量子限制受主远红外电致发光器件的制备与测量

采用分子束外延技术生长GaAs/AlAs三量子阱,并在中间的GaAs阱中δ-掺杂浅受主杂质Be原子,制作出量子限制受主远红外Teraherz原型电致发光器件.实验上测量得到4.5 K时器件的电致发光谱（EL）和电传输特性（I-V曲线）.在EL发射谱中清楚地观察到222 cm^-1处宽的尖峰,这来源于Be受主奇宇称激发态到其基态的辐射跃迁,而非辐射弛豫过程则使发射谱的信号很弱.另外在I-V曲线中072和186 V的位置出现两个共振隧道贯穿现象,分别对应于中间δ-掺杂量子阱受主能级1s_3/2(Γ₆+Γ₇)到左边非掺GaAs量子阱中HH带,及右边非掺杂GaAs量子阱中HH重空穴带到中间掺杂GaAs量子阱中Be受主杂质原子奇宇称激发态2p_5/2(Γ₆+Γ₇)能级的共振隧穿. 关键词： 量子限制效应 电致发光 共振隧穿效应 δ-掺杂GaAs/AlAs三量子阱     

GaAs/AlAs量子阱中受主束缚能和光致发光

从实验和理论上,研究了量子限制效应对GaAs/AlAs多量子阱中受主对重空穴束缚能的影响。实验中所用的样品是通过分子束外延生长的一系列GaAs/AlAs多量子阱,量子阱宽度为3~20nm,并且在量子阱中央进行了浅受主Be原子的δ-掺杂。在4,20,40,80,120K不同温度下,分别对上述样品进行了光致发光谱测量,观察到了受主束缚激子从基态到激发态的两空穴跃迁,并且从实验上测得了在不同量子阱宽度下受主的束缚能。理论上应用量子力学中的变分原理,数值计算了受主对重空穴束缚能随量子阱宽度的变化关系,比较发现,理论计算和实验结果符合地较好。     

基于量子限制的受主带间跃迁太赫兹探测器的制备与测量

使用分子束外延生长设备,在GaAs（100）衬底上生长了量子阱宽度为3 nm的GaAs/AlAs多量子阱样品,并在量子阱层中央进行了Be受主的δ-掺杂。根据量子限制受主从束缚态到非束缚态之间的跃迁,设计并制备了δ-掺杂Be受主GaAs/AlAs多量子阱太赫兹光探测器原型器件。在4.2 K温度下,分别对器件进行了太赫兹光电流谱和暗电流-电压曲线的测量。在6 V直流偏压下,空穴载流子沿量子阱层方向输运。当正入射激光频率为6.8 THz时,器件响应率为2×10^-4 V/W（2 μA/W）。通过器件的暗电流-电压曲线计算了器件全散粒噪声电流,在4.2 K、6 V直流偏压下,全散粒噪声电流为5.03 fA·Hz^-1/2。     

δ-掺杂Be受主GaAs/AlAs多量子阱的空穴共振隧穿（英文）

三个具有不同量子阱宽度的GaAs/AlAs多量子阱结构样品通过分子束外延生长设备生长在半绝缘的(100)p-型GaAs衬底上,并且在量子阱层结构的生长过程中,在GaAs阱层中央进行了Be受主的δ-掺杂。基于这3个结构样品,通过光刻技术和半导体加工工艺制备了相应的两端器件。在4～200 K的温度范围内,我们分别测量了器件的电流-电压特征曲线,清楚地观察到了重、轻空穴通过δ-掺杂Be受主GaAs/AlAs多量子阱结构的共振隧穿现象。发现随着GaAs量子阱层宽的逐渐减小,轻空穴的共振隧穿峰向着高电压方向移动,这个结果和通过AlAs/GaAs/AlAs双势垒结构模型计算的结果是一致的。然而,随着测量温度的进一步升高,两个轻空穴共振峰都朝着低电压的方向移动,并且在150 K温度下,其中一个共振遂穿峰表现为一种振动模式。     

量子限制效应对δ掺杂GaAs/AlAs多量子阱中铍受主态寿命的影响

采用远红外时间分辨光谱,研究了量子限制效应对δ掺杂在GaAs/AlAs多量子阱中铍（Be）受主态寿命的影响.在低温下的远红外吸收谱中,清楚地观察到了三条主要吸收线,它们分别来源于铍受主从基态到它的三个奇宇称激发态的跃迁.实验结果表明：随着量子限制效应的增强,受主激发态寿命而减少,实验测得体材料中Be受主2p激发态的寿命是350 ps,而阱宽10 nm的多量子阱中的寿命是55 ps.量子限制效应对布里渊区折叠声学声子模的影响增强了受主带内空穴与声学声子相互作用,从而加快了受主带内空穴的弛豫过程. 关键词： 量子限制效应 受主态寿命 时间分辨光谱 δ掺杂')" href="#">δ掺杂     

量子限制受主远红外电致发光器件的制备与测量

采用分子束外延技术生长GaAs/AlAs三量子阱,并在中间的GaAs阱中δ-掺杂浅受主杂质Be原子,制作出量子限制受主远红外Teraherz原型电致发光器件.实验上测量得到4.5 K时器件的电致发光谱（EL）和电传输特性（I-V曲线）.在EL发射谱中清楚地观察到222 cm^-1处宽的尖峰,这来源于Be受主奇宇称激发态到其基态的辐射跃迁,而非辐射弛豫过程则使发射谱的信号很弱.另外在I-V曲线中072和186 V的位置出现两个共振隧道贯穿现象,分别对应于中间δ-掺杂量子阱受主能级1s_3/2(Γ₆+Γ₇)到左边非掺GaAs量子阱中HH带,及右边非掺杂GaAs量子阱中HH重空穴带到中间掺杂GaAs量子阱中Be受主杂质原子奇宇称激发态2p_5/2(Γ₆+Γ₇)能级的共振隧穿.     

Be掺杂对InGaAsN/GaAs量子阱性能的提高

InGaAsN/GaAs量子阱中进行铍(Be)元素重掺杂能显著提高其光学性质,并且发光波长发生了红移.X射线衍射摇摆曲线清楚地证实了铍掺杂抑制了InGaAsN(Be)/GaAs量子阱在退火过程中的应力释放.对比退火前,退火后的没有进行铍掺杂的量子阱样品的量子阱的X射线摇摆曲线衍射峰明显向GaAs衬底峰偏移;而对于掺铍的量子阱样品而言,这样的偏移要小很多.     

势垒区δ掺杂量子阱Ge0.3Si0.7/Si/Ge0.3Si0.7的子带间跃迁光吸收系数

采用包络函数方法对生长在Ｇｅ_0.3Ｓｉ_0.7（００１）衬底上势垒区δ掺杂量子阱Ge_0.3Si_0.7/Si/Ge_0.3Si_0.7的电子能带结构及子带间光吸收特性进行了自洽的计算．对光吸收系数与量子阱的阱宽、δ掺杂位置及δ掺杂密度间的变化关系进行了讨论．最后对由高浓度的二维电子气的退极化效应所引起的频率位移进行了研究 关键词：     

δ-掺杂受主的扩散对GaAs/AlAs量子阱子带的影响（英文）

在15 nm GaAs/5 nm AlAs单量子阱的GaAs阱层中间,分别进行不同浓度剂量的铍受主的δ-掺杂。铍受主在量子阱层中的扩散浓度分布,由扩散方程数值解出。高温下扩散在GaAs阱层中的Be受主将发生电离,成为带负电荷的受主离子,同时也向量子阱价带的子带中引入空穴。带负电荷的扩散受主离子和价带子带中的空穴,它们都是带电粒子在GaAs阱层中按库伦定律激发电场。相比较而言,对于无掺杂同结构量子阱,在空穴的薛定谔中增加了一个额外的微扰势,从而使无掺杂的量子阱价带的子带有所改变。在有效质量和包络函数近似下,通过循环迭代方法,数值求解了既满足薛定谔方程又满足泊松方程的空穴波函数,找出了自洽、收敛的空穴子带的能量本征值。计算发现考虑到这种额外微扰势,重空穴基态子带hh的能量有一个电子伏特变化,并且随着掺杂受主剂量的增加,重空穴基态子带hh向着价带顶红移,计算结果与实验测量符合得很好。     

有机量子阱的光学性质

采用多源有机分子气相沉积系统(OMBD)制备了Alq₃，PBD/Alq₃，PBD/Alq₃/PBD单层、双层以及量子阱结构，利用电化学循环伏安法和吸收光谱、荧光光谱研究了量子阱的类型和样品的光致发光特性.电化学循环伏安法和吸收光谱的测量结果表明，PBD/Alq₃有机量子阱为Ⅰ型量子阱结构.荧光光谱的研究结果表明，单层Alq₃的光致发光峰不随Alq₃厚度变化而变化；但是双层PBD/Alq₃结构光致发光峰随Alq₃厚度的减小而发生蓝移；同样对于PBD/Alq₃/PBD量子阱结构光致发光峰随Alq₃厚度的减小而发生蓝移.对引起光谱蓝移的原因进行了讨论. 关键词： 有机量子阱 光谱蓝移     

Far-infrared absorption studies of Be acceptors in δ-doped GaAs/AlAs multiple quantum wells

We report a far-infrared absorption study of internal transitions of shallow Be acceptors in both bulk GaAs and a series of δ-doped GaAs/AlAs multiple quantum well samples with well thicknesses of 20, 15 and 10 nm. Low temperature far-infrared absorption measurements clearly show three principal absorption lines due to transitions of Beacceptor states from the ground state to the first three odd-parity excited states, respectively. Using a variational principle, the 2p-1s transition energies of quantum confined Be acceptors are calculated as a function of the well width. It is found that the theoretical calculation of the 2p_z → 1s transitions is in good agreement with the D-like line experimental data.     

Excitonic transitions in Be-doped GaAs/AlAs multiple quantum well

A series of GaAs/AlAs multiple-quantum wells doped with Be is grown by molecular beam epitaxy. The photoluminescence spectra are measured at 4, 20, 40, 80, 120, and 200 K, respectively. The recombination transition emission of heavy-hole and light-hole free excitons is clearly observed and the transition energies are measured with different quantum well widths. In addition, a theoretical model of excitonic states in the quantum wells is used, in which the symmetry of the component of the exciton wave function representing the relative motion is allowed to vary between the two- and threedimensional limits. Then, within the effective mass and envelope function approximation, the recombination transition energies of the heavy- and light-hole excitons in GaAs/AlAs multiple-quantum wells are calculated each as a function of quantum well width by the shooting method and variational principle with two variational parameters. The results show that the excitons are neither 2D nor 3D like, but are in between in character and that the theoretical calculation is in good agreement with the experimental results.     

Intra-acceptor hole relaxation in Be δ-doped GaAs/AlAs multiple quantum wells

This paper studies the dynamics of intra-acceptor hole relaxation in Be δ -doped GaAs/AlAs multiple quantum wells (MQW) with doping at the centre by time-resolved pump-probe spectroscopy using a picosecond free electron laser for infrared experiments. Low temperature far-infrared absorption measurements clearly show three principal absorption lines due to transitions of the Be acceptor from the ground state to the first three odd-parity excited states respectively. The pump-probe experiments are performed at different temperatures and different pump pulse wavelengths. The hole relaxation time from 2p excited state to 1s ground state in MQW is found to be much shorter than that in bulk GaAs, and shown to be independent of temperature but strongly dependent on wavelength. The zone-folded acoustic phonon emission and slower decay of the wavefunctions of impurity states are suggested to account for the reduction of the 2p excited state lifetime in MQW. The wavelength dependence of the 2p lifetime is attributed to the diffusion of the Be atom δ -layer in quantum wells.     

内嵌InAs量子点的δ掺杂GaAs/AlxGa1-xAs二维电子气特性分析

采用分子束外延技术对δ掺杂GaAs/Al_xGa_1-xAs二维电子气(2DEG)样品进行了生长. 在样品生长过程中, 分别改变掺杂浓度(N_d)、空间隔离层厚度(W_d) 和Al_xGa_1-xAs中Al组分(x_Al)的大小, 并在双温(300 K, 78 K)条件下对生长的样品进行了霍尔测量; 结合测试结果, 分别对N_d, W_d及x_Al与GaAs/Al_xGa_1-xAs 2DEG的载流子浓度和迁移率之间的关系规律进行了细致的分析讨论. 生长了包含有低密度InAs量子点层的δ掺杂GaAs/Al_xGa_1-xAs 2DEG 样品, 采用梯度生长法得到了不同密度的InAs量子点. 霍尔测量结果表明, 随着InAs量子点密度的增加, GaAs/Al_xGa_1-xAs 2DEG的迁移率大幅度减小, 实验中获得了密度最低为16×10⁸/cm²的InAs量子点样品. 实验结果为内嵌InAs量子点的δ掺杂GaAs/Al_xGa_1-xAs 2DEG的研究和应用提供了依据和参考. 关键词： 二维电子气 InAs量子点 载流子浓度 迁移率     

Influence of state hybridization on low-temperature electron transport in shallow quantum wells

We investigate the lateral low-temperature electron transport in shallow pseudomorphous two-sided δ-doped GaAs/In_0.12Ga_0.88As/GaAs quantum wells (QWs) depending on the QW width, doping level, and the presence of a thin central AlAs barrier. Such a barrier is shown to change the band structure and wave functions of electrons in the QWs, causing a significant change in the scattering of electrons and a change in their mobility.     

外加电场和Al组分对纤锌矿AlGaN/GaN量子阱中的电子g因子的影响

研究了外加电场和垒层的Al组分对AlGaN/GaN量子阱中的横向和纵向g因子(g⊥和g//)及其各向异性(δg)的影响.纤锌矿体结构的贡献(S_//~(bulk)和g⊥)是构成g⊥=(g//-g_0)=g_//~(bulk)的主要部分,但g_//~(bulk)和g⊥的差值很小且几乎不随外加电场和Al组分改变.当外加电场的方向同极化电场的方向相同(相反)且增加时,g_//~(bulk)和g_⊥~(bulk)的强度同时增加(减小).当外加电场从-1.5×10~8 V·m~(-1)到1.5×10~8 V·m~(-1)变化时,异质结界面对g⊥的贡献(Γ_(Inter))大于0且强度缓慢增加,阱层对g⊥的贡献(Γ_W)小于0且强度也缓慢增加.然而Γ_(Inter)的强度比Γ_w大,且后者的强度随着外加电场的改变增加较快,所以δg0且强度随着外加电场的变化而减小.当垒层的Al组分增加时,如果不考虑应变效应(S_(1,2)=0),g_//~(bulk)和g⊥的强度同时减小,然而考虑应变效应后(S_(1,2)≠0),β_1g⊥和γ1(g_//~(bulk))的强度随着Al组分的增加而增加.随着垒层Al组分的增加,Γ_(Inter)和Γ_w的强度都增加,但Γ_(Inter)的强度较大且增加得较快,所以的的强度缓慢增加.g⊥的强度先随着Al组分的增加而减小,然后又随着Al组分的增加而增加,因为g⊥小于0且强度随着Al组分增加得很快.结果表明,AlGaN/GaN量子阱结构中的电子g因子及其各向异性可以被外加电场、垒层的Al组分、应变效应和量子限制效应共同调制.     

GaAs/AlAs super-flat interfaces in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells grown on (4 1 1)A GaAs substrates by MBE

Effectively atomically flat GaAs/AlAs interfaces over a macroscopic area (“super-flat interfaces”) have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells (QWs) grown on (4 1 1)A GaAs substrates by molecular beam epitaxy (MBE). A single and very sharp photoluminescence (PL) peak was observed at 4.2 K from each GaAs/AlAs or GaAs/(GaAs) (AlAs) QW grown on (4 1 1)A GaAs substrate. The full-width at half-maximum (FWHM) of a PL peak for GaAs/AlAs QW with a well width ( ) of 4.2 nm was 4.7 meV and that for GaAs/(GaAs) (AlAs) QW with a smaller well width of 2.8 nm (3.9 nm) was 7.6 meV (4.6 meV), which are as narrow as that for an individual splitted peak for conventional GaAs/AlAs QWs grown on (1 0 0) GaAs substrates with growth interruption. Furthermore, only one sharp peak was observed for each GaAs/(GaAs) (AlAs) QW on the (4 1 1)A GaAs substrate over the whole area of the wafer (7 7 mm ), in contrast with two- or three-splitted peaks reported for each GaAs/AlAs QW grown on the (1 0 0) GaAs substrate with growth interruption. These results indicate that GaAs/AlAs super-flat interfaces have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) QWs grown on the (4 1 1)A GaAs substrates.