Evaluation and prediction of the degradation of space Si solar cells induced by a low-earth-orbit radiation environment

Space-graded silicon solar cells are evaluated by 1 MeV and 2 MeV electron-irradiation. The mean degradation of the maximum power (P_max) is presented and analyzed. The degradation at both electron energies has been correlated with the displacement damage dose (D_d). A good linearity between the electron D_d and the mean P_max degradation is obtained. The concept of D_d has also been used to predict the Si solar cell response in a low-earth-orbit (Altitude 799 km, Inclination 99^o) radiation environment, considering the shielded effect of a 120 μ m-thick silica coverglass on reducing the radiation. Compared with the on-orbit data from a Si solar array of a Chinese satellite (duration from April 2007 to July 2010), a good match can be found between the on-orbit data and the predicted results using D_d methodology, indicating the method is appropriate for evaluating the radiation damage of the solar cells, and also to provide a new technique for studying radiation effects on the optoelectronic detectors used in many high energy physics applications, where harsh radiation environments produce damage in optoelectronic device materials.     

硼酸对BaAl2Si2O8陶瓷相转变和微波介电性能的影响

采用传统固相烧结工艺制备BaAl2Si2O8(BAS)基微波介质陶瓷。研究添加H3BO3对BaAl2Si2O8基微波介质陶瓷的烧结特性、相转变、微波介电性能以及微观结构的影响。结果表明,H3BO3可以将BAS陶瓷烧结温度降低200℃左右,可以有效促进六方钡长石向单斜钡长石转变。当H3BO3添加量为10mol%时,具有最佳的综合微波介电性能,εr=6.3,Q×f=14700 GHz。H3BO3添加量为30mol%时,τf值最接近零值,为-13 ppm/℃。     

单轴、双轴应变Si拉曼谱应力模型

本文依据拉曼光谱原理, 基于Secular方程及拉曼选择定则分别获得了单轴、 双轴(001), (101), (111)应变Si材料应变张量与拉曼谱线移动的定量关系, 并在此基础上, 基于广义胡克定律最终建立了单轴、双轴(001), (101), (111)应变Si材料拉曼谱峰与应力的理论关系模型. 该模型建立过程详细、系统, 所得结果全面、量化, 可为应变Si材料应力的测试分析提供重要理论参考.     

四方晶系应变Si空穴散射机制

基于Fermi黄金法则及Boltzmann方程碰撞项近似理论, 推导建立了(001)弛豫Si_1-xGe_x衬底外延四方晶系应变Si空穴散射几率与应力及能量的理论关系模型, 包括离化杂质、声学声子、非极性光学声子及总散射概率(能量40 meV时)模型. 结果表明: 当Ge组分(x)低于0.2时, 应变Si/(001)Si_1-xGe_x材料空穴总散射概率随应力显著减小. 之后, 其随应力的变化趋于平缓. 与立方晶系未应变Si材料相比, 四方晶系应变Si材料空穴总散射概率最多可减小66%. 应变Si材料空穴迁移率增强与其散射概率的减小密切相关, 本文所得量化模型可为应变Si空穴迁移率及PMOS器件的研究与设计提供理论参考.     

应变Ge空穴有效质量的各向异性与各向同性

在利用k·p微扰理论获得应变Ge/Si_1-xGe_x价带E（k）-k关系的基础上,研究得到了（001）,（101）,（111）面应变Ge/Si_1-xGe_x沿不同晶向及各向同性的价带空穴有效质量.结果显示,应变Ge/Si_1-xGe_x沿各晶向的带边有效质量随应力增大而减小,且沿[010]晶向最小;子带空穴有效质量在应力较大时变化不明显,并且在数值上与带边空穴有效质量相差不大.最后利用各向同性有效质量与文献结果进行比对,验证了结果的正确性.     

Si100P2.5（GaP）1.5中随机孔洞对热电性能的影响

纯硅由于原材料来源广、熔点高,是潜在的太阳能热发电用热电材料.它的热电绩效因子ZT很小,室温只有0.01.本研究小组通过掺杂和结构纳米化制备了Si₁₀₀P_2.5（GaP）_1.5,获得813℃时的ZT为0.47.本文在此基础上,通过引入一种新的机制——随机孔洞——来进一步提高纯硅基材料Si₁₀₀P_2.5（GaP）_1.5的ZT.结果表明:由于孔洞增加了对低能载流子的过滤,Seebeck系数得到了提高;又由于孔洞对主要携带热量的声子的散射,晶格热导率大大降低,结果Si₁₀₀P_2.5（GaP）_1.5的ZT提高了32%.研究结果表明引入随机孔洞是增加纯硅基体系ZT的有效途径.     

单层硅Si6H4Ph2的稳定性和电子结构密度泛函研究

采用密度泛函计算方法,研究了二维单层硅Si6H4Ph2的稳定性及其电子结构．通过对纯硅纳米片Si6、加氢钝化的硅纳米片Si6H6以及添加苯基钝化的硅纳米片Si6H4Ph2对比研究,揭示了Si6H4Ph2的稳定性机理．通过电子结构研究,发现Si6H4Ph2与Si6H6类似,显示间接带隙半导体性质．     

A k·p analytical model for valence band of biaxial strained Ge on（001） Si1-xGex

In this paper,the dispersion relationship is derived by using the k·p method with the help of the perturbation theory,and we obtain the analytical expression in connection with the deformation potential.The calculation of the valence band of the biaxial strained Ge/（001）Si1-xGex is then performed.The results show that the first valence band edge moves up as Ge fraction x decreases,while the second valence band edge moves down.The band structures in the strained Ge/（001）Si 0.4 Ge 0.6 exhibit significant changes with x decreasing in the relaxed Ge along the [0,0,k] and the [k,0,0] directions.Furthermore,we employ a pseudo-potential total energy package（CASTEP） approach to calculate the band structure with the Ge fraction ranging from x = 0.6 to 1.Our analytical results of the splitting energy accord with the CASTEP-extracted results.The quantitative results obtained in this work can provide some theoretical references to the understanding of the strained Ge materials and the conduction channel design related to stress and orientation in the strained Ge pMOSFET.     

Longitudinal,transverse,density-of-states,and conductivity masses of electrons in（001）,（101） and（111） biaxiallystrained-Si and strained-Si1-xGex

In this study,the electron effective masses,including longitudinal,transverse,density-of-states and conductivity effective masses,have been systematically investigated in(001),(101) and(111) biaxially strained Si and Si1-xGex.It is found that the effect of strain on the longitudinal and transverse masses can be neglected,that the density-of-states masses in(001) and(110) biaxially strained Si and Si1-xGex materials decrease significantly with increasing Ge fraction(x),and that the conductivity masses along typical orientations in(001) and(110) strained Si and Si1-xGex.are obviously different from those in relaxed Si.The quantitative results obtained from this work may provide valuable theoretical references to understanding strained materials physics and studying conduction channel design related to stress and orientations in the strained devices.