Efficient realization of daytime radiative cooling with hollow zigzag SiO_2 metamaterials

A tunable selective emitter with hollow zigzag SiO_2 metamaterials, which are deposited on Si_3 N_4 and Ag film, is proposed and numerically investigated for achieving excellent radiative cooling effects. The average emissivity reaches a high value of 98.7% in the atmospheric window and possesses a high reflectivity of 92.0% in the solar spectrum. To reveal the enhanced absorptivity, the confined electric field distribution is investigated, and it can be well explained by moth eye effects. Moreover, tunable emissivity can also be initiated with different incident angles and it stays above 83% when the incident angle is less than 80°, embodying the excellent cooling performance in the atmospheric transparency window.Its net cooling power achieves 100.6 W·m~(-2), with a temperature drop of 13°, and the cooling behavior can persist in the presence of non-radiative heat exchange conditions. Therefore, high and tunable selective emitters based on our designed structure could provide a new route to realizing high-performance radiative cooling. This work is also of great significance for saving energy and environmental protection.     

YVO_4∶Eu~(3+)@SiO_2核壳结构纳米复合材料的合成与表征

用沉淀法制备了尺寸约为8 nm的YVO4∶Eu3+纳米粒子,然后用反相微乳液法在YVO4∶Eu3+纳米粒子的表面包覆了一层Si O2壳。利用XRD、TEM、UV-Vis吸收光谱和光致发光光谱对合成的样品进行了表征。得到的复合物具有较好的核壳结构,通过改变硅酸四乙酯的用量可以改变Si O2壳的厚度。研究了Si O2壳对YVO4∶Eu3+发光性质的影响,结果表明:包覆和未包覆的样品在紫外光激发下都有Eu3+的特征发射;随着Si O2壳厚度的增加,发光强度和量子效率越来越低,Eu3+格位对称性越来越高。     

Device simulation of lead-free CH_3NH_3SnI_3 perovskite solar cells with high efficiency

The lead-free perovskite solar cells(PSCs) have drawn a great deal of research interest due to the Pb toxicity of the lead halide perovskite.CH_3NH_3SnI_3 is a viable alternative to CH_3NH_3PbX_3,because it has a narrower band gap of 1.3 eV and a wider visible absorption spectrum than the lead halide perovskite.The progress of fabricating tin iodide PSCs with good stability has stimulated the studies of these CH_3NH_3SnI_3 based cells greatly.In the paper,we study the influences of various parameters on the solar cell performance through theoretical analysis and device simulation.It is found in the simulation that the solar cell performance can be improved to some extent by adjusting the doping concentration of the perovskite absorption layer and the electron affinity of the buffer and HTM,while the reduction of the defect density of the perovskite absorption layer significantly improves the cell performance.By further optimizing the parameters of the doping concentration(1.3 × 10~(16) cm~3) and the defect density(1 × 10~(15) cm~3) of perovskite absorption layer,and the electron affinity of buffer(4.0 eV) and HTM(2.6 eV),we finally obtain some encouraging results of the J_(sc) of 31.59 mA/cm~2,V_(oc) of 0.92 V,FF of 79.99%,and PCE of 23.36%.The results show that the lead-free CH_3NH_3SnI_3 PSC is a potential environmentally friendly solar cell with high efficiency.Improving the Sn~(2+) stability and reducing the defect density of CH_3NH_3SnI_3 are key issues for the future research,which can be solved by improving the fabrication and encapsulation process of the cell.     

Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640×512 focal plane array

In this paper we focused on the mask technology of inductively coupled plasma(ICP) etching for the mesa fabrication of infrared focal plane arrays(FPA).By using the SiO_2 mask,the mesa has higher graphics transfer accuracy and creates less micro-ripples in sidewalls.Comparing the IV characterization of detectors by using two different masks,the detector using the SiO_2 hard mask has the R_0A of 9.7×10~6 Ω·cm~2,while the detector using the photoresist mask has the R_0A of3.2 × 10~2 Ω·cm~2 in 77 K.After that we focused on the method of removing the remaining SiO_2 after mesa etching.The dry ICP etching and chemical buffer oxide etcher(BOE) based on HF and NH4 F are used in this part.Detectors using BOE only have closer R_0A to that using the combining method,but it leads to gaps on mesas because of the corrosion on AlSb layer by BOE.We finally choose the combining method and fabricated the 640×512 FPA.The FPA with cutoff wavelength of 4.8 μm has the average R_0A of 6.13 × 10~9 Ω·cm~2 and the average detectivity of 4.51 × 10~9 cm·Hz~(1/2).W~(-1)at 77 K.The FPA has good uniformity with the bad dots rate of 1.21%and the noise equivalent temperature difference(NEDT) of 22.9 mK operating at 77 K.     

Investigation of 1.3 μm emission in Nd-doped bismuth-based oxide glasses

Nd₂O₃-doped 43Bi₂O₃–xB₂O₃–(57−x)SiO₂–1.0Nd₂O₃ (x=57, 47, 39, 28.5, 19.5, 10, 0 mol%) bismuth glasses were prepared by the conventional melt-quenching method, and the Nd³⁺: ⁴F_3/2→⁴I_13/2 fluorescence properties had been studied in an oxide system Bi₂O₃–B₂O₃–SiO₂. The Judd–Ofelt analysis for Nd³⁺ ions in bismuth boron silicate glasses was also performed on the basis of absorption spectrum, and the transition probabilities, excited-state lifetimes, the fluorescence branching ratios, quantum efficiency and the stimulated emission cross-sections of ⁴F_3/2→⁴I_13/2 transition were calculated and discussed. The stimulated emission cross-sections of 1.3 μm were quite large due to a large refractive index of the host. Although the effective bandwidths decreased with increasing SiO₂ content, quantum efficiencies and stimulated emission cross-sections enhanced largely with increasing SiO₂ content.     

Rare earth photoionization study by the resonant microwave cavity technique

Photoconductivity spectra of rare earth-doped insulating materials are measured using the resonant microwave cavity method. This technique is based on the detection of the cavity Q-factor changes induced by irradiation of the sample (inserted in the cavity) by a pulsed tunable laser. Results obtained with Lu₂(SiO₄)O:Ce³⁺ and BaF₂:Eu²⁺ are presented and discussed. Photoionization thresholds at 400 nm (3.1 eV) and 310 nm (4.0 eV) are measured for Lu₂(SiO₄)O:Ce³⁺ and BaF₂:Eu²⁺, respectively.     

花状掺杂W-VO$lt;sub$gt;2$lt;/sub$gt;/ZnO热致变色纳米复合薄膜研究

为解决掺杂引起的二氧化钒薄膜的红外调制幅度下降以及二氧化钒复合薄膜相变温度需要进一步降低等问题, 采用纳米结构、掺杂改性和复合结构等多种机理协同作用的方案, 利用共溅射氧化法, 先在石英玻璃上制备高(002)取向的ZnO薄膜, 再在ZnO层上室温共溅射沉积钒钨金属薄膜, 最后经热氧化处理获得双层钨掺杂W-VO₂/ZnO纳米复合薄膜. 利用X射线衍射、X射线光电子能谱、扫描电镜和变温光谱分析等对薄膜的结构、组分、形貌和光学特性进行了分析. 结果显示, W-VO₂/ZnO 纳米复合薄膜呈花状结构, 取向性提高, 在保持掺杂薄膜相变温度(约39 ℃)和热滞回线宽度(约6 ℃)较低的情况下, 其相变前后的红外透过率差量增加近2倍, 热致变色性能得到协同增强. 关键词： 2')" href="#">VO₂ ZnO W掺杂 热致变色     

NaZnLa(PO4)2中Ce3+和Tb3+的发光

采用高温固相反应合成了NaZnLa(PO₄)₂中掺杂Ce³⁺、Tb³⁺的荧光体,对其晶体结构、发光行为进行了研究,并尝试对NaZnLa(PO₄)₂:Ce,Tb荧光体进行调制。NaZnLa(PO₄)₂是LaPO₄的同构物,为单斜晶系独居石结构,从XRD谱数据得到NaZnLa(PO₄)₂基质的晶胞参数为a=0.6823nm,b=0.7045nm,c=0.6497nm,β=1039°,v=0.303nm³,其晶胞参数与单斜LaPO₄的晶胞参数相似。在NaZnLa(PO₄)₂:Ce,Tb荧光体中,Ce³⁺对Tb³⁺有良好的敏化作用,掺杂适量的BO₃^3-、Al³⁺、Dy³⁺,可以增强发光亮度。     

微通道板离子壁垒膜粒子阻透特性的蒙特卡罗模拟

在三代微光像管中,微通道板(MCP)输入面上覆盖一层超薄离子壁垒膜(IBF),目的是保护光电阴极,延长像管使用寿命.为了深入研究离子壁垒膜的特性,本文对Al2O3和SiO2两种离子壁垒膜的粒子阻透能力进行了蒙特卡罗模拟,结果表明:5 nm厚Al2O3和SiO2离子壁垒膜的死电压分别为230 ～240 V和220～230...     

Time-dependent response of interface states determined by using differential isothermal transient spectroscopy

A method based on the differential analysis of the isothermal transients is proposed to study the dynamical properties of the charging and discharging of interface states, and several possibilities of using this method are shown. The results obtained in SiO₂/Si and Si₃N₄/SiO₂/Si samples are in agreement with the existence of a spatial and energy distribution of interface states within the insulator. From the experimental data, the concentration of traps within the insulator at 35 Å is estimated to be 5×10⁹ cm^-2 eV^-1, with a tunneling cross section 10^-19 cm², at E_c-E ≈ 0.2 eV.     

A simulation study on p-doping level of polymer host material in P3HT:PCBM bulk heterojunction solar cells

In this study,we investigate the influence of doping on the charge transfer and device characteristics parameters in the bulk heterojunction solar cells based on poly(3-hexylthiophene)(P3HT) and a methanofuUerene derivative(PCBM).Organic semiconductors are also known to be not pure and they have defects and impurities,some of them are being charged and act as p-type or n-type dopants.Calculations of the solar cell characteristics parameters versus the p-doping level have been done at three different n-dopings(N_d) that consist of 5 × 10~(17) cm~(-3),10~(18) cm~(-3),and 5 × 10~(18) cm~(-3).We perform the analysis of the doping concentration through the drift-diffusion model,and calculate the current and voltage doping dependency.We find that at three different n-dopant levels,optimum p-type doping is about N_p = 6 × 10~(18) cm~(-3).Simulation results have shown that by increasing doping level,V_(oc) monotonically increases by doping.Cell efficiency reaches its maximum at somewhat higher doping as FF has its peak at N_p = 3 × 10~(18) cm~(-3).Moreover,this paper demonstrates that the optimum value for the p-doping is about N_p = 6 × 10~(18) cm~(-3) and optimum value for n-dopant is N_d = 10~(18) cm~(-3),respectively.The simulated results confirm that doping considerably affects the performance of organic solar cells.     

In-plane oriented CH_3NH_3PbI_3 nanowire suppression of the interface electron transfer to PCBM

One-dimensional nanowire is an important candidate for lead-halide perovskite-based photonic detectors and solar cells. Its surface population, diameter, and growth direction, etc., are critical for device performance. In this research,we carried out a detailed study on electron transfer process at the interface of nanowire CH_3 NH_3 PbI_3(N-MAPbI_3)/Phenyl C61 butyric acid methyl-ester synonym(PCBM), as well as the interface of compact CH_3 NH_3 PbI_3(C-MAPbI_3)/PCBM by transient absorption spectroscopy. By comparing the carrier recombination dynamics of N-MAPbI_3, N-MAPbI_3/PCBM,C-MAPbI_3, and C-MAPbI_3/PCBM from picosecond(ps) to hundred nanosecond(ns) time scale, it is demonstrated that electron transfer at N-MAPbI_3/PCBM interface is less efficient than that at C-MAPbI_3/PCBM interface. In addition, electron transfer efficiency at C-MAPbI_3/PCBM interface was found to be excitation density-dependent, and it reduces with photo-generation carrier concentration increasing in a range from 1.0 × 1018 cm~(-3)–4.0 × 1018 cm~(-3). Hot electron transfer,which leads to acceleration of electron transfer between the interfaces, was also visualized as carrier concentration increases from 1.0 × 10~(18) cm~(-3)–2.2 × 10~(18) cm~(-3).     

Analysis of frequency-dependent series resistance and interface states of In/SiO2/p-Si (MIS) structures

In this work, the investigation of the interface state density and series resistance from capacitance–voltage (C–V) and conductance–voltage (G/ω−V) characteristics in In/SiO₂/p-Si metal–insulator–semiconductor (MIS) structures with thin interfacial insulator layer have been reported. The thickness of SiO₂ film obtained from the measurement of the oxide capacitance corrected for series resistance in the strong accumulation region is 220 Å. The forward and reverse bias C–V and G/ω−V characteristics of MIS structures have been studied at the frequency range 30 kHz–1 MHz at room temperature. The frequency dispersion in capacitance and conductance can be interpreted in terms of the series resistance (R_s) and interface state density (D_it) values. Both the series resistance R_s and density of interface states D_it are strongly frequency-dependent and decrease with increasing frequency. The distribution profile of R_s–V gives a peak at low frequencies in the depletion region and disappears with increasing frequency. Experimental results show that the interfacial polarization contributes to the improvement of the dielectric properties of In/SiO₂/p-Si MIS structures. The interface state density value of In/SiO₂/p-Si MIS diode calculated at strong accumulation region is 1.11×10¹² eV⁻¹ cm⁻² at 1 MHz. It is found that the calculated value of D_it (≈10¹² eV⁻¹ cm⁻²) is not high enough to pin the Fermi level of the Si substrate disrupting the device operation.     

High and low thermal nitridation of SiO2 thin films

Thin thermal SiO₂ films on crystalline silicon substrate were nitrided at low ammonia pressures (10^-6P_NH310^-1 mbar) for times varying from 1 to 10 h, by means of two techniques. (i) Surface nitridation has been achieved by thermal activation at high temperature (HT), in the range 800–1100°C. (ii) A new process at low temperature (LT), was employed at T ≈ 30°C, under electron-beam irradiation; the nitridation-reaction rate depends on the electron energy (reaching a maximum within the energy range 1 to 2 keV), and on the electron flux. Conduction and electron trapping on the nitrided oxide films depends on the chemical compositions and on the amount of nitrogen incorporated into the bulk of the films and/or at the SiO₂-Si interface.     

三角翼大迎角非对称旋涡破裂数值模拟

采用由伪时间子迭代格式实现的二阶精度LU SGS方法进行时间推进,并以Jameson中心加人工粘性格式进行空间离散,应用层流假设和Baldwin Lomax(B-L)模式,求解雷诺平均的薄层Navier Stokes(N-S)方程组以模拟细长三角翼大迎角流动.为验证本方法,首先计算了具备实验数据的65°后掠角三角翼大迎角流场,获得令人满意的结果;然后模拟了80°后掠角的细长三角翼,研究其大迎角非对称旋涡破裂特性.     

N_2-H_2容性耦合等离子体电非对称效应的particle-in-cell/Monte Carlo模拟

H_2-N_2混合气体电容性耦合射频放电在有机低介电系数材料刻蚀中具潜在研究意义.采用paxticle-incell/Monte Carlo模型模拟了双频(13.56 MHz/27.12 MHz)电压源分别接在结构对称的两个电极上的H_2-N_2容性耦合等离子体特征,研究了其电非对称效应.模拟结果表明,通过调节两谐波间的相位角θ,可以改变其电场、等离子体密度、离子流密度的轴向分布及离子轰击电极的能量分布.当相位角θ为0°时,低频电极(晶片)附近主要离子(H_3~+)的密度最小,离子(H_3~+,H_2~+,H~+)轰击低频电极的流密度及平均能量最高;当θ从0°变化90°时,低频电极的自偏压从-103V到106V近似线性增加,轰击电极的离子流密度变化约±18%,H~+离子轰击低频电极的最大能量约减小2.5倍,轰击电极的平均能量约变化2倍,表明氢离子能量和离子流几乎能独立控制.     

Towards the preparation of realistic model Ziegler-Natta catalysts: XPS study of the MgCl2/TiCl4 interaction with flat SiO2/Si(1 0 0)

Despite of the wide use of supported Ti based Ziegler-Natta catalysts in the olefin polymerization industry, questions concerning the role of each one of the catalyst components in the polymerization process, have not found a satisfactory answer yet. This is mainly because of the high sensitivity of these systems to oxygen and atmospheric moisture that makes their study in an atomic level rather complicated. Realistic surface science models of the pre-activated SiO₂ supported MgCl₂/TiCl₄ and TiCl₄ Ziegler-Natta catalysts were prepared by spin coating on flat conductive SiO₂/Si(1 0 0) supports under inert atmosphere. This preparation technique resembles the wet chemical impregnation which is the industrial method of the catalyst preparation. XPS analysis showed that the catalyst precursor anchors on the silica surface through bonding of the Ti atoms with surface silanes or siloxanes, while Mg is attached to the Ti through chlorine bridges. Thermal treatment of the catalysts at 723 K leads to total Cl desorption when MgCl₂ is not present while a significant amount of the Ti atoms is reduced to the Ti³⁺ state.     

Modification of optical, chemical and structural response of CR-39 polymer by 50 MeV lithium ion irradiation

CR-39 polymer samples were irradiated with 50 MeV lithium ion beam; the fluence was varied in the range 10¹¹–10¹³ ionscm⁻². Irradiation effects were studied using UV–visible, FTIR spectroscopic and X-ray diffraction techniques. The observation of the recorded spectra shows that the detector is sensitive to swift ions irradiation and its UV absorption is influenced by the stopping power (dE/dx)_e. The FTIR spectra does not show any considerable changes due to the irradiation indicating that the detector is chemically stable. No appreciable change in the diffraction pattern of CR-39 polymer after irradiation upto the fluence level of 10¹³ ionscm⁻² is observed, showing its structural stability also.     

30 keV He~(2+)在不同倾斜角度的聚碳酸酯微孔膜中的传输过程

本文测量了30 keV的He~(2+)入射倾斜角度分别为-0.5~?,-1~?,-1.5~?和-2.5~?的聚碳酸酯纳米微孔膜后,出射粒子角度分布、电荷态分布以及相对穿透率随时间的演化.当微孔膜倾斜角度在-0.5~?,-1~?和-1.5~?时,出射的He~(2+)离子始终保持在入射束流方向,出射的He~0原子出射方向由微孔孔道方向逐渐转移到入射束流方向,在实验过程中观测到明显的电荷交换,这一现象与之前发现的导向效应不同,微孔内部沉积的电荷斑和微孔内表面原子的短程集体散射作用,克服入射离子的横向动量,使入射离子在微孔内表面以上以类似镜面掠射的方式出射,并发生时间演化效应,主要传输机制为电荷斑辅助的表面以上的类似镜面掠射行为.而当倾斜角度在-2.5~?时,出射的He~(2+)离子始终保持在入射束流方向,出射的He~0原子始终保持在微孔孔道方向,沉积的电荷斑很难克服入射离子的横向动量,没有时间演化效应,主要传输机制为微孔内表面以下的多次随机非弹性碰撞过程.这一物理图像使中能离子入射不同倾斜角度的微孔膜物理认识更加深入和完整.     

B-MQMAS and Si–{B} Double-Resonance NMR Studies on the Structure of Binary B2O3–SiO2 Glasses

Glasses in the system x B₂O₃·(1−x)SiO₂ (0.2≤x≤1.0) were studied using ¹¹B multiple quantum magic angle spinning NMR spectroscopy (MQMAS), ²⁹Si–\{¹¹B\} rotational echo adiabatic passage double-resonance and ²⁹Si–\}¹¹B\{ CP heteronuclear correlation spectroscopy. The results can be quantitatively interpreted in terms of a phase separation of the borosilicate glasses into a virtually SiO₂-free B₂O₃ phase and a mixed borosilicate phase. While the MQMAS spectra allowed the site speciation and resolution of at least two different ¹¹B resonances, attributable to BO_3/2 units consumed in boroxol rings, BO_3/2 units connecting the boroxol rings and BO_3/2 units involved in B–O–Si linkages, the analysis of the double-resonance data further elucidated the structure of the mixed borosilicate phase. The results indicate that only a fraction of 0.48 mol B₂O₃ can be accommodated per mole SiO₂, building a mixed borosilicate network.