p-i-nInP/In_(0.53)Ga_(0.47)As/InP探测器结构优化

利用半导体仿真工具Silvaco对p-i-n InP/In_(0.53)Ga_(0.47)As/InP近红外光探测器进行优化仿真.参考实际器件对红外探测器进行建模,并将其暗电流、光谱响应仿真结果与实验结果进行拟合,保证仿真结果的有效性.以减小探测器的暗电流为目的,优化其结构.针对探测器吸收层厚度和吸收层掺杂浓度对暗电流、光响应的影响进行研究,发现当吸收层厚度大于0.3μm后,暗电流不再上升,但光响应随着吸收层厚度的增加而增大;当吸收层掺杂浓度不断上升时,器件暗电流不断降低,当掺杂浓度上升到2×1017/cm3时,暗电流达到最低值.本文还研究了p-i-n型探测器的瞬态响应,探究了响应速度与反偏电压之间的关系,发现提高反偏电压能减小探测器响应时间.     

MSM结构Mg0.2Zn0.8O可见盲光电探测器

采用射频磁控溅射,通过传统的紫外曝光和湿法腐蚀的方法,制备了不同电极间距的金属-半导体-金属(MSM)结构Mg0.2Zn0.8O可见盲光电探测器.研究了器件的暗电流和响应度随电极间距的变化关系,当施加的电压没有达到贯穿电压的时候,暗电流和响应度均随着电极间距的增加而减小,并对其具体的机制进行了研究.     

ZnO单晶和BeZnO合金的生长及其紫外探测器研究

用分子束外延(MBE)的方法在c面蓝宝石衬底上生长出了高质量的ZnO单晶薄膜和BexZn1-xO合金薄膜。X射线光电子能谱(XPS)测试结果表明,合金材料中Be元素的摩尔分数分别为1.8%、4.9%、8.0%和15.3%。在此基础上制备了ZnO基和BexZn1-xO基的金属-半导体-金属(MSM)结构紫外探测器。ZnO单晶探测器的响应波长为375nm,在1V电压下,350nm处的光响应度高达43A/W,光电流和暗电流之比达到105量级。在BexZn1-xO基紫外探测器中,其截止响应波长随着合金中Be含量的增加逐渐蓝移,其中Be0.153-Zn0.847O合金探测器的截止响应波长为366nm,紫外波段和可见波段的光电流之比达到2~3个数量级,具有良好的信噪比。此外,提出了氧气等离子体表面处理降低探测器暗电流的方法,并使ZnO单晶探测器的暗电流降低了4个数量级。     

低暗电流InGaAs-MSM光电探测器

MSM(金属-半导体-金属)型光电探测器的较低寄生电容和高带宽的特点使得其应用广泛,可用于空间通信、遥感等多方面,但暗电流偏大仍是制约其发展的重要因素.为此,本文研制了100×100μm2面积的InGaAs-MSM光电探测器,通过设计InAlGaAs/InGaAs短周期超晶格和InAlAs肖特基势垒增强结构,将器件暗电流密度降至0.6pA/μm2(5V偏置),改善了目前同类器件的信噪比.对器件光电参数进行了表征:3dB带宽6.8GHz,上升沿58.8ps,1550nm波段响应度0.55A/W,光吸收区域外量子效率88%.分析了短周期超晶格和肖特基势垒增强层对暗电流的抑制机理.     

ZnO基紫外探测器的制作与研究

利用新型的等离子体辅助金属有机化学气相沉积(P-MOCVD)系统在蓝宝石、硅等衬底上生长出具有单一c轴取向、高阻的ZnO薄膜,利用添加的等离子体发生装置,进行氮掺杂获得高阻ZnO薄膜。利用ZnO的宽禁带与高光电导特性,结合MSM(金属-半导体-金属)结构器件响应度高、速度快、随偏压变化小、工艺简单、易于单片集成等优点,制作了ZnO基紫外探测器,器件规格为80 μm×100μm,电极为叉指式电极。测试中采用500 W的氙灯做测试光源,探测器的Ⅰ-Ⅴ特性曲线显示;正向偏压下探测器的暗电流及光照电流与外加偏压呈线性增长。不同波长下的响应曲线显示:探测器对紫外波段有响应,响应峰值在375nm附近。     

GaN基p-i-n和肖特基紫外探测器的响应光谱及暗电流特性

研究了p-i-n型和肖特基型Ga N基紫外探测器的响应光谱和暗电流特性。实验发现,随着p-Ga N层厚度的增加,p-i-n型紫外探测器的响应度下降,并且在短波处下降更加明显。肖特基探测器的响应度明显比pi-n结构高,主要是由于p-Ga N层吸收了大量的入射光所致。肖特基型紫外探测器的暗电流远远大于p-i-n型紫外探测器的暗电流,和模拟结果基本一致,主要是肖特基型探测器是多子器件,而p-i-n型探测器是少子器件。要制备响应度大、暗电流小的高性能Ga N紫外探测器,最好采用p-Ga N层较薄的p-i-n结构。     

1 MeV电子辐照对短波Hg1-xCdxTe光伏探测器的影响

 研究了1 MeV电子辐照对短波Hg_1-xCd_xTe光伏探测器的影响。通过测试电子辐照前后光伏探测器的响应光谱、信号、噪声、暗电流等性能参数，分析了电子辐照对Hg_xCdxTe光伏器件的影响机制。实验结果发现：电子辐照后器件响应光谱在短波处有变窄的趋势，但响应峰值波长和截止波长基本无变化；随着辐照剂量的增加，通过p-n结的暗电流有所增加，光伏器件的探测率有减小的趋势。     

采用Al/TaN叠层电极提高Si基Ge PIN光电探测器的性能

金属与Ge材料接触由于存在强烈的费米钉扎效应, 导致金属电极与n型Ge接触引入较大的接触电阻, 限制了Si基Ge探测器响应带宽. 本文报道了在SOI衬底上外延Ge单晶薄膜并制备了不同台面尺度的Ge PIN光电探测器. 对比了电极分别为金属Al和Al/TaN叠层的具有相同器件结构的SOI基Ge PIN光电探测器的暗电流、响应度以及响应带宽等参数. 发现在Al与Ge之间增加一薄层TaN可有效减小n型Ge的接触电阻, 将台面直径为24 μ的探测器在1.55 μ的波 长和-1 V偏压下的3 dB响应带宽提高了4倍. 同时, 器件暗电流减小一个数量级, 而响应度提高了2倍. 结果表明, 采用TaN薄层制作金属与Ge接触电极, 可有效钝化金属与Ge界面, 减轻费米钉扎效应, 降低金属与n-Ge接触的势垒高度, 因而减小接触电阻和界面复合电流, 提高探测器的光电性能.     

采用AI／TaN叠层电极提高Si基GePIN光电探测器的性能

金属与Ge材料接触由于存在强烈的费米钉扎效应,导致金属电极与n型Ge接触引入较大的接触电阻,限制了si基Ge探测器响应带宽．本文报道了在SOI衬底上外延Ge单晶薄膜并制备了不同台面尺度的GePIN光电探测器．对比了电极分别为金属Al和A1／TaN叠层的具有相同器件结构的SOI基GePIN光电探测器的暗电流、响应度以及响应带宽等参数．发现在Al与Ge之间增加一薄层TaN可有效减小n型Ge的接触电阻,将台面直径为24um的探测器在1．55um的波长和-1V偏压下的3dB响应带宽提高了4倍．同时,器件暗电流减小一个数量级,而响应度提高了2倍．结果表明,采用TaN薄层制作金属与Ge接触电极,可有效钝化金属与Ge界面,减轻费米钉扎效应,降低金属与n-Ge接触的势垒高度,因而减小接触电阻和界面复合电流,提高探测器的光电性能．     

不同钝化结构对非极性AlGaN-MSM紫外探测器性能的提升

在r面蓝宝石衬底上,采用金属有机化学气相沉积（MOCVD）法高温生长了未掺杂非极性AlGaN半导体薄膜,在此基础上制备了金属-半导体-金属（MSM）结构的紫外探测器。系统研究了在AlGaN半导体薄膜表面分别磁控溅射SiO₂纳米颗粒与SiO₂钝化层两种钝化手段对非极性AlGaN-MSM结构的紫外探测器性能的影响。实验结果表明：磁控溅射SiO₂纳米颗粒钝化或SiO₂钝化层两种手段都能提升AlGaN-MSM结构紫外探测器性能。暗电流测试表明,SiO₂纳米颗粒和SiO₂钝化层可使器件暗电流下降1~2个数量级,达到nA量级。光谱响应测试发现,在5 V偏压下,探测器在300 nm处具有陡峭的截止边,这表明其具有很好的深紫外特性,光谱响应提高了10³倍,紫外可见抑制比高达10⁵。     

一种减小GaN基肖特基结构紫外探测器暗电流的方法

提出了一种减小GaN肖特基结构紫外探测器暗电流的方法.该方法是在普通的GaN肖特基结构的表面增加一层薄的p-GaN.模拟计算结果表明,该层p-GaN能增加肖特基势垒高度,从而减小了器件的暗电流,提高了器件性能.进一步的计算还发现,对于p型载流子浓度较高的情况下,只需要很薄的一层p-GaN就能显著增加肖特基势垒高度,对于p型载流子浓度较低的情况下,则需要较厚的一层p-GaN才能有较好的肖特基势垒高度增加效果. 关键词： GaN 肖特基结构 紫外探测器 暗电流     

Simulation of the Metal-Semiconductor-Metal photodetector based on InGaAs for the photodetection at the wavelength 1.55 μm

In this paper we present the simulation of Metal-Semiconductor-Metal photodetector (MSM-PD) of interdigitated planar structure based on InAlAs/InGaAs adapted for photodetection at the wavelength 1.55 μm. We use the theoretical models to plot the variations of the dark current, the photocurrent, the capacity, and the cut-off frequency of the photodetector as a function of bias voltage and the interelectrode distance. The obtained results show a very low dark current, mainly due to the introduction of a thin layer to increase the Schottky barrier based on In_0.52Al_0.48As in the epitaxial structure of component. The obtained photocurrent and cut-off frequencies are very appreciable, these latter are mainly limited by the transit time of the photo-generated carriers given the low component capacity obtained by simulation.     

Analytical Simulation of an InAsSb Photovoltaic Detector for Mid-Infrared Applications

A generic model of a mid-infrared photodetector based on a narrow bandgap semiconductor has been developed. The model has been applied for analysis and simulation of an InAs_0.89Sb_0.11 photovoltaic detector for operation at room temperature in 2–5 μm wavelength region. The model takes into account the effect of tunneling and other components of dark current on the detectivity of the device by considering all the three dominant recombination mechanisms e.g., radiative, Shockley-Read-Hall and Auger recombination. The study revealed that the dark current of the photodetector under reverse bias is dominated by trap-assisted tunneling component of current and this causes the detectivity of the device to decrease at high reverse bias. It is further concluded that by operating the device at a suitable low reverse bias it is possible to improve the room-temperature detectivity significantly as compared to its value at zero bias.     

p-GaN层厚度对GaN基p-i-n结构紫外探测器性能的影响

研究了p-GaN层厚度对GaN基pin结构紫外探测器性能的影响.模拟计算表明：较厚的p-GaN层会减小器件的量子效率,然而同时也会减小器件的暗电流,较薄的p-GaN层会增加器件的量子效率,但是同时也增加了器件的暗电流.进一步的分析表明,金属和p-GaN之间的结电场是出现这种现象的根本原因.在实际的器件设计中,应该根据实际需要选择p型层的厚度. 关键词： GaN 紫外探测器 量子效率 暗电流     

Large area InAlAs/InGaAs metal semiconductor metal photodiode with very low dark current and its frequency response

An MBE grown InGaAs metal semiconductor metal (MSM) photodiode (PD) with an InAlAs barrier enhancement layer is reported that has very low dark current and high speed characteristics. The detector using Cr/Au Schottky metal fingers with 4m spacing on a large active area of 300×300m2 shows a low dark current of 38nA at 10V. This corresponds to a dark current density of 0.42pA/m2 and is, to our knowledge, the best dark current ever obtained from a large area InGaAs MSM PD. The device also shows a low capacitance of 0.8pF and a high 3dB bandwidth of 2.4GHz. By fitting the measured frequency response to a model consisting of both RC time and transit time limited responses, we show that the device has an RC time and a transit time limited 3dB bandwidth of 3.0 and 4.9GHz, respectively. This revised version was published online in June 2006 with corrections to the Cover Date.     

硅基波导与GeSi／Si超晶格探测器之间光电集成器件的研制

用分子束外延法将ＧｅＳｉ／Ｓｉ超晶格结构生长在ｎ＾＋／ｎ Ｓｉ材料上，先后用反应离子刻蚀法形成探测器波志和硅脊波导，经适当工艺实现硅波导与ＰＩＮ探测器之间的光电集成，５Ｖ偏压下ＰＩＮ控制器的最小暗电流为０．８μＡ，最大光响应电流为２．７μＡ，最大总量子效率为１４％，工作波长为λ＝１．３μｍ。     

Terahertz frontside-illuminated quantum-well photodetector

We have demonstrated the operation of a frontside-illuminated GaAs/AlGaAs quantum-well photodetector based on intersubband absorption in a quantum well (QW) with a targeted peak frequency of 3 THz. A multiple-quantum-well structure consists of 20 periods of 18 nm QWs interleaved by 80 nm barriers with an Al alloy content of 2%. We measured the following performance characteristics: dark current, responsivity, and spectral response. A responsivity of 13 mA/W at an electric bias of 40 mV and an operating temperature of 3 K was obtained with a peak response close to the designed detection frequency. The dark current density was a few microA/cm2 and was limited by thermally assisted tunneling through the barriers. We looked also at possible designs to optimize the device's performance.     

Electrical,optical and spectral characteristics of type-II ZnSe/ZnTe/GaAs superlattice and MSM-photodetector on their base

We report on growth, fabrication and characterization of the metal–semiconductor–metal (MSM) photodiode based on type-II ZnSe/ZnTe heterostructure. Heterostructure was grown on semi-insulating GaAs substrates by MOVPE. For the first time we present the results of experimental investigations of the MSM photodetector on the base of type-II ZnSe/ZnTe superlattice. The MSM-photodetector demonstrates very low dark current, high current sensitivity and external quantum efficiency. The maximum photoresponse of the MSM-detector at the wavelength 620 nm corresponds to current sensitivity 0.22 A/W and external quantum efficiency 44%. Photoresponse of the MSM-detector shows two peaks of response located at 620 nm and 870 nm. ZnSe/ZnTe type-II superlattice structure reduces the MSM-diode dark current significantly. For the MSM-diode with finger width and gap of 3 µm and 100?×?100 µm² photosensitive area we have obtained dark current density 10^?8 A/cm² at room temperature.     

结构参数对GaN肖特基紫外探测器性能的影响及器件设计

研究了GaN肖特基结构(n^--GaN /n⁺-GaN)紫外探测器的结构参数对器件性能的影响机理。模拟计算结果表明:提高肖特基势垒高度和减小表面复合速率,不仅可以增加器件的量子效率,而且可以极大地减小器件的暗电流;适当地增加n^--GaN层厚度和载流子浓度可以提高器件的量子效率,但减小n^--GaN层的载流子浓度却有利于减小器件的暗电流。我们针对实际应用的需要,提出了一个优化器件结构参数的设计方案,特别是如果实际应用中对器件的量子效率和暗电流都有较高的要求,肖特基势垒高度应该≥0.8 eV,n^--GaN层的厚度≥200 nm,载流子浓度1×10¹⁷ cm^-3 左右,表面复合速率＜1×10⁷ cm/s。