二次阳极氧化方法制备有序多孔氧化铝膜

通过二次阳极氧化方法制备多孔氧化铝膜与一次阳极氧化方法制备多孔氧化铝膜孔排布规律性的对比 ,结果发现 ,二次阳极氧化方法制取的多孔氧化铝膜孔排布规律性明显好于一次阳极氧化法制取的多孔膜 .在几个微米范围内 ,孔呈理想的六角排布 .去除一次阳极氧化膜后 ,二次阳极氧化得以在更良好的表面进行 ,制取的氧化铝膜孔规律性和有序度更高 .有序区域的尺寸与晶粒内的亚晶大小有一定关系     

铝阳极氧化多孔膜制备及Eu3+组装

在草酸体系中,采用二次阳极氧化法可制备大面积有序铝阳极氧化多孔膜(AAO),用X射线粉末衍射(XRD)仪进行物相分析,利用扫描电子显微镜(SEM)表征多孔膜的形貌。研究表明,低温条件下制备的多孔膜孔径大小分布均匀,有序性好。微孔在膜的表面沿二维空间规则排列,具有一定的六方对称准周期性。孔道相互平行且与铝基底垂直。低温条件下,草酸体系中电解获得的AAO膜以无定形结构存在,经过800℃高温退火后转化为γ-Al2O3。通过水热反应法,获得了Eu^3 的铝阳极氧化多孔膜组装体(AAO：Eu^3 ),研究了组装体系的光谱特性。结果表明,这种方法制备的发光材料具有非常高的组装浓度,其发光具有很高的色纯度。     

铝阳极氧化过程中氢对氧迁移影响的理论研究

为了研究铝阳极氧化过程中离子在阳极反应中的行为，利用第一性原理研究了氢原子对氧原子在铝(111)表面的吸附迁移行为的影响及氧原子向铝晶体内部的渗透行为的影响.结果表明，由于“抽象”(abstract)效应，氢原子的存在大大降低了氧进入铝晶体的能垒.氢原子的引入也影响了氧原子在铝晶体中的扩散，这可以显著降低氧原子在四面体间隙位置之间迁移的活化能(从1.23eV到0.35eV).这些结论助于我们了解阳极氧化过程和离子迁移过程.     

结构异化对二重光栅辐射特性影响

微机械技术的发展使微结构加工得以实现。但实际加工常与理论设计间存在加工误差,实际工作环境亦会使工件发生氧化等结构异化,使得理论期望难以实现.本文采用严格耦合波分析(RCWA)法研究了氧化膜及加工误差对微尺度二重铝光栅光学特性产生的影响.结果表明,氧化膜的产生将较大削弱二重光栅光学特性调节优势,且主要散热对应温度也将随氧化膜产生而发生变化.对于加工误差,下部凹槽内角所产生的影响为主导作用,应在加工过程中避免.     

不同分枝结构多孔氧化铝膜的制备和光学特性

在阳极氧化铝的制备过程中,采用二次氧化方法,通过降低二次氧化过程中的电压,使之变为初始电压的1n,得到了具有n个分枝结构的纳米孔径的氧化铝膜.利用岛津UV3101分光光度计测试了样品的透射光谱与偏振光谱.结果表明,在可见和近红外波段,线型孔径结构的多孔铝膜比Y型和枝状结构的多孔铝膜具有更好的透射性能,在偏振性能方面也有优势,更适合作含金属微偏振器件的膜板材料.     

刚性衬底上铜铟硒纳米棒阵列的合成与表征

在覆盖有钨电极的硅衬底上利用多孔阳极氧化铝模板为生长掩膜电沉积合成垂直排列的铜铟硒纳米棒阵列. 多孔阳极氧化铝模板由阳极氧化磁控溅射制备的铝膜制成. 扫描电子显微镜结果表明,该纳米棒阵列结构致密,直径约100 nm长度约1μm,纵横比为10. X射线衍射、微区拉曼光谱和高分辨透射电子显微镜结果表明,真空条件下450 oC退火处理的铜铟硒纳米棒是多晶纯相的黄铜矿结构的铜铟硒,在纳米棒轴向方向上有比较大的晶粒尺寸. 能量色散X射线光谱表明,铜铟硒纳米棒的化学组成接近InSe₂的化学计量比,由吸收光谱分析推算铜铟硒纳米棒带隙为0.96 eV.     

狭缝宽度与取样间隔对镶嵌铜多孔铝膜透射光谱的影响

用阳极氧化的方法制备了阳极氧化铝膜，向其孔中镀入了铜，制备了镶嵌铜多孔铝膜。为了研究狭缝宽度与取样间隔对其透射光谱的影响，利用岛津UV－3101型分光光度计，测得了相同取样间隔不同狭缝宽度和相同狭缝宽度不同取样间隔情况下镶嵌铜多孔铝膜的透射光谱，并分析了狭缝宽度和取样间隔对透射曲线的影响，得到了测试镶嵌铜多孔铝膜所需合适的狭缝宽度和取样间隔。测试结果表明：对镶嵌铜多孔铝膜而言，在可见光波段选择3nm的狭缝宽度和0.5nm或1nm的取样间隔为宜；在近红外波段选择5nm或8nm的狭缝宽度和2 nm的取样间隔为宜。     

含分枝铜纳米线多孔铝膜的偏振特性

利用二次阳极氧化法制备了具有分枝结构的多孔铝(PAA)模板,并以交流电化学沉积的方法在该模板中合成了分枝状的铜纳米线。用SEM观察样品的形貌结构,用分光光度计测量了样品的透射光谱和偏振光谱。实验结果表明,含分枝状铜纳米线结构的多孔铝膜在近红外光区具有较高的透射率,且得到了14～22 dB的消光比。这种微偏振器件制备方法简单、效率高、造价低,在光电集成领域有着广泛的应用前景。     

多孔阳极氧化物的形成效率与纳米孔道的形成机理

多孔型阳极氧化铝（PAA）和多孔阳极氧化钛纳米管因其在诸多领域的广泛应用而备受关注．然而这类多孔阳极氧化物中纳米孔道的形成机理至今还不清楚,阳极氧化过程中电流一时间曲线与多孔形貌之间的关系至今无法解释．本文从致密型阳极氧化铝（CAA）的击穿机理入手,详细对比了CAA和PAA形成过程的区别与内在联系,从两种氧化膜电流．时间曲线（或电压一时间曲线）的分界点这个全新视角入手,找出了阳极氧化过程中氧化物形成效率下降的本质原因是电子电流的产生和氧气的析出．在CAA中球形孔洞的证据充分说明初期的规则孔洞是氧气气泡形成的．铝在混合电解液中阳极氧化的结果表明,一旦氧气析出停止,孔道生长就停止并被致密型的氧化物覆盖,一种新型的复合型氧化膜由此而得．最终结果表明：在PAN的形成过程中,适当的电子电流是氧气析出和孔洞形成的保证,适当的离子电流是氧化物形成和孔壁生长的保证．     

具有可渗透阳极的自呼吸微流体燃料电池性能特性

微流体燃料电池去除了质子交换膜,避免了膜退化、水管理等问题,是微型燃料电池领域新的研究热点。本文构建了具有可渗透阳极和空气自呼吸阴极的微流体燃料电池,采用甲酸溶液作为燃料对其性能特性进行了实验研究。结果表明:具有可渗透阳极的自呼吸微流体燃料电池性能随燃料浓度或流量的增加先升高后下降,随电解液浓度的增加而升高;阳极侧反应产生的CO₂气泡对自呼吸微流体燃料电池的性能和燃料利用率的影响较大,适当提高燃料流量有利于气泡的排除。     

Controllable fabrication of highly ordered thin AAO template on Si substrate for electrodeposition of nanostructures

In this work, simple fabrication of hexagonally highly ordered porous anodic aluminum oxide (AAO) of Al thin film (1 μm) on Si substrate is described using two-step anodization method for electrochemical synthesis of nanostructures. In this method, the templates were prepared under the controllable conditions of the parameters, which give rise to the possibility of highly ordered nanopore arrays with a well aspect ratio. Pore widening was then fulfilled in 5 wt% phosphoric acid solution at 25 °C. The pore diameter and spacing are proportional to the applied voltage, which is due to the mechanical stress associated with the volume expansion of the aluminum during the anodization according to the mechanical stress model. Pore-widening solution adjusted the pore diameter and thinned the AAO barrier layer at room temperature under the control of etching time. As an application, Cu nanorods arrays embedded in anodic alumina (AAO) template were fabricated by dc electrodeposition. The characterization of the AAO templates and the Cu nanorods produced was made by X-ray diffraction, field emission scanning microscope, energy dispersive X-ray spectroscopy and atomic force microscope (AFM). The images of AFM show that porous AAO template under constant voltage is 40 V which presents the optimum ordering.     

Surface segregation of Al substrate metal on Zr film surface

Segregation of substrate Al on thin Zr film, Zr/Al/Al system was investigated by heating the specimen in a UHV chamber. Dual-cathode magnetron-sputtering source was used for deposition of Zr film as well as thin Al film to avoid aluminum oxide formation at Zr/Al interface. Al segregates on Zr film surface at 730 K. It was found that oxide-free interface between film and substrate is important for segregation in Al system. The diffusion coefficient calculated for surface segregation and inter-metallic compound showed that the grain boundary diffusion and bulk diffusion are very close in Zr/Al/Al system. Hence, it is important to control specimen heating to cause surface segregation by grain boundary diffusion.     

Gradient porous alumina films with different pore distributions by anodization of aluminum

In this paper, gradient porous alumina films with different pore distributions are fabricated by asymmetrical anodization of Al foils. When an insulating baffle is inserted close to the anode, depending on the shape of the baffle, the current density distribution on the Al foils can be varied. Two kinds of porous alumina films with different pore distributions are fabricated by this method. This bottom-up approach of asymmetrical anodization of Al foil provides us with a low-cost method to fabricate large-size gradient porous structures with different pore distributions.     

Matrix of rectangular pores obtained by AFM nanoindentation and electrolytic oxidation of Al

AFM nanoindentation is used for pretexturing of Al sample intended for anodic oxidation in porous film-forming electrolytes. The rectangular quadratic and non-quadratic matrices of nanoindents were made by means of an AFM with diamond tip. The period of the 2D array of nanoindented concaves ranged from ∼50 to ∼370 nm. The pitch of the holes ranged from 13 to 170 nm. After anodization in water solutions of three different acids (0.3 M sulfuric, 0.3 M oxalic and 0.3 M phosphoric) at voltages chosen according to matrix period (20, 30 and 160 V), the well-arranged matrices of rectangular pores were obtained. The rectangular symmetry of the pretextured Al surface almost ideally transferred on porous alumina matrix, maintaining the highly ordered arrangement of the pores and rectangular cross section trough the whole film thickness with high pore depth to aperture size aspect ratio. During prolonged anodization in phosphoric acid, standard cells on the boundary of nanoindented area disturbed the arrangement and shape of quadratic cells.     

Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology

Metal aluminum (Al) thin films are prepared by 2450-MHz electron cyclotron resonance plasma-assisted atomic layer deposition on glass and p-Si substrates using trimethylaluminum as the precursor and hydrogen as the reductive gas. We focus our attention on the plasma source for thin-film preparation and annealing of as-deposited films related to the surface square resistivity. The square resistivity of as-deposited Al film is greatly reduced after annealing and almost reaches the value of bulk metal. Through chemical and structure analysis we conclude that the square resistivity is determined by neither contaminant concentration nor surface morphology, but by both crystallinity and crystal size in this process.     

New route to form micro-pores on 316L stainless steel surface

In order to seek an effective way for preventing restenosis after coronary stent implantation, a proposal of increasing the amount of loaded drug without changing the size of struts was given. Thereafter, a process of fabricating in-situ formed sub-micro-pores on 316L stainless steel (316L SS) was demonstrated. An aluminum thin film was deposited by magnetron sputtering on a 316L substrate. The aluminum film was then anodized in different acids (0.3 M oxalic and 10 vol.% sulfuric) by regulating direct current power supply. Through an appropriate chemical dissolution, the anodic alumina film was removed and the underlying porous 316L was obtained. The morphology of the porous 316L surface was examined by scanning electron microscope and the composition of the pores was investigated by energy dispersive X-ray analysis. The corrosion behavior of the porous 316L was evaluated by the polarization measurement. The results indicate that the shape and size of pores could be affected evidently by the acids used in anodization. The pores density is found to change with variation of the applied voltage in anodization. The corrosion current of the anodized specimens decrease and the corrosion voltage increase, compared with the untreated specimens.     

基于液相AFM及干涉频谱法的多孔氧化铝薄膜在线测量系统研究

介绍了多孔氧化铝薄膜(PA)厚度在线测量系统的工作原理、系统结构及独特性能。在白光(宽光谱)照射下,薄膜的上表面和下表面反射的两路光线发生干涉,产生了携带薄膜光学厚度信息的反射光谱。同时,利用液相原子力显微镜(AFM)实时获得的PA膜的表面形貌信息,根据膜系统的Maxwell-Garnette有效介电常数理论,经相干势近似计算得到薄膜的有效折射率,进而得到此时PA膜的物理厚度。使用该系统对PA膜氧化制备过程进行了在线扫描和膜厚测量试验,成功的获得了PA样品的实时表面形貌图像,得到样品的孔隙率和有效折射率。并根据样品反射光谱,利用反射干涉频谱法计算得到氧化150和180 min时,PA膜厚分别为5.35和6.25 μm。本系统具有测量简便、实时性好、无损及测量精确的特点,在实时测量和监控膜厚的同时可获得样品的表面形貌、孔隙率、有效折射率等信息。     

Metal oxide buffer layer for improving performance of polymer solar cells

We report the application of aluminum doped ZnO (ZnO:Al) layer as a buffer on ITO glass for fabrication of non-inverted polymer solar cells. The ZnO:Al thin film was deposited using DC magnetron sputtering, with the thickness being varied from 23 to 100 nm. The devices showed most discernible improvements in their efficiencies when a thin layer of ZnO:Al film of thickness ∼40 nm was introduced. The observed enhancement in short circuit current density and open circuit voltage is likely attributed to the role of the ZnO:Al film as an optical tuner and an interfacial diffusion barrier. The result suggests that a metal oxide layer inserted between ITO and polymer layers can be a route for improving both efficiency and stability of polymer solar cells.     

Mechanical properties of Al/a-C nanocomposite thin films synthesized using a plasma focus device

The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.