电化学方法制备ZnO纳米颗粒掺杂类金刚石薄膜及其场发射性能研究

采用液相电化学沉积技术制备了ZnO纳米颗粒掺杂的类金刚石(DLC)薄膜, 研究了ZnO纳米颗粒掺杂对DLC薄膜场发射性能的影响. 利用X射线光电子能谱、透射电子显微镜、Raman光谱以及原子力显微镜分别对薄膜的化学组成、 微观结构和表面形貌进行了表征. 结果表明: 薄膜中的ZnO纳米颗粒具有纤锌矿结构, 其含量随着电解液中Zn源的增加而增加. ZnO纳米颗粒掺杂增强了DLC薄膜的石墨化和表面粗糙度. 场发射测试表明, ZnO纳米颗粒掺杂能提高DLC薄膜的场发射性能, 其中Zn与Zn+C的原子比为10.3%的样品在外加电场强度为20.7 V/μm时电流密度达到了1 mA/cm². 薄膜场发射性能的提高归因于ZnO掺杂引起的表面粗糙度和DLC薄膜石墨化程度的增加.     

ZnO∶(Al,Sm)阻挡层薄膜的制备及其光电性能

采用溶胶凝胶法制备ZnO∶Al,Sm阻挡层薄膜,并用X射线衍射仪(XRD)、能谱仪(EDS)、红外光谱(FTIR)、荧光光谱(PL)、紫外可见光谱(UV-Vis)和扫描电子显微镜(SEM)等对阻挡层薄膜进行了表征,探讨了Al、Sm掺杂量对阻挡层薄膜性能的影响。结果表明:当Al的掺杂摩尔分数为1%、Sm的掺杂摩尔分数为3%时,所制备的阻挡层荧光强度最高,可将部分紫外光下转换为588nm的可见光,拓宽了光谱响应范围;基于ZnO∶1%Al,3%Sm阻挡层的海胆棘壳色素敏化的纳米TiO_2太阳能电池的开路电压为0.73V,短路电流密度为0.68mA/cm~2,转换效率达0.33%,效率比基于ZnO阻挡层的电池提高了约136%。     

Sn掺杂ZnO纳米晶的水热法制备及光学性能

以ZnCl2和NaOH为原料,用SnCl4·4H2O作掺杂剂,通过水热法合成了Sn掺杂ZnO纳米颗粒。利用X射线衍射(XRD)、场发射扫描电镜(FE-SEM)、紫外-可见吸收光谱(UV-Vis)及光致发光(PL)光谱等测试技术对样品的物相、形貌及光学性能进行了表征。结果表明:制得的Sn掺杂ZnO纳米粒子具有六角纤锌矿结构。随着锡掺杂浓度的增大,纳米晶的平均粒度增加,晶体形貌由短棒状向单锥和双锥状转变;提高前驱液的pH值,所得样品的形貌由长柱状向短柱状转变。室温下,观测到三个光致发光带,一个峰值在433nm处的强紫光发射峰,一个约在401nm处的近紫外发光峰及一个在466nm处的弱蓝光发光峰。在实验掺杂浓度范围内,Sn的掺杂只是改变纳米ZnO的发光强度,对发光峰位置影响不大。     

Er3+掺杂对ZnO/GaN发光二极管电致发光性能的调控

采用水热法制备了Er~(3+)掺杂的ZnO纳米棒阵列,通过场发射扫描电镜、X单晶衍射谱仪、透射电镜、微区显微光谱仪等对其形貌结构和发光性能进行了表征。结果表明,掺杂前后ZnO纳米棒的形貌及晶型结构未发生改变,Er~(3+)被均匀地掺杂至ZnO纳米棒中,并未发现形成Er_2O_3;掺杂Er~(3+)后样品的光致发光光谱显示400 nm左右蓝光部分占比先提高后减少,其可见光占比减少归因于Er~(3+)填补了一部分锌空位缺陷,同时抑制了一部分氧空位缺陷。结合荧光寿命光谱分析也可发现其辐射发光部分寿命延长,表明荧光辐射效率提高。最终选取掺杂浓度为30%的单根ZnO纳米棒制备ZnO/GaN异质结发光二极管,与未掺杂Er~(3+)的样品相比,其电致发光强度提高了5倍。本研究可为ZnO基电致发光器件的性能改善提供一种简便可行的方法。     

Er^(3+)掺杂对ZnO/GaN发光二极管电致发光性能的调控EI北大核心CSCD

采用水热法制备了Er^(3+)掺杂的ZnO纳米棒阵列,通过场发射扫描电镜、X单晶衍射谱仪、透射电镜、微区显微光谱仪等对其形貌结构和发光性能进行了表征。结果表明,掺杂前后ZnO纳米棒的形貌及晶型结构未发生改变,Er^(3+)被均匀地掺杂至ZnO纳米棒中,并未发现形成Er_(2)O_(3);掺杂Er^(3+)后样品的光致发光光谱显示400 nm左右蓝光部分占比先提高后减少,其可见光占比减少归因于Er^(3+)填补了一部分锌空位缺陷,同时抑制了一部分氧空位缺陷。结合荧光寿命光谱分析也可发现其辐射发光部分寿命延长,表明荧光辐射效率提高。最终选取掺杂浓度为30%的单根ZnO纳米棒制备ZnO/GaN异质结发光二极管,与未掺杂Er^(3+)的样品相比,其电致发光强度提高了5倍。本研究可为ZnO基电致发光器件的性能改善提供一种简便可行的方法。     

高度均一ZnO纳米梭的水热法制备及其性能

以六亚甲基四胺和硝酸锌为原料,采用水热法在90℃条件下反应24h,于Si衬底上制备出一维ZnO纳米梭材料.采用场发射扫描电镜、X射线衍射仪和高分辨透射电镜等方法对样品形貌和晶体结构进行了表征.结果表明,所得ZnO纳米梭形貌一致、尺寸均匀,为六方纤锌矿型结构,具有良好的结晶性能.对ZnO纳米梭的光致发光性能的研究表明,该...     

水浴法制备ZnO纳米棒及其场发射性能

用硝酸锌(Zn(NO3)2·6H2O)与六亚甲基四胺(C6H12N4)以等浓度配制成反应溶液,通过水浴法制备出了形貌可控的棒状ZnO纳米结构,讨论了不同反应浓度及衬底对ZnO表面形貌的影响.样品的XRD和扫描电子显微镜分析结果表明,所得产物均为六方纤锌矿结构,在有晶种层的衬底上制备出的ZnO纳米棒沿(001)方向并垂直于衬底表面生长.随着反应浓度的增加,ZnO纳米棒的直径增大,长径比减小.样品的场发射性能测试表明,反应溶液浓度为0.005 mol/L,以铜膜为晶种层的硅衬底上制备出的场发射阴极具有较好的场发射性能.     

透明β-NaYF_4∶Yb,Tm/PMMA纳米复合材料的制备及其光学性能

采用高温溶剂热法制备了一系列不同Yb3+掺杂浓度的上转换发光纳米粒子β-NaYF4∶Yb,Tm和核壳结构的β-NaYF4∶Yb,Tm@β-NaYF4∶Yb纳米粒子。采用X射线衍射(XRD)、场发射扫描电镜(FESEM)、光致发光(PL)谱对材料的物相结构、形貌特征和发光性质进行了表征和研究,并特别研究了温度对材料发光性能的影响。结果表明:保持Tm3+浓度不变,随着Yb3+掺杂浓度的增加,β-NaYF4∶Yb,Tm的发光强度先增大后减小。当Yb3+掺杂摩尔分数为30%时,474 nm和645 nm处的发光强度达到最大值;当Yb3+掺杂摩尔分数为50%时,450 nm和692 nm处的发光强度达到最大值。在β-NaYF4∶Yb(30%),Tm上包裹一层β-NaYF4∶Yb壳层后,其发光显著增强,随壳层Yb3+摩尔分数的增加,发光强度也是先增大后减小。当壳层Yb3+摩尔分数为10%时,核壳结构纳米粒子的发光强度达到最大值;当壳层Yb3+摩尔分数达到40%时,核壳结构纳米粒子的发光强度已经低于未包裹时。将样品进行热处理后,荧光增强。样品的发光强度随环境温度的升高,红光变弱,蓝光增强。采用原位聚合法将β-NaYF4∶Yb,Tm纳米粒子与PMMA制成复合材料后,仍能保持较好的透明度和发光强度。     

基于图形化生长纳米氧化锌场致发射阴极阵列的研究

采用光刻技术在覆盖有氧化锌(ZnO)薄膜的ITO玻璃片衬底上实现图形化生长,结合水热法在衬底上制备出结构完整、排列一致的ZnO矩形和圆环型单元阵列。在图形化的基础上二次生长ZnO纳米锥阵列,锥长度最大可达到10μm,远大于一次生长的长度,并且发现锥顶有很多精细的类似针状的纳米量级微细结构。分析了非图形化、图形化一次以及图形化二次生长的ZnO纳米锥阵列的场致发射性能。使用图形化二次生长的ZnO纳米锥阴极阵列制作了12.7cm(5inch)的场发射显示器(FED),能实现全屏发光。实验结果表明,图形化二次生长的ZnO纳米锥阵列发射电流密度为最大,可达0.6mA/cm2,其开启场强为2.5V/μm。图形化生长ZnO纳米锥的方法是一种能较好改善材料场发射性能的好方法,为寻求良好场发射性能材料的制备提供了一条有效的实验途径。     

Ga掺杂对ZnO纳米结构可见光发射的抑制效应

采用碳热还原反应和原位掺杂的方法制备了不同Ga掺杂浓度的ZnO纳米结构. X射线衍射 显示掺杂纳米结构中为单一的氧化锌纤锌矿结构. 扫描电子显微镜 观测发现随掺杂浓度的增大, 纳米结构的形貌逐渐从纳米六棱柱变为纳米锥.光致发光 和X射线光电子能谱 测量分别发现随着掺杂浓度升高, 纳米结构的可见发光强度和其中空位 氧峰相对强度逐渐减小直至消失, 两者存在很强的相关性. 上述结果为ZnO可见光发射的氧空位机理提供了新的实验证据. 对Ga掺杂抑制纳米结构中氧空位的原因进行了分析.     

PLD synthesis of GaN nanowires and nanodots on patterned catalyst surface for field emission study

Patterned gallium nitride nanowires and nanodots have been grown on n-Si (100) substrates by pulsed laser deposition. The nanostructures are patterned using a physical mask, resulting in regions of nanowire growth of different densities. The field emission (FE) characteristics of the patterned gallium nitride nanowires show a turn-on field of 9.06 V/μm to achieve a current density of 0.01 mA/cm² and an enhanced field emission current density as high as 0.156 mA/cm² at an applied field of 11 V/μm. Comparing the peak FE current densities of both the nanowires and nanodots, the peak FE current density of nanowires is around 700 times higher than that of the peak FE current density of nanodots since nanodots have a lower aspect ratio compared to nanowires. The field emission results indicate that, besides density difference, crystalline quality as well as the low electron affinity of gallium nitride, high aspect ratio of gallium nitride nanostructures will greatly enhance their field emission properties.     

A simple method to synthesize worm-like AlN nanowires and its field emission studies

The worm-like AlN nanowires are fabricated by the plasma-enhanced chemical vapor deposition (PECVD) on Si substrates through using Al powder and N₂ as precursors, CaF₂ as fluxing medium, Au as catalyst, respectively. The as-grown worm-like AlN nanowires each have a polycrystalline and hexagonal wurtzite structure. Their diameters are about 300 nm, and the lengths are over 10 μm. The growth mechanism of worm-like AlN nanowires is discussed. Hydrogen plasma plays a very important role in forming the polycrystalline structure and rough surfaces of worm-like AlN nanowires. The worm-like AlN nanowires exhibit an excellent field-emission (FE) property with a low turn-on field of 4.5 V/μm at a current density of 0.01 mA/cm² and low threshold field of 9.9 V/μm at 1 mA/cm². The emission current densities of worm-like AlN nanowires each have a good stability. The enhanced FE properties of worm-like AlN nanowires may be due to their polycrystalline and rough structure with nanosize and high aspect ratio. The excellent FE properties of worm-like AlN nanowires can be explained by a grain boundary conduction mechanism. The results demonstrate that the worm-like AlN nanowires prepared by the proposed simple and the PECVD method possesses the potential applications in photoelectric and field-emission devices.     

Modulation of field emission properties of vertically aligned ZnO nanorods with aspect ratio and number density

Vertically aligned ZnO nanorod arrays with different aspect ratios were synthesized by hybrid wet chemical route. Modulation of the field emission properties (FE) with aspect ratio of ZnO nanorods was examined. With the increase in the aspect ratio, the emission current density increases from 0.02 to 8 μA/cm² at 7.0 V/μm. Turn-on voltage was seen to decrease from 9.6 to 7 V/μm at a current density of 10 μA/cm² with the increase in aspect ratio in the ZnO films. The interrelation between the FE characteristics (emission thresholds, current density, surface uniformity, etc.) and microstructure of the ZnO nanostructure obtained from scanning electron microscopy (SEM) and atomic force microscopy (AFM) was discussed. Quality of the ZnO nanorods was also examined by using Raman spectroscopy and Fourier transformed infrared spectroscopy (FTIR). It was found that the observed enhancements of FE characteristics could mainly be attributed to the increase in aspect ratio and associated number density of ZnO nanorods.     

合成温度对Ce掺杂SiC纳米线的制备及场发射性能的影响研究

本文利用化学气相反应(CVR)法, 系统研究了不同温度对Ce掺杂的SiC纳米线及其场发射性能的影响规律. 利用扫描电镜(SEM)、透射电镜(TEM)、选区电子衍射(SAED)、X射线衍射(XRD)对所得产物进行了表征, 并对其场发射性能进行了测试. 结果表明: 所得产物为具有立方结构的β-SiC晶体, 随着温度的升高, 纳米线逐渐变的弯曲, Ce的含量降低, 产物的开启电场和阈值电场先升高后降低. 当合成温度为1250 ℃, Ce的含量为0.27 at%, 产物的场发射性能最佳,开启电场和阈值电场分别为2.5 V/μm和5.2 V/μm. 关键词： 合成温度 SiC纳米线 场发射性能     

Field emissions of graphene films deposited on different substrates by CVD system

<正>Graphene films are deposited on copper(Cu) and aluminum(Al) substrates,respectively,by using a microwave plasma chemical vapour deposition technique.Furthermore,these graphene films are characterized by a field emission type scanning electron microscope(FE-SEM),Raman spectra,and field emission(FE) I-V measurements.It is found that the surface morphologies of the films deposited on Cu and Al substrates are different:the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate,and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on the Cu substrate.The macroscopic areas of the graphene samples are all above 400 mm~2.     

Effect of temperature on the electron field emission from aligned carbon nanofibers and multiwalled carbon nanotubes

Effect of temperature and aspect ratio on the field emission properties of vertically aligned carbon nanofiber and multiwalled carbon nanotube thin films were studied in detail. Carbon nanofibers and multiwalled carbon nanotube have been synthesized on Si substrates via direct current plasma enhanced chemical vapor deposition technique. Surface morphologies of the films have been studied by a scanning electron microscope, transmission electron microscope and an atomic force microscope. It is found that the threshold field and the emission current density are dependent on the ambient temperature as well as on the aspect ratio of the carbon nanostructure. The threshold field for carbon nanofibers was found to decrease from 5.1 to 2.6 V/μm when the temperature was raised from 300 to 650 K, whereas for MWCNTs it was found to decrease from 4.0 to 1.4 V/μm. This dependence was due to the change in work function of the nanofibers and nanotubes with temperature. The field enhancement factor, current density and the dependence of the effective work function with temperature and with aspect ratio were calculated and we have tried to explain the emission mechanism.     

Mechanism of field electron emission from carbon nanotubes

Field electron emission (FE) is a quantum tunneling process in which electrons are injected from materials (usually metals) into a vacuum under the influence of an applied electric field. In order to obtain usable electron current, the conventional way is to increase the local field at the surface of an emitter. For a plane metal emitter with a typical work function of 5 eV, an applied field of over 1 000 V/μm is needed to obtain a significant current. The high working field (and/or the voltage between the electrodes) has been the bottleneck for many applications of the FE technique. Since the 1960s, enormous effort has been devoted to reduce the working macroscopic field (voltage). A widely adopted idea is to sharpen the emitters to get a large surface field enhancement. The materials of emitters should have good electronic conductivity, high melting points, good chemical inertness, and high mechanical stiffness. Carbon nanotubes (CNTs) are built with such needed properties. As a quasi-one-dimensional material, the CNT is expected to have a large surface field enhancement factor. The experiments have proved the excellent FE performance of CNTs. The turn-on field (the macroscopic field for obtaining a density of 10 μA/cm²) of CNT based emitters can be as low as 1 V/μm. However, this turn-on field is too good to be explained by conventional theory. There are other observations, such as the non-linear Fowler-Nordheim plot and multi-peaks field emission energy distribution spectra, indicating that the field enhancement is not the only story in the FE of CNTs. Since the discovery of CNTs, people have employed more serious quantum mechanical methods, including the electronic band theory, tight-binding theory, scattering theory and density function theory, to investigate FE of CNTs. A few theoretical models have been developed at the same time. The multi-walled carbon nanotubes (MWCNTs) should be assembled with a sharp metal needle of nano-scale radius, for which the FE mechanism is more or less clear. Although MWCNTs are more common in present FE applications, the single-walled carbon nanotubes (SWCNTs) are more interesting in the theoretical point of view since the SWCNTs have unique atomic structures and electronic properties. It would be very interesting if people can predict the behavior of the well-defined SWCNTs quantitatively (for MWCNTs, this is currently impossible). The FE as a tunneling process is sensitive to the apex-vacuum potential barrier of CNTs. On the other hand, the barrier could be significantly altered by the redistribution of excessive charges in the micrometer long SWCNTs, which have only one layer of carbon atoms. Therefore, the conventional theories based upon the hypothesis of fixed potential (work function) would not be valid in this quasi-one-dimensional system. In this review, we shall focus on the mechanism that would be responsible for the superior field emission characteristics of CNTs. We shall introduce a multi-scale simulation algorithm that deals with the entire carbon nanotube as well as the substrate as a whole. The simulation for (5, 5) capped SWCNTs with lengths in the order of micrometers is given as an example. The results show that the field dependence of the apex-vacuum electron potential barrier of a long carbon nanotube is a more pronounced effect, besides the local field enhancement phenomenon.     

Structural and electrical properties of AlN films deposited using reactive RF magnetron sputtering for solar concentrator application

AlN is an interesting material with some excellent properties like high hardness (>11 GPa), high temperature stability (>2400 °C), good electrical resistivity (>10¹⁰ Ω cm), and good thermal conductivity (>100 W/m K). These properties make it useful in the field of photo voltaic systems. Cooling of solar cells in solar concentrator application is of major concern because high temperature reduces their efficiency. In the present work we deposited AlN coating, with and without an Al interlayer, on various substrates like Si, quartz, and copper using RF magnetron sputtering. Deposition conditions such as Al interlayer (deposition time = 5-20 min), Ar:N₂ ratio (N₂% = 0-75%) and substrate bias (0 and −50 V) were changed in order to study their effect on coating properties. Coating surface roughness increased from 0.05 to 0.15 μm with increase in Al interlayer thickness. The coating thickness decreased from 4.4 to 3.1 μm with increase in N₂ gas % and films grew in (0 0 2) orientation. Films deposited on copper using Al interlayer showed good electrical resistance of ∼10¹³ Ω. Films deposited on copper without Al interlayer showed presence of voids or micro cracks and poor electrical properties. AlN films deposited at −50 V bias show cracking and delamination.     

氧空位缺陷对PbTiO_3铁电薄膜漏电流的调控

基于非平衡格林函数及密度泛函理论第一性原理计算方法,计算了Fe, Al, V和Cu四种阳离子掺杂对氧空位缺陷引起的PbTiO_3铁电薄膜漏电流的调控.研究表明:Fe和Al离子掺杂将会增大由其中氧空位缺陷导致的铁电薄膜的漏电流,而Cu和V离子掺杂对该漏电流的大小具有明显抑制作用.这是因为Cu和V掺杂对氧空位缺陷有明显的钉扎作用.相比于半径更大的Cu离子,由于V的离子半径更小,且更接近于PbTiO_3铁电薄膜中Ti的离子半径,可以预言V离子更可能被掺杂进入薄膜,从而抑制氧空位缺陷引起的漏电流.研究结果对铁电薄膜器件的电学性能控制和优化有一定的理论指导意义.