Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films

Thin films (monolayer and bilayer) of cylinder forming polystyrene‐block‐polydimethylsiloxane (PS‐b‐PDMS) were shear aligned by the swelling and deswelling of a crosslinked PDMS pad that was physically adhered to the film during solvent vapor annealing. The nanostructures formed by self‐assembly were exposed to ultraviolet‐ozone to partially oxidize the PDMS, followed by calcination in air at 500 °C. In this process, the PS segments were fully decomposed, while the PDMS yielded silica nanostructures. The highly aligned PDMS cylinders were thus deposited as silica nanolines on the silicon substrate. Using a bilayer film, the center‐to‐center distance of these features were effectively halved from 38 to 19 nm. Similarly, by sequential shear‐alignment of two distinct layers, a rhombic array of silica nanolines was fabricated. This methodology provides a facile route to fabricating complex topographically patterned nanostructures. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 1058–1064     

电子束流品质对自由电子激光小信号增益影响的计算

对电子束有一定初始能量分散或角度分散时的自由电子激光小信号增益用较简便的方法进行了分析计算,并给出了一个渐近公式,结果与用计算机模拟解自由电子激光微分方程组得到的结果一致。     

Imprint lithography of pyramidal photonic pillars using hydrazine etching

An inexpensive method to produce a pyramidal-type 2D photonic structures in the silicon substrate was proposed. The method is based on the combination of imprint lithography and wet Si1 0 0 etching in water solution of hydrazine, which etches 1 1 1 faces much more slowly than others. Thermally grown SiO₂ mask for the hydrazine etching was used, because single Al mask cannot be well bonded to the substrate and tends to peel during the etching. It was revealed that transmittance in the infrared spectrum region of the patterned silicon decreases by about five times compared with that of flat silicon substrate and this decrease is almost independent of the angle of the incident beam. In the infrared region, decrease of transmittance of the patterned samples is directly proportional to the wave number. The shape of formed pyramids has strong influence on the transmittance. Decrease of the transmittance is much more rapid and larger in the case of sharpless pillars.     

微模塑法制备PMMA/SiO2二氧化硅杂化材料微结构

以摩尔比为 1∶1的甲基丙烯酸甲酯 (MMA)、甲基丙烯酸 (3 三乙氧基硅烷基 )丙酯 (ESMA)单体、0 .2 %(单体总量的质量分数 )的偶氮二异丁腈AIBN引发剂和四氢呋喃 (THF)溶剂 ,及 2 0 % (总质量分数 )的正硅酸乙酯TEOS合成出PMMA/SiO2 有机 无机杂化的杂化溶胶 .将溶胶在洗净的普通光学玻璃基片表面甩膜 .利用软刻蚀中的微模塑法 ,把有机硅弹性印章复制有精细图纹一面轻放在杂化溶胶膜上进行微模塑 ,外加 1N压力于12 0℃下处理 2h使溶胶凝胶化 .印章剥离后在基片表面就形成了PMMA/SiO2 有机 无机杂化材料的微图纹结构 .从微图纹的光学显微镜照片可以看出微模塑方法制备杂化材料复制的图纹精细度高 ,操作简单易行 ,是一类比较理想的微细图纹结构加工的方法 .     

Monte Carlo方法研究低能电子束曝光沉积能分布规律

建立一个描述低能电子在多元多层介质中散射的物理模型,运用MonteCarlo方法模拟低能电子在靶体胶衬底中的复杂散射过程,在此基础上通过大量计算研究入射束能、胶层厚度、衬底材料等不同曝光条件对抗蚀剂沉积能密度分布的影响,获得沉积能分布规律:适量的低束能、薄胶层、低原子序数衬底可以使前散射电子对胶中沉积能密度分布的贡献增大、背散射电子的贡献减小,从而提高曝光分辨率. 关键词： 电子束曝光 MonteCarlo方法 低能电子散射 能量沉积     

Radical copolymerization of 2‐trifluoromethylacrylic monomers. II. Kinetics,monomer reactivities,and penultimate effect in their copolymerization with norbornenes and vinyl ethers

Radical copolymerizations of electron‐deficient 2‐trifluoromethylacrylic (TFMA) monomers, such as 2‐trifluoromethylacrylic acid and t‐butyl 2‐trifluoromethylacrylate (TBTFMA), with electron‐rich norbornene derivatives and vinyl ethers with 2,2′‐azobisisobutyronitrile as the initiator were investigated in detail through the analysis of the kinetics in situ with ¹H NMR and through the determination of the monomer reactivity ratios. The norbornene derivatives used in this study included bicyclo[2.2.1]hept‐2‐ene (norbornene) and 5‐(2‐trifluoromethyl‐1,1,1‐trifluoro‐2‐hydroxylpropyl)‐2‐norbornene. The vinyl ether monomers were ethyl vinyl ether, t‐butyl vinyl ether, and 3,4‐dihydro‐2‐H‐pyran. Vinylene carbonate was found to copolymerize with TBTFMA. Although none of the monomers underwent radical homopolymerization under normal conditions, they copolymerized readily, producing a copolymer containing 60–70 mol % TFMA. The copolymerization of the TFMA monomer with norbornenes and vinyl ethers deviated from the terminal model and could be described by the penultimate model. The copolymers of TFMA reported in this article were evaluated as chemical amplification resist polymers for the emerging field of 157‐nm lithography. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1478–1505, 2004     

超大规模集成电路光学光刻技术的现状与展望

光学光刻是目前超大规模集成电路(VLSI)制备中主要的微米和亚微米的图形加工技术,这一技术将继续保持其主导地位成为90年代VLSI发展的关键。本文综述了近年来光学光刻工艺的发展,主要介绍了G线(436nm)、Ⅰ线(365nm)和准分子激光光刻的现状,并对实现高的光学光刻分辨率所必须解决的透镜设计、套准精度和像场面积等问题作了详细描述。最后展望了发展方向、     

宽带折反射式紫外光刻物镜的设计

本文设计了一种新系列的紫外或远紫外激光光刻物镜,它与国内外已有的紫外物镜相比,在365nm以下的光谱区,具有更宽的光谱工作带宽和较高的数值孔径.以宽带准分子激光或短弧汞氙灯做光源,无需另加色散补偿光学元件,可以进行同轴对准.     

Parallel mixing of photolithographically defined nanoliter volumes using elastomeric microvalve arrays

Portable microfluidic systems provide simple and effective solutions for low-cost point-of-care diagnostics and high-throughput biomedical assays. Robust flow control and precise fluidic volumes are two critical requirements for these applications. We have developed a monolithic polydimethylsiloxane (PDMS) microdevice that allows for storing and mixing subnanoliter volumes of aqueous solutions at various mixing ratios. Filling and mixing is controlled via two integrated PDMS microvalve arrays. The volumes of the microchambers are entirely defined by photolithography, hence volumes from picoliter to nanoliter can be fabricated with high precision. Because the microvalves do not require an energy input to stay closed, fluid can be stored in a highly portable fashion for several days. We have confirmed the mixing precision and predictability using fluorescence microscopy. We also demonstrate the application of the device for calibrating fluorescent calcium indicators. Due to the biocompatibility of PDMS, the device will have broad applications in miniaturized diagnostic assays as well as basic biological studies.     

聚氨酯分子印章的制备和表征

“软平板印刷”微结构制备技术为微米和亚微米器件的制备提供了一条新的途径 [1] ,已被电子学家和材料学家所应用 ,近年来进入了生物学领域[2 ] .本实验室将这一方法与生物分子电子学相结合 ,提出了用于 DNA芯片在片合成的分子印章法 [3,4 ] .分子印章法的实质是接触压印与组合化学相结合的固相界面反应 .聚二甲氧基硅氧烷 ( PDMS)是一种软印刷的优良材料 [5] ,但是由于其疏水性和较差的机械性能 ,必须对其进行改性才能用来制备 DNA分子印章 [6 ] .　　聚氨酯作为一种功能材料 ,由于分子中交替的软、硬链段及其不同的热动力学性能而形成…