量子限制受主的光致发光研究

对一系列δ掺杂浅受主铍（Be）原子的GaAs/AlAs多量子阱和均匀掺杂Be受主的GaAs体材料中Be原子的能级间跃迁进行了光致发光（PL）研究.实验中所用的样品是通过分子束外延技术生长的均匀掺杂Be受主的GaAs外延单层样品和一系列GaAs/AlAs多量子阱样品,并在每量子阱中央进行了Be原子的δ掺杂,量子阱宽度为30 到200 ?.在4.2 K温度下测量了上述系列样品的光致发光谱,清楚地观察到了束缚激子的受主从基态1s_3/2（Γ₆）到第一激发态 关键词： 量子限制受主 光致发光 多量子阱 δ掺杂     

量子限制受主远红外电致发光器件的制备与测量

采用分子束外延技术生长GaAs/AlAs三量子阱,并在中间的GaAs阱中δ-掺杂浅受主杂质Be原子,制作出量子限制受主远红外Teraherz原型电致发光器件.实验上测量得到4.5 K时器件的电致发光谱（EL）和电传输特性（I-V曲线）.在EL发射谱中清楚地观察到222 cm^-1处宽的尖峰,这来源于Be受主奇宇称激发态到其基态的辐射跃迁,而非辐射弛豫过程则使发射谱的信号很弱.另外在I-V曲线中072和186 V的位置出现两个共振隧道贯穿现象,分别对应于中间δ-掺杂量子阱受主能级1s_3/2(Γ₆+Γ₇)到左边非掺GaAs量子阱中HH带,及右边非掺杂GaAs量子阱中HH重空穴带到中间掺杂GaAs量子阱中Be受主杂质原子奇宇称激发态2p_5/2(Γ₆+Γ₇)能级的共振隧穿. 关键词： 量子限制效应 电致发光 共振隧穿效应 δ-掺杂GaAs/AlAs三量子阱     

量子限制受主远红外电致发光器件的制备与测量

采用分子束外延技术生长GaAs/AlAs三量子阱,并在中间的GaAs阱中δ-掺杂浅受主杂质Be原子,制作出量子限制受主远红外Teraherz原型电致发光器件.实验上测量得到4.5 K时器件的电致发光谱（EL）和电传输特性（I-V曲线）.在EL发射谱中清楚地观察到222 cm^-1处宽的尖峰,这来源于Be受主奇宇称激发态到其基态的辐射跃迁,而非辐射弛豫过程则使发射谱的信号很弱.另外在I-V曲线中072和186 V的位置出现两个共振隧道贯穿现象,分别对应于中间δ-掺杂量子阱受主能级1s_3/2(Γ₆+Γ₇)到左边非掺GaAs量子阱中HH带,及右边非掺杂GaAs量子阱中HH重空穴带到中间掺杂GaAs量子阱中Be受主杂质原子奇宇称激发态2p_5/2(Γ₆+Γ₇)能级的共振隧穿.     

δ-掺杂Be受主GaAs/AlAs多量子阱的空穴共振隧穿（英文）

三个具有不同量子阱宽度的GaAs/AlAs多量子阱结构样品通过分子束外延生长设备生长在半绝缘的(100)p-型GaAs衬底上,并且在量子阱层结构的生长过程中,在GaAs阱层中央进行了Be受主的δ-掺杂。基于这3个结构样品,通过光刻技术和半导体加工工艺制备了相应的两端器件。在4～200 K的温度范围内,我们分别测量了器件的电流-电压特征曲线,清楚地观察到了重、轻空穴通过δ-掺杂Be受主GaAs/AlAs多量子阱结构的共振隧穿现象。发现随着GaAs量子阱层宽的逐渐减小,轻空穴的共振隧穿峰向着高电压方向移动,这个结果和通过AlAs/GaAs/AlAs双势垒结构模型计算的结果是一致的。然而,随着测量温度的进一步升高,两个轻空穴共振峰都朝着低电压的方向移动,并且在150 K温度下,其中一个共振遂穿峰表现为一种振动模式。     

GaAs/AlAs量子阱中受主束缚能和光致发光

从实验和理论上,研究了量子限制效应对GaAs/AlAs多量子阱中受主对重空穴束缚能的影响。实验中所用的样品是通过分子束外延生长的一系列GaAs/AlAs多量子阱,量子阱宽度为3~20nm,并且在量子阱中央进行了浅受主Be原子的δ-掺杂。在4,20,40,80,120K不同温度下,分别对上述样品进行了光致发光谱测量,观察到了受主束缚激子从基态到激发态的两空穴跃迁,并且从实验上测得了在不同量子阱宽度下受主的束缚能。理论上应用量子力学中的变分原理,数值计算了受主对重空穴束缚能随量子阱宽度的变化关系,比较发现,理论计算和实验结果符合地较好。     

2.9THz束缚态向连续态跃迁量子级联激光器研制

采用气源分子束外延技术生长了GaAs/AlGaAs束缚态向连续 态跃迁的太赫兹量子级联激光器材料, 基于半绝缘等离子体波导工艺制作了太赫兹量子级联激光器. 测量了激光器的发射光谱和功率-电流-电压关系曲线, 研究了器件的激光特性. 器件激射频率约2.95 THz, 脉冲模式下, 最高工作温度为67 K. 连续波模式下, 阈值电流密度最低为230 A/cm², 最大光输出功率1.2 mW, 最高工作温度为30 K. 关键词： 太赫兹 量子级联激光器 分子束外延 波导     

高灵敏度Sb基量子阱2DEG的霍尔器件

用分子束外延技术将高灵敏度的InAs/AlSb量子阱结构的Hall器件赝配生长在GaAs衬底上。设计了由双δ掺杂构成的Hall器件的新结构,有效地提高了器件的面电子浓度。与传统的没有掺杂的InAs/AlSb量子阱结构的Hall器件相比,室温下器件电子迁移率从15 000 cm²·V^-1·s^-1 提高到16 000 cm²·V^-1·s^-1。AFM测试表明材料有好的表面形态和结晶质量。从77 K 到300 K对Hall器件进行霍尔测试,结果显示器件不同温度范围有不同散射机构。双δ掺杂结构形成高灵敏度、高二维电子气（2DEG）浓度的InAs/AlSb异质结Hall器件具有广阔的应用前景。     

一种基于室温工作的量子点光电探测器的微光读出和应用研究

针对量子点光电探测器线列进行微光检测研究,量子点探测器采用AlAs/GaAs/AlAs双势垒结构,GaAs宽阱中分别有一个InAs量子点(QDs)和In_0.15Ga_0.85As量子阱(QW),建立一个简单的器件模型进行分析。常温下,在632.8 nm He-Ne激光照射下,当光功率为 0.01 pW时,器件偏压-0.5 V,积分时间80.2 μs,电压响应率达到7.0×1011 V·W-1,具有非常高的灵敏度,这种光电探测器在300 K温度下可以探测光功率小于10-14 W极弱光。以这种量子点光电探测器为核心研制的高灵敏度光谱仪和分子超光谱系统结合对生物组织样本进行检测,研制了一种图谱相互验证,互为校正的生物组织光谱测量系统。     

半绝缘等离子体波导太赫兹量子级联激光器工艺研究

采用气态源分子束外延设备生长了GaAs/AlGaAs束缚态到连续态跃迁结构的太赫兹（THz）量子级联激光器（QCL）有源区结构,研究了半绝缘等离子体波导THz QCL的器件工艺,采用远红外傅里叶变换光谱仪以及探测器测量了器件的电光特性.器件激射频率为32 THz,10 K下的阈值电流密度为275 A/cm². 关键词： 太赫兹 量子级联激光器 波导 器件工艺     

量子限制效应对δ掺杂GaAs/AlAs多量子阱中铍受主态寿命的影响

采用远红外时间分辨光谱,研究了量子限制效应对δ掺杂在GaAs/AlAs多量子阱中铍（Be）受主态寿命的影响.在低温下的远红外吸收谱中,清楚地观察到了三条主要吸收线,它们分别来源于铍受主从基态到它的三个奇宇称激发态的跃迁.实验结果表明：随着量子限制效应的增强,受主激发态寿命而减少,实验测得体材料中Be受主2p激发态的寿命是350 ps,而阱宽10 nm的多量子阱中的寿命是55 ps.量子限制效应对布里渊区折叠声学声子模的影响增强了受主带内空穴与声学声子相互作用,从而加快了受主带内空穴的弛豫过程. 关键词： 量子限制效应 受主态寿命 时间分辨光谱 δ掺杂')" href="#">δ掺杂     

Excitonic transitions in Be-doped GaAs/AlAs multiple quantum well

A series of GaAs/AlAs multiple-quantum wells doped with Be is grown by molecular beam epitaxy. The photoluminescence spectra are measured at 4, 20, 40, 80, 120, and 200 K, respectively. The recombination transition emission of heavy-hole and light-hole free excitons is clearly observed and the transition energies are measured with different quantum well widths. In addition, a theoretical model of excitonic states in the quantum wells is used, in which the symmetry of the component of the exciton wave function representing the relative motion is allowed to vary between the two- and threedimensional limits. Then, within the effective mass and envelope function approximation, the recombination transition energies of the heavy- and light-hole excitons in GaAs/AlAs multiple-quantum wells are calculated each as a function of quantum well width by the shooting method and variational principle with two variational parameters. The results show that the excitons are neither 2D nor 3D like, but are in between in character and that the theoretical calculation is in good agreement with the experimental results.     

Design and Fabrication of 1.06 μm Resonant-Cavity Enhanced Reflective Modulator with GaInAs/GaAs Quantum Wells

A resonant-cavity enhanced reflective optical modulator is designed and fabricated, with three groups of three highly strained InGaAs/GaAs quantum wells in the cavity, for low voltage and high contrast ratio operation. The quantum wells are positioned in antinodes of the optical standing wave. The modulator is grown in a single growth step in an molecular beam epitaxy system, using GaAs/AlAs distributed Bragg reflectors as both the top and bottom mirrors. Results show that the reflection device has a modulation extinction of 3 dB at -4.5 V bias.     

GaAs/AlAs super-flat interfaces in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells grown on (4 1 1)A GaAs substrates by MBE

Effectively atomically flat GaAs/AlAs interfaces over a macroscopic area (“super-flat interfaces”) have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells (QWs) grown on (4 1 1)A GaAs substrates by molecular beam epitaxy (MBE). A single and very sharp photoluminescence (PL) peak was observed at 4.2 K from each GaAs/AlAs or GaAs/(GaAs) (AlAs) QW grown on (4 1 1)A GaAs substrate. The full-width at half-maximum (FWHM) of a PL peak for GaAs/AlAs QW with a well width ( ) of 4.2 nm was 4.7 meV and that for GaAs/(GaAs) (AlAs) QW with a smaller well width of 2.8 nm (3.9 nm) was 7.6 meV (4.6 meV), which are as narrow as that for an individual splitted peak for conventional GaAs/AlAs QWs grown on (1 0 0) GaAs substrates with growth interruption. Furthermore, only one sharp peak was observed for each GaAs/(GaAs) (AlAs) QW on the (4 1 1)A GaAs substrate over the whole area of the wafer (7 7 mm ), in contrast with two- or three-splitted peaks reported for each GaAs/AlAs QW grown on the (1 0 0) GaAs substrate with growth interruption. These results indicate that GaAs/AlAs super-flat interfaces have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) QWs grown on the (4 1 1)A GaAs substrates.     

基于PdSe2/GaAs异质结的高灵敏近红外光伏型探测器的制备和图像传感的应用

本文制备了一种基于PdSe₂/GaAs异质结的高灵敏近红外光电探测器，该探测器是通过将多层PdSe₂薄膜转移到平面GaAs上制成的. 所制备的PdSe₂/GaAs异质结器件在808 nm光照下表现出明显的光伏特性，这表明近红外光电探测器可以用作自驱动器件. 进一步的器件分析表明，这种杂化异质结在零偏电压和808 nm光照下具有1.16×10⁵的高开关比. 光电探测器的响应度和比探测度分别约为171.34 mA/W和2.36×10¹¹ Jones. 而且，该器件显示出优异的稳定性和可靠的重复性. 在空气中2个月后，近红外光电探测器的光电特性几乎没有下降，这归因于PdSe₂的良好稳定性. 最后，基于PdSe₂/GaAs的异质结器件还可以用作近红外光传感器.     

Far-infrared absorption studies of Be acceptors in δ-doped GaAs/AlAs multiple quantum wells

We report a far-infrared absorption study of internal transitions of shallow Be acceptors in both bulk GaAs and a series of δ-doped GaAs/AlAs multiple quantum well samples with well thicknesses of 20, 15 and 10 nm. Low temperature far-infrared absorption measurements clearly show three principal absorption lines due to transitions of Beacceptor states from the ground state to the first three odd-parity excited states, respectively. Using a variational principle, the 2p-1s transition energies of quantum confined Be acceptors are calculated as a function of the well width. It is found that the theoretical calculation of the 2p_z → 1s transitions is in good agreement with the D-like line experimental data.