非密堆积TiO2空心微球光子晶体的制备与能带分析

利用胶体自组装、高温烧结和HF酸刻蚀技术,制备了SiO2微球非密堆积面心立方(FCC)结构的胶体晶体,并以此为模板,利用溶胶凝胶方法和NaOH湿法刻蚀技术制备了TiO2空心微球非密堆积FCC结构光子晶体.利用电子显微镜分析了晶体的结构,用平面波展开法对该结构进行了能带计算与分析.计算结果表明,制备的TiO2空心微球非密堆积FCC结构光子晶体在低能区的第二、第三能带之间除布里渊区的W点仍保持简并外,其余各点简并都已经消除.     

非密堆积TiO2空心微球光子晶体的制备与能带分析

利用胶体自组装、高温烧结和HF酸刻蚀技术,制备了SiO₂微球非密堆积面心立方(FCC)结构的胶体晶体,并以此为模板,利用溶胶凝胶方法和NaOH湿法刻蚀技术制备了TiO₂空心微球非密堆积FCC结构光子晶体.利用电子显微镜分析了晶体的结构,用平面波展开法对该结构进行了能带计算与分析.计算结果表明,制备的TiO₂空心微球非密堆积FCC结构光子晶体在低能区的第二、第三能带之间除布里渊区的W点仍保持简并外,其余各点简并都已经消除. 关键词： 空心微球 非密堆积 光子晶体 光子带隙     

SiO_2胶体晶体自组装技术

介绍了垂直沉降法和旋涂法制备SiO2胶体晶体,并对两种方法制备的胶体晶体在宏观形貌、微观结构及光子带隙性质进行了比较。采用改进的Stober法在乙醇介质中合成粒径不同、单分散性较好的SiO2微球,用垂直沉积法和旋涂法制备出有序性较好的密排结构的SiO2胶体晶体。宏观照片表明,用旋涂法制备的SiO2胶体晶体经白光照射出现的光柱呈6次对称,而垂直沉降法制备的胶体晶体表面出现条纹。SEM分析表明,选用不同溶剂在同等旋涂工艺下制备SiO2胶体晶体,用乙醇和乙二醇混合溶液作溶剂制备出的SiO2胶体晶体质量最好。透射光谱表明,垂直沉降法所制备的胶体晶体在(111)方向具有明显的光子带隙性质,而旋涂法制备的胶体晶体则不明显。     

SiO2纳米微球表面结构在可见光波段的减反特性

研究了不同尺寸SiO2胶体微球形成纳米结构薄膜的光学传输特性和光子带隙。通过在玻璃基底上自组装透光的SiO2胶体微球形成胶体晶体薄膜, 依据布拉格定律,分析微球尺寸对胶体晶体光子带隙的影响。为实现可见光波段的全方位减反射,提出通过改变胶体粒径将胶体晶体带隙位置移动至紫外波段,理论计算得出当粒径为112 nm,占空比为0.45时能实现可见光波段0.5%的平均反射率。实验结果表明,玻璃基底在400~800 nm间的平均反射率从4.3%降低至0.7%,最小反射率达0.3%。通过控制微球粒径移动光子带隙位置,优化晶体结构参数实现了可见光波段的减反射,有效提高了光学组件对可见光的利用率。     

基于直接胶体晶体刻蚀技术的高度有序纳米硅阵列的尺寸及形貌控制

以自组装单层胶体小球阵列为掩模，采用直接胶体晶体刻蚀技术在硅表面制备二维有序尺寸可控的纳米结构.在样品制备过程中，首先通过自组装法在硅表面制备了直径200nm的单层聚苯乙烯(PS)胶体小球的二维有序阵列；然后对样品直接进行反应离子刻蚀(RIE)，以氧气为气源，利用氧等离子体对聚苯乙烯小球和对硅的选择性刻蚀作用，通过改变刻蚀时间，制备出不同尺寸的PS胶体小球的有序单层阵列；接着以此二维PS胶体单层膜为掩模，以四氟化碳为气源对样品进行刻蚀；最后去除胶体球后得到二维有序的硅柱阵列.SEM和AFM的测量结果表明：改变氧等离子体对胶体球的刻蚀时间和四氟化碳对硅的刻蚀时间，可以控制硅柱的尺寸以及形貌，而硅柱阵列的周期取决于原始胶体球的直径. 关键词： 胶体晶体刻蚀 纳米硅柱阵列     

孔径梯度变化的聚苯乙烯多孔薄膜的制备

 为了对聚合物多孔材料的微观孔结构进行控制,利用垂直沉积技术,制备了蛋白石结构和多层异质结构的SiO₂胶体晶体,并通过模板导向前驱物填充手段,获得了反蛋白石结构和孔径梯度变化的聚苯乙烯多孔薄膜。扫描电镜分析表明,聚苯乙烯多孔结构精确复制了原始模板的反结构。光学透射谱显示,填充聚苯乙烯后复合蛋白石光子禁带位置相对原始模板发生红移,除去模板后,光子禁带位置发生蓝移。根据布拉格衍射方程,计算出胶体晶体模板空隙的填充分数。     

柔性PMMA反蛋白石结构薄膜的制备及表征

以粒径为270 nm的SiO_2微球胶体晶体作为模板,向其中填充过量单体MMA,热聚合后形成SiO_2/PMMA复合结构光子晶体,将此光子晶体浸泡入浓度为20%的HF溶液中,刻蚀半小时后得到脱离ITO玻璃基板的柔性PMMA反蛋白石结构薄膜.该薄膜为周期有序的三维多孔结构,孔径大小均一,约为210 nm,外观蓝紫色与测试得到的带隙位置相对应.分析其微观形貌可知,对模板的过量填充产生了一层附着于胶体晶体上表面的PMMA致密层,致密层与其下层PMMA反蛋白石结构骨架在热聚合过程中由于体积收缩产生一定的应力差,使反结构薄膜自发从原基板脱离,从而获得柔性反蛋白石结构光子晶体.该薄膜可用于柔性光子晶体器件的制备.     

面缺陷对三维胶体晶体光学性质的影响

利用化学自组装方法和旋涂技术,成功地将二氧化硅(SiO2)微球体植入聚苯乙烯微球组成的蛋白石中,获得了嵌有面缺陷的三维胶体晶体.经SiO2渗透后,煅烧除去聚苯乙烯微球,获得了反相结构的光子晶体.胶体球粒直径增大时,无论晶体中有无缺陷态的存在,蛋白石及其反相结构透射谱中峰的位置发生红移,反之则产生蓝移.在胶体球粒直径一定时,对于降低折射率的缺陷,其透射谱峰中缺陷态的位置发生红移;对于增加折射率的缺陷,其透射谱峰中缺陷态的位置发生蓝移.透射谱还与缺陷层的厚度等因素有关.     

低压化学气相沉积技术制备锗反蛋白石三维光子晶体

采用溶剂蒸发对流自组装法将单分散SiO2微球组装形成三维有序胶体晶体模板,用低压化学气相沉积法填充高折射率材料锗,酸洗去除SiO2模板,获得了锗反蛋白石三维光子晶体.通过扫描电镜、X射线衍射仪和紫外-可见-近红外光谱仪对锗反蛋白石的形貌、成分、结构和光学性能进行了表征.结果表明：锗在SiO2微球空隙内具有较高的结晶质量,填充致密均匀.通过改变沉积工艺,可控制锗的填充率;制备的锗反蛋白三维光子晶体具有明显的光学反射峰,表现出光学带隙效应.测试的光学性能与理论计算基本吻合.     

低压化学气相沉积技术制备锗反蛋白石三维光子晶体

采用溶剂蒸发对流自组装法将单分散SiO2微球组装形成三维有序胶体晶体模板,用低压化学气相沉积法填充高折射率材料锗,酸洗去除SiO2模板,获得了锗反蛋白石三维光子晶体.通过扫描电镜、X射线衍射仪和紫外-可见-近红外光谱仪对锗反蛋白石的形貌、成分、结构和光学性能进行了表征.结果表明:锗在SiO2微球空隙内具有较高的结晶质量,填充致密均匀.通过改变沉积工艺,可控制锗的填充率;制备的锗反蛋白三维光子晶体具有明显的光学反射峰,表现出光学带隙效应.测试的光学性能与理论计算基本吻合.     

Fabrication of Colloidal Photonic Crystals with Heterostructure by Spin-Coating Method

Colloidal photonic crystal heterostructures, composed of two opaline photonic crystal films of silica spheres with different diameters, are fabricated by a two-step spin-coating method. Scanning electron microscopy （SEM） and UV-vis spectrophotometer are used to characterize the heterostructures. The SEM images show good ordering of the two-layer colloidal crystals constituting the heterostructures. The transmission spectra measured from the （111） plane in the heterostructure show that the composite colloidal photonic crystals have double photonic stop bands. Furthermore, when the sizes of the silica spheres used for fabricating the composite photonic crystal are slightly different, the transmission spectrum shows that the composite photonic crystals have more extended bandgap than that of the individual photonic crystals due to partial overlapping of its two photonic stop bands.     

采用溶胶凝胶协同自组装方法制备SiO2反蛋白石结构薄膜及其光学性质研究

研究了溶胶凝胶协同自组装制备大面积高质量SiO₂反蛋白石结构薄膜的方法. 向单分散的聚苯乙烯(PS)胶体溶液中添加SiO₂前驱物溶液,用垂直自组装法一步得到微球空隙中均匀填充有凝胶的 复合PS胶体晶体薄膜,在空气中烧结去除PS后得到SiO₂反蛋白石结构薄膜.通过对添加前驱物溶液比例、 自组装温度以及烧结温度等参数的研究,用不同粒径的PS微球制备了不同孔径的高质量SiO₂反蛋白石结构薄膜. 用扫描电子显微镜和X射线能量色散谱仪对制备得到的薄膜样品进行显微形貌和成分表征,并测试了其透射光谱. 结果表明:溶胶凝胶协同自组装法制备的SiO₂反蛋白石结构薄膜大面积高度有序,孔径可以控制且选择范围宽; 薄膜的透射光谱带隙明显,带隙中心波长与理论计算结果相符.     

Subwavelength structures for high power laser antireflection application on fused silica by one-step reactive ion etching

In this paper we report a simple method to fabricate a novel subwavelength structure surface on fused silica substrate using one-step reactive ion etching with two-dimensional polystyrene colloidal crystals as masks. The etching process and the morphologies of the obtained structure are controlled. We show that the period of the obtained fused silica pillar-like arrays were determined by the initial polystyrene nanoparticle size. The height of pillar arrays can be adjusted by controlling the etching duration, which is proved to be of importance in tailoring the antireflection properties of subwavelength structures surface. The novel subwavelength structures surface exhibit excellent broadband antireflection properties, but the size of the pillar affects the antireflective properties in short wavelength region. We anticipate this method would offer a convenient and scalable way for inexpensive and high-efficiency high power laser field designs.     

Macroporous fluoropolymeric films templated by silica colloidal assembly: A possible route to super-hydrophobic surfaces

A super-hydrophobic surface was obtained on a three-dimensional (3D) polyvinylidene fluoride (PVDF) macroporous film. The porous films were fabricated through self-assembled silica colloidal templates. The apparent water contact angle of the surface can be tuned from 106° to 153° through altering the sintering temperature and the diameter of the colloidal templates. A composite structure of micro-cavities and nanoholes on the PVDF surface was responsible for the super-hydrophobicity. The wettability of the porous surfaces was described by the use of the Cassie-Baxter model and Wenzel's equation.     

The key factors in fabrication of high-quality ordered macroporous copper film

The template-directed fabrication of highly-ordered porous film is of significant importance in implementation of the photonic band gap structure. The paper reports a simple and effective method to improve the electrodeposition of metal porous film by utilizing highly-ordered polystyrene spheres (PSs) template. By surface-modification method, the hydrophobic property of the PSs template surfaces was changed into hydrophilic one. It was demonstrated that the surface modification process enhanced the permeability of the electrolyte solution in the nanometer-sized voids of the colloidal template. The homogeneously deposited copper film with the highly-ordered voids in size of less than 500 nm was successfully obtained. In addition, it was found that large defects, such as microcracks in the template, strongly influenced the macroporous films quality. An obvious preferential growth in the cracked area was observed.     

对流自组装2维胶体晶体成膜趋势和覆盖率

从自组装理论出发, 分析对流自组装2维胶体晶体中空白、条纹区域出现的机理,并在实验上予以验证。通过研究得知, 2维胶体晶体的自组装过程呈现空白、条纹、大面积单层、双层条纹的趋势。从胶体晶体覆盖率的角度出发研究2维胶体晶体的组装参数与质量之间的关系,结果表明:胶体晶体的总覆盖率与基片提拉速度倒数呈线性正比,和粒子体积分数呈反比例函数关系; 受到多种因素的影响,大面积2维胶体晶体总是伴随着一定比例的空白区域和双层区域出现,提拉法所能获得的最大单层覆盖率为95%。     

Heteroepitaxial III–V films on fianite substrates and buffer layers

GaAs, GaSb, AlGaAs, and InGaAs epitaxial films and multilayer AlGaAs/InGaAs/GaAs heterostructures for PHEMT field-effect transistors have been obtained on fianite substrates by metal-organic vapour phase epitaxy. Films of different III–V compounds, including GaN, were grown on Si and GaAs substrates with a simple single buffer layer (fianite) and double buffer layer (fianite on porous Si and GaAs). It is established that the use of a two-layer buffer improves the structural quality and homogeneity of III–V films. A possibility of controlling the phase composition of GaN films using a corresponding buffer layer is shown. It is found that the use of a two-layer buffer increases the electrical homogeneity and decreases the electrical activity of defects in GaN films.     

Highly regular nanometer-sized hexagonal pipes in 6H-SiC(0001)

An array of troughs was prepared on a 6H-SiC(0001) surface using focused ion beam (FIB) patterning. Troughs were etched with various ion doses and close-to-circular voids of increasing depths for larger ion doses were obtained. The samples were then etched in a hot-wall reactor at a hydrogen partial pressure of 13 mbar at 1800 °C. The resulting morphological reorganizations have been studied by scanning electron and atomic force microscopy. Very regular hexagonal voids with facets oriented perpendicular to the surface were obtained after hydrogen etching. The voids were surrounded by regular secondary facets of lower inclination. Whereas the depth of the voids increases with ion dose, the void diameter and facet sizes stay constant. This effect is explained by surface diffusion during hydrogen etching. The FIB technique in combination with hydrogen etching allows the preparation of very regular surface patterns and highly ordered wells and tubes for nanometer-sized sieves and photonic crystals. PACS 47.70.Fw; 68.37.-d; 68.37.Hk; 68.37.Ps; 81.65.Cf