In-situ SiN combined with etch-stop barrier structure for high-frequency AlGaN/GaN HEMT

The etch-stop structure including the in-situ SiN and AlGaN/GaN barrier is proposed for high frequency applications.The etch-stop process is realized by placing an in-situ SiN layer on the top of the thin AlGaN barrier.F-based etching can be self-terminated after removing SiN,leaving the AlGaN barrier in the gate region.With this in-situ SiN and thin barrier etch-stop structure,the short channel effect can be suppressed,meanwhile achieving highly precisely controlled and low damage etching process.The device shows a maximum drain current of 1022 mA/mm,a peak transconductance of 459 mS/mm,and a maximum oscillation frequency(fmax)of 248 GHz.     

基于微腔效应增强单层二硫化钨光吸收

提出基于金属薄膜-分布式布拉格反射器微腔效应增强单层二硫化钨光吸收的多层薄膜结构.运用光学传输矩阵理论研究了其输运特性,发现由于金属薄膜-分布式布拉格反射器的微腔效应,在间隔层和覆盖层之间形成电场强度极大值,有效促进入射光与单层二硫化钨的相互作用.综合优化金属层、间隔层和覆盖层厚度,单层二硫化钨在612 nm处的光吸收提高了38倍,达到78.42;.进一步探讨了光入射角、分布式布拉格反射器周期、间隔层折射率与单层二硫化钨光吸收的关系.研究结果表明,上述结构参数的变化可有效调控单层二硫化钨的吸收峰值.研究结果为制备高性能单层二硫化钨光电探测器等新型光电子器件提供了新思路.     

消光式核壳二聚体传感器的设计与光谱特性分析

根据ITO/Au纳米核壳二聚体粒子在生物医学领域的应用合理性,设计了一种实时检测生物液体的核壳二聚体探针消光式传感器;由偶极子理论推导出输出波长与外界环境折射率关系;利用MATLAB设计ITO/Au纳米核壳二聚体粒子结构;采用软件DDSCAT7.3结合离散偶极近似法,利用二聚体有效半径模拟计算了300~950nm可见光到红外光波段不同核壳比、二聚体间距、以及不同介质折射率的消光光谱;根据传感芯片折射率与偶极共振、耦合八级共振的响应关系得出ITO/Au二聚体的折射率灵敏特性。与传统Ag/Au核壳纳米粒子相比,ITO/Au纳米核壳二聚体结构引入了可作为传感芯片灵敏性自参考参数的耦合八级共振峰,同时ITO/Au二聚体结构的折射率灵敏度可达到419nm/RIU。这些工作及其结果对制作消光式传感器具有重要的意义。     

基于相场描述的拉压不对称强度结构拓扑优化

运用了基于相场描述的拓扑优化方法，来寻找在拉伸和压缩中表现出不对称强度行为的连续体结构的最优布局。依据Drucker-Prager屈服准则和幂率插值方案，优化问题可以描述为在局部应力约束下的最小化结构的体积。用qp放松法来解决应力约束的奇异性，并采用基于P-norm函数的聚合方法对应力约束进行凝聚，该方法实现了约束个数的降低，同时引入了稳定转化法来处理大量的局部应力约束和高度非线性的应力行为，以修正应力，提高优化收敛的稳定性。在优化问题求解时，使用拉格朗日乘子法对目标函数和应力约束进行处理。利用伴随变量法进行灵敏度分析，并通过求解Allen-Cahn方程更新相场函数设计变量。数值算例证明了该优化模型和相应数值技术的有效性，相关算例还揭示了考虑拉压不同强度和考虑同拉压强度约束时得到的结构优化拓扑构型具有显著的差异。     

Surface passivation in n-type silicon and its application in silicon drift detector

Based on the surface passivation of n-type silicon in a silicon drift detector(SDD), we propose a new passivation structure of SiO2/Al2O3/SiO2 passivation stacks. Since the SiO2 formed by the nitric-acid-oxidation-of-silicon(NAOS)method has good compactness and simple process, the first layer film is formed by the NAOS method. The Al2O3 film is also introduced into the passivation stacks owing to exceptional advantages such as good interface characteristic and simple process. In addition, for requirements of thickness and deposition temperature, the third layer of the SiO2 film is deposited by plasma enhanced chemical vapor deposition(PECVD). The deposition of the SiO2 film by PECVD is a low-temperature process and has a high deposition rate, which causes little damage to the device and makes the SiO2 film very suitable for serving as the third passivation layer. The passivation approach of stacks can saturate dangling bonds at the interface between stacks and the silicon substrate, and provide positive charge to optimize the field passivation of the n-type substrate.The passivation method ultimately achieves a good combination of chemical and field passivations. Experimental results show that with the passivation structure of SiO2/Al2O3/SiO2, the final minority carrier lifetime reaches 5223 μs at injection of 5×10¹⁵ cm^-3. When it is applied to the passivation of SDD, the leakage current is reduced to the order of nA.     

柱面微通道板的制备及其性能研究

针对未来空间天文学应用的超分辨率光谱成像仪器的需求，对低噪声柱面微通道板（MCP）的制备方法及其性能进行了研究. 提出了一种将光学抛光与热成型相结合的新的柱面MCP制备方法，利用不含放射性元素的低噪声MCP玻璃，制备出曲率半径为400mm、尺寸为30mm′46mm、长径比为80:1、通道直径12.5mm、通道间距15mm的柱面MCP，并将其与感应电荷楔条形阳极（WSA）组成光子计数探测器，对其暗计数率、分辨率进行了检测，暗计数率约为0.1counts/cm2×s.     

微课在高中化学教学中应用的初步探索——以“乙醛”教学的微课应用模型为例

通过微课在高中化学教学中应用模型的构建,介绍了微课的选点、形式、制作、使用和管理要求,阐述了微课在课前、课堂、课后使用的方法,结合案例解析了微课的课堂教学应用。