Internal quantum efficiency drop induced by the heat generation inside of light emitting diodes （LEDs）

The reasons for low output power of AlGaInP Light Emitting Diodes (LEDs) have been analysed. LEDs with AlGaInP material have high internal but low external quantum efficiency and much heat generated inside especially at a large injected current which would reduce both the internal and external quantum efficiencies. Two kinds of LEDs with the same active region but different window layers have been fabricated. The new window layer composed of textured 0.5 μm GaP and thin Indium-Tin-Oxide film has shown that low external quantum efficiency (EQE) has serious impaction on the internal quantum efficiency (IQE), because the carrier distribution will change with the body temperature increasing due to the heat inside, and the test results have shown the evidence of LEDs with lower output power and bigger wavelength red shift.     

Zn杂质扩散诱导AlGaInP/GaInP量子阱混杂

杂质扩散诱导量子阱混杂技术可用于制作腔面非吸收窗口,提高大功率半导体激光器的输出功率.以Zn2As2为扩散源,采用闭管扩散方式,在550℃下对650 nm半导体激光器的外延片进行了一系列Zn杂质扩散诱导量子阱混杂的实验.实验发现,随着扩散时间从20～120 min,样品光致发光(PL)谱蓝移偏移增加,峰值波长蓝移53 nm;当扩散时间超过60 min后,样品的PL谱中不仅出现了常见的蓝移峰,同时还出现了红移峰,峰值波长红移32 nm.分析表明PL谱蓝移来自Zn扩散引起的AlGaInP/GaInP间的量子阱混杂;红移来自Zn杂质扩散对样品中Ga0.51In0.49P缓冲层的影响.还研究了扩散温度(550℃)和扩散时间对样品晶体品质的影响,并在理论上计算了AlGaInP/GaInP量子阱混杂巾的Al-Ga的互扩散系数.     

掺杂与Al组分对AlGaInP四元系LED发光效率的影响

在AlGaInP四元系双异质结发光二极管(DH—LED)的材料生长过程中,限制层的Al组分与P型掺杂浓度的确定有较大的随意性,这对LED的发光不利。通过分析载流子在发光二极管(LED)双异质结中的输运情况,得到了在不同的P型掺杂程度下,限制层Al组分与LED发光效率的关系,从而可以探索P型掺杂与Al组分对发光效率影响的规律,得到的结论对于LED的器件结构设计以及MOCVD材料生长有一定的指导意义。     

电流主动导引结构倒装AlGaInP LED

设计并制备了一种带有电流导引结构的新型倒装AlGaInP LED。实验结果表明,在20mA直流电流注入下,器件的电压为2.19V,输出光功率与普通倒装器件相比提高了17.33%。通过电流导引结构,使得器件注入电流被主动引导到电极以外部分,有效增大了上电极以外部分有源区中用于发光的有效载流子数目的比例,同时减轻了电流密度过大现象,大大提高了器件的出光效率。     

热退火处理对AuGeNi/n-AlGaInP欧姆接触性能的影响

本文在n-(Al0.27Ga0.73)0.5In0.5P表面通过电子束蒸发Ni/Au/Ge/Ni/Au叠层金属并优化退火工艺成功制备了具有较低接触电阻的欧姆接触,其比接触电阻率在445℃退火600 s时达到1.4×10–4 W·cm2.二次离子质谱仪测试表明,叠层金属Ni/Au/Ge/Ni/Au与n-AlGaInP界面发生固相反应,Ga,In原子由于热分解发生外扩散并在晶格中留下Ⅲ族空位.本文把欧姆接触形成的原因归结为Ge原子内扩散占据Ga空位和In空位作为施主提高N型掺杂浓度.优化退火工艺对低掺杂浓度n-(Al0.27Ga0.73)0.5In0.5P的欧姆接触性能有显著改善效果,但随着n-(Al0.27Ga0.73)0.5In0.5P掺杂浓度提高,比接触电阻率与退火工艺没有明显关系.本文为n面出光的AlGaInP薄膜发光二极管芯片的n电极制备提供了一种新的方法,有望大幅简化制备工艺,降低制造成本.     

Red-enhanced white light-emitting diodes using external AlGaInP epilayers with various aperture ratios

A novel hybrid white light-emitting diode (LED) is proposed to enhance the red color and stability of the chromaticity under various operating currents using an AlGaInP photon-recycling (PR) epilayer. A blue/yellow white InGaN LED sample is covered with an external patterned AlGaInP epilayer. Under an optimum aperture ratio of 30%, the luminous efficiency of the PR-LED lamp can achieve a color coordinate of (x=0.340, y=0.295). When the injection current increases from 50 to 350 mA, the color temperature decreases from 4030 to 3700 K and the color rendering index increases from 81 to 86. These could be due to the fact that the AlGaInP epilayer was not attached onto the LED chip, alleviating the thermal effect on the color coordinate. The present white PR-LED samples have high potential for portable liquid-crystal-display backlight applications.     

决定AlGaInP高亮度发光二极管光提取效率的主要因素

影响发光二极管光提取效率的主要因素有：出光表面状态、上电极和体内吸收．对于ＡｌＧａＩｎＰ高亮度发光二极管体内吸收主要是衬底和发光区的吸收．一般采用出光表面粗化、窗口层、ＤＢＲ反射器等措施来提高光提取效率．本文以自发辐射随机分布模型为基础，以ＡｌＧａＩｎＰ高亮度发光二极管典型结构的各种参数为依据，从理论上分析了这几种主要措施对光提取效率的影响．     

决定AlGaInP高亮度发光二极管光提取效率的主要因素

影响发光二极管光提取效率的主要因素有:出光表面状态、上电极和体内吸收.对于AlGaInP高亮度发光二极管体内吸收主要是衬底和发光区的吸收.一般采用出光表面粗化、窗口层、DBR反射器等措施来提高光提取效率.本文以自发辐射随机分布模型为基础,以AlGaInP高亮度发光二极管典型结构的各种参数为依据,从理论上分析了这几种主要措施对光提取效率的影响.     

新型全方位反射铝镓铟磷薄膜发光二极管

提出了一种新型全方位反射铝镓铟磷(AlGaInP)薄膜发光二极管(LED)的结构和制作工艺，在这个结构里应用了低折射率的介质和高反射率的金属联合作为反光镜.用金锡合金(80Au20Sn，重量比)作为焊料把带有反光镜的AlGaInP LED外延片倒装键合到GaAs基板上(RS-LED)，去掉外延片GaAs衬底，把被GaAS衬底吸收的光反射出去.通过与常规AlGaInP 吸收衬底LEDs(AS-LED)和带有DBR的AlGaInP 吸收衬底LEDs(AS-LED(DBR))电、光特性的比较，证明新型全方位反射AlGaInP薄膜LED结构能极大提高亮度和效率.正向电流20mA时，RS-LED的光输出功率和流明效率分别是AS-LED的3.2倍和2.2倍，是AS-LED(DBR)的2倍和1.5倍.RS-LED(20mA下峰值波长627nm)的轴向光强达到194.3mcd，是AS-LED(20mA下峰值波长624nm)轴向光强的2.8倍，是AS-LED(DBR)(20mA下峰值波长623nm)轴向光强的1.6倍. 关键词： 铝镓铟磷 薄膜发光管 全方位反射镜 发光强度     

Si掺杂对AlGaInP/GaInP多量子阱性能的影响

采用LP-MOCVD技术在n-GaAs衬底上生长了AlGaInP／GaInP多量子阱红光LED外延片。以X射线双晶衍射技术和光致发光技术对外延片进行了表征,研究了Si掺杂对AlGaInP／GaInP多量子阱性能的影响。研究表明：掺Si能大大提高(Al0．3Ga0.7)0.5In0.5P／Ga0.5In0.5P多量子阱的发光强度。相对于未故意掺杂的样品,多量子阱垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍。外延片的X射线双晶衍射测试表明,Si掺杂并没有使多量子阱的界面质量变差。