退火和电子辐照复合处理对ZnGeP2单晶性能的改进研究

采用退火和电子辐照相结合的复合工艺方法,对ZnGeP2晶体进行生长后处理.采用傅里叶红外光谱仪(FTIR)和高阻仪(HRM)等,对经不同次序的复合工艺处理前后样品的红外透过率和电阻率进行了测试.结果表明,采用先退火后电子辐照的复合处理工艺,样品的红外透过率能得到明显的提高.     

磷锗锌晶体的热处理研究

采用改进垂直布里奇曼法生长出的磷锗锌(ZnGeP2,ZGP)晶体中存在各种缺陷,导致其红外透过率较低,刚生长的晶体不能直接用于制备红外非线性光学器件.分别采用真空、同成分粉末包裹和真空-同成分粉末包裹的复合退火工艺对生长的ZGP晶体进行了退火热处理研究.应用傅立叶红外光谱仪(FTIR)、高阻仪(HRM)、X射线能谱仪(EDS)等对退火前后的晶体性能和成分进行了测试分析.结果表明,三种方法退火后晶体的红外透过率和电阻率都得到改善,其中复合退火工艺的改善效果最为显著,晶体红外透过率由41;提高到60;,电阻率由2.5×108 Ω·cm提高到7.2 ×108 Ω·cm,晶体成分接近ZGP理想化学配比,退火后晶体的光学和电学性能得到显著改善,可用于ZGP-OPO器件制作.     

γ辐射及退火MgAl2O4透明陶瓷光谱特性研究

本文用不同剂量的γ射线辐照镁铝尖晶石透明陶瓷,并对辐照后的样品进行等时退火,UV-VIS和FI-IR测试表明,辐照前3360cm-1处有吸收峰,它是由V-1OH心吸收引起的.经γ辐射,样品在370nm处产生吸收带,它是由辐照产生的V型色心吸收引起的.通过退火可以使V型色心吸收带消除.结果表明:较低剂量的γ辐照能降低陶瓷紫外到红外的透过率;大剂量的γ辐照能在陶瓷中产生退火效应,能增加陶瓷红外透过率.     

CdSiP2单晶退火研究

以高纯(6N) Cd、Si、P单质为原料,采用双温区气相输运法和改进的垂直布里奇曼法合成生长出等径尺寸为φ17 mm×65 mm的CdSiP2单晶锭,经切割抛光得到CdSiP2晶片.将样品分别置于真空、镉气氛、磷气氛和在同成分粉末包裹中进行了退火试验.采用X射线能量色散谱仪(EDS)和傅里叶红外分光光度计(FTIR)对退火前后的晶片组分及红外透过谱进行了测试分析.结果表明:四种氛围退火前后样品的组分变化不大,原子比接近理想的化学计量比;镉气氛下退火对晶片的红外透过率改善较为显著,在1600 ～ 4500 cm-1范围内的红外透过率由46;～52;提高到51; ～57;,接近CdSiP2晶体红外透过率的理论值.     

硅酸钇晶体的生长、腐蚀形貌和光谱性能研究

本文采用中频感应提拉法成功生长了未掺杂的Y2SiO5(YSO)晶体,经过定向、切割、抛光后得到样品.经过腐蚀后,利用大视场显微镜和扫描电镜在样品表面上观察到了菱形和四边形的位错蚀坑、小角晶界和包裹物等缺陷;测试了经过氢气、空气退火前后,辐照前后YSO晶体的透过谱,结果表明:YSO晶体的吸收边大约在202nm,氢气退火后在200～300nm波段透过率增加,空气退火后透过率显著降低;辐照后,氢气退火的样品在200～500nm波段透过率显著降低.     

CdGeAs2晶体退火与红外光学均匀性分析

采用AIM-8800红外显微镜观察了CdGeAs2晶体的面扫描红外透过图像,分别在2.3～4μm、4～8 μm和8～18μm三个波段对退火前后的CdGeAs2晶片红外透过率和面扫描红外透过图像进行了对比分析,研究了晶体的红外均匀性.结果表明,CdGeAs2晶体在多晶粉末包裹下经450℃退火150 h后,其红外透过率和红外透过均匀性都得到较大程度的改善,其中在2.3 ～4μm和4～8μm波段的改善效果尤为显著;分析了影响晶体红外透过率和均匀性的主要因素,探讨了改善晶体均匀性的可能途径.研究结果对于快速评判CdGeAs2晶片质量具有重要的实用价值.     

稀释磁性半导体Cd0.9Mn0.1Te晶体的退火改性

运用缺陷化学原理近似计算了Cd0.9Mn0.1Te晶体的点缺陷浓度,得到了晶体成分与理想化学计量比偏离最小时的退火条件.利用该退火条件,指导了Cd0.9Mn0.1Te晶体的两温区退火实验,并分析了退火对晶片性能的影响.结果表明:在973 K,Cd气氛下对Cd0.9Mn0.1Te晶片退火140 h后,晶片(111)面的X射线回摆曲线的FWHM值由退火前的168.8' 降至108',红外透过率由退火前48;提升到64;,接近晶体的理论透过率,电阻率也由退火前的2.643×105 Ω·cm提高到4.49×106 Ω·cm.由此可见,对生长态的Cd0.9Mn0.1Te晶体进行退火实验能提高晶体的结晶质量,补偿晶体的Cd空位点缺陷,使晶体成分接近理想的化学计量比.     

AgGa1-xInxSe2晶体退火改性研究

采用改进布里奇曼法生长出外观完整的AgGa1-xInxSe2(x=0.2)单晶锭,晶体的红外透过率低,不能直接用于红外非线性光学器件制备.采用TA公司生产的SDTQ-600热分析仪进行DSC-TGA测试,发现其熔点为826.69℃,结晶点为750.86℃,总失重约为3.9217;.采用同成份粉末源包裹晶体,在抽空封结后进行退火处理.退火处理后晶体的红外透过率有明显改善.在4000cm-1～7000cm-1范围内红外透过率由原先低于25;改进到高于40;;在750cm-1～4000cm-1范围的红外透过率由原先低于45;改善到超过50;,在2000cm-1 ～750cm-1区域甚至高达60;.结果表明:采用同成分粉末源包裹,在抽空封结后退火处理能有效提高AgGa1-xInxSe2晶体的红外透过率,改善晶体的光学均匀性,退火后的晶体适合红外非线性光学器件制备.     

退火条件对KDP晶体光学质量的影响研究

本文在不同退火温度和时间下对KDP晶体进行退火实验,并对其光学质量进行了测试和分析.实验表明:合适的退火条件可以增加晶体的透过率、提高光学均匀性、减少散射颗粒,其中160℃为KDP晶体最佳退火温度.在相同的退火温度下,延长退火时间能够更好地提高晶体的光学均匀性和结构完整性.在160℃下退火48h能够使晶体的光损伤阈值提高28;,退火240h能够提高40;以上.     

纯LaAlO3和Ce3+:LaAlO3单晶的吸收谱和透过谱研究

本文采用中频感应提拉法成功生长了LaAlO3和Ce3+:LaAlO3晶体.沿生长方向即α轴方向切割、抛光后得到实验样品.测试了氢气退火前后纯LaAlO3和Ce3+:LaAlO3从190nm到2500nm的吸收谱和透过谱.测试结果表明:纯LaAlO3晶体在196～220nm处出现宽带吸收,氢气退火后此一波段的吸收系数明显降低;未退火的Ce:LaAlO3晶体在196～209nm,246nm,314nm出现明显的吸收波段,氢气退火后其吸收谱发生显著变化,在198,206,214,246和314nm处出现对应于Ce3+的4f-5d的跃迁吸收;Ce:LaAlO3晶体较之纯LaAlO3晶体在红外区的透过率要高;氢气退火后,Ce:LaAlO3晶体和纯LaAlO3晶体在红外区的透过率下降.     

A review of measurement of thermophysical properties of silicon melt

Measurements of thermophysical properties of Si melt and supplementary study of X-ray scattering/diffraction by the authors' group were reviewed. The values obtained differed variously from those of literature. Density was 2–3% larger, surface tension 20–30% smaller, viscosity up to 40% larger, electrical conductivity 8% smaller, spectral emissivity more or less in good agreement with literature values, and thermal diffusivity a few percent larger. An anomalous density jump was found near the melting point. Surface tension and viscosity also showed anomaly. A strange time-dependent change of density was observed over 3 h after melting. X-ray analyses suggested a slight change in local atom ordering, but showed no sign of cluster formation. An addition of 0.1 at% gallium caused the density jump to disappear, while that of boron caused no change. An EXAFS study of the former melt indicated a strong interaction between Ga and Si atoms as if molecules of GaSi₃ existed. The implications of the measured properties are a possibility of soft-turbulence in an Si melt in a relatively large crucible, a more complicated manner of intake of oxygen depleted molten Si from the free surface region to underneath the growing crystal, and a relaxation of the melt after melting arising from trapped gas species.     

电子显微分析在表征纳米晶体化学组分中的应用

纳米材料的化学组分及含量影响其光、电、声、热、磁等物理性能,电子显微分析是表征纳米晶体化学组分的重要方法之一.本文综述了X-射线能谱(EDS)、X-射线波谱(WDS)、电子能量损失谱(EELS)和选区电子衍射(SAED)等现代电子显微分析技术在表征纳米晶体化学组分、形貌、尺寸和结构等方面的应用及其研究进展,并比较了这些分析方法存在的差异,提出了其应用中存在的不足及今后的研发方向.     

Mesomorphism Dependence on the Position of Substitution of a Pair of Esters

A novel homologous series of ethylene derivatives of thermotropic liquid crystals has been synthesized. The methoxy to octyloxy derivatives are nematogenic, the decyloxy to tetradecyloxy derivatives are smectogenic, in addition to nematogenic, and the hexadecyloxy homologue is smectogenic only. All the members of the series are enantiotropically mesogenic. Thermotropic behavior was determined by an optical polarizing microscope equipped with a heating stage and Differential Scanning Calorimetry (DSC) study. Analytical and spectral data confirm the molecular structures of homologues (infrared, nuclear magnetic resonance, mass spectra, X-ray, and DSC data). Textures of the nematic phase are threaded or Schlieren and that of smectic phase are focal conic fan-shaped of smectic A or C. Transition curves of the phase diagram behave in a normal manner except one or two deviations from the normal trend. The mesophase range (Sm+N) varies from 3°C to 44°C. The average thermal stability for smectic is 93°C and that for nematic 117.4°C. The LC behavior of the novel series is compared with a structurally similar known series.     

原位氮化法制备TiN纳米粉体

用溶胶凝胶法合成的纳米TiO2粉体作为原料,将该粉体在氨气中进行原位氮化制备了TiN纳米粉体.用XRD,TEM,化学分析等手段对合成的TiN纳米粉体的物相组成、形貌、成分进行了分析.实验分析表明:在1000℃和1100℃下分别氮化5h,可以制备粒径大约为40nm和80nm的TiN粉体,其TiN的含量分别为95.40;和98.37;;而在1000℃条件下氮化时间减少到2h时,TiN的含量仅为58.36;.氮化温度和氮化时间是合成纳米TiN的重要因素,提高合成温度和延长氮化时间均可形成纯度较高的TiN纳米粉体,但延长氮化时间更有利于获得粒径小的氮化钛粉体.     

On the influence of structural features of DNA on the possibility of metabolic transfer of electrons

Abstract

A fragment of a DNA molecule is considered as one of the channels of metabolic electron transfer. The heterogeneity of the complementary chains is effectively taken into account. This made it possible to find the speed of the electron injected into the DNA conduction band and the current density that it creates. Estimates of electron mobility in nucleic acid chains are made. They were an order of magnitude smaller than that of typical semiconductors. For the specific conductivity of nucleic acid chains, estimates provide a conductivity of one to two orders of magnitude lower than in graphite.     

前驱物合成条件对锰锌铁氧体结构和性能的影响

采用共沉淀-热处理工艺合成了尖晶石型锰锌铁氧体粉末,利用正交试验优化了制备工艺。利用X射线衍射仪(XRD)扫描电子显微镜(SEM)和振动样品磁强计(VSM)对粉体的显微结构和静磁性能进行了研究。结果表明:热处理温度为1350℃、保温时间为3.5 h、进料比为1.5时,若前驱物的pH值为6,制备的样品的主晶相为锰锌铁氧体;若前驱物的pH值为7 9,则形成单相尖晶石型锰锌铁氧体,样品的饱和磁化强度先增大后减小,矫顽力逐渐增大。pH值为7时,配方为Fe∶Mn∶Zn=68.4816∶17.1368∶14.381,进料比为1.5,滴加时间为40 min,反应温度为50℃,不加表面活性剂时得到的样品具有较高的饱和磁化强度。     

PEG聚合度对氧化铝造粒粉的性能影响

为制备适用于干压成型的氧化铝造粒粉,研究了PEG聚合度对氧化铝造粒粉微观形貌、流动性和松装密度的影响.结果表明PEG的聚合度对氧化铝浆料粘度影响显著,PEG2000-6000是较为理想的粘结剂选择,造粒粉的流动性与环境温度及湿度相关.采用正交实验设计,以造粒粉的流动性和松装密度为评价指标,对PEG聚合度、粘结剂添加量和固含量进行了优选,其影响顺序为PEG聚合度＞固含量＞粘结剂添加量.以优选参数PEG6000、添加量为4wt;、固含量为80wt;,制备了性能优良的氧化铝喷雾造粒粉.     

近化学计量比铌酸锂晶体组分测定与缺陷观察

采用助熔剂提拉法生长得到近化学计量比LiNbO3晶体.用多种方法测定了晶体组分,结果表明生长得到的晶体中[Li2O]含量为49.80;摩尔分数;对晶体缺陷的研究表明晶体质量有待提高,并分析了晶体中出现包裹物的原因.     

Mechanisms of chemical vapor deposition of silicon

The distribution in the silicon epitaxial growth from SiCl₄ and hydrogen are observed in situ by IR absorption spectroscopy. Two methods are used complementarily, one is IR spectroscopy of reactants extracted from the reactor by a fine quartz tube which is not disturbing the reactions, and gives knowledge about the local distribution, the other is direct IR spectroscopy of hot reactants in the reactor which is useful to ascertain the results at the real high temperature situation. The intermediate species are SiHCl₃, SiH₂Cl₂ which is estimated from the induced emission bands at 500 and 570 cm^-1. HCl is a dominant waste product and contributes to reverse reactions. To investigate the reaction, HCl is intentionally injected into the reacting gas. This kind of injection method may also be very effective to analyze the reactions using other reactants such as SiCl₄, SiHCl₃ and SiH₂Cl₂.     

Statistical characterization of the pore space of random systems of hard spheres

An improved statistical characterization of disordered structures such as metallic glasses, random porous media, or granular matter is presented. Suitable structure models follow the idea of dense random packed spheres, where the spheres represent atoms and particles in the case of metallic glasses and porous or granular matter, respectively. The geometry of the empty space between the atoms or particles is described by means of the already otherwise successful concept of so-called contact distributions. Their exact mathematical forms are unknown for hard sphere systems. Knowledge on these is obtained by means of Monte Carlo simulations of the structure models. The numerical results are approximated by simple and general mathematical expressions, with parameters that can be easily determined. These may serve as additional tools for the structural characterization of disordered matter, including systems of partly penetrable spheres.