on-board data compression algorithm

The Dark Matter Particle Explorer(DAMPE) is an upcoming scientific satellite mission for high energy gamma-ray, electron and cosmic ray detection. The silicon tracker(STK) is a subdetector of the DAMPE payload.It has excellent position resolution(readout pitch of 242 μm), and measures the incident direction of particles as well as charge. The STK consists of 12 layers of Silicon Micro-strip Detector(SMD), equivalent to a total silicon area of6.5 m2. The total number of readout channels of the STK is 73728, which leads to a huge amount of raw data to be processed. In this paper, we focus on the on-board data compression algorithm and procedure in the STK, and show the results of initial verification by cosmic-ray measurements.     

Fiber Optic Excitation of Silicon Microspheres in Amorphous and Crystalline Fluids

ABSTRACT

This study investigates the optical resonance spectra of free-standing monolithic single crystal silicon microspheres immersed in various amorphous fluids, such as air, water, ethylene glycol, and 4-Cyano-4’-pentylbiphenyl nematic liquid crystal. For the various amorphous fluids, morphology-dependent resonances with quality factors on the order of 10⁵ are observed at 1428 nm. The mode spacing is always on the order of 0.23 nm. The immersion in various amorphous fluids affects the spectral response of the silicon microsphere and heralds this technique for use in novel optofluidics applications. Even though the nematic liquid crystal is a highly birefringent, scattering, and high-index optical medium, morphology-dependent resonances with quality factors on the order of 10⁵ are observed at 1300 nm in the elastic scattering spectra of the silicon microsphere, realizing a liquid-crystal-on-silicon geometry. The relative refractive index and the size parameter of the silicon microsphere are the parameters that affect the resonance structure. The more 4-Cyano-4’-pentylbiphenyl interacting with the silicon microsphere, the lower the quality factor of the resonances is. The more 4-Cyano-4’-pentylbiphenyl is interacting with the silicon microsphere, the lower the mode spacing Δλ of the resonances is. The silicon microspheres wetted with nematic liquid crystal can be used for optically addressed liquid-crystal-on-silicon displays, light valve applications, or reconfigurable optical networks.     

室温下掺Er富硅氧化硅和掺Er富硅氮化硅的光致发光及其退火

用磁控溅射淀积掺Er氧化硅、掺Er富硅氧化硅、掺Er氮化硅和掺Er富硅氮化硅薄膜,室温下测量这四种薄膜的光致发光（PL）谱,观察到这四种薄膜都具有1.54μm的峰位,其强度与薄膜的退火温度有关。为了确定1.54μmPL的最佳退火温度,这些薄膜都分别在600,700,800,900,1000,1100℃的温度下同时退火,发现两种富硅薄膜的最佳退火温度是800℃,不富硅的两种薄膜的最佳退火温度是900℃。样品的1.54μmPL最强,且800℃退火的掺Er富硅氧化硅薄膜的1.54μm峰强度是最强的,比不富硅的强了约20倍,还观察到这四种薄膜都具有1.38μm的PL带,且掺Er富硅氧化硅和掺Er富硅氮化硅这两种薄膜的PL在强度上1.38μm峰与1.54μm峰有一定的关系。     

Superconductivity in covalent semiconductors

This review covers recent advances in superconductivity of diamond, Si, SiC, group III–V and II–IV semiconductors, metal-intercalated graphite and fullerites. The results are critically analyzed and prospects are given for future research directions. In particular, it is argued that the highest transition temperatures of ∼9 K in diamond and 11.5 K in CaC₆ can further be enhanced and that no reliable evidence exists yet for superconductivity in III-V semiconductors.      

氮化硅薄膜中硅纳米颗粒的形成机制研究

采用等离子体增强化学气相沉积技术,以SiH₄作为硅源, NH₃和N₂共同作为氮源,在单晶硅衬底上制备了不同的氮化硅薄膜. X射线衍射分析薄膜晶体结构,通过计算晶格尺寸大小证明了纳米硅颗粒的存在. 傅里叶变换红外光谱分析了薄膜中的键合作用的变化并结合化学反应过程对氮化硅薄膜中纳米硅颗粒的形成机制进行了研究,发现Si—Si键作为硅纳米颗粒的初始位置, 当反应朝着生成Si—Si的方向进行时,可以促进氮化硅薄膜中硅纳米颗粒的形成. X射线衍射分析和光致发光实验结果表明Si—Si键浓度增大时, 所形成的纳米硅颗粒的尺寸和浓度都随之增大.     

尺寸可控的纳米硅的生长模型和实验验证

基于经典热力学理论，对a-SiN_x/a-Si:H/a-SiN_x三明治结构或a-Si:H/a-SiN_x多层膜结构中纳米硅成核，以及从球形到鼓形的生长过程进行了研究. 建立了限制性晶化理论模型：在纳米硅生长过程中，由于界面能增大将导致生长停止，给出限制性晶化条件——a-Si:H子层厚度小于34 nm. 在激光晶化和常规热退火两种方法形成的a-SiN_x/nc-Si/a-SiN_x三明治结构和nc-Si/a-SiN_x多层膜结构中验证了该理论模型. 关键词： 非晶硅 纳米硅 激光辐照 结晶     

Annealing and amorphous silicon passivation of porous silicon with blue light emission

The photoluminescence (PL) of the annealed and amorphous silicon passivated porous silicon with blue emission has been investigated. The N-type and P-type porous silicon fabricated by electrochemical etching was annealed in the temperature range of 700-900 °C, and was coated with amorphous silicon formed in a plasma-enhanced chemical vapor deposition (PECVD) process. After annealing, the variation of PL intensity of N-type porous silicon was different from that of P-type porous silicon, depending on their structure. It was also found that during annealing at 900 °C, the coated amorphous silicon crystallized into polycrystalline silicon, which passivated the irradiative centers on the surface of porous silicon so as to increase the intensity of the blue emission.     

Silicon as an emissive optical medium

One of the great challenges in photonics has been to modify silicon to enhance light emission properties. In this review article we survey recent studies which have generated light from silicon in a variety of ways including introduction of emissive centers, anodization, fabrication of quantum‐confined structures and by utilizing non‐linear effects. Each method offers insight into silicon as an emissive medium, but no one method has proven effective enough a light source to compete with established technologies based on III‐V and II‐VI compound semiconductors, and in particular no one method of inducing light emission in silicon has made possible an electrically‐pumped silicon laser.     

红外光谱法测定聚醚硅油中含氢硅油的含量

以烷基酚聚氧乙烯醚(OP-10)和含氢硅油为原料,以辛酸亚锡为催化剂,甲苯作溶剂,采用溶液聚合的方法合成了一种新型聚醚硅油。用红外光谱法对合成样品中残留的含氢硅油进行定量分析,利用含氢硅油中Si—H键在2 167 cm-1处的吸收峰,选择司班-60作为内标物,以朗伯-比尔定律为理论依据,推导出样品和内标物的吸光度比(Y)与质量比(X)的线性关系式为Y=kX(k为常数),从而建立了直接红外光谱法测定聚醚硅油中含氢硅油含量的方法。实验测定内标工作曲线为Y=2.072 1X+0.296 3,相关系数r2=0.998 9,通过对方法重现性和回收率的测定,得到了较为满意的结果。该法是确定合成聚醚硅油产品的反应程度和控制产品质量的一种必要手段,同时为调整聚醚硅油的性能提供了依据;从而确定了最佳合成工艺路线及工艺条件。将合成的聚合物经处理后进行了应用实验,该聚合物对醇系和苯系化合物的萃取效果很好,具有广泛的应用前景。     

铝诱导非晶硅薄膜的场致低温快速晶化及其结构表征

铝诱导非晶硅薄膜晶化可以降低退火温度、缩短退火时间，是制备多晶硅薄膜的一种重要方法.在此基础上，通过在退火过程中加入电场加速了界面处硅、铝原子间的互扩散，实现了非晶硅薄膜的快速低温晶化.实验结果表明，外加电场，退火温度为400℃，退火时间为60min时，薄膜的晶化率大于60％；退火温度为450℃退火时间为30min时，薄膜已经呈现明显的晶化现象；退火温度为500℃退火时间为15min时，薄膜的x射线多晶峰强度与非晶峰强度之比为未加电场的3—4倍. 关键词： 非晶硅薄膜 多晶硅薄膜 外加电场     

Electroluminescence from a current-emitting nanostructured silicon device

A three-dimensional silicon based nanodevice mainly consisting of two conductive silicon cantilevers was fabricated out of silicon-on-insulator material by electron beam lithography, reactive ion etching, and fluoride based wet chemical etching. One of the cantilevers is bent and sticks to the silicon substrate while the other one is freely suspended. We observed electroluminescence in the visible range when a voltage of any polarity is dropped across both levers. The measured spectra covered the range 400–950 nm peaking at about 650 nm. The current applied to the device could tune the intensity of the electroluminescence spectrum. Light powers ranging from 160 fW to some pW were measured at frequencies up to 17 kHz. The origin of the electroluminescence is discussed in comparison to porous silicon and spark-processed silicon.     

Enhanced multiple exciton generation in amorphous silicon nanowires and films

ABSTRACT

Multiple exciton generation (MEG) in nanometer-sized hydrogen-passivated silicon nanowires (NWs), and quasi two-dimensional nanofilms depends strongly on the degree of the core structural disorder as shown by the perturbative many-body quantum mechanics calculations based on the density functional theory simulations. Working to the second order in the electron–photon coupling and in the screened Coulomb interaction, we calculate quantum efficiency (QE), the average number of excitons created by a single absorbed photon, in the Si₂₉H₃₆ quantum dots (QDs) with crystalline and amorphous core structures, simple cubic three-dimensional arrays constructed from these QDs, crystalline and amorphous NWs, and quasi two-dimensional silicon nanofilms, also both crystalline and amorphous. Efficient MEG with QE ranging from 1.3 up to 1.8 at the photon energy of about 3E_g, where E_g is the electronic gap, is predicted in these nanoparticles except for the crystalline NW and crystalline film where QE ? 1. MEG in the amorphous nanoparticles is enhanced by the electron localisation due to structural disorder. Combined with the lower gaps, the nanometer-sized amorphous silicon NWs and films are predicted to have effective carrier multiplication within the solar spectrum range.