p型GaN/Al0.35Ga0.65N/GaN应变量子阱中二维空穴气的研究

对Ga面p型GaN/Al_0.35Ga_0.65N/GaN应变异质结构中形成的二维空穴气(2DHG)进行了研究.首先基于半导体-绝缘体-半导体异质结构模型确定了应变异质中的临界厚度，然后自洽求解薛定谔方程和泊松方程，计算了当中间势垒层AlGaN处于完全应变状态和半应变状态两种条件下，顶层GaN及中间层AlGaN厚度的变化对2DHG分布的影响.计算结果表明，势垒层AlGaN和顶层GaN的应变状态和厚度对极化引起的2DHG面密度及分布有重要影响.在此基础上制备了p型GaN/Al_0.35Ga_0.65N/GaN应变量子阱结构肖特基器件，并通过器件的C-V测试证实了异质结处2DHG的存在.器件响应光谱的测试结果表明，由于p型GaN/Al_0.35Ga_0.65N/GaN量子阱中强烈的极化作用和Stark效应使得器件零偏压和反向偏压时的响应光谱都向短波方向移动了10 nm，在零偏压下器件在280 nm处的峰值响应为0.022 A/W，在反向偏压为1 V时，峰值响应达到0.19 A/W，已经接近理论值. 关键词： AlGaN 二维空穴气 极化效应     

p型GaN/Al0.35Ga0.65N/GaN应变量子阱中二维空穴气的研究

对Ga面p型GaN/Al0.35Ga0.65N/GaN应变异质结构中形成的二维空穴气(2DHG)进行了研究.首先基于半导体-绝缘体-半导体异质结构模型确定了应变异质中的临界厚度,然后自洽求解薛定谔方程和泊松方程,计算了当中间势垒层AlGaN处于完全应变状态和半应变状态两种条件下,顶层GaN及中间层AlGaN厚度的变化对2DHG分布的影响.计算结果表明,势垒层AlGaN和顶层GaN的应变状态和厚度对极化引起的2DHG面密度及分布有重要影响.在此基础上制备了p型GaN/Al0.35 Ga0.65N/GaN应变量子阱结构肖特基器件,并通过器件的C-V测试证实了异质结处2DHG的存在.器件响应光谱的测试结果表明,由于p型GaN/Al0.35Ga0.65N/GaN量子阱中强烈的极化作用和Stark效应使得器件零偏压和反向偏压时的响应光谱都向短波方向移动了10 nm,在零偏压下器件在280 nm处的峰值响应为0.022 A/W,在反向偏压为1 V时,峰值响应达到0.19 A/W,已经接近理论值.     

AlGaN/GaN HEMT器件直流扫描电流崩塌机理及其物理模型

通过对AlGaN/GaN HEMT器件直流扫描情况下电流崩塌现象和机理的分析，建立了一个AlGaN/GaN HEMT器件的直流扫描电流崩塌模型.该模型从AlGaN/GaN器件工作机理出发，综合考虑了器件结构、半导体表面与界面，以及量子阱特殊结构对电流崩塌的影响.实验反复证明了该模型与实验结果有良好的一致性. 关键词： AlGaN/GaN HEMT 直流扫描 电流崩塌 模型     

高温AlN插入层对AlGaN/GaN异质结材料和HEMTs器件电学特性的影响

研究了在GaN缓冲层中插入40 nm厚高温AlN层的GaN外延层和AlGaN/GaN异质结材料, AlN插入层可以增加GaN层的面内压应力并提高AlGaN/GaN高电子迁移率晶体管（HEMTs）的电学特性. 在精确测量布拉格衍射角的基础上定量计算了压应力的大小. 增加的压应力一方面通过增强GaN层的压电极化电场, 提高了AlGaN/GaN异质结二维电子气（2DEG）面密度, 另一方面使AlGaN势垒层对2DEG面密度产生的两方面影响相互抵消. 同时, 这种AlN插入层的采用降低了GaN与AlGaN层之间的 关键词： 高温AlN插入层 AlGaN/GaN异质结 二维电子气 应力     

GaN/AlGaN双带红外探测及光子频率上转换研究

研究了GaN/AlGaN异质结构中的双带（中、远）红外探测及光子频率上转换特性.通过光致发光光谱确认GaN/AlGaN探测器结构中AlGaN本征层的Al组分,讨论了不同Al组分GaN/AlGaN异质结的导带带阶界面功函数差.在拟合单周期GaN/AlGaN探测器中红外和远红外波段响应谱的基础上,研究多周期GaN/AlGaN探测器与GaN/AlGaN发光二极管集成结构的中红外和远红外光子频率上转换效率与GaN发射层厚度、AlGaN本征层厚度、紫光光子出射效率、内量子效率、空间频率和发射层掺杂浓度间的关系,优化 关键词： 双带红外探测 光子频率上转换 响应谱 GaN/AlGaN     

界面电偶极子对GaN/AlGaN/GaN光电探测器紫外/太阳光选择比的影响

在GaN/AlGaN/GaN倒置异质结光电二极管（IHP）中，存在于AlGaN/GaN异质结界面处强烈的极化效应对器件的紫外/太阳光(UV/Solar)选择比产生了重要的影响.将极化效应总的影响分为两部分：电偶极子和极化项，在建立的GaN/AlGaN/GaN结构IHP模型的基础上，对电偶极子 对器件UV/Solar选择比的影响进行了分析.分析结果表明，只有在考虑电偶极子的影响时， 光电探测器的UV/Solar选择比在10³数量级左右，与实验结果符合较好.因此， 在IHP中必须考虑电偶极子的影响. 关键词： 紫外/太阳光选择比 太阳盲区探测器 极化 电偶极子     

AlGaN/GaN肖特基结参数分析与电流运输机理研究

通过对AlGaN/GaN HEMT器件肖特基栅电流输运机理的研究,在变温下采用I-V法对AlGaN/GaN上的Ni/Au肖特基势垒高度和理想因子进行了计算. 通过对不同电流机理的分立研究,得到了更为准确的势垒高度值_b. 通过分析温度在300—550K之间肖特基反向泄漏电流的特性,得出结论：AlGaN材料的表面漏电不是HEMT器件反向泄漏电流的主要来源. 关键词： AlGaN/GaN异质结 肖特基结 理想因子     

器件参数对GaN基n~+-GaN/i-Al_x Ga_(1-x)N/n~+-GaN结构紫外和红外双色探测器中紫外响应的影响

研究了AlGaN层参数对GaN基n+-GaN/i-AlxGa1-xN/n+-GaN结构紫外和红外双色探测器中紫外响应的影响规律及物理机制.模拟计算发现:降低AlGaN层本底载流子浓度会增加器件的量子效率,当本底载流子浓度不能进一步降低时,可以通过减小AlGaN层的厚度以保证器件的量子效率.在材料生长和器件工艺过程中都应减少界面态.外加较小的反向偏压能大幅度提高紫外量子效率,分析表明,GaN/AlGaN/GaN形成的两个背靠背、方向相反的异质结电场是出现这些现象的根本原因.在实际器件设计中,应该根据需要调节各结构参数,以保证器件的量子效率.     

GaN基异质结缓冲层漏电分析

通过对GaN基异质结材料C-V特性中耗尽电容的比较,得出AlGaN/GaN异质结缓冲层漏电与成核层的关系.实验结果表明,基于蓝宝石衬底低温GaN成核层和SiC衬底高温AlN成核层的异质结材料比基于蓝宝石衬底低温AlN成核层异质结材料漏电小、背景载流子浓度低.深入分析发现,基于薄成核层的异质结材料在近衬底的GaN缓冲层中具有高浓度的n型GaN导电层,而基于厚成核层的异质结材料的GaN缓冲层则呈高阻特性.GaN缓冲层中的n型导电层是导致器件漏电主要因素之一,适当提高成核层的质量和厚度可有效降低GaN缓冲层的背景载流子浓度,提高GaN缓冲层的高阻特性,抑制缓冲层漏电. 关键词： AlGaN/GaN异质结 GaN缓冲层 漏电 成核层     

GaAs/Ga1-xAlxAs半导体量子阱光辐射-热离子制冷

采用数值计算方法分析了GaAs/Ga_1-xAl_xAs 半导体量子阱的光 辐射-热离子制冷. 以漂移-扩散模型为基础，通过电流连续性方程和泊松方程自洽地计算出在外加正向偏压的 条件下半导体内部的载流子分布情况，并在此基础上计算了阱内载流子的发光复合和俄歇复 合，从而确定了半导体异质结量子阱光辐射-热离子制冷的最优条件.进一步分析了不同Al组 分的Ga_1-xAl_xAs材料以及不同的掺杂浓度对制冷效果的影响， 为该领域的实验工作提供了极有价值的参考. 关键词： 半导体异质结 光辐射 制冷     

Theoretical study of indirect excitons’ lifetime in coupled AlGaN/GaN quantum wells in the presence of an electrostatic trap

The lifetime of electrostatically trapped indirect excitons in a field-effect structure based on coupled AlGaN/GaN quantum wells has been theoretically studied. Within the plane of a double quantum well, indirect excitons are trapped between the surfaces of the AlGaN/GaN heterostructures and a semitransparent metallic top gate. The trapping mechanism has been assumed to be a combination of the quantum confined Stark effect and local field enhancement. In order to study the trapped exciton lifetime, the binding energy of indirect excitons in coupled quantum wells is calculated by finite difference method in the presence of an electric field. Thus, the lifetime of trapped excitons is computed as a function of well width, AlGaN barrier width, the position of double quantum well in the device and applied voltage.     

Electron mobility in the linear region of an AlGaN/AlN/GaN heterostructure field-effect transistor

We simulate the current-voltage （I-V） characteristics of AlGaN/AlN/GaN heterostructure field-effect transistors （HFETs） with different gate lengths using the quasi-two-dimensional （quasi-2D） model. The calculation results obtained using the modified mobility model are found to accord well with the experimental data. By analyzing the variation of the electron mobility for the two-dimensional electron gas （213EG） with the electric field in the linear region of the AlGaN/AlN/GaN HFET I-V output characteristics, it is found that the polarization Coulomb field scattering still plays an important role in the electron mobility of AlGaN/AlN/GaN HFETs at the higher drain voltage and channel electric field. As drain voltage and channel electric field increase, the 2DEG density reduces and the polarization Coulomb field scattering increases, as a result, the 2DEG electron mobility decreases.     

Distribution of donor states on the surfaceof AlGaN/GaN heterostructures

The uniform distribution model of the surface donor states in AlGaN/GaN heterostructures has been widely used in the theoretical calculation. A common and a triple-channel AlGaN/GaN heterostructure Schottky barrier diodes have been fabricated to verify the models, but the calculation results show the uniform distribution model can not provide enough electrons to form three separate 2DEGs in the triple-channel AlGaN/GaN heterostructure. Our experiments indicate the uniform distribution model is not quite right, especially for the multiple-channel AlGaN/GaN heterostructures. Besides, it is found the exponential distribution model possibly matches the actual distribution of the surface donor states better, which allows the 2DEG to form in each channel structure during the calculation. The exponential distribution model would be helpful in the research field.     

Quantum confined carrier transition in a GaN/InGaN/GaN single quantum well bounded by AlGaN barriers

We investigated the carrier transition properties of the GaN/InGaN/GaN single quantum well bounded by AlGaN barriers. In order to confirm the carrier transition coming from the single quantum well, the single quantum well layer was etched by reactive ion etching method. The structural property of the samples was characterized by high resolution X-ray diffraction measurements. In micro-photoluminescence measurements, it is clearly shown that the donor bound exciton transition of the single quantum well sample was redshifted compared to the etched one due to strain. Moreover, a lot of peaks were observed below the GaN band gap energy due to carrier localization in the InGaN/GaN single quantum well, including carrier localization center and quantum confined states. The excitation power dependence and time resolved photoluminescence spectra were investigated to characterize the optical transition of the single quantum well.     

Electron mobility limited by surface and interface roughness scattering in AlxGa1-xN/GaN quantum wells

The electron mobility limited by the interface and surface roughness scatterings of the two-dimensional electron gas in AlxGa1-xN/GaN quantum wells is studied. The newly proposed surface roughness scattering in the AlGaN/GaN quantum wells becomes effective when an electric field exists in the AlxGa1-xN barrier. For the AlGaN/GaN potential well, the ground subband energy is governed by the spontaneous and the piezoelectric polarization fields which are determined by the barrier and the well thicknesses. The thickness fluctuation of the AlGaN barrier and the GaN well due to the roughnesses cause the local fluctuation of the ground subband energy, which will reduce the 2DEG mobility.     

Ultrafast all optical modulation based on intersubband transition in semiconductor quantum wells

Ultrafast modulation of interband-resonant light by intersubband-resonant light in n-doped GaAs/AlGaAs and GaN/AlGaN quantum wells was investigated by femtosecond pump-probe technique. A planar-type AlGaAs/GaAs modulation device shows a modulation speed of ～1 ps at room temperature. The observed modulation efficiency indicates that 99% modulation can be achieved with a control pulse energy of ～1 pJ when a waveguide-type device structure is utilized. The feasibility of the all-optical modulation in GaN/AlGaN quantum wells is also investigated. The intersubband carrier relaxation time, which mainly determines the modulation speed, is measured and is found to be extremely fast (130–170 fs). The results indicate that the optical modulation at a bit rate of over 1 Tb/s will be possible by utilizing the intersubband transition in GaN/AlGaN quantum wells. The modulation efficiency in GaN/AlGaN quantum wells is also discussed in comparison with that in GaAs/AlGaAs quantum wells.     

Donor impurity states in zinc-blende GaN/AlGaN quantum well: Quantum confinement and laser-dressed effects

Within the framework of effective-mass approximation, the effects of a laser field on the ground-state donor binding energy in zinc-blende (ZB) GaN/AlGaN quantum well (QW) have been investigated variationally. Numerical results show that the donor binding energy is highly dependent on QW structure parameters and Al composition in ZB GaN/AlGaN QW. The laser field effects are more noticeable on the donor binding energy of an impurity localized inside the QW with small well width and low Al composition. However, for the impurity located in the vicinity of the well edge of the QW, the donor binding energy is insensible to the variation of Al composition, well width and laser field intensity in ZB GaN/AlGaN QW. In particular, the competition effects between laser field and quantum confinement on impurity states have also been investigated in this paper.     

Electric-field-induced impact ionization of excitons in GaN and GaN/AlGaN quantum wells

Impact ionization of exciton states in epitaxial GaN films and GaN/AlGaN quantum-well structures was studied. The study was done using an optical method based on the observation of exciton photoluminescence quenching under application of an electric field. It was established that electron scattering on impurities dominates over that from acoustic phonons in electron relaxation in energy and momentum. The mean free path of the hot electrons was estimated. The hot-electron mean free path in GaN/AlGaN quantum wells was found to be an order of magnitude larger than that in epitaxial GaN films, which is due to the electron scattering probability being lower in the two-dimensional case.     

Back doping design in delta-doped AlGaN/GaN heterostructure field-effect transistors

In this paper, we investigate theoretically the electron transport in AlGaN/GaN single-barrier and in AlGaN/GaN/AlGaN double-barrier heterostructures, aimed to operate as high-power and high-temperature field-effect transistors. The presence of spontaneous and piezoelectric polarizations as well as the heterointerface polarity are evoked and taken into account in the modelling part. Delta-doping is used as a source of electrons for the channel quantum well. Calculations of the electron-band parameters are made by using self-consistent solutions of coupled Schrodinger-Poisson equations. It is found that the polarization fields act to significantly increase the two-dimensional sheet charge concentration. Moreover, the AlGaN/GaN heterostructures with higher Al compositions are found to be favourable for higher electron densities. On the other hand, the employment of a back doping with delta-shaped profiles is shown to improve further the electrical behaviour of the field-effect transistors studied.