Epidemic spreading in complex networks

The study of epidemic spreading in complex networks is currently a hot topic and a large body of results have been achieved. In this paper, we briefly review our contributions to this field, which includes the underlying mechanism of rumor propagation, the epidemic spreading in community networks, the influence of varying topology, and the influence of mobility of agents. Also, some future directions are pointed out.      

New Molecular Receptors with Cyclophosphazene Subunits: Synthesis, Reactivity, and Structure-Property Relationships

A series of hydrophopic ( 2 and 3) and new hydrophilic ( 4– 7) molecular receptors of the PNP-lariat ether with tetra-substituted cyclotriphosphazene subunits have been prepared by the complete nucleophilic substitution of chlorine atoms in the reactive PNP-crown precursor 1 with the respective sodium cation-paired oxyanions (phenoxy 2, -naphthoxy 3, and methoxytrioxyethylenoxy 4) and aliphatic amines (n-propylamine 5 aziridine 6, and pyrrolidine 7). Their structures were established by MS and ³¹P NMR spectroscopy and their metal ion complexing properties tested by a TLC method. Comparison of the complexation behaviour for ligands 1– 7 shows that the affinity for particular cations is strongly substituent-dependent and, in general, is significantly enhanced by cooperation of the side arm donor atoms (O or N) with the parent PNP-crown structure in the binding process. The remarkable affinity of some ligands for selected cations, in particular lithium, cesium, and silver ions, is interpreted in terms of structure-property relationships.     

高能氩离子辐照硅产生的缺陷研究

在室温下750MeV氩离子对本征单晶硅进行辐照,通过用正电子湮没寿命测量技术、电子顺磁共振技术以及红外光吸收方法研究了辐照产生的缺陷.结果表明:电中性双空位是辐照产生的主要空位团;在4.3×10¹⁴ions/cm²的高剂量下未见样品发生非晶化转变;虽然在离子射程末端双空位的浓度随剂量的增加而显著增大,但在以电离激发过程为主要能损方式的区域里双空位的浓度基本不变.据此可以认为,电子能损过程对辐照产生的缺陷有退人作用.     

掺铒重金属氧氟硅铋酸盐玻璃的光谱性质

研究了重金属氧氟硅铋酸盐玻璃 (50-x)SiO2 xBi2O3 50PbF2(x=0, 3, 5, 8, 10, 13, 15 mol%)中Er3+离子的吸收光谱、荧光光谱、荧光半高宽、荧光 寿命和热稳定性能.应用Judd Ofelt理论计算了玻璃的强度参数Ωt(t=2,4,6)，应用 McCumber计算了能级4I13/2→4I15/2跃迁的受激发射截面. 结果发现荧光半高宽与Ω6有较大联系，Ω6越大，荧光半高宽越宽.对Er3+ 关键词： 重金属氧氟硅铋酸盐玻璃 光谱性质 Er3+离子 Judd Ofelt参数     

电偏转扫描法测量高电荷态ECR源发射度

成功地研制了一套适合于低能离子束流发射度测量的电偏转扫描探测器.对该探测器的原理和结构作了较详细的描述,并给出该探测器对兰州近代物理研究所高电荷态ECR源LECR3引出离子束流发射度的测量结果.典型结果为:在引出高压为15.97kV,引出束流为190μA时,O⁴⁺水平发射度(x方向)为137πmm·mrad,垂直发射度(y方向)为120πmm·mrad(包括90%束流).最后,对测量结果作了一些分析和讨论.     

Tailoring magnetism in artificially structured materials: the new frontier

The current standard of electronic devices and data storage media has reached a level such that magnetic materials have to be fabricated on a nanometer scale. In particular, the emerging concept of spintronics, which is based on fact that current carriers have not only charge but also spin, requires the assembling of nanometer-sized magnetic structures with desired magnetic properties. It is this background that motivates scientists and engineers to attempt to grow and characterize magnetic objects at smaller and smaller length scales, from 2D films and multilayers to 1D wires and eventually to 0D dots. In this article, some of the most significant progress in recent years in the effort of growing artificially structured magnetic materials are reviewed. The new structural and magnetic properties of these materials are discussed, with an emphasis on the correlation between structure and magnetism, which also serves as guidance for improving their magnetic properties. The emerging emphasis is on converting the existing knowledge into growing and studying low-dimensional complex materials, which promise to have considerably higher “tuning” ability for desired properties.     

H_2辉光放电清洗时轰击器壁的离子能量测量与分析

一、引言 辉光放电是清洗锻炼环流器真空室器壁的有效手段。H_2辉光放电时,氢离子轰击器壁与器壁中的C和O发生化学反应,生成CH_4,H_2O等气体;同时,这些离子提供能量使得吸附在器壁表面的杂质气体脱附,从而被泵出真空室外,达到清洗锻炼的目的。由于辉光放电时,离子轰击的能量较高,会引起一定的溅射沉积。我们在模拟真空室(六通装置)进行了辉光放电,对各种参数下的离子能量进行了测量,从中找出了离子能量与极间电压(阳极与器壁之间的电压)、放电电流、以及气压、离子流密度之间的某些关系。     

Gas pressure regulation in a r.f. ion source

An experimental technique by which devterium gas pressure in a radio frequency ion source is automatically controlled and maintained to its initial set value is described. The accuracy achieved is ± 0.5 μ in about 5 μ gas pressure being used in the r.f. ion source of the neutron generator of this laboratory.