缓冲层和掺杂的电子传输层对有机电致发光器件发光效率影响的研究

针对有机发光器件需要提高发光效率问题,利用其最高被占用分子轨道(HOMO)有利于改善空穴注入的特点,将氧化钼(MoO3)插入m-MTDATA与NPB之间;将羟基喹啉锂(Liq)掺入4,7-联苯-1,10-邻二氮杂菲(Bphen)作n型电子传输层,制备具有空穴缓冲层和n型掺杂电子传输层的有机电致发光器件。通过单载流子电子器件J-V曲线的比较,将掺杂质量分数确定为w(Bphen)∶w(Liq)=65∶35。在完整器件中,随着MoO3厚度的增加,器件效率改善显著,当MoO3厚度达到1nm时,器件性能最佳,此后趋于饱和,对厚度变化不敏感。说明使用MoO3及n型掺杂后空穴及电子的注入传输均获得明显提高,并在发光区域达到有效平衡,器件的亮度及发光效率获得明显改善,与控制器件相比,电流效率、功率效率及亮度分别提高约62%、约98%和约60%,电压V下降了约28%。     

量子点发光二极管功能层厚度确定方法

为改善量子点发光二极管器件载流子注入平衡,提出一种量子点发光二极管各功能层厚度的确定方法.首先选定量子点发光层厚度,基于隧穿模型进行仿真分析确定电子传输层厚度;然后采用空间电荷限制电流模型进行仿真分析确定空穴传输层厚度.采用CdSe/ZnS量子点作为发光层、poly-TPD作为空穴传输层、Alq_3作为电子传输层,按照该方法仿真分析得到各功能层厚度进行旋涂-蒸镀法实物器件制备.对比实验结果表明:当poly-TPD、QDs及Alq_3厚度分别为45nm、25nm及35nm时,获得了较高的发光效率及色纯度,器件性能最好.该方法确定的各功能层厚度有助于减少载流子在发光界面积累,获得载流子的注入平衡,从而改善QLEDs发光性能.     

CBP有机薄膜对MEH-PPV聚合物发光二极管性能的影响

以聚合物发光材料MEH-PPV为发光层的聚合物发光二极管的ITO阳极与发光层之间,加入一层溶解于氯仿中的有机小分子CBP,能显著改善发光器件的电流特性。在电压较低的时候能提高电流,在电压较高的时候能抑制电流,从而增加工作电压范围。此外,器件的电流效率也能得到显著的提高。实验结果表明,加入CBP层后,在低电压时,CBP层能够减缓空穴注入到发光层中,将其限制在CBP层,从而在器件中形成一个内电场,有助于电子的传输,降低开启电压,提高发光亮度。在电压较高时,CBP作为电子阻挡层,能阻挡电子漏泄到阳极,从而使在复合区的空穴与少数载流子电子的复合效率提高,改善器件的性能。     

ZnS作为空穴缓冲层的新型有机发光二极管

采用磁控溅射方法在ITO表面沉积了不同厚度的ZnS超薄膜作为有机发光二极管(OLEDs)的缓冲层,使典型结构(ITO/TPD/Alq3/Al)的OLEDs的发光性能得到改善。ZnS缓冲层厚度对器件性能影响的实验结果表明,当ZnS缓冲层厚度为5nm时,器件电流密度提高了近2倍,亮度提高了2倍;当ZnS缓冲层厚度为10nm时,器件发光的电流效率提高18%,器件的性能得到改善。宽禁带的ZnS缓冲层对空穴从阳极到有机功能层的注入有阻碍作用,促进器件载流子平衡,提高了器件发光效率,改善了器件性能。     

一种采用Li3N掺杂电子注入层的底发射倒置结构OLED的制备

采用Li3N掺杂电子注入层Alq3∶Li3N,制作了一种结构为ITO/Alq3 Alq3∶Li3N/Alq3/NPB/MoO3/Al的倒置底发射有机发光器件.其中ITO玻璃作为透明阴极,金属Al作为顶部阳极,在ITO阴极与电子传输层之间加入Li3N n型掺杂层,改善了该器件的电子注入和传输能力|在Al阳极与空穴传输层之间加入MoO3缓冲层,降低了Al阳极与NPB之间较大的空穴注入势垒,改善了空穴注入能力.实验表明:此结构的倒置底发射有机发光器件性能可达到传统结构的常用有机发光器件如ITO/NPB/Alq3/LiF/Al的性能,完全可以满足非晶硅薄膜晶体管有源有机发光器件中驱动电路的匹配及性能要求.     

阳极/有机层界面LiF层在OLED中的空穴缓冲作用

使用真空热蒸发镀膜法,在OLED层状结构中引入不同厚度的LiF作阳极修饰层,制备了结构为ITO/LiF/TPD/Alq₃/Al的器件。LiF超薄层的引入较好地修饰了ITO表面,减少了阳极和有机层界面缺陷态的形成,增强了器件的稳定性。实验结果表明: LiF层有效地阻挡空穴注入,增强载流子注入平衡,提高了器件的亮度和效率,含有1 nm厚LiF空穴缓冲层器件的性能最好,效率较不含缓冲层器件提高了近1.5倍。     

Alq_3发光层厚度对有机电致发光器件性能的影响

文章以MoO3为空穴注入层,NPB为空穴传输层,改变发光/电子传输层Alq3的厚度,考察了器件电学和光学性能的变化。结果表明,随着Alq3层增加厚度,器件的电流逐步减小,由此获得Alq3薄膜的电场分布情况;器件发光光谱有少量红移,但长波端明显展宽,短波端强度下降。该文拟合了器件电致发光谱,与实验曲线吻合较好。同时拟合结果也表明,干涉效应主要影响光谱在长波端的强度分布,发光区域分布决定光谱在短波端的强度分布。     

利用LiF空穴阻挡/激子限制层提高有机电致发光器件效率

将厚度为0.5 nm的LiF薄层引入到双层有机电致发光器件(OLEDs)的Alq3发光/电子传输层中作为空穴阻挡/激子限制层,研究其位置对器件光电性能的影响。发现LiF薄层在不同位置均明显提高器件的发光效率,当LiF薄膜距离TPD/Alq3界面20~40 nm时,OLEDs的最大发光效率约为4.5 cd/A,是对比器件(没有LiF薄层)的1.8倍。OLEDs的电流密度随着减小LiF薄层与阴极的距离而增大。研究表明,这是因为LiF薄层可有效阻挡进入复合发光区域未复合的过剩空穴并导致其积累,空穴积累可提高电子传输区域中的电场,提高其中电子的传输和从阴极的注入,从而提高复合发光区域中的载流子平衡及其复合几率;LiF薄层可将激子限制在复合发光区域,减少激子被阴极淬灭的几率。     

金属氟化物对聚合物发光二极管发光性能的提高

在以聚合物发光材料MEH-PPV为发光层的聚合物发光二极管(PLEDs)的金属阴极与聚合物发光层之间插入一层绝缘的金属氟化物,发光器件的发光性能有所提高,而且绝缘层的厚度会影响器件性能提高的最终效果。特别是具有LiF／Al的双层电极的发光器件,其发光特性与工作性能优良,但稳定性较差的Ba(Ca)／Al电极结构器件的发光特性具有可比性。初步分析表明绝缘层的插入造成了发光聚合物层与金属电极界面的能带发生弯曲,降低了发光器件中少数载流子电子的注入势垒,提高了发光器件中少数载流子电子的注入效率。从而最终导致了发光器件的开启电压、发光强度、外量子效率及电流效率等发光性能指标的显著提高。     

MoO_3阳极缓冲层对有机太阳电池性能的影响

研究了MoO3阳极缓冲层对基于CuPc/C60异质结的有机小分子太阳电池器件性能的影响。发现:MoO3阳极缓冲层略微降低了器件的短路电流、开路电压及能量转换效率;MoO3阳极缓冲层提高了器件的整流比;具有MoO3阳极缓冲层的器件在持续光照条件下连续工作20min,其主要性能参数(如短路电流、开路电压、填充因子及能量转换效率)无明显衰减,而没有MoO3阳极缓冲层的对比器件在相同条件下连续工作20min,其能量转换效率衰减了大约45%。研究结果表明:MoO3阳极缓冲层明显提高了基于CuPc/C60异质结的有机小分子太阳电池器件的稳定性,可能的原因主要是MoO3阳极缓冲层改善了ITO阳极和CuPc界面,抑制了因持续光照连续工作引起的界面老化,从而提高了器件的稳定性。     

具有Au/MoO_3空穴注入层的有机发光二极管

研究了单层MoO3(5nm)和复合Au(4nm)/MoO3(5nm)HILs对OLEDs器件性能的影响,器件结构为ITO/HIL/NPB(40nm)/Alq3(60nm)/LiF(1nm)/Al(100nm)。与单层MoO3HIL的器件相比,具有复合Au/MoO3HIL的器件具有较大的电流和亮度。这是由于Au的功函数介于ITO和MoO3之间,导致Au的引入提高了空穴的注入效率。     

具有新型双空穴注入层的有机发光二极管

采用新型双空穴注入层N, N, N', N'-tetrakis(4-Methoxy-phenyl)benzidine/Copper phthalocyanine(MeO-TPD/CuPc)及器件结构:ITO/MeO-TPD(15 nm)/CuPc(15 nm)/ N, N'-Bis(naphthalen-1-yl)-N, N'-bis(phenyl)benzidine (NPB, 15 nm)/8-hydroxyquinoline (Alq₃, 50 nm)/LiF(1 nm)/Al(120 nm), 研制出高效有机发光二极管(器件D), 与其他器件(器件A, 没有空穴注入层的器件; 器件B, MeO-TPD单空穴注入层; 器件C, CuPc单空穴注入层)相比, 其性能得到明显改善. 器件D的起亮电压降至3.2 V, 比器件A, B, C的起亮电压分别降低了2, 0.3, 0.1 V. 器件D在10 V时, 其最大亮度为23893 cd/m², 最大功率效率为1.91 lm/W, 与器件A, B, C的最大功率效率相比, 分别提高了43% (1.34 lm/W), 22% (1.57 lm/W), 7% (1.79 lm/W). 性能改善的主要原因是由于空穴注入和传输性能得到了改善, 通过单空穴型器件的J-V 曲线对这一现象进行了分析. 关键词： 有机发光二极管 空穴注入层 功率效率 势垒     

DPVBi空穴阻挡层对OLED性能的优化

研究了宽带隙有机小分子材料DPVBi作为空穴阻挡层对OLED器件效率和亮度的优化作用.DPVBi的引入有效地改善了以PEDOT:PSS做空穴注入层的OLED器件的空穴过剩问题.实验结果表明:通过优化DPVBi的厚度,插入30 nm厚的DPVBi空穴阻拦层可以有效地平衡OLED器件的电子和空穴浓度,降低器件的工作电压,优...     

利用NPB/MoO3/NpB作为空穴传输层的低驱动电压的有机发光器件

通过引入(NPB/MoO3)x/NPB作为空穴传输层,获得了低驱动电压的有机电致发光器件(OLEDs),(NPB/MoO3)x为多层结构(x为0,1和2).通过对比发现,在相同亮度下,x=1对应的器件具有最低的工作电压.这是由于在NPB和MoO3之间产生了电荷转移复合物(charge transfer,CT),这将会降低器件的空穴注入势垒,从而降低其工作电压,文中所研究器件为基于8-羟基喹啉铝(tris(8-hydroxyquino-line)aluminum,Alq3)的绿光器件.与x=0时的普通器件相比,在亮度为1 000 cd·m-2时,x=1时的工作电压降低了 0.8 V.     

Introduction of F_4-TCNQ/MoO_3 layers for thermoelectric devices based on pentacene

We introduced a dual electron accepting layer composed of tetrafluoro-tetracyanoquinodimethane(F4-TCNQ) and MoO3 for thermoelectric devices based on a pentacene layer. We found that the power factor is enhanced by placing an F4-TCNQ layer directly in contact with the pentacene layer and it is also enhanced by placing a MoO3 layer between the F4-TCNQ layer and the Au electrode. By examining the contact resistance using a field effect transistor and a hole-only diode, we confirmed that the hole injection is improved due to the reduction of contact resistance at the interface between the MoO3 layer and the Au electrode.     

紫外臭氧处理超薄银修饰ITO电极的高效柔性有机太阳能电池

以紫外臭氧处理超薄Ag复合MoO₃或PEDOT：PSS修饰ITO电极的高效柔性有机太阳能电池。通过优化紫外臭氧处理Ag薄膜的时间,提高了以P3HT：PCBM为有源层的器件的功率转换效率,从1.68%（未经过紫外臭氧处理）提高到2.57%（紫外臭氧处理Ag 1 min）。提高的原因推测是紫外臭氧处理形成了AgO_x薄膜,提高了电荷提取并使器件具有高光学透明度、低串联电阻和优异的表面功函数等一些性能。并且,紫外臭氧处理Ag薄膜与MoO₃或者PEDOT：PSS复合修饰ITO的器件效率分别得到提高,Ag薄膜与MoO₃复合修饰ITO的器件效率从2.02%（PET/ITO/MoO₃）提高到2.97%（PET/ITO/AgO_x/MoO₃）,Ag薄膜与PEDOT：PSS复合修饰ITO的器件效率从2.01%（PET/ITO/PEDOT：PSS）提高到2.93%（PET/ITO/AgO_x/PEDOT：PSS）。此外,以PBDTTT-EFT：PC₇₁BM为有源层的柔性聚合物太阳能电池效率可达6.21%。基于ITO的柔性光电器件效率的提高主要归于ITO被Ag/PEDOT：PSS或Ag/MoO₃修饰后功函数的提高。     

Low driving voltage in an organic light-emitting diode using MoO3/NPB multiple quantum well structure in a hole transport layer

The driving voltage of an organic light-emitting diode(OLED) is lowered by employing molybdenum trioxide(MoO3)/N,N’-bis(naphthalene-1-yl)-N,N’-bis(phe-nyl)-benzidine(NPB) multiple quantum well(MQW) structure in the hole transport layer.For the device with double quantum well(DQW) structure of ITO/[MoO3(2.5 nm)/NPB(20 nm)]2/Alq3(50 nm)/LiF(0.8 nm)/Al(120 nm)],the turn-on voltage is reduced to 2.8 V,which is lowered by 0.4 V compared with that of the control device(without MQW structures),and the driving voltage is 5.6 V,which is reduced by 1 V compared with that of the control device at the 1000 cd/m2.In this work,the enhancement of the injection and transport ability for holes could reduce the driving voltage for the device with MQW structure,which is attributed not only to the reduced energy barrier between ITO and NPB,but also to the forming charge transfer complex between MoO3 and NPB induced by the interfacial doping effect of MoO3.     

Ultrathin nickel oxide film as a hole buffer layer to enhance the optoelectronic performance of a polymer light-emitting diode

In order to promote a polymer LED (PLED), we fabricated and introduced an ultrathin nickel oxide (NiO) buffer layer (<10 nm) between the indium tin oxide (ITO) anode and the poly (3, 4-ethylenedioxythiophene) hole injection layer in the PLED. The NiO buffer layer was easily formed on the ITO anode by electron-beam deposition of a nickel (Ni) metal source and an oxygen plasma treatment process. As a result, the PLED device with the NiO buffer layer on its ITO anode had the same turn-on voltage as conventional PLED devices without the NiO buffer layer, and the luminance of the PLED device with the NiO buffer layer was doubled, compared with the conventional PLED devices without the NiO buffer layer. Improvement of the optoelectronic performance of the PLED can be attributed to the increase of the current driven into the diode, resulting from the NiO buffer layer, which can enhance the hole injection and balance the injection of the two types of carriers (holes and electrons). Thus it is an excellent choice to introduce the NiO buffer layer onto the ITO anode of the PLED devices in order to enhance the optoelectronic performance of PLED devices.     

Surface modification of indium tin oxide anode with self-assembled monolayer modified Ag film for improved OLED device characteristics

Modification of electrodes has attracted much attention in the study of organic semiconductor devices. A self-assembled monolayer (SAM) of 4-fluorothiophenol is employed to modify the Ag film on the surface of indium tin oxide (ITO) to improve the hole injection and the surface morphology. The modified anode was characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), and UV–vis transmittance spectra. To investigate the effect of the modification on the device characteristics, typical double layer devices with the structure of anode/-naphthylphenylbiphenyl diamine (NPB, 60 nm)/tris-(8-hydroxyquinoline) aluminum (Alq₃, 60 nm)/LiF(0.7 nm)/Al(100 nm) were fabricated using the modified anode and the bare ITO. The effect of Ag layer thickness on the device performance is also investigated. The results revealed that SAM modified ultra-thin Ag film is an effective buffer layer for organic light emitting diode. The device using the ITO/Ag (5 nm)/SAM as anode show improved device characteristics than that of using bare ITO as anode. The enhancements in luminance and efficiency are attributed to enhanced hole injection and smooth surface between anode and the organic material. The Ag thickness of 5 nm is chosen as an acceptable compromise between substrate transparency and the device performance.