深能级缺陷对半绝缘InP材料电学补偿的影响

对铁掺杂和高温退火非掺杂磷化铟制备的两种半绝缘材料的电学补偿和深能级缺陷进行了分析和比较.根据热激电流谱(TSC)测得的深能级缺陷结果，分析了这两种半绝缘InP材料中深能级缺陷对电学补偿的影响.在掺铁半绝缘InP材料中，由于存在高浓度的深能级缺陷参与电学补偿，降低了材料的补偿度和电学性能.相比之下，利用磷化铁气氛下高温退火非掺InP获得的半绝缘材料的深能级缺陷浓度很低，通过扩散掺入晶格的铁成为唯一的深受主补偿中心钉扎费米能级，材料表现出优异的电学性质.在此基础上给出了一个更为广泛的半绝缘InP材料的电学补偿模型.     

消除载流子分布的不均匀性的影响准确测量深中心俘获载流子的截面

Zylbersztejn指出在空间电荷区边界层中,由于势垒的存在而引起的载流子分布的不均匀性,对测量深中心对载流子的俘获截面的不良影响,并且提出一种消除这种影响的方法。可惜的是,他的方法只适用于在能级相当深的情况下,测量低温时载流子的俘获截面。本文在详细分析结电容瞬态动力过程的基础上,提出一种消除载流子分布不均匀(包括边界层中载流子分布不均匀和体内浅施主或浅受主浓度不均匀)的影响,准确测量俘获截面的方法,不受测量温度及样品中的能级情况的严重限制。这对于研究俘获截面与温度的关系以及进而研究俘获动力学机制是很 关键词：     

In0.49Ga0.51P中缺陷的俘获行为

利用深能级瞬态谱（ＤＬＴＳ）和瞬态光电阻率谱（ＴＰＲＳ）研究了利用金属有机物化学汽相沉淀（ＭＯＣＶＤ）生长的未有意掺杂的Ｉｎ０．４９Ｇａ０．５１Ｐ中缺陷对载流子的俘获过程和发射过程．利用ＤＬＴＳ测量观测到了一个激活能为０．３７ｅＶ的缺陷,该缺陷的俘获势垒值介于１８０ｍｅＶ到２４０ｍｅＶ之间．该缺陷的俘获势垒值的大的分布被解释为缺陷周围原子重组的微观波动．在研究中发现研究这些缺陷的俘获过程比发射过程更有效,俘获势垒为０．０６ｅＶ和０．４０ｅＶ的两个缺陷在俘获过程中被观测到,而在发射过程中并没有观测到     

测量半导体中深中心分布的双相关技术

自1974年D.V.Lang[1]提出深能级瞬态谱技术(DLTS)以来,DLTS已经成为研究半导体中深能级杂质,缺陷(以下统称深中心)的物理性质的广泛使用的有效手段.例如,通过DLTS测量可以得到深中心的浓度、俘获截面、能级位置等.1977年 H.Lefeve和 M.Schulz[2]提出了双相关DLTS技术(DDLTS),采用DDLTS技术可以方便地测量半导体中深中心的分布.测量半导体中深中心的分布在许多问题中是很重要的.例如在研究辐射损伤产生的深中心问题中,如果我们测得各个能级在经过不同温度退火过程后的浓度分布,则可判明哪些能级是属于同一个深中心.又如通过测…     

低温生长铝镓砷光折变效应的研究

三元化合物铝镓砷(AlGaAs)是一种可用于全光固体超快诊断技术的重要材料.基于低温外延技术的AlGaAs材料不仅具有低温生长砷化镓(low-temperature grown GaAs, LT-GaAs)超短载流子寿命的特点,并且可以调整材料的禁带宽度,为超快诊断系统的设计增加了极大的灵活性.泵浦-探测实验结果表明,低温外延生长可以有效加速AlGaAs材料的非平衡载流子复合,非平衡载流子弛豫时间小于300 fs,而非平衡载流子的复合时间低至2.08 ps.由于经过特殊的钝化工艺处理,极大地降低了表面复合对载流子衰退过程的影响,而低温外延生长引入的As原子团簇,形成了深能级缺陷,是加速载流子复合的主要因素.基于单复合中心的间接复合理论,建立LT-AlGaAs载流子演化模型,获得与复合速率相关的关键物理参量:载流子俘获面积δ_e=6.6×10~(-14) cm~2, δ_h=4.7×10~(-15) cm~2,计算结果与实验相符.该方法可用于半导体材料载流子演化特性定量分析,有助于推进超快响应半导体材料的优化改进.     

CdS/CdTe薄膜太阳电池的深能级瞬态谱和光致发光研究

用深能级瞬态谱和光致发光研究了无背接触层的CdS/CdTe薄膜太阳电池的杂质分布和深能级中心.得到了净掺杂浓度在器件中的分布.确定了两个能级位置分别在E_V+0365 eV和E_V+0282 eV的深中心,它们的浓度分别为167×10¹² cm^-3和386×10¹¹ cm^-2,俘获截面分别为143×10^-14cm²和153×10^-16cm².它们来源于以化学杂质形式存在的Au和（或）Te_Cd^-复合体,或与氩氧气氛下沉积CdTe时的氧原子相关. 关键词： 深能级瞬态谱 光致发光 CdS/CdTe太阳电池     

γ辐照室温短波HgCdTe光伏器件的导纳谱研究

利用变频导纳谱研究了γ辐照前后Hg_1－xCd_xTe(x=0.6)n⁺-on-p结中的深能级缺陷．辐照前其缺陷能级位置在价带上0.15 eV,俘获截面σ_p＝2.9×10^-18cm²,缺陷密度N_t＝6.5×10¹⁵cm^-3,初步认为是Hg空位或与其相关的复合缺陷;经过10⁴Gy的γ辐照后其能级变得更深,在价带上0.19 eV,同时其俘获截面增加了近一个数量级,而缺陷密度基本上没有变化．γ辐照引入的这种能级变化最终使器件的性能(探测率)下降了1/2以上． 关键词：     

磷化铟中铁原子替位与填隙的热致转变及其对材料性质的影响

高温退火后掺铁半绝缘(SI)InP单晶转变为n型低阻材料.利用霍尔效应(Hall)，热激电流谱(TSC)，深能级瞬态谱(DLTS)，X射线衍射等方法分别研究了退火前后InP材料的性质和缺陷.结果表明受高温热激发作用部分铁原子由替位转变为填隙，导致InP材料缺少深能级补偿中心而发生导电类型转变.通过比较掺杂、扩散和离子注入过程Fe原子的占位和激活情况分析了这一现象的机理和产生原因. 关键词： 磷化铟 铁激活 退火 半绝缘     

N型稀磁半导体Ge_(0.96–x) Bi_xFe_(0.04)Te薄膜的磁电性质研究

GeTe基稀磁半导体材料因具有可独立调控载流子浓度和磁性离子浓度的特性而受到广泛关注.本文利用脉冲激光沉积技术制备了该体系的单晶外延薄膜,并通过高价态Bi元素部分取代Ge元素的方法实现了材料中载流子类型从空穴向电子的转变,即制备出N型GeTe基稀磁半导体.测量结果表明,无论是室温还是低温下的Hall电阻曲线皆呈现负斜率,说明体系中载流子是电子;并且当Bi掺杂量达到32%时,电子浓度为10~(21)/cm~3.变温输运性质的测量证明体系的输运行为呈现半导体特征.通过测量低温10 K下的绝热磁化曲线,在高Bi掺杂体系中观测到了明显的铁磁行为,而低于32%Bi掺杂量的体系中未观察到.这一结果说明,高掺杂Bi的替代导致载流子浓度的增加,促进了载流子传递Ruderman-Kittel-Kasuya-Yoshida相互作用,使得分散的Fe-Fe之间产生磁耦合作用,进而形成铁磁有序态.     

碘化铟晶体本征缺陷的第一性原理研究

采用基于密度泛函理论的第一性原理方法,对正交碘化铟（InI）晶体可能存在的6种本征点缺陷（碘空位、铟空位、碘占铟位、铟占碘位、碘间隙、铟间隙）结构进行优化. 通过缺陷形成能的计算,得出各缺陷在生长过程中形成的难易程度;通过态密度的计算,分析出各种缺陷能级位置及其对载流子传输的影响. 结果表明：最主要的低能缺陷铟间隙会引入复合中心和深空穴陷阱,前者降低少数载流子的寿命,后者俘获价带的空穴而降低空穴的迁移率-寿命积. 计算结果为实验中提高InI 晶体载流子的迁移率-寿命积提供理论指导,对获得性能优异的InI核辐射探测材料有重要帮助. 关键词： 碘化铟 形成能 缺陷能级 深空穴陷阱     

Double carriers pulse DLTS for the characterization of electron-hole recombination process in GaAsN grown by chemical beam epitaxy

A nitrogen-related electron trap (E1), located approximately 0.33 eV from the conduction band minimum of GaAsN grown by chemical beam epitaxy, was confirmed by investigating the dependence of its density with N concentration. This level exhibits a high capture cross section compared with that of native defects in GaAs. Its density increases significantly with N concentration, persists following post-thermal annealing, and was found to be quasi-uniformly distributed. These results indicate that E1 is a stable defect that is formed during growth to compensate for the tensile strain caused by N. Furthermore, E1 was confirmed to act as a recombination center by comparing its activation energy with that of the recombination current in the depletion region of the alloy. However, this technique cannot characterize the electron−hole (e-h) recombination process. For that, double carrier pulse deep level transient spectroscopy is used to confirm the non-radiative e-h recombination process through E1, to estimate the capture cross section of holes, and to evaluate the energy of multi-phonon emission. Furthermore, a configuration coordinate diagram is modeled based on the physical parameters of E1.     

Coulomb charging effect of electrons in InAs/InAlAs quantum dots studied by capacitance techniques

Capacitance-voltage and deep level transient spectroscopy were used to study the capture characteristics of self-assembled InAs/InAlAs quantum dots grown on the InP substrate. It is found that the number of electrons captured by quantum dots can be controlled by varying the width of applied pulse voltage in the DLTS measurements. The Coulomb charging energy and the time of capture can be deduced from the filling time dependent deep level transient spectra.     

Effects of rapid thermal annealing on the energy levels of InAs/InP self-assembled quantum dots

We have studied the effects of thermal annealing on the electrical properties of InAs/InP self-assembled quantum dots (QDs) using deep level transient spectroscopy (DLTS). It was found from the DLTS measurements that the activation energy of the QD signal varied from 0.47 to 0.60 eV and the emission cross section changed from 1.01×10⁻¹⁵ to 9.63×10⁻¹⁴ cm² when the annealing temperature increased up to 700 °C. As a result of the thermal annealing process at the temperature ranging from 500 to 600 °C, the higher activation energy and the larger emission cross section of the QD related signal were observed for the annealed samples compared to those for the as-grown sample. On the basis of the capture barrier height for the QDs structure being lowered from 0.24 to 0.06 eV at the annealing temperature of 700 °C, thermal damage was considered as the reason. The appropriate annealing process can provide a clue for the engineering of the energy levels in the self-assembled QD structures.     

双异质结AlxGa1-xAs/GaAs发光管中与氧有关能级的测量

用DLTS和单次脉冲瞬态电容技术研究了液相外延生长的双异质结AlxGa1-xAs/GaAs发光管,掺Si的n-Al0.05Ga0.95As有源层中的深能级。着重分析了一个与氧有关的电子陷阱,其发射激活能为EC-ED=0.29eV。我们发现该电子陷阱随正向注入脉冲宽度tp的增加DLTS峰向低温移动,即在确定的温度下发射率随tp的增加而增加。用DLTS首次测得该能级的俘获瞬态谱,发现俘获峰随反向撤空脉冲宽度tR的增加向低温端移动,即在确定的温度下俘获率随tR的增加而增加,并且俘获激活能从△Eσ=0.28eV变化到0.26eV,用位形坐标图讨论了引起变化的原因。     

有机铬富勒烯衍生物的激发态与光限幅特性

应用倍频ｎｓ／ｐｓＮｄ：ＹＡＧ脉冲激光系统,在波长为５３２ｎｍ,脉冲宽度为２１ｐｓ的条件下,研究了新型有机铬富勒烯衍生物的激发态吸收与光限幅特性,其光限幅特性优于富勒烯甲苯溶液;并应用单重态激发态吸收理论对实验结果进行了分析,实验结果与理论结果基本一致。     

深能级对GaAs1-xPxLED老化过程的影响

用深能级瞬态谱(DLTS)研究了GaAs1-xPx LED在正向电压,I=100mA(J=250A/cm2)大电流下老化750小时左右的过程中深能级浓度、深度、俘获截面的变化。GaAs1-xPx LED中存在三个电子能级:△En1=(0.19±0.01)eV;△En2=(0.20±0.01)eV;△En3=(0.40±0.01)eV。发现老化之后△En1与△En2的能级密度变小,而△En3的能级宽度却有所增大。同时测量了它们的发光光谱、光通,C-V特性和I-V特性。讨论了深能级在GaAs1-xPx LED老化过程中对发光效率与退化特性的影响。认为△En1与△En2对GaAs1-xPx LED的发光效率与退化特性无影响,而△En3是限制GaAs1-xPx LED发光效率和退化特性的有效复合中心。     

Spectroscopic properties of thulium ions in bismuth silicate glass

A new type of bismuth silicate glass (Bi2O3-SiO2-ZnO-Al2O3-La2O3) doped with Tm2O3 is prepared by melt-quenching method. The thermal stability of the glass is examined by differential scanning calorimetry. No crystallization peak is found. Using the absorption and emission spectra, the absorption and emission cross-sections are calculated. Their maximum data are 2.9×10-21cm2 at 1663 nm and 4.7×10-21cm2 at 1826 nm, respectively. Using the Judd-Ofelt theory, the radiation transition probabilities and radiative lifetimes are obtained. The extended overlap integral method is applied to analyze energy transfer process among the Tm3+ ions. The transfer constants of cross-relaxation and energy migration among the Tm3+ ions at the 3H4 level are 7.60×10-40 and 14.98×10-40 cm6 /s, respectively. The critical transfer radius for cross-relaxation is 0.99 nm. The cross relaxation process is easy to realize and is favorable for obtaining ～2-μm laser.     

The Spectrum of Deep Levels in the InP Schottky Barrier

The energy spectrum of deep levels in the space-charge region of the Schottky barrier of InP field-effect transistors is determined by the method of tunneling spectroscopy. It has been established that for the most part the space-charge region of the Schottky barrier has electron traps with large capture cross sections that control the tunneling current in the Schottky barrier.     

Study of non-exponential electron capture by the main electron trap in GaAs0.62P0.38

In deep level transient spectroscopy (DLTS) exponentiality of level population changes in thermal emission as well as in capture processes is assumed. This is however, contrary to what is often observed in experiment. In this paper a model for interpretation of DLTS data in the case of non-exponential capture of electrons is proposed. It is assumed that the height of the capture of carrier changes locally according to the Gaussian distribution This model is applied to the case of deep electron trap with thermal activation energy equal to ΔE_B = 0.39 eV, observed in VPE GaAs_0.62P_0.38. Te. This model provides a capture barrier as well as a capture cross-section which are different from the ones predicted by the exponential transient model i.e., the ones derived from the slope of capacitance changes due to the filling pulse versus pulse duration at very short times.