微氧化烧结制备掺杂Y2O3的SiC陶瓷及含镉模拟废水处理

采用了微氧化烧结制备了不同Y₂O₃质量分数（0%、2%、4%、6%）的多孔SiC陶瓷，通过对陶瓷的晶体结构、微观形貌、物理性能和Cd²⁺的去除率测试发现：添加了Y₂O₃的SiC陶瓷出现了较多的第二相Y₂SiO₇、Y₅Si₃C_0.5，随着Y₂O₃的质量分数增加逐渐升高，主相的衍射峰的强度有降低。扫描电子显微镜测试发现，SiC陶瓷的尺寸在2.5 μm，Y₂O₃引入后，SiC陶瓷的晶粒尺寸降低，高温烧结时液相的含量增加，熔体粘度降低，晶粒结合更加紧密，Y₂O₃的引入提高了多孔陶瓷的体积密度，Y₂O₃质量分数为6%SiC的体积密度最大为2.21 g/cm³。热导率随着Y₂O₃质量分数的增加呈现出先升高后降低的趋势。金属Cd²⁺的过滤测试表明：随着Y₂O₃质量分数增加，Cd²⁺的残留质量浓度、膜通量和去除率先降低后升高，当掺杂质量分数为4%时，Cd²⁺残留质量浓度最低为0.042 mg/L，膜通量达到了最大值572 L/（m²·h），去除率最大为99.95%，相比未掺质量分数杂体系的去除率提高了0.14%。随着溶液pH值的逐渐增大，金属Cd²⁺的残留质量浓度逐渐降低、去除率逐渐升高，pH≥9时最终均趋于稳定。综合来看，多孔SiC陶瓷的助烧剂Y₂O₃最佳掺量为4%。     

SiC晶体生长中气相组分输运特性

针对物理气相传输(PVT)法生长碳化硅(SiC)晶体,建立了一个二维生长动力学模型研究SiC生长腔内气相组分输运特性,该模型考虑了氩气与气相组分之间的流动耦合,Stefan流和浮力影响.研究表明:在压力较低的情况下,自然对流对气相组分的输运过程影响很小,可以忽略,而当压力增高时,自然对流强度显著增大,不可忽略.其次,随着生长温度升高对流的作用增强,生长腔内输运过程由扩散向对流转变,最终对流主导组分的输运过程.随着压力升高对流作用减弱,扩散为气相组分主要输运方式.     

纳米SiC基光催化剂研究进展

Industrialization undoubtedly boosts economic development and improves the standard of living; however, it also leads to some serious problems, including the energy crisis, environmental pollution, and global warming. These problems are associated with or caused by the high carbon dioxide (CO₂) and sulfur dioxide (SO₂) emissions from the burning of fossil fuels such as coal, oil, and gas. Photocatalysis is considered one of the most promising technologies for eliminating these problems because of the possibility of converting CO₂ into hydrocarbon fuels and other valuable chemicals using solar energy, hydrogen (H₂) production from water (H₂O) electrolysis, and degradation of pollutants. Among the various photocatalysts, silicon carbide (SiC) has great potential in the fields of photocatalysis, photoelectrocatalysis, and electrocatalysis because of its good electrical properties and photoelectrochemistry. This review is divided into six sections: introduction, fundamentals of nanostructured SiC, synthesis methods for obtaining nanostructured SiC photocatalysts, strategies for improving the activity of nanostructured SiC photocatalysts, applications of nanostructured SiC photocatalysts, and conclusions and prospects. The fundamentals of nanostructured SiC include its physicochemical characteristics. It possesses a range of unique physical properties, such as extreme hardness, high mechanical stability at high temperatures, a low thermal expansion coefficient, wide bandgap, and superior thermal conductivity. It also possesses exceptional chemical characteristics, such as high oxidation and corrosion resistance. The synthesis methods for obtaining nanostructured SiC have been systematically summarized as follows: Template growth, sol-gel, organic precursor pyrolysis, solvothermal synthesis, arc discharge, carbon thermal reduction, and electrospinning. These synthesis methods require high temperatures, and the reaction mechanism involves SiC formation via the reaction between carbon and silicon oxide. In the section of the review involving the strategies for improving the activity of nanostructured SiC photocatalysts, seven strategies are discussed, viz., element doping, construction of Z-scheme (or S-scheme) systems, supported co-catalysts, visible photosensitization, construction of semiconductor heterojunctions, supported carbon materials, and construction of nanostructures. All of these strategies, except element doping and visible photosensitization, concentrate on enhancing the separation of holes and electrons, while suppressing their recombination, thus improving the photocatalytic performance of the nanostructured SiC photocatalysts. Regarding the element doping and visible photosensitization strategies, element doping can narrow the bandgap of SiC, which generates more holes and electrons to improve photocatalytic activity. On the other hand, the principle of visible photosensitization is that photo-induced electrons move from photosensitizers to the conduction band of SiC to participate in the reaction, thus enhancing the photocatalytic performance. In the section on the applications of nanostructured SiC, photocatalytic H₂ production, pollutant degradation, CO₂ reduction, photoelectrocatalytic, and electrocatalytic applications will be discussed. The mechanism of a photocatalytic reaction requires the SiC photocatalyst to produce photo-induced electrons and holes during irradiation, which participate in the photocatalytic reaction. For example, photo-induced electrons can transform protons into H₂, as well as CO₂ into methane, methanol, or formic acid. Furthermore, photo-induced holes can convert organic waste into H₂O and CO₂. For photoelectrocatalytic and electrocatalytic applications, SiC is used as a catalyst under high temperatures and highly acidic or basic environments because of its remarkable physicochemical characteristics, including low thermal expansion, superior thermal conductivity, and high oxidation and corrosion resistance. The last section of the review will reveal the major obstacles impeding the industrial application of nanostructured SiC photocatalysts, such as insufficient visible absorption, slow reaction kinetics, and hard fabrication, as well as provide some ideas on how to overcome these obstacles.      

6H-SiC/3C-SiC/6H-SiC量子阱结构制备及其发光特性

利用固源分子束外延(SSMBE)生长技术, 在1350K的衬底温度下, 通过改变Si束流强度, 在6H-SiC(0001)面上外延生长6H-SiC/3C-SiC/6H-SiC量子阱结构薄膜, 并用反射高能电子衍射(RHEED)与光致发光(PL)谱对生长的薄膜的晶型和发光特性进行表征. RHEED 结果显示生长的薄膜为6H-SiC/3C-SiC/6H-SiC量子阱结构薄膜. 室温下He-Gd激光激发的光致发光(PL)谱显示, 薄膜在480-600 nm范围内存在衬底未观察到的较强发光. 拟合得到的发光峰与依据量子阱结构模型计算出的发光位置较为一致. 由此表明, 该强发光带可能是6H-SiC/3C-SiC/6H-SiC量子阱结构的发光.     

聚锆碳硅烷陶瓷先驱体的制备与表征

为了提高SiC陶瓷纤维的综合性能,利用聚二甲基硅烷(PDMS)热解制得的液相产物聚硅碳硅烷(PSCS)与乙酰丙酮锆(Zr(AcAc)4)反应,制备了含锆SiC陶瓷纤维的先驱体聚锆碳硅烷(PZCS).选用液相PSCS作为反应原料,可使锆元素在先驱体中分布更加均匀,并能防止Zr(AcAc)4在反应过程中升华.实验合成的PZCS化学式为SiC1.94HxO0.066Zr0.0104,数均分子量Mn=200~400,再成型性良好.反应机理研究表明,反应过程中存在PSCS裂解重排反应,Si—H键在反应中显示出很高的活性,PZCS分子量的增加是PSCS形成的Si—H键与Zr(AcAc)4的配位基发生交联反应的结果.利用PZCS制备的Si—Zr—C—O陶瓷纤维平均强度2.6GPa,平均直径11μm,性能优异.     

聚碳硅烷纤维的空气不熔化处理

用热重和红外光谱分析了聚碳硅烷纤维在空气中的不熔化处理过程, 确定了不熔化处理的反应机理和反应条件。通过控制不熔化处理程度, 有效地改善了碳化硅纤维的力学性能。     

β-SiC薄膜在SF6和SF6+O2中的等离子体刻蚀研究

以SF₆和SF₆+O₂为刻蚀气体,采用等离子体刻蚀工艺成功地对化学气相淀积工艺制备的β-SiC单晶薄膜进行了有效的刻蚀去除.实验指出当气体混合比约为40%时,刻蚀速率达到最大值.俄歇能谱分析表明,在SF₆和SF₆+O₂气体中被刻蚀后的样品没有形成富C表面的SiC层.研究结果为各种SiC器件的研制奠定了必要的实验基础. 关键词：     

化学沉积Ni-P-Al2O3和Ni-P-SiC复合材料的微观组织与物理性能

采用化学沉积方法,可以制备以镍磷合金为基质的复合硬质相粒子的复合材料［１］．镍磷合金颇受青睐之处在于可以调整成分和时效处理温度来改变其组织结构,进而获得广泛变化的性能［２,３］．本文报道化学沉积获得的ＮｉＰ氧化铝和ＮｉＰ碳化硅复合材料的微观组织与...     

铝基复合材料中不同形态碳分析方法的研究

本文研究铝基复合材料中碳元素不同存在形式（总碳、游离碳、碳化硅）的检测方法。 采用高频感应燃烧红外法测定总碳（2.00%～6.00%）,酸溶过滤分离-高频红外法测定游离碳（0.10%～1.50%）,重量法测定碳化硅(1%～35%)的含量。以上三个方法的精密度试验RSD%（n=8）最大分别为4.2%、1.2%、0.51%,测定游离碳和碳化硅(SiC)样品的加标回收率分别是98.5%～100.2%,99%～101%。 这三种方法都快速、可靠,已应用于铝基复合材料的实际分析工作中。     

重掺杂P型SiC的熔融KOH刻蚀行为研究

本文采用熔融KOH刻蚀方法详细研究了液相法生长的重掺杂P型6H-SiC晶体中的位错情况,探究了时间、温度变化对液相法生长的重掺杂P型6H-SiC晶片表面刻蚀的影响。当提高腐蚀时间或腐蚀温度时,晶片表面的腐蚀坑尺寸均表现出不同程度的增加,过高的温度及长时间刻蚀均导致过腐蚀现象的发生。根据不同腐蚀条件下腐蚀坑的形貌与分布,确定出刻蚀重掺杂P型6H-SiC晶片的最佳工艺参数。利用晶片在不同温度下的腐蚀速率变化关系及阿伦尼乌斯公式计算出晶体的反应活化能为10.59 kcal/mol。最后,对穿透型螺位错(TSD)和穿透型刃位错(TED)的形貌、尺寸和内部结构进行了详细的表征和分析,结果表明P型6H-SiC晶体中腐蚀坑的倾角与腐蚀时间无关。