Strain relief and growth optimization of GaSb on GaP by molecular beam epitaxy

In this paper, the impact of growth parameters on the strain relaxation of highly lattice mismatched (11.8%) GaSb grown on GaP substrate by molecular beam epitaxy has been investigated. The surface morphology, misfit dislocation and strain relaxation of the GaSb islands are shown to be highly related to the initial surface treatment, growth rate and temperature. More specifically, Sb-rich surface treatment is shown to promote the formation of Lomer misfit dislocations. Analysis of the misfit dislocation and strain relaxation as functions of the growth temperature and rate led to an optimal growth window for a high quality GaSb epitaxial layer on (001) GaP. With this demonstrated optimized growth, a high mobility (25?500?cm(2)?V (-1)?s(-1) at room temperature) AlSb/InAs heterostructure on a semi-insulating (001) GaP substrate has been achieved.     

Optimization of InAs/GaSb type-II superlattices for high performance of photodetectors

The optimum growth conditions and strain balancing processes have been studied using molecular beam epitaxy (MBE) grown 51 Å InAs/40 Å GaSb type-II superlattices (SLs) designed to have cut-off wavelength of 10 μm. The most dominant factor in reducing the defect level in the SL structure was buffer growth temperature evidenced by transmission electron microscopy. In the study of the strain balancing process, the SLs could be lattice matched to the GaSb substrate by increasing the thickness of the InSb interfaces (IFs) from a nominal value of 1.0 to 1.4 ML, however, the structural quality degraded dramatically when the thickness of IFs reached beyond 1.0 ML. By optimizing the growth condition and MBE shutter sequences, micron thick InAs/GaSb SLs with a reduced lattice mismatch were routinely obtained with the full-width half-maximum of 18 arcsec, and the root mean square values of surface roughness of 2 Å in 5 μm area scan of atomic force microscopy demonstrating high quality. Correlation between material quality and photoresponse signal strength in photoconductivity measurements was made on SL samples with cut-off wavelength on the order of 10 μm.     

Effect of strain on vibrational modes in strained layer superlattices

We have investigated the lattice vibrational properties of a two-component strained layer semiconductor superlattice (GaAs) _n1 (GaSb) _n2 using a one-dimensional linear chain model and transfer matrix method [1]. Effect of strain, arising due to the lattice mismatch (∼ 7%) has been considered explicitly in the equation of motion. We show for the first time that the optical vibrational frequency increases (in the case of (GaAs)₄ (GaSb) _n ) or decreases (in the case of (GaAs) _n (GaSb)₄) with increase of layer thicknessn, in either type of superlattices. Raman scattering measurements on some other similar systems support our findings.     

In1-xGaxAsyP1-y/InP异质界面晶格失配对外延晶体质量的影响

用X-射线双晶衍射,双晶形貌术和光致发光方法综合研究了In1-xGaxAsyP1-y/InP异质界面晶格失配对LPE晶体质量的影响。实验表明,异质界面晶格失配是导致外延层中位错和缺陷增多,杂质凝聚和辐射复合深中心增多的重要因素。     

GaSb衬底上外延InAsxSb1-x材料的LP-MOCVD研究

采用自制的低压金属有机化学汽相淀积LP-MOCVD设备, 在(100)面GaSb单晶衬底上外延生长了InAsSb材料.用X射线双晶衍射、光学显微镜和扫描电镜、电子探针能谱仪等对材料特性进行了表征，分析研究了生长温度、Ⅴ/Ⅲ比、过渡层等对外延层的影响.并且获得了与GaSb衬底晶格失配度较低的表面光亮的晶体质量较好的InAsSb外延层.     

Electronic structure of GaSbAlSb superlattices

We present optical absorption experiments performed at low temperature in very high quality GaSbAlSb superlattices grown by MBE. The absorption spectra exhibit pronounced exciton peaks separated by absorption plateaus. The data are interpreted within an effective mass theory, taking into account the effect of strains induced by the 0.65 % lattice mismatch of the hosts. From the number of observed transitions, we can determine quite accurately the band offsets in this system. The crossover of the quantized states originating from the Λ and L minima of the GaSb conduction band is also discussed.     

High-efficiency metal-semiconductor-metal photodetectors on heteroepitaxially grown Ge on Si

We demonstrate extremely efficient germanium-on-silicon metal-semiconductor-metal photodetectors with responsivities (R) as high as 0.85 A/W at 1.55 microm and 2V reverse bias. Ge was directly grown on Si by using a novel heteroepitaxial growth technique, which uses multisteps of growth and hydrogen annealing to reduce surface roughness and threading dislocations that form due to the 4.2% lattice mismatch. Photodiodes on such layers exhibit reverse dark currents of 100 mA/cm2 and external quantum efficiency up to 68%. This technology is promising to realize monolithically integrated optoelectronics.     

InAs/(GaIn)Sb superlattices for IR optoelectronics: Strain optimization by controlled interface formation

The structural properties of InAs/(GaIn)Sb and (InGa)As/GaSb superlattices (SLs), grown by solid-source molecular-beam epitaxy on GaAs substrates using a strain relaxed GaSb or InAs buffer layer or directly on InAs substrates, were analyzed by high-resolution X-ray diffraction and Raman spectroscopy. The residual strain within the SL was found to depend critically on the type of interface bonds, which can be either InSb- or GaAs-like. Thus, to achieve lattice matching to the buffer layer or substrate by strain compensation within the SL stack, the controlled formation of the interface bonds is vital. On the other hand, minimization of the residual strain is shown to be a prerequisite for achieving a high photoluminescence yield and high responsivities for InAs/(GaIn)Sb SL based IR detectors.     

Growth and characterization of InAsSb alloys by metalorganic chemical vapour deposition

Low pressure metalorganic chemical vapour deposition (LP-MOCVD) growth and characteristics of InAsSb on (100) GaSb substrates are investigated. Mirror-like surfaces with a minimum lattice mismatch are obtained. The samples are studied by photoluminescence spectra, and the output is 3.17μm in wavelength. The surface of InAsSb epilayer shows that its morphological feature is dependent on buffer layer. With an InAs buffer layer used, the best surface is obtained. The InAsSb film shows to be of n-type conduction with an electron concentration of 8.52×10¹⁶cm^-3.     

Controlling anisotropy of GaSb(As)/GaAs quantum dots by self-assembled molecular beam epitaxy

A systematic study was performed to control the geometrical anisotropy of GaSb(As)/GaAs quantum dot structures formed by the Stranski–Krastanov growth mode of molecular beam epitaxy. In particular, effects of both the Sb₄ beam flux and the As₄ background pressure on the geometrical anisotropy were clarified and elongated QDs with lateral aspect ratio greater than 3 were successfully formed. Under a low As₄ background pressure, As₄ is found to act as surfactant to influence the adatom diffusion and change the density of QDs. By contrast, under high As₄ background pressure, the intermixing of As and Sb takes place and reduces strains induced by the lattice mismatch.     

GaSb layers with low defect density deposited on (001) GaAs substrate in two-dimensional growth mode using molecular beam epitaxy

We report on the growth of fully relaxed and smooth GaSb layers with reduced density of threading dislocations, deposited on GaAs substrate. We prove that three parameters have to be controlled in order to obtain applicable GaSb buffers with atomically smooth surface: interfacial misfit (IMF), the etch pit density (EPD) and the growth mode.The GaSb/GaAs interfacial misfit array and reduced EPD ≤1.0 × 10⁷ cm^?2 were easily obtained using As-flux reduction for 3 min and Sb-soaking surface for 10 s before the GaSb growth initiation. The successive growth of GaSb layer proceeded under the technological conditions described by the wide range of the following parameters: r_G ∈ (1.5 ÷ 1.9) Å/s, T_G ∈ (400 ÷ 520)°C, V/III ∈ (2.3 ÷ 3.5). Unfortunately, a spiral or 3D growth modes were observed for this material resulting in the surface roughness of 1.1 ÷ 3.0 nm. Two-dimensional growth mode (layer by layer) can only be achieved under the strictly defined conditions. In our case, the best quality 1-μm-thick GaSb buffer layer with atomically smooth surface was obtained for the following set of parameters: r_G = 1.5 Å/s, T_G = 530 °C, V/III = 2.9. The layer was characterized by the strain relaxation over 99.6%, 90° dislocations array with the average distance of 5.56 nm, EPD ～8.0 × 10⁶ cm^?2 and 2D undulated terraces on the surface with roughness of about 1 ML. No mounds were observed. We belive that only thin and smooth GaSb layer with reduced EPD may be applied as the buffer layer in complex device heterostructures. Otherwise, it may cause the device parameters deterioration.     

p型Ga0.47In0.53AS接触层的生长

用过冷法在632-630℃生长了掺Zn的p型Ga0.47In0.53As接触层.研究了液相中Ga组分和Zn组分对GaxIn1-xAs/InP异质结晶格失配的影响,用一次外延技术生长了GaxIn1-xAs作接触层的GaInAsP/InP双异质结.     

(InAs)1/(GaSb)1超晶格纳米线第一原理研究

半导体纳米线作为纳米器件的作用区和连接部分具有理想的形状, 把电子运动和原子周期性限制在一维结构当中.通过体材料的已知特性, 有效地选择材料组分使纳米线的低维结构优点更加突出.此外, 还可以通过其他方式来调整纳米线特性, 如控制纳米线直径、晶体学生长方向、结构相、表面晶体学晶面和饱和 度等内部或固有的特性;施加电场、磁场、热场和力场等外部影响. 体材料InAs和GaSb的晶格常数非常相近, 因此InAs/GaSb异质结构晶格失配很小, 可生长成为优良的红外光电子材料.另外, 体材料InAs在二元III---V化合物半导体中具有最低的有效质量, 这使得电子限制在InAs层的InAs/GaSb超晶格具有良好的输运特性. 本文通过第一原理计算研究轴线沿[001]和[111]闪锌矿晶体学方向的 (InAs)₁/(GaSb)₁超晶格纳米线(下标表示分子或双原子单层的数量) 的结构、电子和力学特性, 以及它们随纳米线直径(线径约为0.5---2.0 nm)的变化规律.另外, 分析了外部施加的应力对电子特性的影响, 考察了不同线径(InAs)₁/(GaSb)₁超晶格纳米线的电子带边能级随轴向应变的变化, 从而确定超晶格电子能带的带边变形势.     

直接键合的三结太阳能电池研究

本文研制了直接键合的三结GaInP/GaAs/InGaAsP太阳电池.直接键合技术可以减少晶格不匹配的材料在外延生长过程中产生的线位错和面缺陷,将缺陷限制在界面几十纳米的薄层而不向内扩散,是未来实现高效多结电池的发展趋势之一.此类电池国内鲜有报道.本文键合三结电池的键合界面采用p+GaAs/n+InP结构,得到电池开路电压3.0 V,在电池结构没有优化的情况下获得效率24%,表面未做减反膜.开路电压表明三结电池实现了串联,为单片集成的高效多结电池提供了新的途径.对实验结果进行了分析并给出了改进措施.     

Raman scattering of polycrystalline GaSb thin films grownby co-evapouration process

<正>This paper reports that GaSb thin films have been co-deposited on soda-lime glass substrates.The GaSb thin film structural properties are characterized by Raman spectroscopy.The Sb-A_1g/GaSb-TO ratio decreases rapidly with the increase of substrate temperature,which suggests a small amount of crystalline Sb in the GaSb thin film and suggests that Sb atoms in the thin film decrease.In Raman spectra,the transverse optical（TO） mode intensity is stronger than that of the longitudinal optical（LO） mode,which indicates that all the samples are disordered.The LO/TO intensity ratio increases with increasing substrate temperature which suggests the improved polycrystalline quality of the GaSb thin film.A downshift of the TO and LO frequencies of the polycrystalline GaSb thin film to single crystalline bulk GaSb Raman spectra is also observed.The uniaxial stress in GaSb thin film is calculated and the value is around 1.0 GPa.The uniaxial stress decreases with increasing substrate temperature.These results suggest that a higher substrate temperature is beneficial in relaxing the stress in GaSb thin film.     

GaN外延衬底LiGaO2晶体的生长和缺陷

ＬｉＧａＯ２与ＧａＮ的晶格失配率只有０．２％，是一种很有潜力的蓝光衬底材料。通过多次实验，用提拉法生长了尺寸为１５×６０ｍｍ的高质量ＬｉＧａＯ２单晶。利用化学侵蚀、光学显微镜、透射电子显微镜对晶体中的缺陷进行了分析，研究了生长参数、原料化学配比对晶体质量的影响。ＬｉＧａＯ２晶体在〈１００〉方向生长速率最快，在〈００１〉方向上生长较慢。由于原料按非化学计量比挥发致使组份偏离，容易产生γ－Ｇａ２Ｏ３包裹物。包裹物和位错的形成具有一定的相互促进作用，往往形成平行于（００１）面的亚晶界。通过调整原料配比、生长工艺参数可克服上述问题。     

Raman properties embeddedof GaSb nanoparticlesin SiO2 films

The Raman shifts of nanocrystalline GaSb excited by an Ar^ ion laser at wavelengths 514.5, 496.5, 488.0, 476.5,and 457.9nm are studied by an SPEX-1403 laser Raman spectrometer respectively, and they are explained by phonon confinement, tensile stress, resonant Raman scattering and quantum size effects. The Stokes and anti-Stokes Raman spectra of GaSb nanocrystals strongly support the Raman feature of GaSb nanocrystals. The calculated optical spectra compare well with experimental data on Raman scattering GaSb nanocrystals.     

Phonon dispersion in quasiperiodic semiconductor superlattices

The phonon spectra of unstrained and strained quasiperiodic semiconductor superlattices (QSSL) have been calculated using one-dimensional linear chain model. We consider two types of quasiperiodic systems, namely cantor triadic bar (CTB) and Fibonacci sequences (FS), constituting of AlAs, GaAs and GaSb of which the latter two have a lattice mismatch of about 7%. The calculations have been made using transfer matrix method and also with and without the inclusion of strain. We present the results on phonon spectra of two component CTB and two as well as three component FS semiconductor superlattices (SSL), thickness and order dependence on LO mode of GaAs, effect of strain on LO frequency of GaAs. The calculated results show that the strain generated due to lattice mismatch reduces significantly the magnitudes of the confined optical phonon frequency of GaAs.     

The mechanism of the recrystallization process in epitaxial GaN under dynamic stress field: atomistic origin of planar defect formation

The mechanism of the recrystallization in epitaxial (0001) GaN film, introduced by the indentation technique, is probed by lattice dynamic studies using Raman spectroscopy. The recrystallized region is identified by micro‐Raman area mapping. ‘Pop‐in’ bursts in loading lines indicate nucleation of dislocations and climb of dislocations. These processes set in plastic motion of lattice atoms under stress field at the center of indentation for the initiation of the recrystallization process. A planar defect migration mechanism is evolved. A pivotal role of vacancy migration is noted, for the first time, as the rate‐limiting factor for the dislocation dynamics initiating the recrystallization process in GaN. Copyright © 2009 John Wiley & Sons, Ltd.     

Mismatch dislocations caused by preferential sputtering of a platinum-nickel alloy surface

Preferential sputtering and recoil mixing of a Pt₂₅Ni₇₅(111) single crystal surface leads to platinum enrichment in the upper monolayers, thereby increasing the lattice constant in these layers. This results in subsurface lattice mismatch dislocations, which have been studied by scanning tunneling microscopy. While the subsurface dislocations are only visible as shallow ditches in STM topographs, the Burgers vectors of the dislocation system can be determined by means of atomically resolved images of dislocations reaching the surface. A comparison with simulations of lattice relaxation using embedded-atom potentials shows good agreement with STM data and further allows the determination of the thickness of the Pt enrichment. We have estimated the Pt concentration in these layers from the dislocation density and studied the annealing behaviour of the surface.