On the origin of the anomalous sign reversal in the Hall effect in Nb thin films

We re-visit the anomalous sign reversal problem in the Hall effect of the sputtered Nb thin films. We find that the anomalous sign reversal in the Hall effect is extremely sensitive to a small tilting of the magnetic field and to the magnitude of the applied current. Large anomalous variations are also observed in the symmetric part of the transverse resistance R_xy. We suggest that the surface current loops on superconducting grains at the edges of the superconducting thin films may be responsible for the Hall sign reversal and the accompanying anomalous effects in the symmetric part of R_xy.     

N型稀磁半导体Ge_(0.96–x) Bi_xFe_(0.04)Te薄膜的磁电性质研究

GeTe基稀磁半导体材料因具有可独立调控载流子浓度和磁性离子浓度的特性而受到广泛关注.本文利用脉冲激光沉积技术制备了该体系的单晶外延薄膜,并通过高价态Bi元素部分取代Ge元素的方法实现了材料中载流子类型从空穴向电子的转变,即制备出N型GeTe基稀磁半导体.测量结果表明,无论是室温还是低温下的Hall电阻曲线皆呈现负斜率,说明体系中载流子是电子;并且当Bi掺杂量达到32%时,电子浓度为10~(21)/cm~3.变温输运性质的测量证明体系的输运行为呈现半导体特征.通过测量低温10 K下的绝热磁化曲线,在高Bi掺杂体系中观测到了明显的铁磁行为,而低于32%Bi掺杂量的体系中未观察到.这一结果说明,高掺杂Bi的替代导致载流子浓度的增加,促进了载流子传递Ruderman-Kittel-Kasuya-Yoshida相互作用,使得分散的Fe-Fe之间产生磁耦合作用,进而形成铁磁有序态.