GaN厚膜中的质子辐照诱生缺陷研究

本文采用正电子湮没谱研究质子辐照诱生缺陷, 实验发现: 能量为5 MeV的质子辐照在GaN厚膜中主要产生的是Ga单空位, 没有双空位或者空位团形成; 在10 K测试的低温光致发光谱中, 带边峰出现了"蓝移", 辐照后黄光带的发光强度减弱, 说明黄光带的起源与Ga空位(V_Ga)之间不存在必然的联系, 各激子发光峰位置没有改变, 仅强度随质子注量发生变化; 样品(0002)面双晶XRD扫描曲线的半峰宽在辐照后明显增大, 说明质子辐照对晶格的周期性产生了影响, 薄膜晶体质量下降. 关键词： GaN 缺陷 质子 辐照     

电子束辐照对GaN基LED发光性能的影响

研究了不同能量的电子束辐照对GaN基发光二极管(Light emitting diode,LED)发光性能的影响。利用实验室提供的电子束模拟空间电子辐射,对GaN基LED外延片进行1.5,3.0,4.5 MeV电子束辐照实验,并应用光致发光(Photoluminescence,PL)谱测试发光性能。结果表明:在1.5 MeV电子束辐照下,采用10 kGy剂量辐照时,LED的发光强度增加约25%;而在100 kGy剂量辐照时,LED的发光强度降低约16%。3 MeV的电子束辐照可使原来色纯度不高的LED的色纯度变好,而更高能量的辐照将会引起器件失效。     

表面态调控对GaN荧光光谱的影响

采用高阻本征GaN薄膜,通过H3PO4刻蚀和SiOxNy薄膜钝化方法对GaN薄膜进行表面态调控,研究了表面态调控对GaN薄膜光致荧光光谱的影响.研究发现,H3PO4刻蚀对改善GaN薄膜的紫外荧光发射作用不大,但显著增加可见荧光的强度;经SiOxNy薄膜表面钝化的GaN紫外荧光量子效率增加12—13倍,同时对可见荧光有明显增加.通过比较H3PO4刻蚀和SiOxNy薄膜钝化的室温和低温荧光光谱,探讨了表面态调控对GaN紫外荧光、蓝带荧光和黄带荧光的影响及相关物理机理.     

利用离子激发发光研究低温条件下ZnO发光行为EI北大核心CSCD

离子激发发光(Ions beam induced luminescence,IBIL)可以实时原位分析不同温度、不同离子辐照条件下材料内部点缺陷的演变行为。本文利用2 MeV H^(+)研究了300,200,100 K温度下ZnO单晶内部点缺陷发光及其随注量的演变行为。实验中发现ZnO深能级发射和近带边发射,结合Voigt分峰与XPS实验结果,确定红光(1.75 eV)与V_(Zn)相关,橙红光(1.95 eV)来自Zn_(i)到O_(i)跃迁;对于与V_(O)相关的绿光(2.10 eV),其红移可能由于温度降低导致更多电子由导带释放到Zn_(i)。峰中心位于3.10 eV和3.20 eV近带边发射分别来自于Zn_(i)到价带的跃迁和激子复合,红移原因分别为Zn_(i)附近局域化能级和带隙收缩。利用单指数公式对发光强度进行拟合,获得的衰减速率常数(f)可以表征缺陷的辐射硬度,对比发现深能级发射峰在200 K时辐射硬度最大,而近带边发射峰在300 K时辐射硬度最大。     

GaN基多量子阱蓝光LED的γ辐照效应

本文用4×104Ci(1Ci=3.7×1010Bq)的60Co源(剂量率2×105rad(Si)/h)对GaN基InGaN/GaN多量子阱蓝光LED进行5种剂量的γ射线的辐照实验.通过辐照前后蓝光LED的波长、色纯度、最大半峰宽(FWHM)和电流-电压(I-V)、电流-光通量(I-F)等电光学特性分析,得到γ射线对GaN基LED器件的辐照效应.结果发现,辐照后LED器件的发光一致性和均匀性变差,在20mA工作电流下,最大剂量下器件发光强度衰减近90%,光通量衰减约40%,并得到器件的抗辐照能力的参数τ0Kγ为4.039×10-7rad.s-1,发现较低的正向偏压下(小于2.6V)器件的饱和电流随辐照总剂量增大而增大.     

反射式负电子亲和势GaN光电阴极的光电发射及稳定性研究

利用在线多信息紫外光电阴极激活评估系统,测试了真空室内两个GaN 光电阴极Cs,O激活后及衰减6 h和18 h后补Cs的光谱响应特性曲线和量子效率曲线;并绘制了光纤光源波长为300 nm的光电阴极响应电流衰减变化曲线.实验结果证明,GaN 光电阴极较GaAs阴极具有更好的稳定性,量子效率可保持相对稳定达10 h,然后缓慢衰减,衰减速率较窄禁带半导体材料低得多.补Cs后光电流最大值较刚激活完有16.8%的增长,这充分证明阴极表面量子效率衰减的原因是Cs的脱附,而不是O的吸附.这些现象可由双偶极层模型来解释, 关键词： 光学 光电阴极 量子效率 稳定性     

梯度掺杂结构GaN光电阴极的稳定性

利用GaN光电阴极多信息量测试评估系统,对反射式梯度掺杂和均匀掺杂GaN光电阴极样品进行了激活及衰减后的量子效率测试,并测试衰减速率。在同样的衰减时间内,和均匀掺杂样品相比,梯度掺杂样品的衰减比例较小,衰减速率较慢,其原因在于梯度掺杂结构可在其发射层内部产生系列内建电场,致使其能带连续向下弯曲,导致其表面真空能级比均匀掺杂样品下降得更低,发射层表面形成的负电子亲和势更明显,造成发射层内的光生电子更易逸出,阴极量子效率的衰减变慢,从而使其稳定性强于均匀掺杂结构。     

近紫外波段NEA GaN阴极响应特性的研究

为了深入理解近紫外波段NEA GaN阴极的光谱响应特性, 在超高真空系统中对MOCVD生长的不同发射层厚度和掺杂浓度的三个样品进行激活实验, 并在线测试样品光谱响应. 利用反射式GaN阴极量子效率公式和最小二乘法对入射光波长为0.25—0.35 μ之间的 阴极响应量子效率实验数据进行拟合, 分别得到后界面复合速率和拟合直线L的斜率, 并使用量子效率公式对入射光波长为0.35 μ时的反射式GaN阴极光谱响应量子效率进行仿真. 结果表明, 后界面复合速率和直线v的斜率都能很好地反映GaN阴极的响应性能, 当GaN阴极后界面复合速率小于10⁵ cm/s, 发射层的厚度取0.174—0.212 μ时, 阴极光谱响应性能最好. 关键词： 反射式GaN 势垒 最小二乘法 后界面缺陷     

中子辐照对AlGaN/GaN高电子迁移率晶体管器件电特性的影响

本文采用能量为1 MeV的中子对SiN钝化的AlGaN/GaN HEMT(高电子迁移率晶体管)器件进行了最高注量为1015cm-2的辐照.实验发现:当注量小于1014cm-2时,器件特性退化很小,其中栅电流有轻微变化(正向栅电流IF增加,反向栅电流IR减小),随着中子注量上升,IR迅速降低.而当注量达到1015cm-2时,在膝点电压附近,器件跨导有所下降.此外,中子辐照后,器件欧姆接触的方块电阻退化很小,而肖特基特性退化却相对明显.通过分析发现辐照在SiN钝化层中引入的感生缺陷引起了膝点电压附近漏电流和反向栅泄漏电流的减小.以上结果也表明,SiN钝化可以有效地抑制中子辐照感生表面态电荷,从而屏蔽了绝大部分的中子辐照影响.这也证明SiN钝化的AlGaN/GaN HEMT器件很适合在太空等需要抗位移损伤的环境中应用.     

天鹅绒阴极产生的双脉冲强流相对论电子束特性实验研究

在时间分辨的模式下, 实验研究了天鹅绒阴极产生的双脉冲相对论强流电子束的束心运动、束包络和束的发射度. 在实验中, 电子束流强度和电子束心运动用电阻环进行测试, 而电子束和石英玻璃的相互作用产生的契仑科夫辐射用来给出电子束包络和发射度信息. 电子束和石英玻璃作用产生的契仑科夫辐射用1台8幅分幅相机记录. 实验结果表明, 天鹅绒阴极产生的相对论强流双脉冲电子束在束流大小、束心运动轨迹、束包络及束发射度等方面具有较好的一致性.     

Low dose 60Co gamma-irradiation effects on electronic carrier transport and DC characteristics of AlGaN/GaN high-electron-mobility transistors

The impact of internal irradiation with secondary Compton electrons, generated by gamma-photons, on the characteristics of III-N/GaN-based devices was explored. N-channel AlGaN/GaN high-electron-mobility transistors (HEMTs) were exposed to gamma-radiation from a ⁶⁰Co source for doses up to 600?Gy. Temperature-dependent electron beam-induced current (EBIC) was employed to measure minority carrier transport properties. For low doses below ～250?Gy, the minority carrier diffusion length in AlGaN/GaN HEMTs is shown to increase by about 40%. This increase is likely due to longer minority carrier lifetime induced by internal Compton electron irradiation. An associated decrease in activation energy, extracted from temperature-dependent EBIC, was also found. The obtained increase in transconductance and decrease in gate leakage current indicate an improvement in performance of the devices after low doses of irradiation. For high doses of gamma-irradiation, above ～300?Gy, the performance of HEMTs showed a deterioration. The deterioration results from the onset of increased carrier scattering due to additional radiation-induced defects, as is translated in a decrease of minority carrier diffusion length.     

EBIC investigations of GaN layers prepared by epitaxial lateral overgrowth

GaN films prepared by lateral overgrowth are investigated by scanning electron microscopy in the electron beam induced current (EBIC) mode. A comparison of experimental and simulated dependences of induced current on beam energy has allowed us to determine not only the diffusion length, but also the donor concentration in different areas of a film. It has been found that the donor distribution is inhomogeneous and this inhomogeneity increases under fast neutron irradiation. This is indicative of the significant influence of structural defects on the rate of radiation defect accumulation. An anomalously slow signal decay outside the Schottky barrier has been found, which can be determined by charged defects formed at the merger boundary.     

GaN薄膜的蓝光和红光发射机理研究

由于生长工艺的不完善，非掺杂GaN薄膜中通常存在未知的杂质和缺陷，产生与这些未知杂质和缺陷能级相关的发光。报道了非掺杂GaN薄膜的692nm红色发光．并研究了非掺杂GaN薄膜的蓝、红色发光的发射机理；利用作者提出的吸收归一化光致发光激发光谱，直接测量出了非掺杂GaN薄膜的蓝、红色发光的初始态能级，确定蓝色发光为施主-价带跃迁复合，而红色发光为施主-受主跃迁复合；给出了黄、蓝、红光的发射模型。所取得的结果对于确定未知杂质和缺陷的种类具有重要的参考价值。     

InGaN/GaN多量子阱蓝光发光二极管老化过程中的光谱特性

系统地研究了小注入电流(＜4 mA)下InGaN/GaN多量子阱结构蓝光发光二极管的发光光谱特性在老化过程中的变化。对比老化前后的电致发光(EL)光谱,发现在注入电流1 mA下的峰值波长(peak wavelength)和半高宽(FWHM)随老化时间增加而减小,变化过程分两个阶段：前期(＜100 h)减小速度较快,而后逐渐变缓,呈现出与LEDs的发光光功率一致的变化规律,说明LEDs的等效极化电场在老化过程中减弱,这一变化和量子阱内缺陷的增加有明确的关系。通过电学特性测量发现同一结电压(V_j=1.8 V)下的结电容C_j和由交流小信号I—V方法计算得到的注入电流1 mA下的结电压V_j随老化时间增加而增大,明确了在同等小注入电流下量子阱内的载流子浓度随老化过程增加。分析表明在老化过程中InGaN/GaN 多量子阱结构蓝光发光二极管量子阱内的缺陷及其束缚的载流子数量增加,形成了增强的极化电场屏蔽效应,减弱的等效极化电场导致了量子阱的能带倾斜变小,带边辐射复合能量增大,能态密度增多,对应的发光过程的峰值波长变短(蓝移),半高宽变窄。     

Luminescent properties of GaN films grown on porous silicon substrate

GaN films have been grown on porous silicon at high temperatures (800-1050 °C) by metal organic vapor phase epitaxy. The optical properties of GaN layers were investigated by photoluminescence (PL) and cathodoluminescence (CL) spectroscopy. PL spectra recorded at 5 K exhibit excitonic emissions around 3.36-3.501 eV and a broad yellow luminescence at 2.2 eV. CL analysis at different electron excitation conditions shows spatial non-uniformity in-depth of the yellow and the band-edge emissions. These bands of luminescence are broadened and red- or blue-shifted as the electron beam penetrates in the sample. These behaviors are explained by a change of the fundamental band gap due to residual strain and the local thermal effect. It was found that the use of AlN buffer layer improves the crystalline quality and the luminescence property of GaN.     

Low and moderate dose gamma-irradiation and annealing impact on electronic and electrical properties of AlGaN/GaN high electron mobility transistors

To understand the effects of ⁶⁰Co gamma-irradiation, systematic studies were carried out on n-channel AlGaN/GaN high electron mobility transistors. Electrical testing, combined with electron beam-induced current measurements, was able to provide critical information on defects induced in the material as a result of gamma-irradiation. It was shown that at low gamma-irradiation doses, the minority carrier diffusion length in AlGaN/GaN exhibits an increase up to ～300?Gy. The observed effect is due to longer minority carrier (hole) life time in the material's valence band as a result of an internal electron irradiation by Compton electrons. However, for larger doses of gamma irradiation (above 400?Gy), deteriorations in transport properties and device characteristics were observed. This is consistent with the higher density of deep traps in the material's forbidden gap induced by a larger dose of gamma-irradiation. Moderate annealing of device structures at 200°C for 25?min resulted in partial recovery of transport properties and device performance.     

Luminescence of different modifications of crystalline silicon dioxide: Stishovite and coesite

Luminescence of very small samples of single crystals of coesite and stishovite has been studied. The spectra were detected under ionizing radiation (X-ray and electron beam) and the decay kinetics of cathodoluminescence in the range of time from 10 ns to 3 ms was measured. The coesite luminescence possesses a broad band at 3 eV with exponential decay about 680 μs at 80 K. The nature of this luminescence was explained as a self-trapped exciton creation in tetrahedron framework. The stishovite luminescence possesses two bands—blue (2.8 eV) and UV (4.7 eV). The UV band intensity grows more than 20 times with irradiation dose from initial level. This shows that the corresponding luminescence centers could be induced by the radiation. The decay of the UV band possesses a fast and a slow component. The determination of the fast decay parameters is beyond the capabilities of our apparatus (less than 10 ns), whereas the slow decay of the UV is non-exponential and takes place in the range of hundreds of microsecond. The blue band decay kinetics can be well approximated by power law ∼t⁻², which may correspond to recombination of defects created by radiation. The stishovite single crystal luminescence is very similar to that of germanium dioxide single crystal of rutile structure. The nature of the stishovite luminescence is explained as recombination of defects created by irradiation in octahedron-structured lattice.     

Influence of proton irradiation on the photoluminescence spectra of zinc oxide modified by ZrO2 and ZrO2·Y2O3 nanopowders

ZnO powder photoluminescence spectra at 360-660 nm modified and unmodified by ZrO₂, ZrO₂Y₂O₃ nanopowders before and after 100 keV proton irradiation were investigated. It was found that introduction of nanoparticles led to ultraviolet band intensity decrease and to visual spectrum band intensity increase. Extinction of intensity occurs under the effect of protons in both bands of luminescence. Decomposition of spectra into elementary defects and analysis of their area change during modification and irradiation were carried out.