掺镧锆锡钛酸铅陶瓷极化强度变化量对电子发射电流强度的影响

铁电阴极因其优异的电子发射性能在高功率微波管的电子束源、平板显示技术以及宇航推进器等领域 有着广阔应用前景而日益受到人们的重视.大量研究表明,铁电阴极电子发射性能受阴极材料性能的影响. 在激励电场作用下,铁电阴极材料会产生表面非屏蔽电荷而引起极化强度的变化, 这表明铁电阴极电子发射性能可能与阴极材料的极化强度变化量存在着某种关系. 为研究阴极材料极化强度变化量对铁电阴极电子发射性能的影响,以掺镧锆锡钛酸铅铁电和反铁电陶瓷样品 作为阴极材料,通过正半周电滞回线测试得到阴极材料在不同电场强度下的极化强度变化量, 测量得到电子发射电流强度随激励电场的变化曲线,并分析了电子发射电流强度与极化强度变化量的关系. 结果表明,两种样品电子发射电流强度与极化强度变化量正相关.     

BIT/PLZT/BIT多层铁电薄膜结构设计及制备的实验研究

为了有效阻止锆钛酸铅镧(PLZT)与半导体界面发生反应和互扩散,根据锆钛酸铅镧和钛酸铋(B IT)各自的铁电性能,提出了一种新的设计思想———多层铁电薄膜.采用脉冲准分子激光淀积(PLD)方法制备了B IT/PLZT/B IT多层铁电薄膜.采用Sawyer-Tower电路测量,其剩余极化强度Pr=34μC/cm2,矫顽场Ec=40 kV/cm.这种结构吸收了锆钛酸铅镧和钛酸铋的优点,提高了铁电薄膜的铁电性能.     

聚合物电导率对0-3型压电复合材料极化性能的影响

建立了0-3型压电复合材料的等效电学模型.分析了聚合物电导率对复合材料极化性能的影响，研究了聚苯胺改性0-3型锆钛酸铅/聚偏氟乙烯复合材料极化性能与聚合物电导率之间的关系.理论分析和实验结果均表明，提高聚合物电导率可以提高复合材料的极化性能. 关键词： 压电复合材料 电导率 极化 聚偏氟乙烯     

强电场作用下反铁电锆钛酸铅的介电行为研究

采用电滞回线方法和偏置直流电场中叠加小交变电场方法研究了锆钛酸铅反铁电陶瓷材料在强电场作用下的介电行为.测量结果显示，锆钛酸铅反铁电材料的介电常数随外加电场强度呈非线性变化，在反铁电 铁电转变的电场区间形成介电峰.表征极化强度随电场强度变化率的微分介电常数εd峰值出现在反铁电 铁电转换电场强度处，最高达到41000.随着偏置电场增加反铁电向铁电体转变过程中，小信号介电常数εc减小；在电场降低铁电回复成反铁电过程中，小信号介电常数εc增大，小信号介电常数εc峰先于微分介电常数εd峰出现.根据电场作用下反铁电 关键词： 锆钛酸铅反铁电陶瓷 介电行为 强电场条件     

铁电阴极前电极表面等离子体横向扩散速度估算

分析了激励脉冲电压作用下铁电阴极电容的变化,即等离子体沿着铁电阴极前电极表面扩散而引起电容变化;建立了激励脉冲电压作用下铁电阴极等效电容模型并推导铁电阴极前电极表面等离子横向扩散速度表达式。采用传统固相烧结工艺制备的掺镧锆锡钛酸铅反铁电陶瓷作为阴极材料,通过测量激励脉冲电压作用下铁电阴极两端的电压及充放电电流,计算得到掺镧锆锡钛酸铅陶瓷表面等离子体横向扩散速度为1.89×106 cm/s。     

反铁电陶瓷的强电子发射特性研究

采用掺镧锆锡钛酸铅反铁电陶瓷作为阴极材料,研究了脉冲电压激励下陶瓷的电子发射特性.当激励电压为800V、抽取电压为0V时,得到1.27A/cm²的发射电流密度;当抽取电压增加到4kV时,获得1700A/cm²的发射电流密度.分析了发射电流随抽取电压的变化关系,讨论了反铁电陶瓷强电子发射的内在机理.结果表明：掺镧锆锡钛酸铅反铁电陶瓷能够在较低的激励电压(400V)下实现电子发射,发射电流远大于按照Child-Langmuir定律计算出的电流,三接点附近局域反铁电—铁电相变产生初始电子发射,初始电子电离中性粒子形成等离子体,增强了电子发射. 关键词： 铁电阴极 反铁电体 电子发射     

(111)取向(Pb,La)TiO3铁电薄膜中90°纳米带状畴与热释电性能的研究

采用射频磁控溅射技术在Pt/Ti/SiO2/Si(100)衬底上生长了掺镧钛酸铅(PLT)铁电薄膜.用X射线衍射技术(XRD)研究了PLT薄膜结晶性能,结果表明PLT薄膜为(111)择优取向钙钛矿相织构.使用原子力显微镜(AFM)和压电响应力显微镜(PFM)分别观察了PLT薄膜的表面形貌和对应区域的电畴结构.PFM观察显示PLT薄膜中存在90°纳米带状畴,电畴的极化为首尾相接的低能量的排列方式,带状畴的宽度为20-60nm.研究了PLT10铁电薄膜的制备条件与性能之间的关系.发现在优化条件下制备的PLT10铁电薄膜的介电常数εr为365、介电损耗tgδ为0.02,热释电系数γ为2.18×10-8C·(cm2·K)-1,可以满足制备非制冷红外探测器的需要.     

(111)取向(Pb,La)TiO3铁电薄膜中90°纳米带状畴与热释电性能的研究

采用射频磁控溅射技术在Pt/Ti/SiO₂/Si(100)衬底上生长了掺镧钛酸铅(PLT)铁电薄膜.用X射线衍射技术(XRD)研究了PLT薄膜结晶性能，结果表明PLT薄膜为 (111)择优取向钙钛矿相织构.使用原子力显微镜(AFM)和压电响应力显微镜(PFM) 分别观察了PLT薄膜的表面形貌和对应区域的电畴结构.PFM观察显示PLT薄膜中存在90°纳米带状畴，电畴的极化为首尾相接的低能量的排列方式，带状畴的宽度为20—60nm.研究了PLT10铁电薄膜的制备条件与性能之间的关系.发现在优化条件下制备的PLT10铁电薄膜的介电常数ε_r为365、介电损耗tgδ为0.02，热释电系数γ为2.18×10^-8C·(cm²·K)^-1，可以满足制备非制冷红外探测器的需要. 关键词： PLT薄膜 电畴 PFM 极化     

镝掺杂锆钛酸铅镧透明陶瓷的结构和电光性能

针对锆钛酸铅镧(PLZT)电光陶瓷在光调制器应用中存在工作电压偏高、场致滞后明显等不足,以镧系镝(Dy)元素对锆钛酸铅镧(Pb0.88La0.12)(Zr0.4Ti0.6)0.96O3 [PLZT(12/40/60)]线性电光材料进行掺杂改性.采用热压技术研制镝掺杂锆钛酸铅镧[Pb0.88(La1-xDyx)0.12](Zr0.40Ti0.60)0.96O3](PLDZT)(x=0.1～0.5)透明电光陶瓷.系统考察了PLDZT透明陶瓷的光学性能和电光特性及其与材料结构的相关性.研究表明,Dy掺杂导致材料晶格畸变,微量Dy掺杂有效提高了 PLZT(12/40/60)透明陶瓷的光学透过率,并且使典型的线性电光材料呈现二次电光效应特征,二次电光系数R约为5.59×10-15m2/V2;同时掺杂改性的PLDZT(x=0.1)透明陶瓷的驱动电压较未改性PLZT材料明显降低.     

铁电体电子发射特性的实验

铁电体在高压脉冲或者激光脉冲的激励下发射电子。铁电体的极化方向处在预极化(通过外部的条件，改变畴方向，使畴沿着一定的方向)方向，正、负束缚电荷等量的分布于与极矩相对的两表面上，这些电荷与外部空间的粉尘等所带的电荷中和，宏观上不表现出带电性；在负的束缚电荷聚集的表面加负高压脉冲，这时负的束缚电荷与负的自由电荷互相排斥，电荷与负的自由电相排斥，使畴的极化方向发生反转。反转后负的束缚电荷与岁的自由电荷之间形成很强的电场，可以达到GV／cm，在这一强电场作用下，负的自由电荷被排斥，离开铁电体表面，形成电子发射。     

溶胶-凝胶法制备Pb(Zr1?xTix)O3复合梯度薄摸以及介电与热释电特性

"在Pt/Ti/SiO2/Si基片上用溶胶-凝胶法生长制备了PZT(Pb(Zr1-xTix)O3)复合梯度铁电薄膜． 薄膜最终结构由6层组成,"向上"梯度薄膜在Pt底电极上的第一层从PbZrO3开始,顶层是PZT(50/50),即第一层是PbZrO3,第二层PZT90/10 (10%Ti),第三层是PZT80/20,第四层PZT70/30,第五层PZT60/40,第六层PZT50/50．每一层与此相反的是"向下"梯度PZT薄膜．用X射线衍射、俄歇电子能谱和阻抗分析来研究梯度薄膜的结构与介电特性．600     

Nanostructured heterophase thin films of lead zirconate titanate

The results of a comprehensive study of electrophysical and photoelectric properties of capacitor structures are analyzed within the proposed model of Pb(ZrTi)O₃ (PZT) films with an excess lead content, which is based on the presence of heterophase intergrain boundaries. It is shown that aging of thin-film capacitor structures is accompanied by a significant increase in the oxygen content in submicron PZT films, as well as by the modification of elemental and phase compositions of the interfaces. It is confirmed experimentally that a decrease in the switching charge in the aged PZT films is due to the oxygen sorption at heterophase crystallite boundaries containing lead oxide and to pinning of the polarization in regions adjacent to the charged boundaries. It is demonstrated that the current-voltage characteristics of the capacitor structures are described in terms of the mechanisms of space-charge-limited currents.     

Knudsen cell mass spectrometric investigation of the PbO-ZrO(2)-TiO(2) system

Knudsen effusion mass spectrometry (KEMS) was used for direct determination of lead oxide activity as a function of temperature in various regions of the PbO-ZrO(2)-TiO(2) system. From the results, the enthalpy, Gibbs free energy and entropy of formation of PbTiO(3) (PT), PbZrO(3) (PZ) and Pb(Zr,Ti)O(3) (PZT) were evaluated. In addition, the single phase widths of Pb(Zr(0.5)Ti(0.5))O(3) and PbTiO(3) perovskite structures were determined at 1100 K. The reaction rate of PZT synthesis in vacuo was followed by direct measurement of the change of PbO activity with time. Lead oxide activity in stoichiometric Pb(Zr(0.5)Ti(0.5))O(3), PbTiO(3) and Pb(0.968)(Zr(0.5)Ti(0.5))O(2.968) (3% lead deficient) at 850 degrees C was found to be 0.40, 0.45 and 0.1, respectively. PZT, PT and PZ powder samples prepared by a solid state procedure were also measured, all revealing lead deficiency. Copyright 1999 John Wiley & Sons, Ltd.     

Electronic structure of O-doped SiGe calculated by DFT+U method

To more in depth understand the doping effects of oxygen on Si Ge alloys, both the micro-structure and properties of O-doped Si Ge(including: bulk,(001) surface, and(110) surface) are calculated by DFT + U method in the present work.The calculated results are as follows.(i) The(110) surface is the main exposing surface of Si Ge, in which O impurity prefers to occupy the surface vacancy sites.(ii) For O interstitial doping on Si Ge(110) surface, the existences of energy states caused by O doping in the band gap not only enhance the infrared light absorption, but also improve the behaviors of photo-generated carriers.(iii) The finding about decreased surface work function of O-doped Si Ge(110) surface can confirm previous experimental observations.(iv) In all cases, O doing mainly induces the electronic structures near the band gap to vary, but is not directly involved in these variations. Therefore, these findings in the present work not only can provide further explanation and analysis for the corresponding underlying mechanism for some of the experimental findings reported in the literature, but also conduce to the development of μc-Si Ge-based solar cells in the future.     

Suppressed dependence of polarization on epitaxial strain in highly polar ferroelectrics

A combined experimental and computational investigation of coupling between polarization and epitaxial strain in highly polar ferroelectric PbZr(0.2)Ti(0.8)O3 (PZT) thin films is reported. A comparison of the properties of relaxed (tetragonality c/a approximately 1.05) and highly strained (c/a approximately 1.09) epitaxial films shows that polarization, while being amongst the highest reported for PZT or PbTiO3 in either film or bulk forms P(r) approximately 82 microC/cm(2)), is almost independent of the epitaxial strain. We attribute this behavior to a suppressed sensitivity of the A-site cations to epitaxial strain in these Pb-based perovskites, where the ferroelectric displacements are already large, contrary to the case of less polar perovskites, such as BaTiO3. In the latter case, the A-site cation (Ba) and equatorial oxygen displacements can lead to substantial polarization increases.     

Pulsed laser deposition of Pb(Zr0.52Ti0.48)O3 thin film on cobalt ferrite nano-seed layered Pt(111)/Si substrate: effect of oxygen pressure

The effect of oxygen pressure during pulsed laser deposition of Pb(Zr_0.52Ti_0.48)O₃ (PZT) thin films on CoFe₂O₄ nano-seed layered Pt(111)/Si substrate was investigated. The PZT film deposited at oxygen pressure lower than 25 mTorr is identified as both perovskite and pyrochlore phases and the films deposited at high oxygen pressure (50-100 mTorr) show the single-phase perovskite PZT that has a perfect (111)-orientation. In addition, the film deposited at P_O2 of 50 mTorr has a uniform surface morphology, whereas the film deposited at P_O2 of 100 mTorr has a non-uniform surface morphology and more incompacted columnar cross-section microstructure. The polarization of film deposited at 100 mTorr is higher than that deposited at 50 mTorr, but shift of the hysteresis loop along the electrical field axis in the film deposited at P_O2 of 100 mTorr is larger than that of the film deposited at P_O2 of 50 mTorr.     

Electronic structure and adsorption properties of the system Cs/O/W(110)

Comparative studies are carried out of the Cs/O/W(110) and Cs/W(110) adsorption systems. The method of threshold photoemission spectroscopy is used to study the work function and electronic structure in the energy region near the Fermi level as functions of the sub-monolayer cesium coverage. A significant increase of the saturation cesium coverage is observed on the O/W(110) surface. A new adsorption-induced surface band is observed in the electronic spectrum of the system Cs/O/W(110) with a binding energy ∼0.7 eV. For coverages of about one monolayer metallization of the adsorbed layer is observed. It is shown that the electronic structures of the systems Cs/O/W(110) and Cs/W(110) are similar for low coverages. A difference in the adsorption properties for these two systems occurs for coverages close to one monolayer, which is explained by the creation of new interaction centers of the Cs adatoms on the W(110) surface in the presence of oxygen. Fiz. Tverd. Tela (St. Petersburg) 39, 1683–1686 (September 1997)     

Structural,electronic, stability and reduction properties of perovskite surfaces: The case of rhombohedral BaCeO3

The (100), (110) and (111) surfaces of rhombohedral phase BaCeO₃ perovskite with two kinds of surface terminations are investigated using a periodic DFT + U method. We show that the lowest energy for surface formation via crystal cutting (cleavage energy) corresponds to (100) terminations. Out of all studied terminations, only BaO(100) and BaCeO(110) are stable with respect to precipitation of oxide phases and metals in respective ranges of oxygen chemical potentials, whereas CeO2(100) termination is not stable with respect to CeO₂ precipitation for all temperatures and oxygen partial pressures. Analyzing the electronic properties of the surfaces, we have established that reduction of the cerium oxidation state occurs in response to the local stoichiometry (lack of surface oxygen's, etc.) rather than as a result of breaking of cerium–oxygen bonds and formation of under-coordinated cerium ions. This equally applies to cerium reduction in the case of surface vacancy formation. We have calculated the vacancy formation energies as these can be viewed as a measure of surface activity in the catalytic reaction with various adsorbates. We find that CeO2 termination of the (100) surface and modified O2 termination of the (110) surface (O termination) have the lowest vacancy formation energies.     

Research of the behaviour of O chemisorption on the (110) surface of Rhx--Pt1－x alloy

An atomic group model of the disordered binary alloy Rhx-Pt1-x has been constructed to investigate surface segregation. According to the model, we have calculated the electronic structure of the Rhx-Pt1-x alloy surface by using the recursion method when O atoms are adsorbed on the Rhx-Pt1-x （110） surface under the condition of coverage 0.5. The calculation results indicate that the chemical adsorption of O changes greatly the density of states near the Fermi level, and the surface segregation exhibits a reversal behaviour. In addition, when x 〈 0.3, the surface on which O is adsorbed displays the property of Pt; whereas when x 〉 0.3 it displays the property of Rh.     

无序二元合金（NixCu1－x）不同解理面上O吸附对Cu偏析的影响

应用计算机编程构造出了存在和不存在表面偏析的无序二元合金Ni_xCu_1-x (x=0.4)(１００)表面及(１１０)表面的原子集团模型，然后按覆盖度θ=0.5，构造 出了O吸附后的原子集团模型，应用Recursion方法计算了O在Ni_xCu_{1-x(存在偏析和不存在偏析时)无序二元合金(１００)和(１１０)表面吸附的电子结构.由此 得出：1)O吸附使合金表面态密度峰降低，带宽加宽，并且表面Ni原子的d电子与吸附质O原 子的s，p电子的共价作用比Cu更强烈；2)O吸附在NixCu1-x(x=0.4) (１１０)表面比(１００)表面更稳定；3)O的吸附抑制了Cu在表面富集，且这种作用主要表 现在表面一层. 关键词： 化学吸附 表面偏析 Recursion方法 态密度}