Microstructure evolution and passivation quality of hydrogenated amorphous silicon oxide(a-SiOx:H) on〈100〉- and 〈111〉-orientated c-Si wafers

Hydrogenated amorphous silicon oxide(a-SiOx:H) is an attractive passivation material to suppress epitaxial growth and reduce the parasitic absorption loss in silicon heterojunction(SHJ) solar cells. In this paper, a-SiOx:H layers on different orientated c-Si substrates are fabricated. An optimal effective lifetime(τ(eff)) of 4743 μs and corresponding implied opencircuit voltage(iV(oc)) of 724 mV are obtained on〈100〉-orientated c-Si wafers. While τ(eff) of 2429 μs and iV_oc of 699 mV are achieved on 111-orientated substrate. The FTIR and XPS results indicate that the a-SiOx:H network consists of SiOx(Si-rich), Si–OH, Si–O–SiHx, SiO2 ≡ Si–Si, and O3 ≡ Si–Si. A passivation evolution mechanism is proposed to explain the different passivation results on different c-Si wafers. By modulating the a-SiOx:H layer, the planar silicon heterojunction solar cell can achieve an efficiency of 18.15%.     

钙钛矿/硅异质结叠层太阳电池:光学模拟的研究进展

近几年,钙钛矿/硅异质结叠层太阳电池发展迅速,效率已经从13.7%提升到29.1%.由于叠层电池器件的制作工艺复杂,而叠层太阳电池中的光学损失对转换效率的影响很大,所以通过光学模拟进而获得高效电池至关重要.本文首先从商业软件和自建模型两方面概述了光学模拟的方法,接着从反射损失和寄生吸收两方面针对光学模拟研究进展进行了总结和分析,最后指出了叠层电池光学模拟过程中需要注意的问题.钙钛矿/硅异质结叠层太阳电池的转换效率极限最高可达40%,具备很大的提升空间,结合模拟工作的研究,叠层电池的发展将会取得更大的进步.     

Si衬底上插入SiO2膜对Ag纳米颗粒陷光性能的影响

采用磁控溅射法在Si衬底上制备了SiO2介质膜,系统地研究了SiO2膜引入对Ag纳米颗粒的表面覆盖率、形貌、形成机理和光学性质的影响.研究发现引入SiO2介质膜后,Ag纳米颗粒的表面覆盖率显著增加,平均粒径明显降低.基于现有的Ag纳米颗粒形成机理,提出了粗糙表面Ag膜断裂模型以解释其形貌发生变化的原因.紫外-可见光分光光度计测试表明,引入SiO2膜并优化其厚度,可使Ag纳米颗粒的偶极消光峰最大红移86nm,但消光峰强度明显下降.数值模拟计算表明,引入SiO2膜的Ag纳米颗粒所能散射的光子数量最小减少2×1018个.因此,在Si衬底上沉积SiO2膜,不利于Ag纳米颗粒陷光性能的提高.