气体压强及表面等离激元影响表面波等离子体电离发展过程的粒子模拟

基于表面等离激元 (SPP) 的表面波等离子体 (SWP) 源, 具有高密度、低温度及高产率等优异性能, 其应用在电子器件微纳加工、材料改性等领域. 但由于SPP激励SWP放电的电离过程难于用理论分析和实验测量描述, 因而SWP源均匀稳定产生的电离发展过程一直未研究清晰. 本文以SWP放电的数值模拟为研究手段, 采用等离子体与电磁波相互作用的粒子模拟 (PIC) 方法, 结合蒙特卡罗碰撞 (MCC) 方法处理碰撞效应的优势, 研究气体压强影响电离过程的电磁能量耦合机理. 模拟结果表明SWP的高效产生是SPP的局域增强电场致使, 气体压强能够改变波模共振转换的出现时刻而影响了SWP的电离发展过程. 本文的研究成果展示了SPP维持SWP放电的电离过程, 可为下一代米级SWP源的参数优化提供设计建议. 关键词： 表面波等离子体 表面等离激元 粒子模拟 电离过程     

ECR微波等离子体源离子输运的蒙特卡罗模拟

采用蒙特卡罗方法，模拟了ＥＣＲ微波等离子体源中离子离开放电室后历经中性区，鞘层区，最后被加负偏压的工件表面吸收的全过程。研究了鞘层外界处的衔接问题，得到了自洽电势分布和鞘层区不同位置处的速度分布，能量分布与角分布。同时，讨论了磁场对鞘势的影响。     

离子轰击控制准直碳纳米管生长的研究

用CH₄,H₂和NH₃作为反应气体，利用等离子体增强热丝化学汽相沉积制备出准直碳纳米管，并用扫描电子显微镜研究了不同负偏压对准直碳纳米管生长的影响. 结果表明，随着负偏压的增大，准直碳纳米管的平均直径减小、平均长度增大. 由于辉光放电的产生，在衬底表面附近形成阴极鞘层，并在阴极鞘层内形成大量的离子和在衬底表面附近形成很强的电场. 离子在电场的作用下对衬底表面的强烈轰击将对准直碳纳米管的生长产生影响. 结合有关理论，分析和讨论了离子的轰击对准 关键词： 准直碳纳米管 离子轰击 负偏压     

圆柱模型下电子回旋共振微波等离子体离子输运过程的数值研究

在圆柱模型下，采用Ｍｏｎｔｅ Ｃａｒｌｏ方法模拟了电子回旋共振（ＥＣＲ）微波等离子体源中离子离开放电室后历经中性区、鞘层区以及工件表面二次电子发射形成的虚拟阴极“屏蔽区”，最后被加负偏压的工件表面吸收的全过程．研究了鞘层边界处的衔接问题，得到了光滑自洽的电势分布曲线及工件表面离子的能量分布和角分布，同时讨论了磁场、气压以及二次电子发射对鞘势的影响． 关键词：     

低气压感性耦合等离子体源模拟研究进展

感性耦合等离子体源具有放电气压低、等离子体密度高、装置结构简单等优点,因此常被用于材料刻蚀及表面处理工艺中.为了深入了解感性耦合等离子体的特性及其与表面的相互作用,数值模拟成为了目前人们普遍采用的研究手段之一.针对具体问题,可以选择不同的模拟方法,如整体模型、流体力学模型、流体力学/蒙特卡罗碰撞混合模型、偏压鞘层模型、粒子模拟/蒙特卡罗碰撞混合模型等.其中,整体模型计算效率最高,常被用于模拟复杂的反应性气体放电.但整体模型无法给出各物理量的空间分布,因此二维及三维的流体力学模型,也得到了人们的广泛关注.在低气压等极端的放电条件下,由于电子能量分布函数显著偏离麦氏分布,则需要耦合蒙特卡罗碰撞模型,来精确地描述等离子体内部的动理学行为.此外,通过耦合偏压鞘层模型,还可以自洽地模拟鞘层的瞬时振荡行为对等离子体特性的影响.对于等离子体中的非局域及非热平衡现象,则需要采用基于第一性原理的粒子模拟方法来描述.最后对目前感性耦合放电中的前沿问题进行了展望.     

大面积表面波等离子体源微波功率吸收的数值模拟研究

建立了大面积矩形表面波等离子体(SWP)源全尺寸的三维模型,用数值模拟的方法研究了SWP源基于碰撞的功率吸收问题,给出了随等离子体参数变化的微波反射率曲线,分析了不同天线对微波功率沉积的影响,并讨论了微波功率吸收和表面波的定性关系. 结果发现,均匀放电的SWP源功率沉积本质是由表面波等离子体的性质决定的,等离子体密度太大或太小都不利于功率吸收. 在正常工作气压下,SWP源通过碰撞机理即可以实现微波功率的有效沉积,微波吸收率可达80%以上,与已有实验相符. 本研究同时发现,天线阵列激发的表面波模式越紧凑,强度越大,越有利于微波的吸收. 关键词： 时域有限差分法 等离子体表面波 功率吸收 狭缝天线     

ICP等离子体鞘层附近区域发光光谱特性分析

为了独立控制鞘层附近区域离子密度和离子能最分布,采用光发射谱(OES)测量技术,对不同射频功率、放电气压和基底偏压下感应耦合等离子体鞘层附近区域辉光特性进行了研究.原子谱线和离子谱线特性分析表明,在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度.改变放电气压和射频功率,对得到的光谱特性分析表明,鞘层附近区域离子密度随射频功率的增大而线性增大,在低压下随气压的升高而增大.低激发电位原子谱线强度增加迅速,高激发电位原子谱线强度增加缓慢,而离子谱线强度增加很不明显.改变基底直流偏压,对得到的发射光谱强度变化分析表明,谱线强度随基底正偏压的增加而增大.随着基底负偏压的加入,谱线强度先减小而后增大;直流偏压为-30 V时,光谱强度最弱.快速离子和电子是引起Ar激发和电离过程的主要能量来源.     

在等离子体源离子注入中靶周围等离子体的行为

在等离子体源离子注入中，将待处理的工件直接放在等离子体内，并在工件上按一定的占空比加脉冲连续式负偏压，我们通过计算，分析了在工件未加负偏压时等离子体对工件的作用，并给出了在工件加上负偏压时注入工件的离子能量的简化分布模型，最后计算了在负偏压脉冲持续时间内离子阵鞘层边界的扩展。     

增强辉光放电等离子体离子注入的三维PIC／MC模拟

采用三维粒子模拟／蒙特卡洛模型自洽地模拟了增强辉光放电等离子体离子注入过程中离子产生和注入,获得了放电空间的离子总数、电势分布、等离子体密度分布和离子入射剂量等信息．模拟结果表明,5μs时鞘层达到稳定扩展,15μs时离子的产生与注入达到平衡,证实了增强辉光放电等离子体离子注入能在一定条件下实现白持的辉光放电．注入过程中,在点状阳极正下方存在一个高密度的等离子体区域,证实了电子聚焦效应．除靶台边缘外,离子的注入速率稳定且入射剂量均匀．脉冲负偏压提高时注入速率增加但入射剂量的均匀性变差．     

ECR微波等离子体离子输运的数值模拟

建立了ECR微波等离子体源离子输运的平板和圆柱模型,对离子历经的空间区域的输运过程进行了数值研究。采用Monte Carlo(M-C)方法模拟了存在外磁场情况下,离子离开开放电室后历经中性区、鞘层区、最后被加负偏压的工作表面吸收的全过程,考虑了离子与中性粒子的电荷交换碰撞玫弱性散性,统一处理了中性区和鞘层区电势的衔接,采用曲线拟合,电势自洽迭代方法把中性区和鞘层区衔接起来,得到了光滑自治的电势分布曲线和鞘层区不同位置处的速度分布、能量分布及角分布。     

A numerical simulation of surface wave excitation in a rectangular planar-type plasma source

The principle of surface wave plasma discharge in a rectangular cavity is introduced simply based on surface plasmon polariton theory. The distribution of surface-wave electric field at the interface of the plasma-dielectric slab is investigated by using the three-dimensional finite-difference time-domain method (3D-FDTD) with different slot-antenna structures. And the experimental image of discharge with a novel slot antenna array and the simulation of the electric field with this slot antenna array are both displayed. Combined with the distribution of surface wave excitation and experimental results, the numerical simulation performed by using 3D-FDTD is shown to be a useful tool in the computer-aided antenna design for large area planar-type surface-wave plasma sources.     

Modeling of argon discharge characteristics of planar-type surface wave plasmas in an electron fluid model

The planar-type surface wave plasma (SWP) device permits the generation of high-density and uniform processing plasmas via 2.45-GHz microwave power without the application of an external magnetic field. In the present study, the discharge characteristics in the SWP device were analyzed using a two-dimensional numerical simulation code, and the results were compared with experimental observations. The simulation code is based on the finite-difference time-domain (FDTD) method for the microwave field and on the electron fluid model for the argon discharge plasma. Experimental measurements were performed, and they showed that the surface-wave discharge at a filling pressure of 10-100 mtorr has characteristic electron-density distributions that have a peak at approximately 2 cm from the surface. This characteristic of the electron density profiles, as well as the electron temperature profiles in the plasma, is reproduced by the simulation code, albeit with some discrepancies. In order to reduce the effects of these discrepancies, intentional changes in the electron heat conductivity were introduced, and the adiabatic assumption was found to result in a reasonable electron temperature profile. The effects of the alumina window thickness were also investigated in the simulation.     

Reflection of Surface Plasmon Polaritons by a Corner Reflector of Negative Index Materials

A novel type of corner reflector for the reflection of surface plasmon polariton (SPP) is proposed. The reflector consists of two layers of compensatory media whose permittivity and permeability take opposite signs to that of the corresponding layer of the SP waveguide. By rigorously solving Maxwell's equations, the reflected SPP is proved to exist. The transverse wave vector of the reflected SPP is always antiparallel to that of the incident SPP and no phase retardation is introduced.     

Self-consistent three-dimensional modeling and simulation of large-scale rectangular surface-wave plasma source

A self-consistent and three-dimensional (3D) model of argon discharge in a large-scale rectangular surface-wave plasma (SWP) source is presented in this paper, which is based on the finite-difference time-domain (FDTD) approximation to Maxwell's equations self-consistently coupled with a fluid model for plasma evolution. The discharge characteristics at an input microwave power of 1200~W and a filling gas pressure of 50~Pa in the SWP source are analyzed. The simulation shows the time evolution of deposited power density at different stages, and the 3D distributions of electron density and temperature in the chamber at steady state. In addition, the results show that there is a peak of plasma density approximately at a vertical distance of 3~cm from the quartz window.     

Self-consistent charge-up simulation for the microscopic feature of SiO2 layer in rf capacitive discharge

The charge-up simulation of the microscopic feature with SiO₂ layer was investigated in various conditions of rf capacitive discharge by using the three-dimensional (3-D) particle-in-cell (PIC) charge-up simulation coupled with the one-dimensional (1-D) particle-in-cell Monte Carlo collision (PIC-MCC) simulation of rf capacitive argon discharge. The result showed that the charge-up effect on the micro-trench was greatly influenced by the conditions of the gas pressure and the discharge voltage in rf capacitive discharge. Based on the analysis of the distributions of electrons and ions arriving at the substrate in various plasma conditions, the charge-up effect and its reduction mechanisms on the micro-trench of capacitive discharge were discussed. This article is expected to provide qualitative and quantitative insight for the understanding of charging and its reduction mechanism on many plasma processes performed by the rf capacitive discharge.     

干涉高斯光诱导的表面等离子激元驻波场的分析

考虑到实际入射光强的空间分布不均匀,基于Kretschmann模型并采用角谱方法分析模拟了两束高斯光干涉诱导表面等离子激元(SPP)驻波场。与理想平面波不同,高斯光诱导的SPP干涉条纹幅值大小不等,分布复杂,这表明光强空间非均匀程度会严重地影响到曝光深度的分布。还分析了金属薄膜的厚度、损耗以及光刻胶的介电常数对SPP驻波场的影响,并得出不恰当的金属板厚和细微损耗都会极大削弱SPP驻波场,而如果光刻胶的介电常数过大则有可能产生不了表面等离子体共振的结论。     

Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis.     

Extraordinary optical transmission through metal gratings with single and double grooved surfaces

We investigate the transmission properties of a normally incident TM plane wave through metal films with periodic parabolic-shaped grooves on single and double surfaces using the finite-difference-time-domain method. Nearly zero transmission efficiency is found at wavelengths corresponding to surface plasmon excitation on a flat surface in the case where the single surface is grooved. Meanwhile, resonant excitation of surface plasmon polariton (SPP) Bloch modes leads to a strong transmission peak at slightly larger wavelengths. When the grating is grooved on double surfaces, the transmission enhancement can be dramatically improved due to the resonant tunnelling between SPP Bloch modes.