AlxGa1-xN/GaN双量子阱的结构和掺杂浓度对子带间跃迁波长和吸收系数的影响

用薛定谔方程和泊松方程自洽计算的方法研究了Al_0.75Ga_0.25N/GaN对称双量子阱(DQWs)中子带间跃迁(ISBT)的波长和吸收系数对中间耦合势垒高度、中间耦合势垒宽度、势阱宽度和势垒掺杂浓度的依赖关系.研究发现,第一奇序子带S_1ood与第二偶序子带S_2even ISBT波长随着中间耦合势垒高度的降低而变短.当中间耦合势垒高度高于0.62 eV时,S_{1odd< 关键词： 自洽 x}Ga_1-xN/GaN双量子阱')" href="#">Al_xGa_1-xN/GaN双量子阱 子带间跃迁     

Invariable optical properties of phosphor-free white light-emitting diode under electrical stress

This paper reports that a dual-wavelength white light-emitting diode is fabricated by using a metal-organic chemical vapor deposition method. Through a 200-hours’ current stress, the reverse leakage current of this light-emitting diode increases with the aging time, but the optical properties remained unchanged despite the enhanced reverse leakage current. Transmission electron microscopy and cathodeluminescence images show that indium atoms were assembled in and around V-shape pits with various compositions, which can be ascribed to the emitted white light. Evolution of cathodeluminescence intensities under electron irradiation is also performed. Combining cathodeluminescence intensi- ties under electron irradiation and above results, the increase of leakage channels and crystalline quality degradation are realized. Although leakage channels increase with aging, potential fluctuation caused by indium aggregation can effectively avoid the impact of leakage channels. Indium aggregation can be attributed to the mechanism of preventing optical degradation in phosphor-free white light-emitting diode.     

大尺寸HVPE反应器托盘温度的数值模拟研究

对大尺寸氢化物气相外延(HVPE)反应器的流场和温场进行二维数值模拟研究,旨在提高托盘表面温度和温度分布均匀性.基准模拟显示,靠近喷头的加热器对托盘温度的影响大于底部加热器,随着加热器功率增大,温度分布均匀性变差.在基准模拟的基础上,提出在反应器底部设置隔热钼屏的托盘升温方法.优化后的模拟显示,托盘温度升高约48 K,而温度均匀性变化不大.在使用4层钼屏的基础上,通过在石墨托盘内部开圆柱槽,显著提高了托盘温度分布均匀性,并使温度进一步提升约5K.     

Gradual variation method for thick GaN heteroepitaxy by hydride vapour phase epitaxy

Two strain-state samples of GaN, labelled the strain-relief sample and the quality-improved sample, were grown by hydride vapour phase epitaxy (HVPE), and then characterized by high-resolution X-ray diffraction, photoluminescence and optical microscopy. Two strain states of GaN in HVPE, like 3D and 2D growth modes in metal-organic chemical vapour deposition (MOCVD), provide an effective way to solve the heteroepitaxial problems of both strain relief and quality improvement. The gradual variation method (GVM), developed based on the two strain states, is characterized by growth parameters' gradual variation alternating between the strain-relief growth conditions and the quality-improved growth conditions. In GVM, the introduction of the strain-relief amplitude, which is defined by the range from the quality-improved growth conditions to the strain-relief growth conditions, makes the strain-relief control concise and effective. The 300-μm thick bright and crack-free GaN film grown on a two-inch sapphire proves the effectiveness of GVM.     

2,6-二甲基-3,5-二（吡唑-3-基）吡啶构筑的新型八钼酸盐的合成及其电化学性质

利用六水合硫酸锌（ZnSO₄· 6H₂O）、七钼酸铵［(NH₄)₆Mo₇O₂₄· 4H₂O］和2,6-二甲基-3,5-二（吡唑-3-基）吡啶（H₂L）为原料，通过水热反应，合成了一个新型的八钼酸盐［Zn(H₃L)₂(H₄Mo₈O28), 1）］，其结构和性能经IR、元素分析,X 射线单晶衍射和TGA表征。结果表明:〖STHZ〗1〖STBZ〗(CCDC: 1860339)属三斜晶系，P₁空间群，晶胞参数a=9.421(5) , b=10.737(5) , c=11.826(5) , α=100.340(5)°, β=97.939(5)°, γ=100.053(5)°, V=1140.9(4) ³, Z=1, R₁=0.029 2, wR₂=0.0769。1的结构中，锌离子被质子化的有机配体H₃L⁺连接形成一维链结构，同多钼酸簇{Mo₈O₂₈}将相邻的一维链连接起来形成二维层结构。电化学分析结果表明：1对亚硝酸根离子还原具有较好的催化作用，当亚硝酸根离子浓度为5 mmol·L^-1时，催化效率为61%。     

MOCVD侧向外延GaN的结构特性

侧向外延（EL0）GaN的原子力显微镜（AFM）表面形貌图像表明,ELO—GaN相当平整,而掩膜区中央有线状分布的小丘群,这是由ELO—GaN在掩膜区中央接合时晶向不一致而产生的缺陷造成的。观察ELO—GaN扫描电子显微镜（SEM）截面图,侧向接合处存在着三角空洞,并且侧向接合导致上述小丘群。X射线衍射（XRD）曲线表明,掩膜边界处的GaN晶面有倾斜。拉曼散射谱表明,掩膜区GaN质量相对于窗口区大为提高。ELO—GaN和普通外延GaN的拉曼散射谱比较表明,ELO—GaN中的应力较小,晶体质量较高。     

AlGaN-Based Deep-Ultraviolet Light Emitting Diodes Fabricated on AlN/sapphire Template

We report on the growth and fabrication of deep ultraviolet （DUV） light emitting diodes （LEDs） on an AIN template which was grown on a pulsed atomic-layer epitaxial buffer layer. Threading dislocation densities in the AlN layer are greatly decreased with the introduction of this buffer layer. The crystalline quality of the AlGaN epilayer is further improved by using a low-temperature GaN interlayer between AlGaN and AlN. Electroluminescences of different DUV-LED devices at a wavelength of between 262 and 317nm are demonstrated. To improve the hole concentration of p-type AlGaN, Mg-doping with trimethylindium assistance approach is performed. It is found that the serial resistance of DUV-LED decreases and the performance of DUV-LED such as EL properties is improved.     

氮化蓝宝石衬底上GaN薄膜的微结构与光学性质

用透射电子显微镜(TEM),X射线衍射(XRD)和光荧光谱(PL)等测量手段研究了GaN薄膜的微结构和光学性质。样品是用光辐射加热MOCVD在蓝宝石衬底上制备的。随着衬底氮化时间的增加,扩展缺陷的密度显著增加。在位错密度增加一个数量级时,XRD摇摆曲线半宽度(FWHM)由11″增加到15″,PL谱的黄光发射从几乎可忽略增加到带边发射强度的100倍。结合生长条件,我们对黄光与微结构的关系作了讨论。     

In0.5(Ga1-xAlx)0.5P合金的掺杂生长特性

利用LP-MOCVD分别生长Zn和S掺杂的In0.5(Ga1-xAlx)0 5P外延层,研究生长温度、掺杂源流量、V/Ⅲ比、Al组分以及衬底晶向偏离等生长条件对外延层掺杂浓度的影响.实验结果表明:降低生长温度和Al含量、增加DEZn流量、选择由(100)向(111)A偏6～15的衬底都有利于增加IRGaAlP合金中Zn的掺杂浓度;提高生长温度和增加SIH4流量、减小Al含量和V/Ⅲ比,都有助于增加Si掺杂浓度,而衬底晶向对Si掺杂浓度无影响.     

基于正丁醚在纳米氧化锌表面的催化发光设计制造的传感器测定空气中正丁醚的含量北大核心CSCD

基于正丁醚在纳米氧化锌材料表面的催化发光现象设计并制造了正丁醚催化发光传感器,并提出了一种快速测定空气中正丁醚的方法。在检测波长为440nm,反应温度为288℃,载气流量为280mL·min-1条件下,正丁醚的质量浓度在30.0～2 000mg·m-3内与其催化发光强度呈线性关系,检出限(3S/N)为12.0mg·m-3。将上述方法用于空气样品中正丁醚含量的测定,其测定结果与气相色谱-质谱法所得结果吻合。