含有AlGaAs插入层的InAs/GaAs三色量子点红外探测器

本文报道了采用分子束外延技术制备的三色InAs/GaAs量子点红外探测器. 器件采用nin型结构, 吸收区结构是在InGaAs量子阱中生长含有AlGaAs插入层的InAs量子点, 器件在77 K下的红外光电流谱有三个峰值: 6.3, 10.2和11 μm. 文中分析了它们的跃迁机制, 并且分别进行了指认. 因为有源区采用了不对称结构, 所以器件在外加偏压正负方向不同时, 光电流谱峰值的强度存在一些差异. 不论在正偏压或者负偏压下, 当偏压达到较高值, 再进一步增大偏压时, 都出现了对应于连续态的跃迁峰强度明显下降的现象, 这是由量子点基态与阱外连续态的波函数交叠随着偏压进一步增大而迅速减小导致的.     

具有非均匀渐变界面DBR的光学特性分析

应用特征矩阵法研究了非均匀渐变界面Al_0.9Ga_0.1As/Al_yGa_1-yAs/GaAs/Al_xGa_1-xAs DBR的光学特性.建立了非均匀渐变界面Al_yGa_1-yAs的折射率模型，并得到了渐变界面特征矩阵的解析解，通过特征矩阵法分别计算了突变GaAs/Al_0.9Ga_0.1As DBR和渐变DBR的反射谱和反射相移，分析了非均匀渐变层对DBR光学特性的影响，对渐变DBR，需要在DBR前面再增加一定厚度的非均匀渐变相位匹配层才能使整个DBR满足中心波长相位匹配条件，并通过光学厚度近似方法求出相位匹配层厚度. 关键词： DBR 反射谱 反射相移 特征矩阵法     

p型掺杂1.3μm InAs/GaAs量子点激光器的最大模式增益特性的研究

对p型掺杂13 μm InAs/GaAs量子点激光器的最大模式增益进行了实验和理论分析.实验上,测量了不同腔长激光器阈值电流密度与总损耗的对应关系,拟合出的最大模式增益为175 cm^-1,与相同结构非掺杂量子点激光器的最大模式增益一致.同时理论分析表明,p型掺杂对InAs/GaAs量子点激光器的最大模式增益并无影响,并且最大模式增益的计算结果与实验值相符.具有较小高度或高宽比的量子点能达到更高的最大模式增益,而较高的最大模式增益对p型掺杂13 μm InAs/GaAs自组织量子点激光器在光通信系统中的应用具有重要意义. 关键词： 最大模式增益 p型掺杂 InAs/GaAs量子点激光器     

A 10Gb/s Directly-Modulated 1.3μm InAs/GaAs Quantum-Dot Laser

We demonstrate 10 Gb/s directly-modulated 1.3 μm InAs quantum-dot （QD） lasers grown on GaAs substrates by molecular beam epitaxy. The active region of the QD lasers consists of five-stacked InAs QD layers. Ridge-waveguide lasers with a ridge width of 4 μm and a cavity length of 600 μm are fabricated with standard lithography and wet etching techniques. It is found that the lasers emit at 1293 nm with a very low threshold current of 5 mA at room temperature. Furthermore, clear eye-opening patterns under 10 Gb/s modulation rate at temperatures of up to 50oC are achieved by the QD lasers. The results presented here have important implications for realizing low-cost, low-power-consumption, and high-speed light sources for next-generation communication systems.     

High Characteristic Temperature 1.3μm InAs/GaAs Quantum-Dot Lasers Grown by Molecular Beam Epitaxy

We report the molecular beam epitaxy growth of 1.3 μm InAs/GaAs quantum-dot （QD） lasers with high characteristic temperature T0. The active region of the lasers consists of five-layer InAs QDs with p-type modulation doping. Devices with a stripe width of 4 μm and a cavity length of 1200 μm are fabricated and tested in the pulsed regime under different temperatures. It is found that T0 of the QD lasers is as high as 532 K in the temperature range from 10°C to 60°C. In addition, the aging test for the lasers under continuous wave operation at 100°C for 72 h shows almost no degradation, indicating the high crystal quality of the devices.     

大功率半导体激光器的可靠性研究

对InGaAs/AlGaAs和InGaAsP/GaAs有源区含铝的915nm和无铝的808nm腔面镀膜及未镀膜的大功率半导体激光器进行了老化实验。在老化前通过综合参数测试仪测试两种激光器的斜率效率、阈值电流，发现有腔面膜的激光器比无腔面膜的激光器的阈值电流降低25％以上。在1.2倍阈值电流下，恒流老化40h左右，老化后再分别测试它们的阈值电流、功率参数，我们发现在老化后未镀膜的激光器的阈值电流和镀有腔面膜的激光器相比增加25mA以上，输出功率也比镀过腔面膜的减小到了原来的1／2，可见腔面保护对于延长激光器的寿命是很重要的。     

Influence of GaAsP Insertion Layers on Performance of InGaAsP/InGaP/A1GaAs Quantum-Well Laser

We report on the use of very thin GaAsP insertion layers to improve the performance of an In GaAsP/InGaP/AIGaAs single quantum-well laser structure grown by metal organic chemical vapour deposition. Compared to the noninsertion structure, the full width at half maximum of photoluminescence spectrum of the insertion structure measured at room temperature is decreased from 47 to 38 nm indicating sharper interfaces. X-ray diffraction shows that the GaAsP insertion layers between AIGaAs and InGaP compensates for the compressive strain to improve the total interface. The laser performance of the insertion structure is significantly improved as compared with the counterpart without the insertion layers. The threshold current is decreased from 560 to 450 mA while the slope efficiency is increased from 0.61 to 0.7W/A and the output power is increased from 370 to 940mW. The slope efficiency improved is very high for the devices without coated facets. The improved laser performance is attributed to the suppression of indium carry-over due to the use of the GaAsP insertion layers.     

高功率半导体量子阱激光器测试中的灾变性损伤

在使用综合参数测试仪测试808nm发射的半导体量子阱激光器的过程中，出现了一种由电浪涌所导致的灾变性损伤。通过测试的功率曲线和伏安特性曲线，断定激光器出现了灾变性的损伤，同时测试的发射光谱不再是激射光谱，而是由自发辐射所产生的荧光光谱。由扫描电镜(SEM)观察到了激光器的腔面膜出现了熔化，证实激光器的确发生了灾变性损伤。作为对比，我们引用了另一种在测试中发现的快速退化现象，对两种退化出现的原因进行了理论上的分析，了解到激光器的退化主要还是由器件本身的材料、结构以及后期的工艺过程所决定的，在测试器件过程中电浪涌只不过会加速或产生突然灾变性退化。通过测试我们建立了一种比较简单的检验一个激光器质量可靠性的方法，所以理解由电浪涌所引起的退化行为是非常重要的。     

键合界面对面发射激光器光与热性质的影响

通过界面有效吸收系数的计算及界面对腔模的反射率的影响可知,采用双面键合技术制备面发射激光器应使键合界面处于驻波场分布零点位置,同时界面厚度应该小于20 nm以使器件光学性能受界面吸收系数的影响较小.采用有限元方法分析VCSEL温度分布,结果证实薄的键合界面使VCSEL有源区温度对界面的热导率和电导率改变不敏感,而厚的键合界面将可能使有源区温度有较大地升高,给器件带来严重的不良影响.亲水键合和疏水键合的SEM照片说明疏水处理界面较薄,适合用于器件的制备.而亲水处理界面厚度>40 nm,对器件的光、热特性不利 关键词： 键合 面发射激光器 热导率 电导率