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1.
钛酸铅钡铁电薄膜的光学性能研究   总被引:1,自引:0,他引:1  
采用溶胶-凝胶工艺在石英衬底上制备了Pb1-xBaxTiO3(BPT,x=0~1)铁电薄膜.利用X-射线衍射(XRD)、原子力显微镜(AFM)和拉曼光谱(Raman)对薄膜的相变特性、晶粒尺寸、结构和表面形貌进行了表征.结果表明,在750 ℃的退火温度下,所有的样品都已经完全晶化为多晶钙钛矿结构,薄膜表面均匀致密.在x=0.4时,薄膜由铁电四方相结构转化为顺电立方相结构.采用紫外-可见分光光度计在200~1000 nm波长范围内测试薄膜样品的光学透过率,并通过透射光谱计算了薄膜的光学带隙以及折射率和消光系数的色散关系.  相似文献   

2.
采用两步溶胶-凝胶法,分别在850℃,950℃和1050℃下成功制备了BaFe12O19/Ni0.Zn0.4Fe2O4复合材料,利用X射线衍射(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、振动样品磁强计(VSM)对样品的化学成分、结构、形貌、磁性能进行了表征.结果表明,钡铁氧体大部分呈片状,Ni0.6Zn0.4Fe2O4呈颗粒状分散在钡铁氧体周围.与850℃制备的钡铁氧体和镍锌铁氧体纯相纳米粉体相比,850 ℃制备的BaFe12O19/Ni06Zn04Fe2O4复合粉体的矫顽力和剩余磁化强度介于BaFe12O19和Ni0.6Zn0.4Fe2O4之间;饱和磁化强度(Ms=55.61 emu/g)比钡铁氧体(Ms=53.33emu/g)和镍锌铁氧体(Ms=54.13 emu/g)的都有提高.不同煅烧温度制备的BaFe12O19/ Ni0.6Zn0.4Fe2O4复合粉体,当烧结温度为950℃时饱和磁化强度最大(M =64.84 emu/g);是一种性能优良的磁性材料.  相似文献   

3.
采用溶胶-凝胶法在玻璃基片上旋涂生长了ZnO、Fe, Ni单掺杂及(Fe,Ni)共掺杂ZnO薄膜.产物的显微照片及XRD图谱结果表明, 该方法所制备的ZnO薄膜表面均匀致密,都存在(002)择优取向,具有六角纤锌矿结构,晶粒尺寸平均在13 nm 左右,振动样品磁强计(VSM)测试结果显示掺杂ZnO薄膜均存在室温铁磁性.光致发光(PL)测量表明所有样品薄膜的PL谱主要由较强的紫外发光峰(394 nm)、蓝光峰(420 nm)、绿光峰(480 nm)组成.Fe、Ni单掺杂和共掺杂并不改变ZnO薄膜的发光峰位置,但掺杂后该紫外发光峰减弱,420 nm处的蓝光峰增强.  相似文献   

4.
采用脉冲激光沉积法在Si(100)衬底上制备了Ni0.7Zn0.3O薄膜,通过热处理改变薄膜的缺陷状态,并利用X射线衍射仪、扫描电子显微镜和荧光光谱仪表征薄膜的晶体结构、表面形貌和缺陷发光特性.结果表明:沉积态薄膜为立方结构的Ni0.7Zn0.3O单相,且沿着(200)面高度取向生长.经过热处理后,薄膜形成ZnO和Ni0.7Zn0.3O两相共存的镶嵌结构.样品具有非常丰富的室温荧光光谱,其发光峰主要来自Ni0.7Zn0.3O的缺陷能级跃迁,多缺陷能级导致了多发光峰的荧光光谱.热处理引起薄膜中缺陷的种类和浓度发生变化,严重影响其发光特性.  相似文献   

5.
采用超声波辅助沉淀法在不同条件下制备了多组纳米氢氧化镍,用X射线衍射仪对样品晶相结构进行了测试分析.结果表明,反应条件如镍源、掺杂元素、缓冲剂、制备方法都对Ni(OH)2晶相有较大影响.镍源或缓冲剂较大的阴离子半径有助于α-Ni(OH)2的形成;二元掺杂比单元掺杂时其产物α-Ni(OH)2比例高;掺杂离子的种类、半径、价态都直接影响Ni(OH)2的晶相.本文还对微乳液法和超声波辅助沉淀法制备的样品进行了对比分析.  相似文献   

6.
液相沉积法制备(004)取向的TiO2薄膜   总被引:1,自引:0,他引:1  
张欣  徐海燕  陈博 《人工晶体学报》2016,45(5):1416-1420
采用液相沉积法(LPD)制备二氧化钛薄膜,探索pH值对二氧化钛薄膜样品成份、结构和性能的影响,利用XRD、FESEM、UV等方法对薄膜的结构、形貌以及光学特性进行表征.结果表明LPD制备的二氧化钛薄膜为锐钛矿相,可见光透过率高达80;,具有明显的(004)取向;薄膜的结构和光学特性依赖沉积液pH值,pH=2.03时所制备的薄膜取向性最佳,柱状晶粒排列整齐.  相似文献   

7.
采用水热法成功制备了不同浓度的Zn1-xNixO(x =0,0.01,0.05,0.10,0.20)稀磁半导体材料,并利用X射线衍射(XRD)、透射电子显微镜(TEM)、选区电子衍射(SAED)、X射线能量色散分析(XEDS)、拉曼(Raman)光谱和振动样品磁强计(VSM)对其晶体结构、形貌、组成元素和磁学性能等进行表征,实验结果表明,本方法所制备的不同掺杂浓度的Zn1-xNixO稀磁半导体样品具有结晶良好的纤锌矿结构,没有杂峰出现,样品中的Ni2+全部进入ZnO晶格中替代了部分Zn2+的格点位置,生成单一相的Zn1-xNixO,样品形貌都为纳米棒状结构,分散性良好.Zn1-xNixO样品在室温条件下存在明显的铁磁性,饱和磁化强度都随着Ni2+掺杂量的增加而呈现出先增加后减小的趋势,同时样品的单个镍原子的磁矩是逐渐下降的.  相似文献   

8.
采用传统固相烧结法制备了Pb0.92Sr0.08-xBax(Sb2/3 Mn1/3)005Zr0.48Ti0.47O3(PSBSM-PZT)压电陶瓷样品.研究了不同Sr2+、Ba2+掺杂含量对样品的相结构、微观形貌、压电和介电性能的影响.结果显示:所有样品均为钙钛矿结构.而当x=0.02~0.06时,陶瓷样品组分位于准同型相界区(MPB).由于位于准同型相界区域的陶瓷样品对于电畴的转向具有促进作用,所以处于MPB区域的陶瓷样品具有较大的压电和介电性能,但同时由于电畴转向带来的较大内摩擦和结构损耗,从而提高了材料的机械损耗和介电损耗.当x=0.02时的陶瓷样品获得最佳的综合性能:d33=346 pC/N,kp=0.58,Qm=1217,εr=1724,tanδ=0.774;.  相似文献   

9.
采用电沉积法在ITO导电玻璃表面沉积了PbS薄膜,并用X射线衍射仪(XRD)、原子力显微镜(AFM)以及傅立叶变换红外光谱仪(FT-IR)对薄膜的结构和光学性能进行了表征,研究了沉积温度对薄膜的相组成、显微形貌以及光学性质的影响.结果表明:在U=3 V,pH=2.5,T=60 ℃,沉积时间为20 min,加入EDTA作络合剂的情况下,可制备出沿(111)和(200)晶面取向生长的立方相PbS薄膜.薄膜显微结构均匀而致密,随着反应温度从20 ℃增加到60 ℃,薄膜内的压应力逐渐减小,禁带宽度也随着变小.所制备的微晶PbS薄膜的禁带宽度约为0.39 eV.  相似文献   

10.
采用固相法制备了(Ba0.85Ca0.15)(Ti1-xZrx)O3(BCTZ)无铅压电陶瓷,研究Zr含量(x=0~0.15)对BCTZ陶瓷微观结构和电性能的影响。结果表明:所有样品均具有纯的钙钛矿结构;随Zr含量的增加,室温下样品逐渐由四方相向三方相转变,在0.05相似文献   

11.
The models for calculation of phase diagrams of semiconductor thin films with different substrates were proposed by considering the contributions of strain energy, the self-energy of misfit dislocations and surface energy to Gibbs free energy. The phase diagrams of the AlxIn1−xAs and AsxSb1−xAl thin films grown on the InP (1 0 0) substrate, and the AlxIn1−xSb thin films grown on the InSb (1 0 0) substrate at various thicknesses were calculated. The calculated results indicate that when the thickness of film is less than 1 μm, the strain-induced zinc-blende phase appears, the region of this phase extends with decreasing of the layer thickness, and there is small effect of surface energies of liquid and solid phases on the phase diagrams.  相似文献   

12.
The elastic properties of GexAsySe100−xy (0x30; 10y40) glasses have been studied. The results were analyzed in terms of the dependence on the theoretical mean coordination number (mean number of covalent bonds per atom) m (m=2+(2x+y)×0.01). Three ranges of m (2.1m2.51, 2.51<m2.78, 2.78<m3) were revealed, where different dependencies of elastic moduli (Young’s modulus, shear modulus) and Poisson’s ratio of glasses on m were observed.  相似文献   

13.
14.
15.
NdAl3(BO3)4 single crystals were grown by the flux method and the TSSG technique using a K2O/3MoO3/B2O3/0.5Nd2O3/KF flux system. Light-violet clear crystals could be obtained. The effects of fluoride on the growth of NAB crystals were investigated. As the content of KF was gradually increased, the growth form of NAB was changed from the equant to the columnar and the primary crystalline region of NAB was shrinked. At the ratio of KF/K2O = 0.75, NAB crystals could not be grown.  相似文献   

16.
The crystallization behaviours of Co100?1(x+y)NbxBy amorphous alloys were investigated by means of differential thermal analysis and a conventional X-ray diffractometer. The crystallization sequences are discussed in terms of the equilibrium phase diagram of the ternary alloy system.Assuming crystallization occurs as a result of nucleation and growth, the stabilizing effect of eutectic phase separation on the crystallization is shown by introducing the effective free energy of the critical nucleus.  相似文献   

17.
The vapour growth of InAs1-xPx layers has been carried out by the hydride process. The phosphorus rich part of the system (0.7 ? x ? 1) was especially investigated. Heteroepitaxial deposits of InAs1-xPx and InP have been performed on substrates such as InAs, GaAs and GaP. A systematic study of the influence of the substrate orientation on the quality of the layer has been carried out by growth on hemispherical substrates. Preferential planes have been pointed out: (100) and (111) A for InAs, (111) for GaAs and GaP. The band gap variation as a function of the composition has been determined by photoluminescence at 4.2 °K and X-ray diffraction measurements. It fits the equation: EG(x) eV = 0.425 + 0.722 x + 0.273 x2 at 4.2 °K.  相似文献   

18.
The Mott T?14 law for the dc hopping conductivity for amorphous semiconductors is derived from the rate equation formalism by using the methodology of Butcher and Hayden. This formula is then fitted to the experimental data for a-Si, a-Ge, partially compensated heavily doped n-type Ge and polymer PPIB at 640 atmospheric pressures. It is found that the “simplified Butcher formula” approximately fits the experimental data for a-Si and a-Ge. The values of the density of states at the Fermi level calculated from the expression for the prefactor of this formula are much more reasonable values than those obtained from the original Mott formula. The origin of this significant improvement is found to lie not in improved approximations but in the choice of the values of the characteristics frequency R0.  相似文献   

19.
Three polycrystalline bismuth-containing layered perovskite-like oxides are synthesized by high-temperature solid-state reactions. One of these compounds was described previously, namely, Bi3Ti1.5W0.5O9, for which the unit cell parameters a = 5.372(5) Å, b = 5.404(4) Å, and c = 24.95(2) Å are determined in this study. The other two compounds, namely, Na0.75Bi2.25Nb1.5W0.5O9 with the unit cell parameters a = 5.463(1) Å, b = 5.490(7) Å, and c = 24.78(0) Å and Ca0.5Bi2.5Ti0.5Nb1.5O9 with the unit cell parameters a = b = 3.843(2) Å and c = 24.97(6) Å, are synthesized for the first time. The compositions of these compounds are based on the composition of the well-known compound Bi3TiNbO9 with a high Curie temperature (T C = 1223 K), in which bismuth, niobium, and titanium atoms are partially or completely replaced by other atoms. The experimental and calculated interplanar distances determined from the X-ray diffraction patterns of the studied compounds are presented. __________ Translated from Kristallografiya, Vol. 50, No. 1, 2005, pp. 59–64. Original Russian Text Copyright ? 2005 by Geguzina, Shuvaev, Shuvaeva, Shilkina, Vlasenko.  相似文献   

20.
Glasses in the system Na2O/B2O3/Al2O3/In2O3 were melted and subsequently tempered in the range from 500 to 700 °C. Depending on the chemical composition, various crystalline phases were observed. From samples without Al2O3, In2O3 could not be crystallized from homogeneous glasses, because either spontaneous In2O3 crystallization occurred during cooling, or other phases such as NaInO2 were formed during tempering. The addition of alumina, however, controlled the crystallization of In2O3. Depending on the crystallization temperature applied, the crystallite sizes were in the range from 13 to 53 nm. The glass matrix can be dissolved by soaking the powdered glass in water. This procedure can be used to prepare nano-crystalline In2O3-powders.  相似文献   

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