原子力显微扫描云纹法的相移技术研究

提出一种原子力显微镜扫描云纹法的相移新技术 ,运用原子力显微镜的压电扫描头作为相移元件 ,对所得云纹图像可进行 0 - 2 π范围内的四步相移。对该方法的测量原理和实验技术进行了详细的阐述。作为典型实验和应用实例 ,分别对由全息光栅和含热变形的电子封装试件栅形成的云纹进行相移分析。成功的实验结果表明 ,该方法是可行的 ,为微米云纹方法的条纹处理提供了一种新途径。该方法可望在微观变形的云纹法测量中发挥积极作用     

基于液晶显示投影技术的数字影栅云纹相移实现方法

影栅云纹是物体离面变形和表面形貌测量常用的一种比较简单的方法,用单纯的影栅云纹法即便在最好的光学系统配置情况下测量精度也只有1~100μm左右,在影栅云纹测试方法中引进相移技术是提高测量精度的主要手段。采用液晶投影仪和数字图像处理技术实现数字影栅云纹测量的准确数字相移,避免了在影栅云纹法中使用结构比较复杂或特制的相移机构。由计算机产生相移条纹图经液晶显示投影,应用实时图像灰度算术相减技术得到数字相移影栅云纹条纹图。该方法具有“基准栅”的栅距和相移步长实时可调,配置高速图像采集系统和图像后处理软件,可将相移技术引入动态测量中,从而提高动态测量的精度的优点。最后的悬臂梁实验结果证实了该方法的有效性。     

扫描离子束云纹法

提出了一种在微米尺度下测量物体面内位移的新型扫描离子束云纹法。对该方法的测量原理以及变形测量的精度进行了阐述。以平行云纹和转角云纹为典型实验对该方法的测量精度进行了检验。该方法成功地应用于微电子系统结构在去除SiO2牺牲层后的残余变形测量。实验结果证实了该方法的可行性。     

高分辨显微镜纳米云纹方法的发展与应用

介绍了近年来发展的纳米云纹法及其新的应用。这些方法是基于原子力显微镜、扫描隧道显微镜和透射电子显微镜的原理提出来的。纳米云纹法能够对物体的微/纳观变形提供定量的分析。详述了这些方法的测量原理和实验技术,并进行了新的应用研究。实验结果论证了这些方法的可行性,并证实了这些方法具有纳米级的位移测量灵敏度。     

相移逻辑云纹法用于三维物体面形测量

讨论了相移逻辑云纹法用于三维形状测量的原理，并给出了多个测量实例，实验证明，此法可快速得到物体的三维形状轮廓图。误差小于１０％。     

测量微细尺度流体温度场的傅立叶变换激光云纹技术

本文研究了一种能测量微细尺度流体温度场的激光云纹技术。激光云纹法利用莫尔条纹的位移量或者位相变化来计算光线穿过位相物体时产生的偏转角,并由此获得流体的温度梯度和温度场分布。激光云纹技术具有灵敏度高,空间分辨率高,稳定性好,实时观测等优点。本文介绍了激光云纹法的测量原理、实验技术,并利用该方法测量了加热细丝自然对流的微细尺度温度场分布。     

水转印栅线聚氨酯大变形及动态力学特性测量

将水转印工艺与数字图像处理方法结合,提出水转印栅线相移云纹法,该方法可用于聚氨酯类超弹性材料大变形测量。通过水转印制作试件栅与参考栅,并采用计算机对两者的数字图像进行算术相减,得到数字相移云纹条纹;运用Carré算法从相移云纹条纹图中提取出面内变形相关的相位。所提方法仅用一幅试件栅与参考栅图像实现试样变形信息的自动、准确提取,可为动态大变形的测量提供一种成本低、有效精确的测试手段。给出了所提方法用于聚氨酯圆环静载压缩变形定量测量,及圆棒的冲击压缩动态变形特性实验研究的结果。     

一种利用散斑干涉和灰度等级测量纳米级位移的新方法

为了解决散斑干涉计量中亚波长位移测量的困难，相移技术被广泛使用，但相移技术有其固有缺点，应用非常麻烦。这里提出一种不同于已往相移技术的全新微小位移测量方法。即把灰度等级法和散斑干涉计量相结合以实现对亚波长位移或变形的测量。克服了散斑干涉计量中变形或位移小于半个波长不产生完整条纹时计量困难的缺点,论述了其测量原理并进行了实验。实验结果很好地证明了上述方法的可行性。为精密散斑干涉计量提供了一种更简单有效的方法。     

数字仿真形貌影栅云纹法及实验系统的原理

基于影栅虚云纹场的概念，提出并实现了对形貌影栅云纹法利用计算机布置影栅云纹仪各种光场，自动生成高质量全场仿真影栅云纹图，建立了一种数字仿真形貌影栅云纹法自动测量和处理一体化实验系统（全文简称为实验系统）.系统特别适合于作为形貌影栅云纹法误差分析的评估系统，对光场布置不同的影栅云纹仪及其对应的相移值近似程度不一样引起的初始系统误差进行分析、预测和评估，给出减少这种系统误差应遵循的准则.     

激光全场模态测量技术研究

详细阐述了电子散斑时间平均法振动测量技术的原理,通过对影响测量精度的诸因素进行理论和实验分析,提出通过应用连续相位扫描技术克服相移系统相移不准确所带来的误差.通过散斑平均技术的实施,消除散斑对测量精度的影响.在实验中得到了满意的测量结果.通过线性近似法,解决了振幅低于30nm的振动测量问题,从而使系统分辨率达到亚纳米级,测量精度达到纳米级.     

激光扫描共聚焦显微镜中云纹法的实验研究

将激光扫描共聚焦显微镜与实验力学中的云纹法相结合,提出了激光扫描共聚焦显微镜云纹法并对其进行了实验研究.实验中以激光扫描共聚焦显微镜的扫描线作为虚拟参考栅,以1 200 lines/mm的全息光栅作为试件栅,这两组栅线相干涉形成云纹条纹.对激光扫描共聚焦显微镜中云纹的形成原理和出现条件进行了讨论,对实验结果与理论分析进行了比较.结果表明,激光扫描共聚焦显微镜云纹法是真实可行的.由于该方法无需干涉系统且对测量环境无特殊要求,因此有望在待测物体表面微米量级变形观察和测量上得到应用.     

Phase shifting SEM moiré method

A new phase shifting scanning electron microscope (SEM) moiré method is proposed in this paper. The phase shifting technique is realized in four steps from 0 to 2π by shifting electron beam in the y-axis direction controlled by the SEM system. It is successfully applied to determine the residual strain of a deformed holographic grating with a frequency of 1200 lines/mm in an electronic package. As a further application, it is used to measure the virtual strain of a MEMS structure with a 5000-line/mm grating and to determine the phase distribution of a SEM moiré formed with a 6000-line/mm grating fabricated by electron beam lithography. The experiments show the feasibility of this method. It provides a new way for disposal of fringes pattern in sub-micro moiré method.     

A novel raster-scanning method to fabricate ultra-fine cross-gratings for the generation of electron beam moiré fringe patterns

The resolution of the electron beam moiré method depends on the line frequency of the grating. Recently, more and more effort has been devoted to increase the frequency, and a novel method for producing high-resolution electron beam gratings is presented in this work. Cross-gratings with a frequency up to 14,832 lines/mm (67 nm pitch) were successfully fabricated using a common scanning electron microscope without a dedicated pattern generation system. The quality of the grating was high enough to produce high-quality moiré fringe patterns. In this method, the ultra-fine cross-grating can be fabricated only through one-directional scanning on the resist, which can improve the grating quality and significantly reduces the fabrication time. The number of control parameters for grating fabrication could be reduced to two compared to the six parameters required by conventional methods, which facilitates the use of the electron beam moiré method. The frequency of the fabricated grating is linearly proportional to the exposure magnification. Thus, the frequency of the grating can be accurately predetermined, and the null field can be easily obtained in the electron beam moiré method. The quality of the fabricated gratings was illustrated by the obtained micrographs and moiré fringe patterns. The full-field local strain near an induced crack was studied to verify the application potential of this method.     

Scanning moiré and phase shifting with time delay and integration imaging

Scanning moiré is generated by undersampling of a phase-modulated grating pattern. In projection profilometry the scanning moiré pattern represents equal height and depth contours on a test object. By use of time delay and integration (TDI) imaging, it is possible to generate an on-line scanning moiré pattern from the complete periphery of a rotating cylindrical object. For automated phase and profile unwrapping from scanning moiré fringes, phase-shifting interferometry techniques are most desirable. However, lack of spatial information in the undersampled scanning moiré fringes introduces serious errors in phase unwrapping. We report a method that uses oversupply of data to balance the effect of undersampling. This oversupply is achieved with a TDI feature that permits programmable image magnification in the scanning direction.     

Application of the moiré deflectometry on divergent laser beam to the measurement of the angle of arrival fluctuations and the refractive index structure constant in the turbulent atmosphere

When a slightly divergent laser beam passes through a turbulent ground level atmosphere and strikes a linear grating, fluctuating self-images are formed at Talbot distances. By superimposing a similar grating on one of the self-images, even for the case of parallel gratings' lines, fluctuating moiré fringes are formed owing to the beam divergence. Recording the successive moiré patterns by a CCD camera and feeding them to a computer, after filtering the higher spatial frequencies, produces highly magnified fluctuations of the laser beam. Using moiré fringe fluctuations we have calculated the fluctuations of the angle of arrival and the atmospheric refractive index structure constant. The implementation of the technique is straightforward, a telescope is not required, fluctuations can be magnified more than ten times, and the precision of the technique is similar to that reported in our previous work.     

Digital moiré fringe measurement method for alignment in imprint lithography

Accurate layer-to-layer alignment, which is of prime importance for the fabrication of multilayer nanostructures in integrated circuits, is one of the main obstacles for imprint lithography. Current alignment measurement techniques commonly involve an image detection process for coarse alignment followed by a grating interference process for fine alignment. Though this kind of two-level alignment system is reasonable for measurement, when it is used in real imprint lithography, it is inconvenient because of the existence of a complex loading system that needs space for alignment. In this study, we propose a fine alignment method using only image detection using grating images and digital moiré fringe technology. In this method, though the gratings are also selected as alignment marks for accurate measurement, they do not interfere with the physics. The grating images captured from the template and wafer are used to measure angular displacement and to form parallel digital moiré fringes. The relative linear displacement between the template and wafer is determined by detecting the spatial phase of parallel digital moiré fringes. Owing to the magnification effect of digital moiré fringes, this method is capable of generating accurate measurements. According to the experimental results, this digital moiré fringe technique is accurate to less than 10 nm. In addition, without a complex grating interference system, this method has the advantage of being easy to operate.     

云纹干涉载频调制技术及分析

在物体变形场的测量中,云纹干涉的载频调制技术有重要作用.在云纹干涉中,对称光照明产生的衍射光沿试件栅表面的法线传播并产生干涉.通过改变照明光的入射角度,可实现变形条纹场的空间调制.通过光程差的分析说明了载波条纹产生的机理,得出了载波频率与照明光入射角度变化之间的关系式.利用三点弯曲加载结合二维载频调制实验,给出了实验结果.证明了在初始条纹较少的情况下,载频调制技术能有效地测量物体的位移场.     

Circular carrier-frequency photography for observing phase objects

A circular grating is photographed through a phase object which deforms the image of the grating lines. By super-imposing these deformed lines with a master grating on photographic film, moiré patterns are observed. These patterns are interpreted as fringes of constant radial derivative.