Sub-microns period grating couplers fabricated by silicon mold

This paper describes a novel simple process suitable for fabrication of micro-periodic structure in optical waveguide. The mold was fabricated using electron beam lithography and fast atom beam etching. Sub-micron-scale patterns were transferred from silicon mold to polymer layer. Grating coupler was fabricated by the mold and normal optical mask. In the proposed method, no press which is needed for imprint lithography is required and the mold structure can be duplicated with high aspect ratio. Experimental coupling efficiency is about 25%. This technique can also be used to fabricate other nanometer-scale structures.     

Features of the manufacture of deep X-ray lithography masks in the siberian synchrotron and terahertz radiation center

The development of a low-cost technology to manufacture high-contrast X-ray LIGA masks is topical because this technology is important for various applied research on microstructured products with minimum element sizes of 10–50 μm, such as microfluid analytical systems, selective waveguide mesh-based elements to control terahertz (THz) radiation, microshaped optical elements for the visible range, etc. Technological particularities of mask manufacture are considered. A method to check the quality of masks is presented. Test microproducts manufactured using the produced deep X-ray lithography masks are demonstrated.     

X-ray masks based on epoxygraphite

A simple fabrication technology of hard X-ray masks with thin (50–150μm thick) X-ray transparent bearing membranes made of a new material, i.e., polymerized epoxy resin with graphite filler (hereafter, epoxygraphite), is described. The first results of using such masks in pattern scanning synchrotron X-ray lithography in the exposing radiation wavelength range λ ≈ 0.5–3 Å are presented. The prospects of applications of such masks in the softer spectral range λ ≈ 3–7 Å are considered.     

软X射线相位型聚焦波带片的研制

软X射线波带片是软X射线光学中聚焦、色散和成像的重要元件。以激光全息-离子束刻蚀技术制作金的振幅型软X射线聚焦波带片,以此为掩模,利用接触式同步辐射光刻和离子束刻蚀技术在聚酰亚胺衬底上,分别制作出了镍和锗的软X射线相位型聚焦波带片。     

Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching

Laser interference lithography (LIL) has the capability to fabricate large-area microstructures on the photoresist with only a couple of minutes’ exposure and development. In this study, LIL was adopted to fabricate micro/nanostructures in quartz by combining the following dry-etching process either reactive ion etching (RIE) or inductively coupled plasma (ICP). A layer of gold film was coated on the quartz to act as a hard mask during the dry-etching process. A microhole array in quartz with a thin gold film covered on the surface was fabricated when choosing RIE. Each hole in the microhole array was surrounded with gold nanoparticle capped silica (Au/SiO₂) cones when using ICP instead of RIE. This is due to the thin gold film that serves as the mask for creating the surface roughness required for creating the silica cone structure.     

2000 l/mm X射线镂空透射光栅的制备研究

在满足工艺要求的前提下,通过模拟光栅衍射,设计出镂空透射光栅模型,在此基础上将电子束和X射线光刻技术相结合,研究了制造2000 l/mm X射线镂空透射光栅的新工艺技术.首先利用电子束光刻和微电镀技术在镂空聚酰亚胺薄膜底衬上制备X射线母光栅掩模.然后利用X射线光刻和微电镀技术实现了光栅图形的复制,之后采用紫外光刻和微电镀技术制作加强筋结构,最后通过腐蚀体硅和等离子体刻蚀聚酰亚胺完成镂空透射光栅的制作.从此新的制造工艺结果上来看.制备的光栅栅线平滑,占空比合理,侧壁陡直,不同光栅之间一致性好,完全可以满足应用需求,充分表明了该制造技术是透射式X射线衍射光学元件制造的良好选择.     

A novel hanging bowl-shaped mask for the fabrication of vertical sidewall structures

Contact exposure is expected to occur in conventional lithography, and can be a source of process deviations (such as shrinking and distortion of templates) during reactive ion etching and inductively coupled plasma etching, as these deviations are induced by ion bombardment. This typically results in undesired sidewall effects, such as lower sidewall angles. Here we report a novel hanging bowlshaped lithography mask that can effectively minimize sidewall effects in lithography applications. As a test case, standard silicon carbide pillars with vertical sidewalls are fabricated using this mask. The mask could be used for fabrication of high-aspect-ratio structures with ultra-violet lithography.     

Design and analysis of the single-step nanoimprinting lithography equipment for sub-100 nm linewidth

Nanoimprint lithography (NIL) is the cutting-edge technology to produce sub-100 nm scale features on substrates. The fundamental procedure of nanoimprint lithography is replicating the patterns defined in the stamp to any deformable materials such as photoresist spun on substrates by pressing and the physical shape of the resist is deformed during the imprinting process. In this study, for the single-step nanoimprinting process, the 4-in. imprinting head, the fabricated 4-in. mask, the alignment system for multi-layer processes, and the six-DOF compliant mechanism of a wafer stage for single-step nanoimprinting on a 4-in. wafer are proposed. Using the designed nanoimprinting equipment, the nanoscale patterns with 100 nm linewidth and 150 nm height were clearly patterned on the substrate. Finally, the nanoimprinting results show the validity of the developed equipment.     

Research of photolithography technology based on surface plasmon

This paper demonstrates a new process of the photolithography technology,used to fabricate simply fine patterns,by employing surface plasmon character.The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask.According to the traditional semiconductor process,the grating structures are fabricated at exposing wavelength of 436 nm.At the same time,it provides additional and quantitative support of this technique based on the finite-difference time-domain method.The results of the research show that surface plasmon characteristics of metals can be used to increase the optical field energy distribution differences through the silica structures with silver film,which directly impact on the exposure of following photosensitive layer in different regions.     

基于同步辐射光刻的三维微细加工方法

同步辐射光刻的三维聚甲基丙烯酸甲酯（Polymethyl Methacrylate，PMMA）微结构制造对X射线光刻掩膜板的吸收体形状和PMMA所吸收的X射线能量分布有直接影响，即三维PMMA微结构形状取决于X射线光刻掩膜板的吸收体形状。如果不对X射线光刻掩膜板进行补偿，在被曝光的结构中可观察到结构侧面的变形。研究了引起这种结构侧面变形的各种原因并提出X射线剂量对刻蚀深度非线性曲线是最直接的原因。基于X射线光刻掩膜板图形形状和实际制造的三维PMMA微结构的误差，X射线光刻掩膜板从双直角三角形变为双半圆图形使得微注射针阵列的强度得到增强。为了量化实际制造的三维PMMA微结构的误差，给出了X射线吸收能量分布与微结构的结构形状数据。     

制作工艺误差对X射线组合折射透镜聚焦性能影响研究

本文主要介绍对X射线组合折射透镜的制作工艺误差对其聚焦性能影响的研究结果. 首先给出采用深度X射线光刻技术制作的PMMA材料圆柱面型X组合折射透镜的工艺测试结果,得出制作工艺误差值,定性分析制作工艺误差对X射线组合折射透镜聚焦性能的影响. 然后根据实际的制作工艺误差建模,给出详尽的理论分析和定量的理论模拟结果. 最后在北京同步辐射装置(BSRF)上,构建基于PMMA材料的圆柱面型X射线组合折射透镜的微束聚焦实验系统,实际测试了有明显工艺误差和尽量消除工艺误差的两种X射线组合折射透镜的聚焦性能,给出实测结果 关键词： X射线组合折射透镜 制作工艺误差 X射线聚焦性能 同步辐射     

软X射线投影光刻技术及其发展

软X射线投影光刻的研究近年来取得了突破性进展，所采用的新型光学系统由于无污染激光等离子光源及分辨率大视场投影光刻系统组成，该技术多采用无应力光学装调工艺、深亚纳米级的镜面加工和多层膜制备技术及低缺陷反射式掩摸技术，该技术还采用表面成像光刻胶技术并涉及到精密扫描机构等技术，本文介绍了这一技术的发展历史，关键技术以及研究进展。     

Fabrication of nested elliptical KB mirrors using profile coating for synchrotron radiation X-ray focusing

This paper describes fabrication methods used to demonstrate the advantages of nested or Montel optics for micro/nanofocusing of synchrotron X-ray beams. A standard Kirkpatrick-Baez (KB) mirror system uses two separated elliptical mirrors at glancing angles to the X-ray beam and sequentially arranged at 90° to each other to focus X-rays successively in the vertical and horizontal directions. A nested KB mirror system has the two mirrors positioned perpendicular and side-by-side to each other. Compared to a standard KB mirror system, Montel optics can focus a larger divergence and the mirrors can have a shorter focal length. As a result, nested mirrors can be fabricated with improved demagnification factor and ultimately smaller focal spot, than with a standard KB arrangement. The nested system is also more compact with an increased working distance, and is more stable, with reduced complexity of mirror stages. However, although Montel optics is commercially available for laboratory X-ray sources, due to technical difficulties they have not been used to microfocus synchrotron radiation X-rays, where ultra-precise mirror surfaces are essential. The main challenge in adapting nested optics for synchrotron microfocusing is to fabricate mirrors with a precise elliptical surface profile at the very edge where the two mirrors meet and where X-rays scatter. For example, in our application to achieve a sub-micron focus with high efficiency, a surface figure root-mean-square (rms) error on the order of 1 nm is required in the useable area along the X-ray footprint with a ∼0.1 mm-diameter cross section. In this paper we describe promising ways to fabricate precise nested KB mirrors using our profile coating technique and inexpensive flat Si substrates.     

3333lp/mm X射线透射光栅的研制

针对X射线透射光栅摄谱仪中的高线密度光栅,研究了采用电子束曝光和X射线曝光技术结合制作高线密度X射线透射光栅的工艺技术.首先利用电子束曝光和微电镀技术在镂空的薄膜上制备母光栅X射线掩模版,然后利用X射线曝光和微电镀技术小批量复制光栅.在国内首次完成了3333lp/mm X射线透射光栅的研制,栅线宽度为150nm,周期为300nm,金吸收体厚度为500nm.衍射效率标定的结果表明,该光栅的占空比合理、侧壁陡直,具有良好的色散特性,能够满足空间探测、同步辐射和变等离子诊断等多个领域的应用.     

Dye assisted enhanced transmission in near field optical lithography

Surface plasmon lithography using embedded-amplitude masks has received considerable attention in recent times for its ability to produce high density features with resolution beyond diffraction limit. However plasmon damping caused due to intrinsic metal absorption restricts the achievable aspect ratio of the fabricated features. One possible way to rectify this issue is to use a gain medium to amplify the surface plasmons and thereby increase their propagation length. In this context this paper proposes a novel concept of employing dye medium to enhance plasmon propagation in mask based surface plasmon lithography, so as to obtain higher transmission depth in the writing medium. The proposed concept is supported by numerical simulations and the results obtained indicate a 14.5 fold field enhancement in presence of dye (gain) medium.     

基于同步辐射的快速扫描X射线微束荧光成像方法

在上海光源硬X射线微聚焦光束线站(BL15U1)上, 基于EPICS软件平台, 集成运动控制, 光强探测, 荧光探测等功能, 实现了"飞行"模式 (on-the-fly) X射线扫描微束荧光成像方法. 用"飞行"扫描X射线荧光成像法获得了标准镍网, 以及微量元素Cu, Zn,K, Fe在样品老鼠脾内的分布图像, 结果显示该方法不但在速度上有了极大的提高, 而且获得的元素分布图像具有高质量. 关键词： 快速扫描X射线微束荧光成像 同步辐射 微量元素分布     

激光干涉光刻法制作100 nm掩模

 介绍了一种利用激光干涉光刻技术得到特征图形,并通过离子束刻蚀将图形转移到铬层上,从而获得掩模的方法。针对掩模透光率以及对干涉图形对比度可能产生影响的两个参数分别进行了数值仿真,从而证明此方法的可行性和参数的优化选择。自搭干涉光刻实验系统,用257 nm的激光光源实现光刻,得到特征尺寸为100 nm的图形,再经过离子束刻蚀,最终得到周期200 nm、线宽100 nm的掩模。     

Fabrication of Nanoimprint Stamp Using Interference Lithography

Interference lithography is used to fabricate a nanoimprint stamp, which is a key step for nanoimprint lithography. A layer of chromium in thickness of about 20 nm is deposited on the newly cleaned fused silica substrate by thermal evaporation, and a layer of positive resist in thickness of 150nm is spun on the chromium layer. Some patterns, including lines, holes and pillars, are observed on the photoresist film by exposing the resist to interference patterns and they are then transferred to the chromium layer by wet etching. Fused silica stamps are fabricated by reactive ion etching with CHF3/O2 as etchants using the chromium layer as etch mask. An atomic force microscope is used to analyse the pattern transfer in each step. The results show that regular hole patterns of fused silica, with average full width 143nm at half maximum （FWHM）, average hole depth of 76nm and spacing of 450nm, have been fabricated. The exposure method is fast, inexpensive and applicable for fabrication of nanoimprint stamps with large areas.     

大面积10000线/毫米软X射线金属型透射光栅的设计、制作与检测

基于严格的矢量耦合波理论,优化设计了用于13.4nm软X射线干涉光刻的透射型双光栅掩模版. 采用电子束光刻技术,在国内首次成功制作了周期为100nm的大面积金属型透射光栅.光栅面积为1.5mm ×1.5mm,Cr浮雕厚度为50nm,Gap/period为0.6,衬底Si₃N₄厚度为100nm. 此光栅将用于上海光源软X射线干涉光刻实验站.利用其1级衍射光和2级衍射光将可以经济高效地制作周期为50和25nm的大面积周期结构.最后,测量了该光栅对波长为13.4nm 同步辐射光的衍射光强度,并且推算得出该光栅的1级和2级衍射效率分别为4.41%和0.49%,与理论设计值比较符合.实验结果与理论模拟结果的对比表明该光栅侧壁陡直,Gap/period的控制也与设计值符合. 关键词： 软X射线金属型透射光栅 严格耦合波方法 衍射效率 软X射线干涉光刻     

Beamline BL‐07 at Indus‐2: a facility for microfabrication research

The X‐ray lithography beamline on Indus‐2 is now operational, with two modes of operation. With a pair of X‐ray mirrors it is possible to tune the energy spectrum between 1 and 20 keV with a controlled spectral bandwidth. In its `no optics' mode, hard X‐rays up to 40 keV are available. Features and performance of the beamline are presented along with some example structures. Structures fabricated include honeycomb structures in PMMA using a stainless steel stencil mask and a compound refractive X‐ray lens using a polyimide–gold mask in SU‐8.