引导磁场对收集极中电子能量沉积的影响

理论分析了引导磁场对收集极材料中电子运动的约束作用,推导了引导磁场作用下二次电子的逃逸条件,利用蒙特卡罗方法计算了引导磁场作用下电子束在收集极中的能量沉积规律。研究结果表明:引导磁场对电子在材料内部的运动约束作用很弱,对二次电子有强约束作用;大部分二次电子经拉莫回旋再次轰击在收集极上被收集,逃逸的二次电子沿引导磁场方向进入束波作用区;增大电子的入射角度时,束流密度的降低和二次电子的再次入射降低了收集极中电子的最大沉积能量密度,提高了收集极的耐电子轰击能力。     

Two-scale modeling of adsorption processes at structured surfaces

We present an algorithm for the simulation of vicinal surface growth. It combines a lattice gas anisotropic Ising model with a phase-field model. The molecular behavior of individual adatoms is described by the lattice gas model. The microstructure dynamics on the vicinal surface are calculated using the phase-field method. In this way, adsorption processes on two different length scales can be described: nucleation processes on the terraces (lattice gas model) and step-flow growth (phase field model). The hybrid algorithm that is proposed here, is therefore able to describe an epitaxial layer-by-layer growth controlled by temperature and by deposition rate. This method is faster than kinetic Monte Carlo simulations and can take into account the stochastic processes in a comparable way.     

沉积粒子能量对薄膜早期生长过程的影响

利用Monte Carlo(MC)模型研究了能量粒子对薄膜生长的初始阶段岛膜的形貌和岛的尺寸的影响,沉积粒子的能量范围为:0—0.7eV.在模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,并详细考虑了临近和次临近原子的影响.结果表明,在所采用的参量范围内不同的基底温度情况下,能量粒子的影响有很大的区别.低基底温度情况下,沉积粒子强烈地影响着薄膜的生长过程中,岛膜的形貌、数量和尺寸随能量粒子的能量增加而有很大的变化.分析表明,这些变化都是由于能量粒子的介入使得表面吸附粒子的扩散能力增强所致 关键词： 薄膜生长 Monte Carlo方法 扩散     

FLUKA程序在法拉第杯设计中的应用

法拉第杯是加速器束流强度绝对测量装置,其收集效率对于法拉第杯的设计至关重要。应用蒙特卡罗软件FLUKA对北京正负电子对撞机直线加速器分析磁铁AM2处的法拉第杯进行模拟设计。给出了法拉第杯不同部位对收集效率的影响曲线,并给出了入射电子在法拉第杯中的能量沉积分布与带电粒子分布图,最终得到了优化的法拉第杯尺寸,使得对入射电子的收集效率达到99.73%。     

低能CU6团簇在CU(001)表面和AU(001)表面沉积的分子动力学模拟研究

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Molecular dynamics simulation of deposition and etching of Si bombarding by energetic SiF

In this study, SiF interaction with amorphous Si surface at normal incidence was investigated using molecular dynamics simulation at 300 and 600 K. The incident energies of 50, 100 and 200 eV were used. The results show that the deposition rate is not sensitive to the incident energy, while with increasing the surface temperature, the deposition rate decreases. The etch yield is sensitive to the incident energy and the surface temperature. The etch yield increases with increasing incident energy and temperature. After bombarding, a Si_xF_y interfacial layer is formed. The interfacial layer thickness increases with increasing incident energy mainly through enhanced penetration of the silicon lattice. In the interfacial layer, for SiF_x (x = 1-3) species, SiF is dominant and only little SiF₃ is present. At the outmost and innermost of the interfacial layer, SiF species is dominant. Most of SiF₃ species is concentrated above the initial surface.     

质子在碳化硅中不同深度的非电离能量损失

利用蒙特卡罗方法,应用Geant4程序,模拟计算了1—500 MeV质子在碳化硅材料中的非电离能量损失,并研究了不同种类的初级反冲原子对非电离能量损失的贡献.模拟结果表明:在相同质子辐照下,碳化硅材料中的非电离能量损失要比硅、镓等半导体材料更小,说明碳化硅器件的稳定性更好,抗位移损伤能力更强;当靶材料足够厚时,在不同能量质子辐照下,材料损伤最严重的区域会随着质子入射能量的增加从质子射程末端逐渐前移到材料表面;不同种类的初级反冲原子对非电离能量损失的贡献表明,在低能质子辐照下,28Si和~(12)C是位移损伤的主要原因,而随着质子能量的增加,通过核反应等过程产生的次级离子迅速增多,并对材料浅层造成严重的位移损伤.     

Multilayer growth of BaTiO3 thin films via pulsed laser deposition: An energy-dependent kinetic Monte Carlo simulation

An energy-dependent kinetic Monte Carlo approach was proposed to simulate the multilayer growth of BaTiO₃ thin films via pulsed laser deposition, in which the four steps, such as the deposition of atoms, the diffusion of adatoms, the bonding of adatoms, and the surface migration of adatoms, were considered. Distinguishing with the traditional solid-on-solid (SOS) model, the adatom bonding and the overhanging of atoms, according to the perovskite structure, were specially adopted to describe the ferroelectric thin film growth. The activation energy was considered from the interactions between the ions, which were calculated by Born-Mayer-Huggins (BMH) potential. From the simulation the relative curves of the each layer coverage and roughness vs total coverage were obtained by varying the parameter values of the incident kinetic energy, laser repetition rate and mean deposition rate. The relationship between growth modes and the different parameters was also acquired.     

Fabrication and characteristics of lateral Ti/4H-SiC Schottky barrier diodes

This paper describes the fabrication and characteristics of the lateral Ti/4H-SiC Schottky barrier diodes (SBDs). SBDs are fabricated by nitrogen ion implantation into p-type 4H-SiC epitaxial layer. The implant depth profile is simulated using the Monte Carlo simulator TRIM. Measurements of the reverse I－V characteristics demonstrate a low reverse current, that is good enough for many SiC-based devices such as SiC metal-semiconductor field-effect transistors, and SiC static induction transistors. The parameters of the diodes are extracted from the forward I－V characteristics. The barrier height φ_b of Ti/4H-SiC is 0.95 eV.     

Evolution of topological order in Xe films on a quasicrystal surface

We report results of the first computer simulation studies of a physically adsorbed gas on a quasicrystalline surface Xe on decagonal Al-Ni-Co. The grand canonical Monte Carlo method is employed, using a semiempirical gas-surface interaction, based on conventional combining rules, and the usual Lennard-Jones Xe-Xe interaction. The resulting adsorption isotherms and calculated structures are consistent with the results of LEED experimental data. The evolution of the bulk film begins in the second layer, while the low coverage behavior is epitaxial. This transition from epitaxial fivefold to bulklike sixfold ordering is temperature dependent, occurring earlier (at lower coverage) for the higher temperatures.     

Energy deposition model for I-125 photon radiation in water

In this study, an electron-tracking Monte Carlo algorithm developed by us is combined with established photon transport models in order to simulate all primary and secondary particle interactions in water for incident photon radiation. As input parameters for secondary electron interactions, electron scattering cross sections by water molecules and experimental energy loss spectra are used. With this simulation, the resulting energy deposition can be modelled at the molecular level, yielding detailed information about localization and type of single collision events. The experimental emission spectrum of I-125 seeds, as used for radiotherapy of different tumours, was used for studying the energy deposition in water when irradiating with this radionuclide.     

微结构X射线源中电子与阳极作用的蒙特卡罗模拟

根据电子多重散射理论,基于蒙特卡罗方法研究不同能量电子垂直入射不同材料的阳极靶后,电子在阳极靶内的沉积能量分布,及X射线发射位置的能量分布.结果表明：电子在靶内的轨迹扩展和入射电子能量、靶材料有关,99%电子能量沉积在近似圆柱形区域内.且电子在入射方向上的沉积能量分布不是直接递减,而是先递增到一定深度后再递减,符合电子背散射理论.说明X射线产生区域是在距表面一定深度区域内.另外,通过对比分析发现金刚石膜作为电子吸收光栅是不可行的,但作为热沉材料有很大的潜力.这些结论可为微结构X射线源研究及高亮度高相干X射线源设计提供参考.     

Simulation study using GEANT4 Monte Carlo code for a Gd-coated resistive plate chamber as a thermal neutron detector

The Resistive Plate Chamber (RPC) has been developed in many application areas ever since its introduction, from high energy physics experiments to positron emission tomography. Such detectors can be coated with a Gd layer that enables them to detect thermal neutrons. Consequently these RPCs can be utilized for industrial and medical purposes. Here, we present the configuration of a resistive plate chamber which is utilized to detect thermal neutrons by employing GEANT4 Monte Carlo code. The response of the RPC was evaluated as a function of neutron energy in the GEANT4 Monte Carlo code. The simulation results are taken for incident neutron energy in the energy range from 25 meV to 100 meV. The detection efficiency was found to be between 10% and 20%, depending on the detector configuration, for incident thermal neutrons of 25 meV energy.     

Simulation of island aggregation influenced by substrate temperature, incidence kinetic energy and intensity in pulsed laser deposition

Using kinetic Monte Carlo method, we have simulated a pulsed energetic growth process in pulsed laser deposition. During the growth of film, substrate temperature mainly influences upon film morphology by directly enhancing the adatom mobility through the temperature-dependent thermal vibration. By contrast, the effect of incidence kinetic energy on film growth is complex resulting from the collisions between the incident particles and the adatoms. The results show that improving incident kinetic energy cannot significantly accelerate the migration rate of adatom but change surface microstructure and promote single adatom formation resulting in more island aggregation density. Moreover, since pulse-influx characterizes pulsed laser deposition, the intensity per pulse contributes to the evolvement of nucleation density and the results illustrate that a general scaling law different from ordinary power law still exists in energetic growth of pulsed laser deposition.     

Simulation of temporal characteristics of ion-velocity susceptibility to single event upset effect

Using a Monte Carlo simulation tool of the multi-functional package for SEEs Analysis(MUFPSA), we study the temporal characteristics of ion-velocity susceptibility to the single event upset(SEU) effect, including the deposited energy,traversed time within the device, and profile of the current pulse. The results show that the averaged dposited energy decreases with the increase of the ion-velocity, and incident ions of209 Bi have a wider distribution of energy deposition than132 Xe at the same ion-velocity. Additionally, the traversed time presents an obvious decreasing trend with the increase of ion-velocity. Concurrently, ion-velocity certainly has an influence on the current pulse and then it presents a particular regularity. The detailed discussion is conducted to estimate the relevant linear energy transfer(LET) of incident ions and the SEU cross section of the testing device from experiment and simulation and to critically consider the metric of LET.     

Three-dimensional simulation of fabrication process-dependent effects on single event effects of SiGe heterojunction bipolar transistor

The fabrication process dependent effects on single event effects(SEEs) are investigated in a commercial silicon–germanium heterojunction bipolar transistor(SiGe HBT) using three-dimensional(3D) TCAD simulations. The influences of device structure and doping concentration on SEEs are discussed via analysis of current transient and charge collection induced by ions strike. The results show that the SEEs representation of current transient is different from representation of the charge collection for the same process parameters. To be specific, the area of C/S junction is the key parameter that affects charge collection of SEE. Both current transient and charge collection are dependent on the doping of collector and substrate. The base doping slightly influences transient currents of base, emitter, and collector terminals. However, the SEEs of SiGe HBT are hardly affected by the doping of epitaxial base and the content of Ge.     

在6H-SiC衬底上用低压MOVPE法生长AlN和GaN的过程中用(AlN/GaN)多层缓冲层来控制残余应力

人们已提出用BAlGaN四元系材料制备紫外光谱区的光发射器件.GaN和AlN二元系是这种四元材料在器件应用中的基础材料.6H-SiC衬底在氮化物生长中因其晶格失配小是一大优势,而且SiC衬底的热膨胀系数也和AlN的很接近.然而,对于AlN外延层来说,需要控制其中的残余应力,因为在SiC衬底上直接生长的AlN外延层中存在着因晶格失配所产生的压缩应力.另一方面,在SiC衬底上直接生长的GaN外延层中存在着拉伸应力.这种拉伸应力起源于GaN比衬底有着更大的热膨胀系数.本文讨论了在6H-SiC衬底上生长的氮化物外延层中残余应力的类型、数量及控制.为此目的,提出了在6H-SiC衬底上,无论是生长AlN,还是生长GaN,都可以采用(GaN/AlN)多层缓冲层的办法,作为控制残余应力的有效方法.我们还讨论了AlN和GaN外延层的结晶质量和残余应力间的关系.     

闪烁光纤在γ射线辐照下部分特性的蒙特卡罗模拟

 闪烁光纤在射线成像方面的应用越来越广泛。为了进一步了解闪烁光纤在射线辐照下的基本特性，基于蒙特卡罗方法，利用计算机模拟分析了γ射线在闪烁光纤中的好事例率与光纤长度及射线能量的关系，能量沉积效率与光纤长度及射线能量的关系。此项工作对于闪烁光纤阵列在射线成像，剂量场测量等方面的研究很有价值。     

电子能量对收集极中电子束能量沉积的影响北大核心CSCD

理论分析了收集极中运动电子的失能机制和电子能量对电子束能量沉积的影响,用蒙特卡罗方法计算了不同能量下入射电子的能量沉积分布,分析了电子能量对电子束在收集极中能量沉积的影响,并据此提出了提高收集极耐电子束轰击能力的两种途径。结果表明:激发和电离是收集极中入射电子的主要失能机制;电子的能量越高,在材料中的穿透能力越强,收集极中被收集电子束的最大能量沉积密度越低。综合考虑束流密度分布对能量沉积的影响,可通过两种途径来提高收集极耐电子束轰击的能力:一是通过结构设计增大电子束的收集面积,减小收集极上被收集电子束的束流密度;二是设计高阻抗器件,增大被收集电子束的电子能量,减小收集极上被收集电子束的束流密度。     

国产SiC衬底上利用AIN缓冲层生长高质量GaN外延薄膜

采用高温AlN作为缓冲层在国产SiC衬底上利用金属有机物化学气相外延技术生长GaN外延薄膜.通过优化AlN缓冲层的生长参数得到了高质量的GaN外延薄膜,其对称(0002)面和非对称(1012)面X射线衍射摇摆曲线的半峰宽分别达到130 arcsec和252 arcsec,这是目前报道的在国产SiC衬底上生长GaN最好的...