一种纳米硅薄膜的传导机制

基于对实验和理论的分析，提出一种异质结量子点隧穿（HQD）模型，并导出了纳米硅薄膜电导率完整的表达式．其主要思想是，纳米硅薄膜中的微晶粒（几个纳米大小）具有量子点特征，在微晶粒与界面之间由于两者能隙的差异构成晶间势垒，这类似于多晶硅中经常使用的晶间势垒模型（GBT）．考虑到量子点中的单电子隧穿特征，认为纳米硅薄膜中的电传导是由微晶粒中电子弹道式输运与单电子越过势垒的隧穿构成的．这就是HQD模型的主要内容，理论结果与实验相符 关键词：     

成型压力对CrO2低温输运性质的影响

本文研究了压力对CrO₂样品低温磁输运性质的影响.样品的X射线衍射结果表明(110)峰的相对强度随压力的增加而增大，说明压力对CrO₂针状纳米颗粒有取向的作用.低温时CrO₂样品的电阻和磁阻均随压力的增加而减少.实验结果表明，低温下样品的电导呈现出典型的晶粒间隧穿特征，其Δ值随着压力和磁场的增加而减小，并且Δ随磁场的变化幅度与成型压力有关，成型压力越高，Δ随磁场的变化越小.这些变化可以归因为压力对晶粒间隧穿势垒的调制. 关键词： 磁阻 压力 隧穿 势垒厚度     

纳米硅结构中分裂能级对光电输运特性的影响

基于电子在分裂能级系统中同时存在的共振隧穿和子带输运过程,结合光生载流子作用提出了纳米硅结构中的光电输运理论模型.利用该模型计算了纳米硅结构在光照条件下的电流密度、电场强度及电子浓度分布.结果表明,光生电子在具有分裂能级的纳米硅中是以共振隧穿为主要输运方式.在此基础上,详细研究了光电流与吸收系数、外加偏压以及纳米硅层层数之间的关系,发现在特定的外界条件下光电流会出现跳变增加的现象,其物理原因是纳米硅结构中电场强度的二次分布.     

成型压力对CrO2低温输运性质的影响

本文研究了压力对CrO2样品低温磁输运性质的影响.样品的X射线衍射结果表明(110)峰的相对强度随压力的增加而增大,说明压力对CrO2针状纳米颗粒有取向的作用.低温时CrO2样品的电阻和磁阻均随压力的增加而减少.实验结果表明,低温下样品的电导呈现出典型的晶粒间隧穿特征,其△值随着压力和磁场的增加而减小,并且△随磁场的变化幅度与成型压力有关,成型压力越高,△随磁场的变化越小.这些变化可以归因为压力对晶粒间隧穿势垒的调制.     

多层结构双自旋过滤隧道结中的电子输运特性

在转移矩阵方法及Mireles和Kirczenow的量子相干输运理论的基础上,研究了正常金属层/磁性半导体层/非磁绝缘层/磁性半导体层/正常金属层型双自旋过滤隧道结中Rashba自旋轨道耦合效应和自旋过滤效应对自旋相关输运的影响.讨论了隧穿磁电阻（TMR）、隧穿电导与各材料层厚度、Rashba自旋轨道耦合强度以及两磁性半导体中磁矩的相对夹角θ之间的关系.研究表明：含磁性半导体层的双自旋过滤隧道结由于磁性半导体层的自旋过滤效应和Rashba自旋轨道耦合作用可获得极大的TMR值.另外TMR和隧穿电导随着Rashba自旋轨道耦合强度的变化而振荡,振荡周期随Rashba自旋轨道耦合强度的增大逐渐减小. 关键词： 双自旋过滤隧道结 Rashba自旋轨道耦合 隧穿磁电阻 隧穿电导     

双栅调控的硅量子线中的库仑振荡效应

基于单电子隧穿和库仑阻塞效应,研究了硅量子线中的单电子输运特性.利用绝缘体上硅薄膜材料作为衬底构建侧栅结构的硅量子线单电子晶体管,通过背栅和侧栅对量子线的电子输运特性进行调制.实验发现,在硅量子线中分别观察到背栅和侧栅调制的单电子效应和库仑振荡现象.从微分电导的二维灰度轮廓图,清楚地观察到了库仑阻塞区,说明由于栅压导致在硅量子线中形成了库仑岛. 关键词： 库仑振荡 单电子效应 硅量子线     

硅烯/d_(x~2-y~2)+id_(xy)混合波超导隧道结隧道输运性质研究

运用Blonder-Tinkham-Klapwijk (BTK)理论研究了硅烯/d_(x~2-y~2)+id_(xy)混合波超导隧道结的隧穿性质.研究发现:垂直施加的电场、超导配对势的方向角和两种混合波配对能隙的比值Δ_1/Δ_0强烈地影响正常反射、Andreev反射和隧穿电导的值;当两种混合波的序参量比值较大时,隧道谱线在外加偏压E=Δ_1处出现谐振峰;系统的隧穿电导、正常反射幅和Andreev反射幅随超导方向角成周期性变化,变化周期为π/2;由于d_(xy)-波的存在,通过改变外加电场可以对隧穿电流加以调控.     

硅量子点中电子的荷电动力学特征

利用频率依赖电容谱的测量,对于SiO₂/硅量子点/SiO₂/硅衬底隧 穿电容中硅量子点的荷电特征进行了研究.由于量子点的极小尺寸和良好的均匀性,室温下 在强反型区成功地观察到了与单电子隧穿相关的两个电容和电导共振峰,它们分别对应于硅 衬底导带上的电子与量子点中第一与第二个基态之间直接隧穿过程.实验数据分析给出了量 子点中的库仑荷电能,并进行了讨论. 关键词： 量子点 电容谱 库仑荷电能 直接隧穿     

硅烯/dx2-y2+idxy混合波超导隧道结隧道输运性质研究

运用Blonder-Tinkham-Klapwijk(BTK)理论研究了硅烯/dx2-y2 +idxy 混合波超导隧道结的隧穿性质.研究发现:垂直施加的电场、超导配对势的方向角和两种混合波配对能隙的比值Δ1/Δ0 强烈地影响正常反射、Andreev反射和隧穿电导的值;当两种混合波的序参量比值较大时,隧道谱线在外加偏压E =Δ1 处出现谐振峰;系统的隧穿电导、正常反射幅和Andreev反射幅随超导方向角成周期性变化,变化周期为π/2;由于dxy-波的存在,通过改变外加电场可以对隧穿电流加以调控。     

电荷直接隧穿特征时间的计算模型

在分析硅基纳米存储器的势结构和价带混合效应对直接隧穿过程影响的基础上,采用顺序隧穿理论和巴丁传输哈密顿方法,发展了电子和空穴直接隧穿时间的计算模型.利用该模型数值计算了硅基纳米存储器的编程时间和保留时间,讨论了结构参数和外加偏压对器件存储性能的影响,指出需要设计新的器件结构模型来优化硅基纳米存储器的保留特性.     

Electrical conduction mechanism in amorphous Se80In20−xPbx films

DC conductivity measurements on thin films of a-Se₈₀In_20−xPb_x (where x=0, 2, 6 and 10) are reported in the temperature range 200–400 K. The density of states near the Fermi level is calculated using the DC conductivity (Mott parameters). The conduction in the low-temperature region is found to be due to variable range hopping while that in the high-temperature region is due to thermally assisted tunneling of the carriers in the localized states near the band edge.     

Dc and Ac conductivity of La2CuO4+δ

The complex conductivity of La₂CuO_4+δ has been investigated for frequencies 20 Hz≤ν≤4 GHz and temperatures 1.5K≤T≤450 K. Two single crystals with δ≈0 and δ≈0.02 were investigated, using dc (four-probe), reflectometric and contact-free techniques. At high temperatures the dc conductivity is thermally activated with low values of the activation energy. For low temperatures Mott's variable range hopping dominates. The real and imaginary parts of the ac conductivity follow a power-law dependence σ～v ^s, typical for charge transport by hopping processes. A careful analysis of the temperature dependence of the ac conductivity and of the frequency exponents has been performed. It is not possible to explain all aspects of the ac conductivity in La₂CuO_4+δ by standart hopping models. However, the observed minimum in the temperature dependence of the frequency exponents strongly suggests tunneling of large polarons as dominant transport process.     

Conductivity and thermoelectric power below a mobility edge in amorphous silicon

A model is presented which explains conductivity and thermopower data for amorphous silicon in the temperature range 200 to 400 K. The model considers nonpolaronic hopping transport below a mobility edge and includes an energy dependence in the mobility activation energy. It is shown that variations in the slope of the mobility activation energy may be partly responsible for the doping dependence of the quantity $\text{Q =}\text{ln}\text{σ + |eπ/k}\text{T}\text{|}$.     

Carrier transport of doped nanocrystalline Si formed by annealing of amorphous Si films at various temperatures

Phosphorus- and boron-doped hydrogenated amorphous silicon thin films were prepared by the plasma-enhanced chemical vapor deposition method. As-deposited samples were thermally annealed at various temperatures to get nanocrystalline Si with sizes around 10 nm. X-ray photoelectron spectroscopy measurements demonstrated the presence of boron and phosphorus in the doped films. It is found that the nanocrystallization occurs at around 600 °C for the B-doped films, while it is around 700-800 °C for the P-doped samples. For the P-doped samples, the dark conductivity decreases at first and then increases with the annealing temperature. While for the B-doped samples, the dark conductivity monotonously increases with increasing annealing temperature. As a result, the carrier transport properties of both P- and B-doped nanocrystalline Si films are dominated by the gradual activation of dopants in the films. The conductivity reaches 22.4 and 193 S cm⁻¹ for P- and B-doped sample after 1000 °C annealing.     

Tunneling conductivity in lithiated transition metal oxide cathode Li<Subscript>0.9</Subscript>[Ni<Subscript>1/3</Subscript>Mn<Subscript>1/3</Subscript>Co<Subscript>1/3</Subscript>]O<Subscript>1.95</Subscript>

Electrical complex ac conductivity of the compound Li_0.9[Ni_1/3Mn_1/3Co_1/3]O_1.95 has been studied in the frequency range 10 Hz–2 MHz and in the temperature range 93–373 K. It has been observed that the frequency dependence of the ac conductivity obeys a power law and the temperature dependence of the ac conductivity is quite weak. The experimental data have been analyzed in the framework of several theoretical models based on quantum mechanical tunneling and classical hopping over barriers. It has been observed that the electron tunneling is dominant in the temperature range from 93 K to 193 K. A crossover of relaxation mechanism from electron tunneling to polaron tunneling is observed at 193 K. Out of the several models discussed, the electron tunneling and the polaron tunneling models are quite consistent with the experimental data for the complex ac conductivity. The various parameters obtained from the fits of the experimental results for the real and imaginary parts of the conductivity to the predictions of these models are quite reasonable.     

Electrical properties and dielectric relaxation of thermally evaporated zinc phthalocyanine thin films

The electrical transport properties and dielectric relaxation of Au/zinc phthalocyanine, ZnPC/Au devices have been investigated. The DC thermal activation energy at temperature region 400-500 K is 0.78 eV. The dominant conduction mechanisms in the device are ohmic conduction below 1 V and space charge limited conduction dominated by exponential trap distribution in potentials >1 V. Some parameters, such as concentration of thermally generated holes in valence band, the trap concentration per unit energy range at the valence band edge, the total concentration of traps and the temperature parameter characterizing the exponential trap distribution and their relation with temperatures have been determined. The AC electrical conductivity, σ_ac, as a function of temperature and frequency has been investigated. It showed a frequency and temperature dependence of AC conductivity for films in the temperature range 300-400 K. The films conductivity in the temperature range 400-435 K increased with increasing temperature and it shows no response for frequency change. The dominant conduction mechanism is the correlated barrier hopping. The temperature and frequency dependence of real and imaginary dielectric constants and loss tangent were investigated.     

Dc and Ac conductivity of La2CuO4+δ

The complex conductivity of La₂CuO_4+δ has been investigated for frequencies 20 Hz≤ν≤4 GHz and temperatures 1.5K≤T≤450 K. Two single crystals with δ≈0 and δ≈0.02 were investigated, using dc (four-probe), reflectometric and contact-free techniques. At high temperatures the dc conductivity is thermally activated with low values of the activation energy. For low temperatures Mott's variable range hopping dominates. The real and imaginary parts of the ac conductivity follow a power-law dependence σ∼v ^s, typical for charge transport by hopping processes. A careful analysis of the temperature dependence of the ac conductivity and of the frequency exponents has been performed. It is not possible to explain all aspects of the ac conductivity in La₂CuO_4+δ by standart hopping models. However, the observed minimum in the temperature dependence of the frequency exponents strongly suggests tunneling of large polarons as dominant transport process.     

Electronic transport mechanisms in tetraphenyleprophyrin thin films

Thermally-evaporated thin films of tetraphenylporphyrin, TPP, with thickness range from (175 to 735) nm had been prepared. Annealing temperatures ranging from (273–473) K do not influence the amorphous structure of these films. The influence of environmental conditions: film thickness, temperature and frequency on the electrical properties of TPP thin films had been reported. It was found that dc conductivity increases with increasing temperature and film thickness. The extrinsic conduction mechanism is operating in temperature range of (293–380) K with activation energy of 0.13 eV. The intrinsic one is in temperatures >380 K via phonon assisted hopping of small polaron with activation energy of 0.855 eV. The ac electrical conductivity and dielectric relaxation in the temperature range (293–473) K and in frequency range (0.1–100) kHz had been also studied. It had been shown that theoretical curves generated from correlated barrier hopping (CBH) model gives the best fitting with experimental results. Analysis of these results proved that conduction occurs at low temperatures (300–370) K by phonon assisted hopping between localized states and it is performed by single polaron hopping process at higher temperatures. The temperature and frequency dependence of both the real and imaginary parts of dielectric constant had been reported.     

Structural and transport properties of Li-intercalated vanadium pentoxide nanocrystalline films

The X-ray diffraction (XRD), transmission electron microscopy, density, electrical and thermoelectric power (TEP) properties of nanocrystalline Li _x V₂O₅ ? nH₂O xerogel films (0 ≤ x ≤ 22 mol.%) were investigated. The films were produced by the sol–gel technique (colloidal route), which was used to enable high-purity, uniform preparation. The relative intensity of the (002) XRD line increased with increasing Li content. The particle size was found to be about 6.0 nm. Electrical conductivity and thermoelectric power were measured parallel to the substrate surface in the temperature range 300–480 K for the as-prepared films. The electrical conductivity showed that all the samples were semiconductors and that conductivity increased with increasing Li content. The conductivity of the present system was primarily determined by hopping carrier mobility, which was found to vary from 6.81 × 10^?6 to 0.33 × 10^?6 cm² V^?1 s^?1 at 380 K. The carrier density was evaluated to be 8.73 × 10¹⁹–1.118 × 10²¹ cm^?3. The conduction was confirmed to obey non-adiabatic small polaron hopping. The thermoelectric power, or Seebeck effect, increased with increasing Li content. The results obtained indicate an n-type semiconducting behavior within the temperature range investigated.