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1.
对1mmHg左右的低压气体施加一电场进行辉光放电,气体中的少量自由电子将沿电场方向被加速。在压力低,距离长的条件下,电子的运动趋向极高的速度,因而得到相当大的动能。此种高能电子与分子或原子碰撞时将会使之激发、离解或断裂,产生各种激发态分子、离子、自由基及电子,气体处于电离状态。其中正离子和电子所带电荷相等,表观上呈中性,因而通常称之为等离子体。一般辉光放电所得到的等离子体离子化度K=10~(-5)~10~(-6),电子密  相似文献   

2.
低温等离子体对高分子材料表面的改性   总被引:1,自引:0,他引:1  
低温等离子体是以低气压放电(辉光、电晕、高频、微波)产生的电离气体,其中蕴含着丰富的活性粒子,可以引起种种化学反应。处于非平衡态的低温等离子体,其电子温度 T_e>>离子温度 T_i 和气体温度 T_g。如辉光放电或射频放电产生的低温等离子体,其 T_e≈10~4K, T_g则略低二个数量级。在低温等离子体条件下进  相似文献   

3.
利用聚丙烯腈基活性碳纤维(PAN-ACF)表面存在的羧基与氯化亚砜SOCl2发生酰氯化反应后与乙二胺110℃加热回流在其表面接枝胺基、酰胺基团对其进行改性,用傅立叶转换红外光谱仪(FTIR)、X射线光电子能谱仪(XPS)对改性前后活性碳纤维的表面结构和元素结合态及含量变化进行了表征,并将改性后的活性碳纤维(NH-ACF)应用于水体中Cu2+离子的去除处理,用电感耦合等离子体原子发射光谱仪(ICP-AES)检测被处理溶液中的Cu2+离子浓度变化,进而得出Cu2+离子在NH-ACF上的最大吸附量qmax.结果表明,NH-ACF比未改性处理的PAN-ACF对Cu2+吸附去除能力具有显著的优势,前者约为后者的1.5倍.  相似文献   

4.
利用聚丙烯腈基活性碳纤维(PAN-ACF)表面存在的羧基与氯化亚砜SOCl2发生酰氯化反应后与乙二胺110℃加热回流在其表面接枝胺基、酰胺基团对其进行改性,用傅立叶转换红外光谱仪(FTIR)、X射线光电子能谱仪(XPS)对改性前后活性碳纤维的表面结构和元素结合态及含量变化进行了表征,并将改性后的活性碳纤维(NH-ACF)应用于水体中Cu2+离子的去除处理,用电感耦合等离子体原子发射光谱仪(ICP-AES)检测被处理溶液中的Cu2+离子浓度变化,进而得出Cu2+离子在NH-ACF上的最大吸附量qmax.结果表明,NH-ACF比未改性处理的PAN-ACF对Cu2+吸附去除能力具有显著的优势,前者约为后者的1.5倍.  相似文献   

5.
<正> 在前报,已应用ESCA等方法研究了辉光区和非辉光区等离子体聚四氟乙烯(PPTFE)淀积膜的结构。鉴于等离子体聚合反应的复杂性,前人对等离子体聚合反应机理争论较大,争论焦点集中在反应的活性种是离子还是自由基以及反应的地点这两个问题上,本工作在前报工作的基础上,进一步应用ESR检测出等离子体气体流出物的冷凝物中含有大量自由基,为证实等离子体聚合的自由基反应历程提供了新依据;还采用GC-MS表征了气体冷凝物的结构。比仅用MS分析气相产物有较大优点。综合这些实验结果,为推测四氟乙烯等离子体聚合反应历程奠定了一定的基础。  相似文献   

6.
利用辉光放电技术,将C_2H_2/CO_2/H_2的等离子体聚合物沉积处理聚氯乙烯商品膜表面进行改性。用红外光声光谱和扫描电子显微镜分析观察了等离子体改性的聚氯乙烯膜的结构和表面形态。测量了改性膜的水接触角,计算了它们的表面自由能,界面自由能以及表面功,从而研究了改性膜的亲水性。同时,利用热重分析仪(TGA)研究了改性膜的热稳定性。  相似文献   

7.
本工作应用ESCA研究了聚合条件对产物结构的影响,并着重讨论了在非辉光区中形成的等离子体聚四氟乙烯(PPTFE)膜的ESCA表征。发现在非辉光区中形成的PPTFE是近于线型的,并用X射线粉末照相证实,聚合膜具有类似普通PTFE的结晶结构,约有20条衍射环。另外,考察了放电功率、压力和等离子气体等对聚合膜结构的影响。  相似文献   

8.
任煜  张银  王晓娜  臧传锋  张伟 《高分子学报》2016,(10):1439-1446
利用空气介质阻挡放电(DBD)等离子体对超高分子量聚乙烯(UHMWPE)纤维进行表面改性处理研究以提高纤维表面的润湿和粘结性能.分别研究了等离子体处理时间及电压对UHMWPE纤维拉伸断裂强力、接触角、表面形貌、表面化学成分和粘结性能等的影响规律.SEM分析结果表明,空气DBD等离子体处理后UHMWPE纤维表面出现垂直于纤维轴向分布的凹坑和裂纹,使得纤维表面粗糙度显著增加.XPS分析表明空气DBD处理后纤维表面碳元素含量显著下降;同时氧元素和氮元素的含量均较处理前增加,但氧元素含量增加的幅度显著高于氮元素.XPS分峰结果表明等离子体处理后UHMWPE纤维纤维表面C—O/C—N基团含量显著增加,同时出现了C O和O—C O这2种新的含氧官能团.同时,接触角及和与环氧树脂之间的界面剪切力(IFSS)测试结果表明DBD等离子体处理后UHMWPE纤维表面润湿性能和粘结力均产生显著提高,且随着等离子体处理时间或电压的增加,UHMWPE纤维的表面润湿性能和粘结力均呈现先上升后下降的趋势.空气DBD等离子体处理对UHMWPE纤维的力学性能影响较小,当处理电压低于200 V,处理时间小于100 s,纤维强力下降比率小于5.2%.  相似文献   

9.
采用电感耦合射频等离子体(ICP)和介质阻挡放电(DBD)低温等离子体对高性能连续纤维表面进行改性,分别采用X光电子能谱(XPS)、原子力显微镜(AFM)和动态接触角测定仪(DCA)等分析测试手段系统地研究了等离子体处理时间、放电功率、放电气压等对连续碳纤维、聚苯并二噁唑(PBO)纤维改性处理前后,纤维表面状态、表面组成、表面形貌、浸润性能的变化规律以及经等离子体处理前后纤维增强双马树脂基复合材料界面结构与性能的影响关系及变化规律、复合材料界面粘结和破坏机理.研究结果表明,经过等离子体处理后,纤维表面接枝上了大量的含羧基、羟基等极性官能团,表面粗糙度增加,表面自由能增加,纤维浸润性能得到明显改善,导致纤维与双马树脂基体界面层间剪切强度(ILSS)明显提高,复合材料的破坏模式由未处理的界面脱粘破坏转变为等离子体处理后的树脂基体破坏.最后,对纤维表面时效性及其对纤维增强双马树脂基复合材料界面性能的影响关系也进行了论述.  相似文献   

10.
综述了无机固体样品中硫的高温燃烧热解(包括燃烧-红外吸收法、燃烧-碘量法、燃烧-库仑滴定法、燃烧-中和滴定法和燃烧-电导法等)、湿法消解(包括硫酸钡重量法、硫酸钡比浊法、电感耦合等离子体原子发射光谱法、电感耦合等离子体质谱法、原子吸收光谱法和离子色谱法等)和固体样品直接分析(包括火花源原子发射光谱法、辉光放电原子发射光谱法、X射线荧光光谱法等)等3类测定方法的研究进展(引用文献117篇)。  相似文献   

11.
The etching mechanism of Pb(Zr,Ti)O3 (PZT) thin films in Cl2/Ar plasma was investigated through the analysis of gas mixing ratio on volume and surface chemistries. Experiments showed that PZT etch rate keeps a constant value up to 40% of Ar addition into Cl2/Ar plasma. Langmuir probe measurement showed the noticeable influence of Cl2/Ar mixing ratio on electron temperature and electron density. The modeling of volume kinetics for neutral and charged particles indicated monotonic changes of both densities and fluxes of active species such as chlorine atoms and positive ions. The analysis of surface kinetics showed that PZT etch rate behavior may be explained by the combination of spontaneous and ion-assisted etch mechanisms.  相似文献   

12.
13.
This article is an electronic publication in Spectrochimica Acta Electronica (SAE), the electronic section of Spectrochimica Acta Part B (SAB). The hardcopy text is accompanied by three disks with data files with the hardcopy paper in Word 5.0 and ASCII format, and a disclaimer. The text details the purpose of the work and the structure of the three-dimensional Ar ionization temperature and electron number density data files. The line-to-continuum method was used to evaluate the spatial distribution of Ar ionization temperatures, Tion, and electron number densities, ne, within a dry Ar inductively coupled plasma (ICP). The emission measurements were spatially resolved in three dimensions by reconstruction algorithms for computed tomography. The 40.68 MHz Ar ICP was operated at applied r.f. power levels of 0.75 and 1.0 kW. The reconstructed distributions of Ar I line emission (430.0 nm) and continuum emission (428.6 nm) show good reproducibility over a series of five replicate runs. Argon ionization temperatures remain within a 6500–8500 K range throughout the continuum-emission cone of the plasma. Deviations from this temperature range occur in the central channel and around the outer edge of the plasma. Low in the plasma, the central-channel Tion is cooler than 6000 K. Along the outer edge of the plasma, the line-to-continuum ratio becomes small; this low ratio results in erroneously high temperatures (> 12000 K). The errors in Tion appear to be due to reproducible artifacts in the reconstruction process that lead to low Ar I line-emission readings along the outer edge of the plasma. Electron densities show a maximum of 8.5 × 1014 cm−3 and 1.2 × 1015 cm−3 at 0.75 and 1.0 kW, respectively. Electron number densities were much better behaved than Tion due to their dependence on the square-root of continuum measurements and only the fourth-root of Tion.  相似文献   

14.
In this study, first the acrylonitrile‐butadiene rubber (NBR5080) was modified by argon (Ar), air, and oxygen plasma at low temperature, and the effect of plasma process (power, time, and pressure) on the surface properties of NBR5080, the interfacial properties, physical properties, and the mechanical properties of NBR5080/polytetrafluoroethylene (PTFE) composites were investigated. The state contact angle and the surface free energy were applied to characterize the surface wettability of NBR5080. The scanning electron microscope and the atomic force microscope were used to observe the surface morphology of the NBR5080. The chemical changes on the NBR5080 surface were verified by X‐ray photoelectron spectroscopy. The average water contact angle the NBR5080 declined obviously when NBR5080 was treated by Ar (100 W/600 s/30 Pa). The active oxygen groups were introduced onto the surface of NBR5080 by cold plasma treatment and more active group containing oxygen were observed on the samples treated by Ar plasma. The peel strength between the NBR5080 and the PTFE was increased obviously, which increased from 0 to 44.2 N?m?1 for Ar plasma treatment. The mass and the dimension of NBR5080 increase sharply after immersing in kerosene, whereas the NBR5080/PTFE composites changed a little. The mechanical properties of NBR5080 and NBR5080/PTFE composites decreased as the immersion time in kerosene increased, but the decreased degree of NBR5080 is higher than NBR5080/PTFE composites.  相似文献   

15.
The excitation temperatures of Ar and Fe, the ionization temperatures of Ar and Ca and the electron number densities have been determined for a radiofrequency capacitively coupled plasma in the tip-ring electrode geometry. The temperatures and the electron number densities possess their maximum value close to the electrodes.  相似文献   

16.
The excitation temperatures of Ar and Fe, the ionization temperatures of Ar and Ca and the electron number densities have been determined for a radiofrequency capacitively coupled plasma in the tip-ring electrode geometry. The temperatures and the electron number densities possess their maximum value close to the electrodes.  相似文献   

17.
罗正维  江晖  胡龙志  李丹  耿文华  韦萍 《催化学报》2014,35(10):1752-1760
研究了N2/Ar介质阻挡放电处理对负载CuO的TiO2可见光光催化活性的影响.采用X射线衍射、紫外-可见分光吸收光谱、透射电镜、X射线光电子能谱和电子自旋共振进行了表征,详细考察了等离子改性参数包括气氛组成、处理时间和处理功率对改性效果的影响,并通过降解甲基橙溶液考察了可见光光催化活性.结果表明,最佳等离子处理条件为N2与Ar比例为8:2,处理时间为20 min,放电电流为1.0 A.最后,使用改性后的光催化剂对模拟含汞废水进行了处理.  相似文献   

18.
Studies have been performed to characterize laser induced breakdown spectroscopy (LIBS) plasmas formed in Ar/H2 gas mixtures that are used for hydride generation (HG) LIBS measurements of arsenic (As), antimony (Sb) and selenium (Se) hydrides. The plasma electron density and plasma excitation temperature have been determined through hydrogen, argon and arsenic emission measurements. The electron density ranges from 4.5 × 1017 to 8.3 × 1015 cm?3 over time delays of 0.2 to 15 μs. The plasma temperatures range from 8800 to 7700 K for Ar and from 8800 to 6500 K for As in the HG LIBS plasmas. Evaluation of the plasma properties leads to the conclusion that partial local thermodynamic equilibrium conditions are present in the HG LIBS plasmas. Comparison measurements in LIBS plasmas formed in Ar gas only indicate that the temperatures are similar in both plasmas. However it is also observed that the electron density is higher in the Ar only plasmas and that the emission intensities of Ar are higher and decay more slowly in the Ar only plasmas. These differences are attributed to the presence of H2 which has a higher thermal conductivity and provides additional dissociation, excitation and ionization processes in the HG LIBS plasma environment. Based on the observed results, it is anticipated that changes to the HG conditions that change the amount of H2 in the plasma will have a significant effect on analyte emission in the HG LIBS plasmas that is independent of changes in the HG efficiency. The HG LIBS plasmas have been evaluated for measurements of elements hydrides using a constant set of HG LIBS plasma conditions. Linear responses are observed and limits of detection of 0.7, 0.2 and 0.6 mg/L are reported for As, Sb and Se, respectively.  相似文献   

19.
通过低温等离子体技术对聚乙二醇双丙烯酸酯(PEGDA)/甲基丙烯酸β-羟乙酯(HEMA)共聚物水凝胶生物材料进行表面改性,以骨髓基质干细胞(BMSc)为细胞模型,考察了细胞在等离子体表面改性前后的水凝胶材料的黏附和增值行为,材料的表面性能通过 X 射线光电子能谱、接触角和扫描电镜进行表征.研究结果表明,材料表面经氩等离...  相似文献   

20.
In this work, laser triggered spark discharge was combined with laser-ablation under Air and Ar gases to investigate the characteristics of laser-ablated plasma emission. The experimental results show that the optical emission intensity is significantly enhanced by electric discharge compared to without discharge and the spectral emission time of plasma is much longer than that without discharge. The enhancement effect is more apparent in the presence of Ar ambient. In addition, the plasma temperature and electron density as well as limits of detections (LOD) have been determined. The better LOD can be attributed to the improvement of plasma. The higher plasma temperature and electron density indicate that the enhanced mechanism in emission intensity is predominated by the further excitation/ionization of the laser-ablated material by the spark discharge due to the energy deposition in the plasma.  相似文献   

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