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1.
用不同电荷态的126Xeq+离子(9≤q≤30)在室温下轰击GaN晶体表面,经原子力显微镜分析表明,当q>18,辐照区域由隆起转为显著的刻蚀.被轰击后的GaN晶体表面形貌主要取决于入射离子的电荷态.同时,样品表面形貌还与入射离子的剂量和入射角有关;在实验参数范围,与入射离子的初动能没有明显关系(180 keV≤Ek≤600 keV).当入射离子的电荷态q=18,与样品表面法线成60°角倾斜入射和垂直表面入射时,样品的表面几乎没有变化,只是倾斜入射后有很微小的隆起;当q<18时,样品表面膨胀隆起,粗糙度增强,倾斜入射时表面隆起比垂直入射时更明显,而且都有清晰的峰状分界区;当q>18时,样品表面被蚀刻呈凹陷状,有明显的齿状刻痕,且侵蚀深度与离子剂量近似呈线性关系,倾斜入射时的刻蚀深度大于垂直入射时的刻蚀深度.  相似文献   

2.
利用兰州大学2×1.7 MV串列加速器离子-原子碰撞实验终端上产生的单核子能量为20—500 keV的Cq+和Oq+q=1—4)离子与He原子碰撞.采用符合测量方法和多参数数据获取系统得到了散射离子与反冲离子电荷态的二维谱,从而分别得到直接电离、入射离子俘获电子和入射离子损失电子截面与总截面的截面比Rdirect, RcaptureRloss,并对强扰动能区的各个反应道之间竞争关系及同一反应道在不同碰撞体系中所表现出的实验规律进行了比较和定性分析. 关键词: 离子-原子碰撞 截面比 竞争关系 强扰动区  相似文献   

3.
用金属有机物化学气相沉积方法在r面蓝宝石上生长了非极性a面GaN薄膜,通过采用AlGaN多量子阱插入层,得到了高质量的非极性GaN材料. 用原子力显微镜和高分辨X射线衍射仪研究了a面GaN的表面形貌和结晶质量,发现非极性材料上典型的三角坑缺陷被消除,(1120)面X射线双晶摇摆曲线的半峰宽为680″. 关键词: GaN 原子力显微镜 高分辨X射线衍射仪 非极性  相似文献   

4.
用同一动能(150keV)而不同电荷态的40Arq+(8≤q≤16)离子入射金属Al表面,靶原子受激辐射产生特征光谱线. 实验结果表明:高电荷态离子与金属表面相互作用过程中,经过与靶原子碰撞(Penning碰撞)交换动能和共振电子俘获(resonant capture)释放库仑势能,将携带的能量沉积于靶表面,使靶原子激发. 这种激发不同于光激发,它不仅激发了原子复杂电子组态之间的跃迁,而且跃迁辐射的特征谱线强度增强的趋势与入射粒子的库 关键词: 高电荷态离子 库仑势 特征光谱 光谱强度  相似文献   

5.
利用低速高电荷态Xeq+和Pbq+离子对在蓝宝石衬底上生长的GaN晶体膜样品进行辐照,并利用X射线光电子能谱(XPS)对样品表面化学组成和元素化合态进行了分析.结果表明,高电荷态离子对样品表面有显著的刻蚀作用;经高电荷态离子辐照的GaN样品表面氮元素贫乏而镓元素富集;随着入射离子剂量和所携带电荷数的增大,Ga—Ga键相对含量增大;辐照后,GaN样品中Ga—Ga键对应的Ga3d5/2电子的束缚能偏小,晶格损伤使内层轨道电子束缚能向低端方向偏移.  相似文献   

6.
高电荷态离子126Xeq+与Ti固体表面作用的激发光谱   总被引:1,自引:1,他引:0       下载免费PDF全文
报道用150keV的高电荷态离子126Xeq+(6≤q≤30)轰击Ti固 体表面产生2 00—1000nm波段发射光谱的实验结果.结果显示,用电荷态足够高的离子作光谱激发源,无 需很强的束流强度(nA量级),便可激发起样品表面的原子和离子在可见光波段的特征谱线 .当入射离子剥离度q>qc≈20时,Ti原子及其离子的特征谱线强度突然显著增强 ;不 同金属靶,特征谱线突然增强的qc值不同.理论分析表明,这与q大于此临界值 后,单电子转移释放能量激发靶材料传导电子气体的表面等离激元密切相关. 关键词: 低速高电荷态离子 特征谱线 经典过垒模型 等离激元  相似文献   

7.
高电荷态离子比普通的离子携带较高的势能,势能在材料表面的瞬间释放,能在材料表面形成nm量级的结构损伤。它在纳米刻蚀、小型纳米器件、纳米材料、超小尺寸半导体芯片制作、固体表面处理和固体结构分析等领域具有广泛应用前景。因此对高电荷态重离子(Xeq+)引起半导体材料表面(6H-SiC)纳米结构变形进行了研究。采用Xe18+和Xe26+离子,选取从11014到51015 ionscm-2逐渐递增的剂量,以垂直和倾斜60角两种入射方式辐照6H-SiC薄膜样品, 经原子力显微镜分析表明,辐照后的表面肿胀凸起。对于Xe18+离子辐照的样品,辐照区至未辐照区边界的台阶高度随离子剂量增加而连续增大,而对于Xe26+离子辐照的样品则先增加而后减小。在相同入射角和剂量条件下,Xe26+离子辐照样品形成的台阶高度大于Xe18+离子辐照形成的台阶高度,在相同离子和剂量的条件下,垂直照射时形成的台阶高度大于倾斜照射时形成的台阶高度。根据损伤机理和实验数据,首次初步建立了一个包括势能、电荷态、入射角和剂量等物理量的理论模型来预测高电荷态离子在半导体材料表面形成的纳米结构变形。暗示了高电荷态离子的潜在的应用价值及进一步研究的必要性。  相似文献   

8.
采用反冲离子飞行时间-散射离子位置灵敏符合测量技术,测量了能量范围在0.7v0—4.4v0(v0为玻尔速度)的碳离子Cq+(q=1—4)与He原子碰撞过程不同出射道靶原子的双电离与单电离截面比R,包括入射离子不损失电子(直接电离)的出射道(Rq,q),入射离子俘获一个电子的出射道(Rq,q-1)和入射离子损失一个电子的出射道(Rq,q+1),并研究了R随入射C离子的能量及电荷态的变化关系.实验表明,对给定电荷态的入射离子,靶原子的双电离与单电离截面比R与出射道有很强的依赖关系,即Rq,q<Rq,q+1<Rq,q-1.直接电离出射道截面比Rq,q与入射离子电荷态几乎无关,而入射离子俘获一个电子的出射道和损失一个电子的出射道靶原子双电离与单电离截面比Rq,q-1Rq,q+1却与入射离子电荷态有很强的关系.采用原子极化理论和电子屏蔽与反屏蔽作用对实验结果进行了解释. 关键词: 离子-原子碰撞 电离 截面比  相似文献   

9.
高电荷态离子比普通的离子携带较高的势能,势能在材料表面的瞬间释放,能在材料表面形成nm量级的结构损伤。它在纳米刻蚀、小型纳米器件、纳米材料、超小尺寸半导体芯片制作、固体表面处理和固体结构分析等领域具有广泛应用前景。因此对高电荷态重离子(Xeq+)引起半导体材料表面(6H-SiC)纳米结构变形进行了研究。采用Xe18+和Xe26+离子,选取从1×1014到5×1015 ions·cm-2逐渐递增的剂量,以垂直和倾斜60°角两种入射方式辐照6H-SiC薄膜样品,经原子力显微镜分析表明,辐照后的表面肿胀凸起。对于Xe18+离子辐照的样品,辐照区至未辐照区边界的台阶高度随离子剂量增加而连续增大,而对于Xe26+离子辐照的样品则先增加而后减小。在相同入射角和剂量条件下,Xe26+离子辐照样品形成的台阶高度大于Xe18+离子辐照形成的台阶高度,在相同离子和剂量的条件下,垂直照射时形成的台阶高度大于倾斜照射时形成的台阶高度。根据损伤机理和实验数据,首次初步建立了一个包括势能、电荷态、入射角和剂量等物理量的理论模型来预测高电荷态离子在半导体材料表面形成的纳米结构变形。暗示了高电荷态离子的潜在的应用价值及进一步研究的必要性。  相似文献   

10.
不同电荷态低速离子(Arq+,Pbq+)轰击Si(110)晶面,测量不同入射角情况下的次级粒子的产额. 通过比较溅射产额与入射角的关系,证实沟道效应的存在. 高电荷态离子与Si相互作用产生的沟道效应说明溅射产额主要是由动能碰撞引起的. 在小角入射条件下,高电荷态离子能够增大溅射产额. 当高电荷态离子以40°—50°入射时,存在势能越高溅射产额越大的势能效应. 关键词: 高电荷态离子 溅射 沟道效应  相似文献   

11.
Surface change of gallium nitride specimens after bombardment by highly charged Pbq^+-ions (q = 25, 35) at room temperature is studied by means of atomic force microscopy. The experimental results reveal that the surface of GaN specimens is significantly etched and erased. An unambiguous step-up is observed. The erosion depth not only strongly depends on the charge state of ions, but also is related to the incident angle of Pbq^+-ions and the ion dose. The erosion depth of the specimens in 60° incidence (tilted incidence) is significantly deeper than that of the normal incidence. The erosion behaviour of specimens has little dependence on the kinetic energy of ion (Ek = 360, 700 keV). On the other hand, surface roughness of the irradiated area is obviously decreased due to erosion compared with the un-irradiated area. A fiat terrace is formed.  相似文献   

12.
Laser-induced voltage effects in c-axis oriented Ca3Co4O9 thin films have been studied with samples fabricated on 10 tilted LaAlO3(001) substrates by a simple chemical solution deposition method. An open-circuit voltage with a rise time of about 10 ns and full width at half maximum of about 28 ns is detected when the film surface is irradiated by a 308-nm laser pulse with a duration of 25 ns. Besides, open-circuit voltage signals are also observed when the film surface is irradiated separately by the laser pulses of 532 nm and 1064 nm. The results indicate that Ca3Co4O9 thin films have a great potential application in the wide range photodetctor from the ultraviolet to near infrared regions.  相似文献   

13.
利用金属有机气相外延方法研究了非故意掺杂GaN薄膜的方块电阻与高温GaN体材料生长时载气中N2比例的关系.研究发现,随着载气中N2比例的增加,GaN薄膜方块电阻急剧增加.当载气中N2比例为50%时,GaN薄膜方块电阻达1.1×108Ω/□,且GaN表面平整,均方根粗糙度为0.233nm.二次离子质谱分析发现,载气中N2比例不同的样品中碳、氧杂质含量无明显差别.随着载气中N2关键词: 半绝缘GaN薄膜 载气 金属有机气相外延 位错  相似文献   

14.
The structure transformation occurring in fullerene film under bombardment by 50 keV C60+ cluster ions is reported. The Raman spectra of the irradiated C60 films reveal a new peak rising at 1458 cm−1 with an increase in the ion fluence. This feature of the Raman spectra suggests linear polymerization of solid C60 induced by the cluster ion impacts. The aligned C60 polymeric chains composing about 5–10 fullerene molecules have been distinguished on the film surface after the high-fluence irradiation using atomic force microscopy (AFM). The surface profiling analysis of the irradiated films has revealed pronounced sputtering during the treatment. The obtained results indicate that the C60 polymerization occurs in a deep layer situated more than 40 nm below the film surface. The deep location of the C60 polymeric phase indirectly confirms the dominant role of shock waves in the detected C60 phase transformation.  相似文献   

15.
The X-ray spectra of Nb surface induced by Ar q+ (q = 16,17) ions with the energy range from 10 to 20 keV/q were studied by the optical spectrum technology. The experimental results indicate that the multi-electron excitation occurred as a highly charged Ar16+ ion was neutralized below the metal surface. The K shell electron of Ar16+ was excited and then de-excited cascadly to emit K X-ray. The intensity of the X-ray emitted from K shell of the hollow Ar atom decreased with the increase of projectile kinetic energy. The intensity of the X-ray emitted from L shell of the target atom Nb increased with the increase of projectile kinetic energy. The X-ray yield of Ar17+ is three magnitude orders larger than that of Ar16+. Supported by the National Natural Science Foundation of China (Grant Nos.10774149 and 10405025)  相似文献   

16.
The influence of H2 plasma treatment on the field emission properties of amorphous GaN (a-GaN) films is studied. It is found that the treatment makes little change to the surface morphology. The current density of the treated film decreases from 400 to 30 μA/cm2 at the applied field of about 30 V/μm. The treatment can reduce the defects in a-GaN films, and therefore the treatment results in the weakening of the tunneling emission of the a-GaN film at the high field region. The treatment also seems to change the conduction mechanism of the a-GaN film.  相似文献   

17.
Auger electron/X-ray photoelectron and cathodoluminescent (CL) spectroscopic studies were conducted on pulsed laser deposited SrAl2O4:Eu2+,Dy3+ thin films and the correlation between the surface chemical reactions and the decrease in the CL intensity was determined. The Auger electron and the CL data were collected simultaneously in a vacuum chamber either maintained at base pressure or backfilled with oxygen gas. The data were collected when the films were irradiated for 14 h with 2 keV electrons. The CL emission peak attributed to the 4f65d1 → 4f7 transitions was observed at ∼521 nm and the CL intensity of the peaks degraded at different rates in different vacuum conditions. X-ray photoelectron spectroscopy (XPS) data collected from degraded films suggest that strontium oxide (SrO) and aliminium oxide (Al2O3) were formed on the surface of the film as a result of electron stimulated surface chemical reaction (ESSCR).  相似文献   

18.
The transverse laser induced thermoelectric voltage effect has been investigated in tilted La0.5Sr0.5CoO3 thin films grown on vicinal cut LaAlO3 (1 0 0) substrates when films are irradiated by pulse laser at room temperature. The detected voltage signals are demonstrated to originate from the transverse Seebeck effect as the linear dependence of voltage on tilted angle in the range of small tilted angle. The Seebeck coefficient anisotropy ΔS of 0.03 μV/K at room temperature is calculated and its distorted cubic structure is thought to be responsible for this. Films grown on a series of substrates with different tilted angles show the optimum angle of 19.8° for the maximum voltage. Film thickness dependence of voltage has also been studied.  相似文献   

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