集成光学波导光栅研究进展

报道了20世纪80年代以来,研究组在集成光学波导光栅研究领域的主要工作及研究成果。其中包括集成光学波导光栅的制备研究;若干非线性波导光栅器件研究;高效体相位全息布拉格光栅-光导板的耦合互连;单片集成波导光栅波分复用等。这些研究工作为光通信、光计算、光传感和光学信息处理等应用领域提供小型化、低功耗、超快速全光型器件奠定了技术基础。     

基于纳米压印技术分布反馈激光器阵列的ONU光源研究

利用纳米压印工艺及对接生长工艺制作了基于分布反馈(DFB)激光器阵列的适用于波分复用光无源网络(WDM-PON)光网络单元(ONU)的低成本光源芯片。器件使用单片集成多模干涉器进行合波输出。测试结果显示,器件平均阈值小于10mA,边模抑制比大于40dB,波长调谐范围大于10nm,出光功率大于0.2mW。     

半绝缘等离子体波导太赫兹量子级联激光器工艺研究

采用气态源分子束外延设备生长了GaAs/AlGaAs束缚态到连续态跃迁结构的太赫兹（THz）量子级联激光器（QCL）有源区结构,研究了半绝缘等离子体波导THz QCL的器件工艺,采用远红外傅里叶变换光谱仪以及探测器测量了器件的电光特性.器件激射频率为32 THz,10 K下的阈值电流密度为275 A/cm². 关键词： 太赫兹 量子级联激光器 波导 器件工艺     

快速热处理对应变InGaAs/GaAs单量子阱激光二极管电子发射和DX中心的影响

研究分子束外延(MBE)生长的应变In0.2Ga0.8AsGaAs折射率梯度变化异质结单量子阱激光二极管的快速热处理(RTA)效应.结果表明,RTA移除了InGaAsGaAs界面非辐射中心,提高77K光致发光效率和有源层电子发射.同时Al和Ga原子互扩散,也增加了AlGaAs波导层DX中心浓度.RTA处理后样品电流冲击老化实验证明DX中心浓度呈现出相应的增加.这表明DX中心可能是激光二极管性能退化的原因之一. 关键词： 量子阱 快速热处理 电子发射 DX中心     

硅基锗薄膜的异质外延生长及其在光电子器件中的应用

准直接带隙的锗,其禁带宽度小,吸收系数大,迁移率高,更重要的是,它能与硅微电子工艺兼容,在硅基光电集成中得到了广泛的研究和应用．文章综述了硅基锗薄膜的异质外延生长及其在光电子器件（特别是长波长光电探测器和激光器）应用上的进展;介绍了在硅衬底上异质外延生长锗薄膜的缓冲层技术,如组分变化的SiGe缓冲层技术、选区外延技术和低温技术;讨论了硅基锗薄膜光电探测器的性能与结构的关系以及发展趋势;分析了张应变和n型掺杂对锗光电性质的影响;展望了硅基锗薄膜单片集成和电抽运激光器的前景．     

1550nm波长PNP型InGaAsP-InP异质结晶体管激光器材料设计与外延生长

基于器件模拟仿真,设计了一种PNP型1.5μm波长多量子阱InGaAsP-InP异质结晶体管激光器材料外延结构,并采用金属有机化学气相沉积外延生长.其中基区采用N型Si掺杂.因为扩散系数小,比较P型Zn搀杂具有较高的稳定性,因而较NPN结构外延材料容易获得高质量的光学有源区.由于N型欧姆接触比P型容易获得,基区搀杂浓度可以相对较低,有利于减小基区光损耗和载流子复合,从而获得较低的阈值电流和较高的输出光功率.所获得的外延材料呈现较高光-荧光谱峰值和65.1nm较低半峰宽.测试结果显示了较高的外延片光学质量.     

1 550 nm波长PNP型InGaAsP-InP异质结晶体管激光器材料设计与外延生长

基于器件模拟仿真,设计了一种PNP型1.5 μm 波长多量子阱InGaAsP-InP异质结晶体管激光器材料外延结构,并采用金属有机化学气相沉积外延生长.其中基区采用N型Si掺杂.因为扩散系数小,比较P型Zn搀杂具有较高的稳定性,因而较NPN结构外延材料容易获得高质量的光学有源区.由于N型欧姆接触比P型容易获得,基区搀杂浓度可以相对较低,有利于减小基区光损耗和载流子复合,从而获得较低的阈值电流和较高的输出光功率.所获得的外延材料呈现较高光-荧光谱峰值和65.1 nm较低半峰宽.测试结果显示了较高的外延片光学质量.     

高亮度GaAlAs单异质结红光二极管

本文从工业生产角度对GaAlAs单异质结红光二极管的芯片制作技术作了细致研究.设计出能同时生长多枚外延片的新结构生长舟,选择了合适的管芯参数与生长条件,制定出稳定重复的工艺流程.用本项技术制出的单异质结管芯,发光波长为660nm,平均亮度达到4.5mcd/20mA,最高亮度达6.2mcd.     

渐变耦合脊波导晶体管探测器光响应分析

为提高InP基光探测器的吸收效率和工作速度,设计了一种渐变耦合脊波导单载流子传输异质结光敏晶体管探测器。采用有效折射率法和光束传播法,分析渐变耦合脊波导的光传输模式,优化后波导宽度和波导长度分别为2.6μm和250μm,可实现单模传输和高的光吸收效率。由于渐变耦合脊波导单载流子传输异质结光敏晶体管光传输方向与载流子运动方向垂直,分别优化光敏晶体管的吸收效率和速度,器件输出光电流和特征频率均得到改善。渐变耦合脊波导单载流子传输异质结光敏晶体管的响应度为33.83A/W,饱和输出光电流为90mA,最高特征频率达到87GHz,其饱和输出电流和特征频率相比于台面单载流子传输异质结光敏晶体管分别提高了20%和24%。但渐变耦合脊波导单载流子传输异质结光敏晶体管吸收体积大,获得饱和电流时的光功率也比较大,因此渐变耦合脊波导单载流子传输异质结光敏晶体管的响应度略小于台面的单载流子传输异质结光敏晶体管的响应度。     

高质量单层二硫化钼薄膜的研究进展

作为一种新型的二维半导体材料,单层二硫化钼薄膜由于其优异的特性,在电子学与光电子学等众多领域具有潜在的应用价值.本文综述了我们课题组在过去几年中针对单层二硫化钼薄膜的研究所取得的进展,具体包括:在二硫化钼薄膜的制备方面,通过氧辅助化学气相沉积方法,实现了大尺寸单层二硫化钼单晶的可控生长和晶圆级单层二硫化钼薄膜的高定向外延生长;在二硫化钼薄膜的加工方面,发展了单层二硫化钼薄膜的无损转移、洁净图案化加工、可控结构相变与局域相调控的方法,为场效应晶体管等电子学器件的制备与性能优化提供了基础;在二硫化钼异质结方面,研究了二硫化钼薄膜与其他二维材料形成的异质结的电学以及光电性质,为二维材料异质结的构筑和器件特性研究提供了实验参考;在二硫化钼薄膜功能化器件与应用方面,构筑了全二维材料、亚5 nm超短沟道场效应晶体管器件,验证了单层二硫化钼对短沟道效应的有效抑制及其在5 nm工艺节点器件中的应用优势;此外,利用制备的高质量单层二硫化钼和发展的器件洁净加工技术,实现了高性能柔性薄膜晶体管的集成,获得了超高灵敏度与稳定性的非接触型湿度传感器.我们在二硫化钼薄膜的制备、加工以及器件特性研究方面所取得的进展对于二硫化钼及其他二维过渡金属硫属化合物的基础和应用研究均具有指导意义.     

4 × 25 GHz uni-traveling carrier photodiode arrays monolithic with In P-based AWG demultiplexers using the selective area growth technique

We use the selective area growth(SAG) technique to monolithically integrate In P-based 4-channel arrayed waveguide gratings(AWGs) with uni-traveling carrier photodiode arrays at the O-band. Two kinds of channel spacing demultiplexers of 20 nm and 800 GHz are adopted for potential 100 Gbps coarse wavelength division multiplexing and local area network wavelength division multiplexing systems, with an evanescent coupling plan to facilitate the SAG technique into device fabrication. The monolithic chips in both channel spacings exhibit uniform bandwidths over 25 GHz and a photodiode responsivity of 0.81 A/W for each channel, in agreement with the simulated quantum efficiency of 80%. Cross talk levels are below-20 d B for both channel spacing chips.     

Design and fabrication of multi-channel photodetector array monolithic with arrayed waveguide grating

We have provided optical simulations of the evanescently coupled waveguide photodiodes integrated with a 13-channels AWGs. The photodiode could exhibit high internal efficiency by appropriate choice of layers geometry and refractive index. Aseamless joint structure has been designed and fabricated for integrating the output waveguides of AWGs with the evanescently coupled waveguide photodiode array. The highest simulation quantum efficiency could achieve 92% when the matching layer thickness of the PD is 120 nm and the insertion length is 2 μm. The fabricated PD with 320-nm-thick matching layer and 2-μm-length insertion matching layer present a responsivity of 0.87 A/W.     

Design of bias-free operational uni-traveling carrier photodiodes for terahertz wave generation

In this paper, the bias-free operational uni-traveling-carrier photodiode (UTC-PD) for terahertz wave generation is designed via physics-based simulation. The physics-based model is established at first and then the reliability of the simulation is demonstrated by comparison to previously reported experimental results. The epitaxial layers of the UTC-PD are analyzed and investigated to improve its bandwidth and output-power simultaneously. By optimizing the spacers and the collector, and using a combination of optimal graded-doping profile and graded-bandgap material for the absorber, the 3-dB bandwidth and the peaked output-power of the UTC-PD are improved by 36.5% and 2.262 dB, respectively. The 3-dB bandwidth of the optimized bias-free operational UTC-PD with mesa diameter of 8, 6, 5, 4 and 3-μm can achieve 106, 137.67, 158.3, 183 and 211 GHz, respectively.     

Optical matching layer structures in evanescent coupling photodiodes at a wavelength of 1.55μm： physics,design and simulation

We have studied the optical matching layers (OMLs) and external quantum efficiency in the evanescent coupling photodiodes (ECPDs) integrating a diluted waveguide as a fibre-to-waveguide coupler, by using the semi-vectorial beam propagation method (BPM). The physical basis of OML has been identified, thereby a general designing rule of OML is developed in such a kind of photodiode. In addition, the external quantum efficiency and the polarization sensitivity versus the absorption and coupling length are analysed. With an optical matching layer, the absorption medium with a length of 30μm could absorb 90% of the incident light at 1.55μm wavelength, thus the total absorption increases more than 7 times over that of the photodiode without any optical matching layer.     

Optimization of the UTC-PD Epitaxy for Photomixing at 340?GHz

We present a method to optimize the epitaxial layer structure of an InGaAs/InP uni-traveling-carrier photo-diode (UTC-PD) for continuous THz-wave generation. The design approach used is general in that it can be applied for any target frequency while this study focuses on 340 GHz. The photodiode epitaxy is modeled and optimized using a TCAD software implementing the hydrodynamic semiconductor equations. This physical device model was found to be in good agreement with reported experimental results. It is shown that the UTC-PD can generate ~1 mW at 340 GHz by choosing the optimum absorption layer and collection layer thicknesses.     

刻划微棱锥抗反射层的GaP太赫兹波发射器

报道了利用出射面加工有微棱锥结构抗反射层的GaP晶体THz发射器产生超快THz脉冲. 基于微结构界面等效折射率渐变原理, 设计并利用超精密微加工技术在GaP块状THz发射器出射面加工了亚波长微棱锥结构层, 用以提高所产生的THz波的耦合输出. 实验验证了该微结构层能提高所产生的THz波的耦合输出效率, 并能够有效散射剩余抽运光, 提高系统运转的稳定性.     

PIN-photodiode with a large spot size input waveguide

Polarization insensitive optical coupling of a large spot size input waveguide to a small spot size photodiode is achieved by the introduction of a transition waveguide. The coupling efficiency to the photodetector and the related absorption efficiency of the photodiode depend mainly on the refractive indices of the different InGaAsP layers. Waveguide alignments, waveguide widths and the n-contact etch depth do not influence the absorption efficiency relative to a 1-dB tolerance.     

小尺寸低折射率差硅基二氧化硅阵列波导光栅

随着AWG型器件在光通信系统中的大规模应用,对低成本AWG芯片的需求越来越多。在各种降成本方案中,减小AWG芯片的尺寸是最有效的方法之一。本文介绍了一种新型小尺寸低折射率差硅基二氧化硅阵列波导光栅（AWG）的设计。在该AWG中,输入波导/输出波导与平板波导连接的部分制作成两侧为空气槽的高折射率差波导,所以在与输出平板波导连接处的相邻输出波导间距较小,这样可以在设计上缩短平板波导的长度、减少阵列波导的数量,实现较小的AWG芯片尺寸。该AWG的其它部分,如输入/输出波导与光纤耦合的部分、阵列波导光栅等均采用常规的低折射率波导工艺,所以就同时具有与常规的低折射率波导AWG相同的优点：如低耦合损耗、较好的串扰以及光学特性等。根据这个原理,设计了一种40通道100 GHz频率间隔的低折射率差硅基二氧化硅AWG,其芯片尺寸只有23.88 mm?10.5 mm,是传统相同材料制作的AWG尺寸的1/6。     

Study on the saturation characteristics of high-speed uni-traveling-carrier photodiodes based on field screening analysis

A back-illuminated mesa-structure InGaAs/InP charge-compensated uni-traveling-carrier(UTC) photodiode(PD) is fabricated,and its saturation characteristics are investigated.The responsivity of the 40-μmdiameter PD is as high as 0.83 A/W,and the direct current(DC) saturation current is up to 275 mA.The 1-dB compression point at the 3-dB cutoff frequency of 9 GHz is measured to be 100 mA,corresponding to an output radio frequency(RF) power of up to 20.1 dBm.According to the calculated electric field distributions in the depleted region under both DC and alternating current(AC) conditions,the saturation of the UTC-PD is caused by complete field screening at high optical injection levels.     

InAs/GaAs量子点1.3 μm单光子发射特性

采用双层耦合量子点的分子束外延生长技术生长了InAs/GaAs量子点样品,把量子点的发光波长成功地拓展到1.3 μm.采用光刻的工艺制备了直径为3 μm的柱状微腔,提高了量子点荧光的提取效率.在低温5 K下,测量得到量子点激子的荧光寿命约为1 ns;单量子点荧光二阶关联函数为0.015,显示单量子点荧光具有非常好的单光子特性;利用迈克耳孙干涉装置测量得到单光子的相干时间为22 ps,对应的谱线半高全宽度为30 μeV,且荧光谱线的线型为非均匀展宽的高斯线型.