基于并五苯/酞菁铅异质结的近红外光敏有机场效应管(英文)

采用并五苯(Pentacene)和酞菁铅(PbPc)两种有机材料作为有源层,制备了异质结有机光敏场效应管。在波长为808 nm、强度为124 mW/cm2的近红外光照条件下,异质结phOFET获得最大的光暗电流比达4.4×104,栅压为-50 V时的最大光响应度为118 mA/W,比单层酞菁铅phOFET分别高出766倍和785倍。在经过120 h后,器件的最大光暗电流比和最大光响应度分别稳定于5.4×104和326 mA/W附近。由于在异质结phOFET中采用了对近红外光具有高吸收效率的酞菁铅作为光敏层,而高空穴迁移率的并五苯材料作为靠近栅介质的沟道层,光生载流子的产生与传输能力得到了有效的提高。实验结果表明,基于并五苯/酞菁铅的有机异质结应用于光敏有机场效应管的结构设计中,可以使phOFET成为一种同时具有良好光敏性及稳定性的近红外光探测器件。     

基于PTCDA的有机/无机光敏二极管结构优化

以p型硅和苝四甲酸二酐 （perylene-3,4,9,10-tetracarboxylic acid dianhydride,PTCDA）为异质结,梳状金（Au）薄膜作为顶电极和光入射窗口制备了光敏二极管。研究表明,PTCDA的厚度和Au电极的厚度对光敏二极管的光响应度有很大的影响。对比不同PTCDA厚度的器件性能,在PTCDA厚度为100 nm时,光响应度最高达到0.3 A/W。进而采用最优化的100 nm厚的PTCDA薄膜制备硅基光敏二极管,对比不同Au电极厚度的器件性能。在Au厚度为20 nm时,器件的光响应度达到最优化的0.5 A/W。     

基于PTCDA的有机/无机光敏二极管结构优化

以p型硅和苝四甲酸二酐(perylene-3,4,9,10-tetracarboxylic acid dianhydride,PTCDA)为异质结,梳状金(Au)薄膜作为顶电极和光入射窗口制备了光敏二极管。研究表明,PTCDA的厚度和Au电极的厚度对光敏二极管的光响应度有很大的影响。对比不同PTCDA厚度的器件性能,在PTCDA厚度为100 nm时,光响应度最高达到0.3 A/W。进而采用最优化的100 nm厚的PTCDA薄膜制备硅基光敏二极管,对比不同Au电极厚度的器件性能。在Au厚度为20 nm时,器件的光响应度达到最优化的0.5 A/W。     

衬底温度对TiOPc光敏有机场效应管的影响

制备了基于酞菁氧钛(TiOPc)的有机光敏场效应管,对氧化铟锡(ITO)衬底器件进行温度优化。实验结果表明,随着衬底温度(T_(sub))的增加,器件载流子迁移率(μ)、光暗电流比(P)和光响应度(R)先增加后减小,在T_(sub)=140℃时达到最大。T_(sub)=140℃的ITO衬底器件,在波长808 nm、光功率密度190 m W·cm~(-2)的近红外光照下,最大载流子迁移率达到1.35×10~(-2)cm~2·V~(-1)·s~(-1),最大光暗电流比为250,栅压为-50 V时的最大光响应度为1.51 m A/W。     

电极肖特基接触对有机光敏晶体管性能的影响

有机光敏晶体管是一种在有机场效应管结构中引入光控“栅极”的新型光探测器件,其光灵敏度、光响应度性能参数与源/漏电极和有源层的接触情况关系密切。本文通过真空蒸发法分别制备了采用金电极和铝电极的单层并五苯及酞菁铜有机光敏晶体管。研究了它们在黑暗和光照条件下的输出及转移特性。结果表明,高迁移率的并五苯有源层更适合搭配接触特性较好的金电极,该器件具有和铝电极器件相同高水平的光灵敏度~3×104,但其光响应度是铝电极器件的13倍;而低迁移率的酞菁铜薄膜较适合搭配能够和有源层形成肖特基接触的铝电极,有利于抑制暗电流、增强激子解离效率、提高光电流,进一步使器件在获得和金电极器件同数量级光响应度的同时,其光灵敏度是金电极器件的102倍。本文对光照下电极/有源层肖特基接触的能带变化做了理论分析,总结归纳了有机光敏晶体管电极材料和有源层材料的初步筛选规律。     

基于酞菁钯和C60的异质结有机光敏场效应管

采用酞菁钯(PdPc)和C60两种有机半导体材料,通过真空热蒸镀法以不同的沉积顺序制备了两种不同结构的平面异质结有机光敏场效应管,并对这两种结构器件的光敏特性进行比较。在波长655 nm、光强100mW/cm2的光照条件下,结构为n+-Si/SiO2/PdPc/C60/Al(S&D)(PdPc/C60-OFET)器件的最大光暗比为2×103,光响应度为3 mA/W;而结构为n+-Si/SiO2/C60/PdPc/Al(S&D)(C60/PdPc-OFET)器件的最大光暗比为3×103,光响应度为11mA/W。实验结果表明C60/PdPc-OFET可以获得更好的光敏特性。     

GaN基MIS紫外探测器的电学及光电特性

制备了GaN基金属-绝缘层-半导体(MIS)结构紫外探测器,并测量了其暗电流和光谱响应。通过分析其暗电流,发现在反偏情况下,其主要电流输运机制为隧穿复合机制;在正偏情况下,随着偏压的增大,电流输运机制从隧穿机制变为空间电荷限制电流机制。光谱响应测试结果显示,该探测器在-5 V的偏压下,在315 nm处获得了最大响应度170 mA/W,探测度为2.3×10¹² cm·Hz^1/2·W^-1。此外,还研究了不同厚度I层对器件光电压的影响,结果表明,光电压受隧穿机制与漏电流机制的共同制约。     

基于Au纳米岛修饰的CdSSe纳米带光电探测器

三元合金CdS_xSe_1–x兼具CdS和CdSe的物理性质,其带隙可以通过改变元素的组分来调节.该合金具有优异的光电性能,在光电器件方面具有潜在的应用价值.本文首先通过热蒸发法制备了单晶CdS_0.42Se_0.58纳米带器件,在550 nm光照及1 V偏压下,器件的光电流与暗电流之比为1.24×10³,光响应度达60.1 A/W,外量子效率达1.36×10⁴%,探测率达2.16×10¹¹ Jones,其上升/下降时间约为41.1/41.5 ms.其次,通过Au纳米岛修饰该CdS_0.42Se_0.58纳米带后,器件的光电性能显著提升,在550 nm光照及1 V偏压下,器件的光开关比、响应度、外量子效率及探测率分别提高了5.4倍、11.8倍、11.8倍和10.6倍,并且上升/下降时间均缩短了近一半.最后基于Au纳米岛的局域表面等离子共振解释了器件光电性能增强的微观物理机制,为在不增大器件面积的前提下,...     

基于Pt/GaN/AlGaN异质结高响应度双波段紫外探测器

提出一种在AlGaN基PIN器件的p-GaN表面上沉积Pt,形成肖特基势垒(SB)-PIN异质结器件,器件的能带和载流子的输运发生了变化,这种新型光电探测器实现了双波段紫外探测,可分别工作在光伏和光电导模式下。器件在275 nm波长的紫外光照射的负偏置电压下,工作模式为光伏探测,当入射光功率密度为100μW/cm²,偏置电压为-10 V时,器件得到最大响应度(0.12 A/W);当偏置电压为-0.5 V时,器件得到最大探测率(1.0×10¹³ cm·Hz^1/2·W^-1)。器件在正偏置电压工作模式下可作为高响应、高增益的光电导探测器,当偏置电压为+10 V时,用275 nm和365 nm波长的紫外光照射(光功率密度为100μW/cm²),器件的响应度分别为10 A/W和14 A/W,外量子效率分别为4500%和4890%。所设计的双波段多功能器件将极大地扩展基于AlGaN的紫外探测器的用途。     

6H-SiC pn结紫外光探测器的模拟与分析

运用器件模拟软件模拟了pn结6H-SiC紫外光探测器的光响应灵敏度特性.讨论了不同掺杂浓度、不同器件结深对响应灵敏度的影响.对于p+n结器件，当受光面为p+层，且厚度约为0.2μm、浓度约为9×10.18cm-3、n层浓度约为1×1 0.16cm-3时，器件有较大的响应灵敏度，R=167.2mA/W；当受光面为n+ 层 ，且厚度约为0.2μm、浓度约为9×10.18cm-3、p层浓度约为1×10.16cm-3时，器件有较大的响应灵敏度，R=183.5mA/W.通过比较可知，模型能较好地反应实际情况，与实验数据符合较好. 关键词： 6H-SiC 紫外光探测 吸收系数 光响应灵敏度     

Solution-processed P3HT-based photodetector with field-effect transistor configuration

In this paper, we presented a solution-processed photodetector with a configuration of field-effect transistor Au/poly(3-hexylthiophene) (P3HT)/poly(methyl methacrylate) (PMMA)/Al, in which P3HT acts as the active layer and PMMA as dielectric layer, and the drain and source electrodes (Au) were fabricated through a shadow mask. Using the top-gate bottom-contact configuration and employing orthogonal solvent to avoid “solution corrosion”, the devices with three different thicknesses (38, 150 and 223 nm) of the P3HT layer were investigated, and all of them showed typical transistor properties and their drain–source current can be controlled by the gate voltage. The photocurrent of the device Au/P3HT(223 nm)/PMMA(930 nm)/Al shows an obvious increment over a broad range of wavelengths from 350 to 650 nm, giving a maximum photo-to-dark current ratio of 2,404 with a photoresponsivity of 22.71 mA/W under the incident 350 nm light at V _DS = ?5 V.     

The role of metal contacts in the stability of n-type organic field effect transistors

We are presenting a long-time bias stress stability of C₆₀-based n-type organic field effect transistors (OFETs), in bottom gate, top contacts configuration, with aluminium (Al), silver (Ag) and gold (Au) source–drain contacts. The results clearly shows that the bias stress effects in C₆₀-based n-type OFETs is similar to p-type OFETs and it can be reduced by using an appropriate metal for the source–drain contacts. During the bias stress time, the threshold voltage shift and an increase in the contacts resistance have also been measured. On the basis of the stability of the device parameters, it is proposed that the Al source–drain contact-based devices gives better stability as compared to the devices with Ag and Au source–drain contacts. Our results show that the bias stress-induced threshold voltage shift is due to the trapping of charges in the channel region and in the vicinity of the source–drain contacts.     

Performance of Organic Field Effect Transistors with Self-Improved Cu/Organic Interfaces

We fabricate pentacene-based organic field effect transistors （OFETs） with Cu as source and drain （S-D） electrodes. The fabricated devices stored for ten hours under ambient atmospheric conditions exhibit superior performance compared with the as-prepared devices. The field-effect mobility increases from 0. 012 to 0.03 cm^2 V^-1 s^-1, and the threshold voltage downshifts from -14 to -9 V. The on/off current ratios are close to the order of 10^4. The improved performance of the stored devices is attributed to the formation of thin Cu oxide at the Cu electrodes/organic interfaces. These results suggest a simple and available way to optimize device properties and to reduce fabrication cost for OFETs.     

Fabrication and performance evaluation of ultraviolet photodetector based on organic /inorganic heterojunction

Organic/inorganic ultraviolet photodetector was fabricated using thermal evaporation technique. Organic/inorganic heterojunction based on thermally evaporated copper (II) acetylacetonate thin film of thickness 200 nm deposited on an n-type silicon substrate is introduced. I–V characteristics of the fabricated heterojunction were investigated under UV illumination of intensity 65 mW/cm². The diode parameters such as ideality factor, n, barrier height, Φ_B, and reverse saturation current, I_s, were determined using thermionic emission theory. The series resistance of the fabricated diode was determined using modified Nord's method. The estimated values of series resistance and barrier height of the diode were about 0.33 KΩ and 0.72 eV, respectively. The fabricated photodetector exhibited a responsivity and specific detectivity about 9 mA/W and 4.6 × 10⁹ Jones, respectively. The response behavior of the fabricated photodetector was analyzed through ON-OFF switching behavior. The estimated values of rise and fall time of the present architecture under UV illumination were about 199 ms and 154 ms, respectively. Finally, enhancing the photoresponsivity of the fabricated photodetector, post-deposition plasma treatment process was employed. A remarkable modification of the device performance was noticed as a result of plasma treatment. These modifications are representative in a decrease of series resistance and an increase of photoresponsivity and specific detectivity. The process of plasma treatment achieved an increment of external quantum efficiency from 5.53% to 8.34% at −3.5 V under UV illumination.     

Room-temperature and solution-processed vanadium oxide buffer layer for efficient charge injection in bottom-contact organic field-effect transistors

We introduce a room temperature and solution-processible vanadium oxide (VO_x) buffer layer beneath Au source/drain electrodes for bottom-contact (BC) organic field-effect transistors (OFETs). The OFETs with the VO_x buffer layer exhibited higher mobility and lower threshold voltages than the devices without a buffer layer. The hole mobility with VO_x was over 0.11 cm²/V with the BC geometry with a short channel length (10 μm), even without a surface treatment on SiO₂. The channel width normalized contact resistance was decreased from 98 kΩ cm to 23 kΩ cm with VO_x. The improved mobility and the reduced contact resistance were attributed to the enhanced continuity of pentacene grains, and the increased work function and adhesion of the Au electrodes using the VO_x buffer layer.     

超薄EuF3电极修饰层对有机场效应晶体管性能的提升

采用EuF₃薄层修饰低功函数金属Ag源、漏电极,制备了CuPc有机场效应晶体管,研究了不同厚度EuF₃对器件性能的影响。结果表明,EuF₃的厚度由0 nm增至0.6 nm时,接触电阻由23.65×10⁵ Ω·cm减 至3.86×10⁵ Ω·cm,使得器件载流子迁移率由1.5×10^-3 cm²·V^-1·s^-1提高到4.65×10^-3 cm²·V^-1·s^-1。 UPS测试结果表明,薄层EuF₃在Ag与有机半导体间形成了界面偶极势垒,使源漏电极表面功函数增大,空穴注入势垒降低,Ag电极与有机半导体层界面的接触电阻减小,进而提升了空穴的注入效率。     

Multi-photoactive quantum-dot channels for zinc oxide phototransistors by a surface-engineering patterning process

Red, green, blue (RGB) selective zinc oxide (ZnO) phototransistors with multi-photoactive quantum-dot (QD) channels have been fabricated by a charge-assisted layer-by-layer (LbL) patterning process. QDs were patterned as RGB pixels in multi-photoactive QD channels through the LbL process. The solution-processed ZnO film, which acts as an active-channel layer of the ZnO TFTs, is patterned via a photoinduced surface engineering method to reduce the leakage current of the ZnO TFTs. The average off-current of the patterned ZnO TFTs reduced from 10^?10 to 10^?11 A. QDs absorb visible light and generate photoelectrons, which are then transferred to the ZnO to produce photocurrents. The device shows photoresponsivity of 9.4 mA/W, 12.5, and 137 A/W to the illumination of 638, 520, and 405 nm wavelength light. Our results suggest a promising way to develop an RGB selective phototransistor that uses QDs as a visible light absorption layer and ZnO as an active channel semiconductor.     

Extrinsic limiting factors of carrier transport in organic field-effect transistors

Extrinsic factors to disturb the carrier transport in pentacene field-effect transistors (FETs), as a representative of the high-mobility organic FETs (OFETs), have been comprehensively analyzed by using atomic-force-microscope potentiometry (AFMP), microscopic four-point-probe field-effect transistor (MFPP-FET) measurement, and other techniques. In the first part, by mainly using AFMP as a powerful tool to reveal the potential distribution in working OFETs, we show how and how much the formation of source/drain electrodes influences the apparent field-effect mobility both for top- and bottom-contact configurations. In the second part, we show the influence of irregular grain structures and regular grain boundaries. The films grown both at very low and high temperature ranges contain distinctive insulating parts, which make the apparent mobility very low. Within the moderate growth temperature range, the intrinsic field-effect mobility obtained by MFPP-FET measurement is proportional to the average grain size. This behavior is well explained by the polycrystalline model with the diffusion theory. According to the observations in this work, it is obvious that these extrinsic limiting factors must be carefully excluded to discuss the intrinsic mechanism of the carrier transport in OFETs.