排序方式: 共有7条查询结果,搜索用时 15 毫秒
1
1.
纳秒脉冲激光在氮气、氧气和空气等不同氛围中加工出的硅量子点都有光致荧光(PL)的发光增强效应,并且在700 nm波长附近观察到了受激辐射.在不同氛围下生成的样品有几乎相同的PL光谱分布,其原因是不同氛围下加工出的样品带隙中有相同的电子态分布.计算结果显示:当硅量子点表面被氮或氧钝化后,在带隙中能够形成几乎相同的局域电子态,这种局域电子态可以俘获来自导带的电子,从而形成亚稳态,这是PL发光增强乃至产生受激辐射的关键因素.
关键词:
硅量子点
PL光谱
发光增强
电子局域态 相似文献
2.
Hole-net structure silicon is fabricated by laser
irradiation and annealing, on which a photoluminescence (PL) band in a
the region of 650--750~nm is pinned and its intensity increases
obviously after oxidation. It is found that the PL intensity changes
with both laser irradiation time and annealing time. Calculations
show that some localized states appear in the band gap of the
smaller nanocrystal when Si=O bonds or Si--O--Si bonds are
passivated on the surface. It is discovered that the density and the
number of Si=O bonds or Si--O--Si bonds related to both the
irradiation time and the annealing time obviously affect the
generation of the localized gap states of hole-net silicon, by which
the production of stimulated emission through controlling oxidation
time can be explained. 相似文献
3.
We report fabrication of low-dimensional structures in air by a pulsed laser on SiGe alloy samples in which different oxide structures are formed by laser irradiation and annealing treatment. The micro-structures on SiGe are more complex than those on Si. A series of photolumineseence (PL) emission is observed due to various trap states at the SiGe-SiO2 interface formed under different preparing conditions. The peak centre of PL emission exhibits red=shift from Si to SiGe because of narrower gap. A model for explaining the PL emission is proposed in which the trap states of the interface between some oxide and SiGe play an important role. 相似文献
4.
经激光辐照和高温退火后能够在硅基上生成氧化多孔硅结构。用514 nm的激光泵浦,观测到该多孔硅的受激辐射。当激励强度超过阈值时,在650~750 nm区域有很强的受激发光峰。这些受激发光峰的半高宽小于0.5 nm。激光辐照和高温退火后,在样品上能形成某些特殊的氧化结构。在傅里叶红外光谱分析中,显示有硅氧双键或硅氧桥键在硅表面形成。计算结果表明:当硅氧双键或硅氧桥键形成时,电子的陷阱态出现在纳晶硅的带隙中。价带顶和陷阱态之间的粒子数反转是解释这种受激辐射的关键。 相似文献
5.
6.
飞秒激光形成的半导体低维结构与发光 总被引:1,自引:0,他引:1
采用飞秒激光辐照硅和硅锗样品,用扫描电子显微镜(SEM)观察样品同,发现样品上产生了某低维结构.用飞秒激光作用产生等离子体相干驻波对硅和硅锗表面的融蚀模型来解释低维结构的形成机制,发现硅的表面周期约为400 nm的光栅结构在波长719 nm处有较强的光致荧光(PL)峰.该光致荧光的发光强度较小,其机制可从激光的脉宽和重复率两个方面来分析.当激光辐照的能量明显超过硅的融蚀阈值时,光栅形状消失,另一种锥状结构开始形成.控制加工条件,可以获得用于衍射和微分束的纳米光栅. 相似文献
7.
经过激光辐照和高温退火加工能够生成多孔硅样品,在650—780 nm处检测到很强的光致荧光(PL)峰,并且有明显的钉扎和增强效应.实验表明,这种PL发光的强度与样品受辐照和退火的时间短密切相关.通过第一性原理模拟计算发现,样品表面用SiO 双键和Si—O—Si桥键钝化,能隙中会出现电子局域态.激光辐照和高温退火的时间长短决定了样品表面SiO双键和Si—O—Si桥键的密度,而该密度正是影响多孔硅量子点中电子局域态生成的关键.
关键词:
多孔硅量子点
硅氧钝化键
电子局域态 相似文献
1