Laser on porous silicon after oxidation by irradiation and annealing

Stimulated emission has been observed from oxide structure of silicon when optically excited by 514 nm laser. The photoluminescence (PL) pulse has a Lorentzian shape with a full width at half maximum (FWHM) of 0.5-0.6 nm. The twin peaks at 694 nm and 692 nm are dominated by stimulated emission which can be demonstrated by its threshold behavior and transition from sub-threshold to linear evolution in light emission. The gain coefficient from the evolution of the peak-emission intensity as a function of the optically pumped sample length has been measured. The oxide structure was fabricated by laser irradiation and annealing treatment on silicon. A model for explaining the stimulated emission has been proposed in which the trap states of the interface between oxide of silicon and porous nanocrystal play an important role.     

多孔硅量子点的受激辐射：陷阱态的作用

 经激光辐照和高温退火后能够在硅基上生成氧化多孔硅结构。用514 nm的激光泵浦,观测到该多孔硅的受激辐射。当激励强度超过阈值时,在650～750 nm区域有很强的受激发光峰。这些受激发光峰的半高宽小于0.5 nm。激光辐照和高温退火后,在样品上能形成某些特殊的氧化结构。在傅里叶红外光谱分析中,显示有硅氧双键或硅氧桥键在硅表面形成。计算结果表明：当硅氧双键或硅氧桥键形成时,电子的陷阱态出现在纳晶硅的带隙中。价带顶和陷阱态之间的粒子数反转是解释这种受激辐射的关键。     

Optical properties of silicon microcolumn grown by nanosecond pulsed laser irradiation

We have investigated the optical properties of silicon pillars formed by cumulative nanosecond pulsed excimer laser irradiation of single-crystal silicon in vacuum created under different repetition rates. The changes in optical characteristics of silicon pillar were systematically determined and compared as the number of KrF laser shots was increased from 1 to 15,000.The results show that silicon pillar PL curves exhibit a blue band around 430 nm and an ultraviolet band peaking at 370 nm with the vanishing of the green emission at 530 nm. A correlation between the intensity of the blue PL band and the intensity of the Si-O absorption bands has been exploited to explain such emission, whereas, the origin of the ultraviolet band may be attributed to different types of defects in silicon oxide.     

不同气体氛围下硅量子点的结构及其发光机理

纳秒脉冲激光在氮气、氧气和空气等不同氛围中加工出的硅量子点都有光致荧光(PL)的发光增强效应,并且在700 nm波长附近观察到了受激辐射.在不同氛围下生成的样品有几乎相同的PL光谱分布,其原因是不同氛围下加工出的样品带隙中有相同的电子态分布.计算结果显示:当硅量子点表面被氮或氧钝化后,在带隙中能够形成几乎相同的局域电子态,这种局域电子态可以俘获来自导带的电子,从而形成亚稳态,这是PL发光增强乃至产生受激辐射的关键因素. 关键词： 硅量子点 PL光谱 发光增强 电子局域态     

脉冲激光辐照单晶硅形成的低维结构及其光致荧光特性

 将功率密度约为0.5 J·s^-1·cm^-2、脉冲宽度约为8 ns、束斑直径为0.045 mm、波长为1 064 nm的YAG激光束照射在硅样品表面打出小孔,在孔内的侧壁上形成较规则的网孔状结构;该结构有很强的光致荧光,其强度比该样品的瑞利散射强;发光峰中心约在700 nm处。在无氧化的环境里用激光加工出的硅样品几乎无发光,这证实了氧在光致荧光增强上起着重要作用。用冷等离子体波模型来解释孔侧壁网孔状结构形成的机理,并用量子受限-发光中心模型来解释纳米网孔壁结构的强荧光效应。当激光辐照时间为9 s时,孔洞侧壁上的网孔状结构较稳定,且有较强的光致荧光。     

多孔硅紫外发光性质的研究

采用水热刻蚀技术制备多孔硅粉末。紫外激光244 nm激发时,多孔硅呈现出310 nm的强紫外发光。随着研磨时间的延长,多孔硅结构消失,紫外发光带也随之消失。氧气热处理后,多孔硅表面被氧化生成氧化硅薄层,同样造成紫外发光带的消失。我们认为310 nm紫外发光来源于硅纳米结构中电子和空穴的直接禁带结构辐射复合。     

532 nm纳秒激光辐照下的单晶硅表面微结构及荧光特性

采用Nd:YAG纳秒脉冲激光对单晶硅在空气中进行辐照,研究了表面微结构在不同能量密度和扫描速度下的演化情况。扫描电子显微镜测量表明,激光在相对较低能量密度下辐照硅表面诱导出鱼鳞状波纹结构,激光能量密度相对较大时,诱导出絮状多孔的不规则微结构。光致荧光谱（PL）表明,激光扫描区域在710 nm附近有荧光发射。用氢氟酸腐蚀掉样品表面的SiOx后,荧光峰的强度显著降低,说明SiOx在光致发光增强上起重要作用。能量色散X射线谱（EDS）表明氧元素的含量随激光能量密度的增大而增加。研究表明:纳秒激光的能量密度和扫描速度对微结构形成起着决定性作用,改变了硅材料表面微结构尺寸,增大了光吸收面积; 氧元素在光致发光增强上起重要作用,微构造硅和SiOx对光致荧光的发射都有贡献。     

Y2O3:Bi,Yb减反转光薄膜的制备及其性能研究

采用脉冲激光沉积(PLD)方法在湿法腐蚀后的Si(100)衬底上制备了Y₂O₃:Bi,Yb减反转光薄膜。所制备的薄膜在300~800 nm波长范围内的平均反射率最低至5.28%,同时在晶体硅太阳能电池最佳响应范围内的980 nm附近表现出了良好的下转光特性。与非减反下转光薄膜相比较,具有减反结构的Y₂O₃:Bi,Yb下转换薄膜的转光强度有了明显的提升。随着衬底腐蚀时间在一定范围内的延长,Bi³⁺和Yb³⁺的发射峰强度线性增大。该减反转光薄膜为太阳能电池效率提高提供了一种简单可行的方法。     

Localized electronic states in gaps on hole-net structures of silicon

Hole-net structure silicon is fabricated by laser irradiation and annealing, on which a photoluminescence (PL) band in a the region of 650--750~nm is pinned and its intensity increases obviously after oxidation. It is found that the PL intensity changes with both laser irradiation time and annealing time. Calculations show that some localized states appear in the band gap of the smaller nanocrystal when Si=O bonds or Si--O--Si bonds are passivated on the surface. It is discovered that the density and the number of Si=O bonds or Si--O--Si bonds related to both the irradiation time and the annealing time obviously affect the generation of the localized gap states of hole-net silicon, by which the production of stimulated emission through controlling oxidation time can be explained.     

钨酸锌晶体的受激拉曼散射和光致发光研究

采用皮秒532nm 激光激发，研究了ZnWO₄晶体的受激拉曼散射和本征荧光发射.在SRS光谱中观察到一级(558.7nm)和二级(588.6nm)斯托克斯光，线宽分别为130和77cm^－1, 一级斯托克斯光的抽运阈值为6.8mJ.在532nm激光抽运下ZnWO₄晶体的荧光光谱呈现出由能量为2.30，2.45和2.83eV的3个高斯分量组成的独特结构.光致发光表明晶体具有从400nm到650nm的宽带本征发光，其峰值波长为472.0nm，相应于钨氧之间的辐射跃迁. 关键词： 晶体 钨酸锌 受激拉曼散射 闪烁体     

Low-dimensional structures formed by irradiation of laser

Some kinds of low-dimensional nanostructures can be formed by irradiation of laser on the pure silicon sample and the SiGe alloy sample. This paper has studied the photoluminescence (PL) of the hole-net structure of silicon and the porous structure of SiGe where the PL intensity at 706nm and 725nm wavelength increases obviously. The effect of intensity-enhancing in the PL peaks cannot be explained within the quantum confinement alone. A mechanism for increasing PL emission in the above structures is proposed, in which the trap states of the interface between SiO₂ and nanocrystal play an important role.     

Optical properties of low-dimensional structures formed by irradiation of laser

Some kinds of low-dimensional nanostructures can be formed by the irradiation of laser on a pure silicon sample and SiGe alloy sample. We have studied the photoluminescence (PL) of the hole-net structure of silicon and the porous structure of SiGe where the PL intensity at 706 nm and 725 nm wavelength increases obviously. The effect of intensity-enhancing in the PL peaks cannot be explained within the quantum confinement alone. We propose a mechanism on the increasing PL emission in the above structures, in which the trap state of the interface between SiO₂ and nanocrystal plays an important role.      

Nano-laser on silicon quantum dots

A new conception of nano-laser is proposed in which depending on the size of nano-clusters (silicon quantum dots (QD)), the pumping level of laser can be tuned by the quantum confinement (QC) effect, and the population inversion can be formed between the valence band and the localized states in gap produced from the surface bonds of nano-clusters. Here we report the experimental demonstration of nano-laser on silicon quantum dots fabricated by nanosecond pulse laser. The peaks of stimulated emission are observed at 605 nm and 693 nm. Through the micro-cavity of nano-laser, a full width at half maximum of the peak at 693 nm can reach to 0.5 nm. The theoretical model and the experimental results indicate that it is a necessary condition for setting up nano-laser that the smaller size of QD (d < 3 nm) can make the localized states into band gap. The emission energy of nano-laser will be limited in the range of 1.7-2.3 eV generally due to the position of the localized states in gap, which is in good agreement between the experiments and the theory.     

掺钕微球的受激辐射激光和自受激拉曼散射

采用溶胶-凝胶法在SiO_2微球表面覆盖上一薄层Nd~(3+)掺杂SiO_2,并经电极放电熔融后形成表面光滑的高Q值微球.采用锥光纤将808 nm的抽运激光耦合入钕离子掺杂的高Q值微球形成回廊模,激发产生了1080—1097 nm波段受激辐射激光.由于所产生的激光有足够高的功率密度,在高Q SiO_2微球中激发产生了波长为1120—1143 nm一级自受激拉曼散射激光.推导了锥光纤掺钕微球组合的自受激拉曼散射的输出功率和阈值公式.描述了输出激光的特性:阈值、输出功率、线宽、边模抑制比.     

Nd~(3+)/Yb~(3+)共掺磷酸盐玻璃光纤的发光与激光特性研究

以970 nm和808 nm半导体激光器作为抽运源,从光纤长度和抽运功率两个方面,探讨了Nd~(3+)/Yb~(3+)摩尔浓度比约为4:1的共掺磷酸盐玻璃光纤的发光与激光特性.在970 nm抽运下,光纤光谱以Yb~(3+)离子的发光为主,但Yb~(3+)→Nd~(3+)能量传递会对光纤光谱(激光和受激放大自发辐射)产生调制作用,调制作用随970 nm抽运功率或光纤长度的增加而显著,甚至出现显著的双波长激光现象.尽管玻璃样品中Nd~(3+)→Yb~(3+)的能量传递效率ηNd→Yb高达64%,但在808 nm抽运下,激光峰始终在1053 nm附近产生,且与808 nm抽运功率大小和光纤长度无关.为解释这一现象,推导了考虑Nd~(3+)离子受激辐射的能量传递模型.从理论模型来看,Nd~(3+)→Yb~(3+)能量传递作用随Nd~(3+)离子受激辐射信号光强度的增加而迅速减弱,这与该光纤实际测试的荧光光谱随808 nm抽运功率的变化规律相符合.因此,当采用Nd~(3+)离子来敏化Yb~(3+)离子时,需要考虑Nd~(3+)离子的受激辐射对Nd~(3+)→Yb~(3+)能量传递的抑制作用.     

Plasmonic emission and plasma lattice structures induced by pulsed laser in Purcell cavity on silicon

The lattice structure image of a plasma standing wave in a Purcell cavity of silicon is observed. The plasma wave produced by the pulsed laser could be used to fabricate the micro-nanostructure of silicon. The plasma lattice structures induced by the nanosecond pulsed laser in the cavity may be similar to the Wigner crystal structure. It is interesting that the beautiful diffraction pattern could be observed in the plasma lattice structure. The radiation lifetime could be shortened to the nanosecond range throughout the entire spectral range and the relaxation time could be lengthened for higher emission efficiency in the Purcell cavity, which results in the fact that the plasmonic emission is stronger and its threshold is lower.     

Strong luminescence emission enhancement by wet oxidation of pyrolytic silicon nanopowders

A strong luminescence enhancement of several orders of magnitude was obtained using a wet chemical oxidation process on silicon nanopowders (Si-np) produced by laser-assisted pyrolysis of silane. IR absorption spectroscopy, X-ray diffraction analysis and Raman characterization of the as-prepared and processed Si-np show that the oxidation process acts on the oxide layer surrounding the particles by improving its stoichiometry, without affecting the inner crystalline silicon core. Accordingly, the luminescence emission band was centered at about 780 nm and was not shifted after the oxidation process. These results point out the importance of the quality of the oxide capping layer for the passivation of defects which can otherwise quench the luminescence emission.     

射频磁控溅射法制备高质量ZnO薄膜的激光特性研究

用射频磁控溅射方法在SiO2衬底上制备ZnO薄膜。在室温下观测到了A、B激子吸收以及在19K下发现的A、B、C激子的反射表明所制备的ZnO薄膜具有很好的纤锌矿结构。我们获得了来自于电子空穴等离子体的受激发射。进一步研究我们发现由大量窄峰所组成的激光发射，窄峰的间距都为0.5nm左右。根据理论计算，产生激光发射的自成腔的长度为31.5 μm。我们认为ZnO薄膜中产生激光发射的自成腔的形成与其六角型结构有重要关系。     

钬铥双掺钨酸镱钾激光晶体光谱参数计算

采用顶部籽晶提拉法（TSSG）生长了钬铥双掺钨酸镱钾（KHo_0.04Tm_0.06Yb_0.9（WO₄）₂）激光晶体。测试了该晶体的吸收及荧光光谱,计算了其光谱参数。实验结果表明：该晶体在890~1 000 nm范围吸收带较宽,半峰宽为90 nm,计算了主峰1 000 nm处吸收截面为16.92×10^-20 cm²;Tm³⁺在1 690~1 812 nm范围存在较宽的吸收带,半峰宽为118 nm,易于实现Yb→Ho、Yb→Tm、Tm→Ho的能量传递。根据Judd-Ofelt理论,计算了该晶体的光谱强度参数。根据Tm³⁺、Ho³⁺、Yb³⁺离子能级图,讨论了产生1 750~2 200 nm荧光发射的3种能量传递方式。最后计算了主峰2 030 nm处受激发射截面为3.47×10^-20 cm²,表明该晶体可作为2 μm波段优异的激光增益介质。     

Second-Stokes YVO4/Nd:YVO4/YVO4 self-frequency Raman laser

We demonstrated an efficient second-Stokes Raman laser emission at 1313 nm based on self-frequency stimulated Raman scattering from a diode-end-pumped actively Q-switched YVO(4)/Nd:YVO(4)/YVO(4) laser at 1064 nm for the first time, to the authors' knowledge. A double-end diffusion-bonded Nd:YVO(4) composite crystal was adopted for sufficiently improving the thermal lensing effect in the course of self-frequency stimulated Raman scattering operation. With an incident pump power of 14.6 W and a pulse repetition (PRR) of 40 kHz, a maximum average output power of 2.34 W was obtained, corresponding to an optical-to-optical conversion efficiency of 16%. Pulse width and peak power were 1.2 ns and 49 kW, respectively.