Fabrication and implementation of large-area organic light-emitting-diode devices on direct patterned backplanes

In this paper, we report on a new cost-effective fabrication technology for large-area organic light-emitting diode (OLED) devices that we have developed. We fabricated OLED lighting devices on a directly patterned backplane using a dry process without employing conventional photolithography patterning technology. The indium–tin-oxide (ITO) anode, metal cathode, insulator, and emissive organic layer patterns were all formed directly on the substrates during the sputtering and evaporation steps by using a shadow mask without using etching or lift-off methods. We fabricated and characterized green phosphorescent emission OLED devices with an emission area of 30 × 120 mm², based on backplanes formed by direct patterning technology. Application of direct patterning technology reduced the total number of processing steps to 4 from the 26 steps required by conventional photo-patterning technology, making it possible to reduce large-scale production cost. Although the process steps were reduced considerably, the typical characteristics were comparable to those of photo-patterned OLEDs. Furthermore, the lifetime of the OLEDs based on direct patterned backplane was observed to be 27,200 h, which is approximately 97% of the lifetime of conventionally patterned OLEDs.     

Position-selective growth of vertically aligned carbon nanotubes for application of electronic-measuring nanoprobes

Position-selective growth of carbon nanotubes (CNTs) and vertically aligned CNTs (VACNTs) on patterned metal electrodes have been prepared by thermal chemical vapor deposition (TCVD) and DC plasma enhanced chemical vapor deposition (PECVD). We propose newly a position-controlling method of CNTs by controlling not only a position of Ni as catalysts but also the morphology of Mo as underlayers for the catalysts. The position-selective growth of CNTs was achieved at the edges of the patterned metal by TCVD. The morphologies of the Mo underlayer at the selected area were rough and porous. No CNTs grew on smooth Mo surfaces. The minimum width of selectively grown CNTs, ca. 2.6 μm, was approximately one-eightieth of the patterned metal, 200 μm. VACNTs were synthesized by a PECVD method, however, the VACNTs grew up all over the patterned metal. The Ni catalysts formed into fine particles on rough surfaces of the Mo underlayer. Then the selective growth was achieved by Ni fine particles formed only at the edges of the metal pattern. The results of PECVD suggest that the plasma promoted the Ni catalysts to become fine particles on smooth surfaces of Mo. Conclusively a position-controlling method of CNTs was demonstrated in the optimum conditions of the TCVD.     

Incubation effect and its influence on laser patterning of ITO thin film

Results are presented on the surface damage thresholds of ITO thin films induced by single- and multi-pulse laser irradiation at a pulse duration of 10 ps and a wavelength of 1064 nm. For multi-pulse ablation the incubation effect results in a reduction of the damage threshold, especially apparent at low pulse numbers and very small film thicknesses. The incubation effect attributes to the accumulation of defect sites and/or the storage of thermal stress-strain energy induced by the incident laser pulses. An incubation coefficient of S=0.82 has been obtained which is independent on the film thickness in the range of 10–100 nm. In practical applications, the incubation effect determines the laser patterning structure of ITO films while increasing the pulse overlapping rate. The width of the patterned line can be predicted by the proposed model involving the laser fluence, the overlapping rate and the incubation coefficient.     

Effect of SAM layer on bias-stability of inkjet printed TIPS pentacene thin-film transistor

We have studied the effect of self-assembled monolayer (SAM) on the performance and bias-induced changes in bottom contact, inkjet printed organic thin-film transistors (OTFTs) with 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS pentacene). The device was fabricated using the photo-definable photoacryl (PA) and silver (Ag) as gate insulator and source/drain metal electrodes, respectively. The SAM was formed by immersing the patterned Ag electrodes in pentafluorothiophenol (PFBT) solution or by spin coating of phenethyltrichlorosilane (PTS) on the substrate, and TIPS pentacene was inkjet printed at 90 °C. The OTFT with SAMs exhibited the field-effect mobility of 0.18 cm²/Vs and showed the stretched exponential decay with time constant of 1.13 × 10⁷ s and exponential exponent of 0.28.     

Selective gold nano-patterning on flexible polymer substrate via concurrent nanoimprinting and nanotransfer printing

We report a simple technique of selective gold nano-patterning on non-planar polycarbonate substrate by combining nanoimprinting and gold nanotransfer printing techniques in a single concurrent nano-patterning process: thermal nanoimprinting directly patterns a MPTMS (3-mercaptopropyl trimethoxysilane)-coated polycarbonate sheet to form the non-planar nanostructures using a gold-film deposited mold. Simultaneously, the gold-film from the mold is selectively transfer-printed either onto the protrusion or the base of the imprinted non-planar structures. This high nano-patterning selectivity is achieved due to a combined effect of a thiol-terminated MPTMS-gold surface chemistry, more importantly, aided by a surface area dependent differential work of adhesion. We show the high delineation of the patterned gold on the non-planar polycarbonate substrate of various geometries such as pillars, dimples, and gratings, down to nano-scale resolution (130 nm) as well as over micro-scale resolution (10 μm), thus demonstrating that this can be a generic metal patterning technique. Using this technique, we fabricate a metal nanowire grid polarizer to demonstrate a potential device application. The main advantage of this technique lies in its inherent self-aligned process that simplifies selective Au nano-patterning on non-planar polymer surfaces, which is otherwise difficult to be obtained using conventional patterning techniques.     

Selective growth of ZnO nanowires on substrates patterned by photolithography and inkjet printing

Zinc oxide nanowires (ZnO NWs) were grown by a two-step growth method, involving the deposition of a patterned ZnO thin seeding layer and the chemical vapor deposition (CVD) of ZnO NWs. Two ways of patterning the seed layer were performed. The seeding solution containing ZnO precursors was deposited by sol–gel/spin-coating technique and patterned by photolithography. In the other case, the seeding solution was directly printed by inkjet printing only on selected portion of the substrate areas. In both cases, crystallization of the seed layer was achieved by thermal annealing in ambient air. Vertically aligned ZnO NWs were then grown by CVD on patterned, seeded substrates. The structure and morphology of ZnO NWs was analyzed by means of X-ray diffraction and field emission scanning electron microscopy measurements, respectively, while the vibrational properties were evaluated through Raman spectroscopy. Results showed that less-defective, vertically aligned, c-axis oriented ZnO NWs were grown on substrates patterned by photolithography while more defective nanostructures were grown on printed seed layer. A feature size of 30 µm was transferred into the patterned seed layer, and a good selectivity in growing ZnO NWs was obtained.     

Fabrication of patterned gold microstructure by selective electroless plating

Patterned gold microstructures on glass or Si wafers have been fabricated by a novel method which is composed of selective electroless plating and microcontact printing. This process may be widely used for the production of fine metal patterns in printed circuits or as a substrate to form patterned SAMs. In addition, these patterned metal microstructures can be readily transferred to adhesive tape surface to fabricate flexible metal microstructure, which may be applied in all-plastic circuit.     

Direct writing of micro/nano-scale patterns by means of particle lens arrays scanned by a focused diode pumped Nd:YVO4 laser

A practical approach to a well-known technique of laser micro/nano-patterning by optical near fields is presented. It is based on surface patterning by scanning a Gaussian laser beam through a self-assembled monolayer of silica micro-spheres on a single-crystalline silicon (Si) substrate. So far, the outcome of this kind of near-field patterning has been related to the simultaneous, parallel surface-structuring of large areas either by top hat or Gaussian laser intensity distributions. We attempt to explore the possibility of using the same technique in order to produce single, direct writing of features. This could be of advantage for applications in which only some areas need to be patterned (i.e. local area selective patterning) or single lines are required (e.g. a particular micro/nano-fluidic channel). A diode pumped Nd:YVO₄ laser system (wavelength of 532 nm, pulse duration of 8 ns, repetition rate of 30 kHz) with a computer-controlled 3 axis galvanometer beam scanner was employed to write user-defined patterns through the particle lens array on the Si substrate. After laser irradiation, the obtained patterns which are in the micro-scale were composed of sub-micro/micro-holes or bumps. The micro-pattern resolution depends on the dimension of both the micro-sphere’s diameter and the beam’s spot size. The developed technique could potentially be employed to fabricate photonic crystal structures mimicking nature’s butterfly wings and anti-reflective “moth eye” arrays for photovoltaic cells.     

Optical Properties of Micro-patterned Silver Nanoparticle Substrates

In this paper, we describe a novel technique for depositing metal nanoparticles (NPs) on a planar substrate whereby the NPs are micro-patterned on the surface by a simple stamp-printing procedure. The method exploits the attractive force between negatively charged colloidal metal NPs and positively-charged polyelectrolyte layers which have been selectively deposited on the surface. Using this technique, large uniform areas of patterned metal NPs, with different plasmonic properties, were achieved by optimisation of the stamping process. We report the observation of unusual fluorescence emission from these structures. The emission was measured using epifluorescence microscopy. Fluorescence lifetime behaviour was also measured. Furthermore, the μ-patterned NPs exhibited blinking behaviour under 469 nm excitation and the fluorescence spectrum was multi-peaked. It has been established that the fluorescence is independent of the plasmon resonance properties of the NPs. As well as optimising the novel NP μ-patterning technique, this work discusses the origin and characteristics of the anomalous fluorescence behaviour in order to characterise and minimise this unwanted background contribution in the use of metal NPs for plasmonic enhancement of fluorescence for optical biochip applications.     

Sliding behavior of water droplets on line-patterned hydrophobic surfaces

We prepared line-patterned hydrophobic surfaces using fluoroalkylsilane (FAS) and octadecyltrimethoxysilane (ODS) then investigated the effect of line direction on sliding behavior of water droplets by direct observation of the actual droplet motion during sliding. Water droplets slide down with a periodic large deformation of the contact line and sliding velocity fluctuation that occurred when they crossed over the 500-μm ODS line regions in FAS regions on a Si surface tilted at 35°. These behaviors are less marked for motion on a 100-μm line surface, or on lines oriented parallel to the slope direction. Smaller droplets slide down with greater displacement in the line direction on 500-μm line patterning when the lines were rotated at 13° in-plane for the slope direction. This sliding behavior depended on the droplet size and rotation angle, and is accountable by the balance between gravitational and retentive forces.     

The effect of phonon anisotropic scattering on the thermal conductivity of silicon thin films at 300K and 400K

Previous studies have shown that anisotropy in phonon transport exist because of the difference in phonon dispersion relation due to different lattice directions, as observed by a difference in in-plane and cross-plane thermal conductivities. Our current work intends to study the effect of anisotropy scattering on silicon thermal conductivity at 300 K and 400 K. We adopt the Henyey and Greenstein probability density function in our phonon Monte Carlo simulation to investigate the effect of highly forward and backward scattering events. The impact of applying the anisotropy scattering using this approach is discussed in detail. While the forward and backward scattering will increase and decrease thermal conductivity respectively, the extent of the effect is non-linear such that forward scattering has a more obvious effect on thermal conductivity than backward scattering.     

Laser nano-fabrication of large-area plasmonic structures and surface plasmon resonance tuning by thermal effect

A simple and flexible technique aimed to generate large-area periodic nano-dot array features on metal thin films by laser interference lithography (LIL) has been demonstrated. In this paper, gold nano-dot arrays with a period of ∼450 nm and a dot diameter of ∼100 nm on quartz substrates coated with a gold film of 50 nm thick were fabricated. Multiple enhanced transmission peaks were observed in this patterned film. In addition to the characteristic peak of the gold surface plasmon resonance around 500 nm, multiple shoulder peaks that range from 550 to 700 nm were also observed in the nano-chain array structures. These shoulder peaks disappeared after thermal annealing. It was found that the nano-dots became smaller and well-separated nano-balls under the high temperature annealing process. These nano-structures have potential applications in solar cell, nano-lithography and biosensing.     

ZnO nanowire lines and bundles: Template-deformation-guided alignment for patterned field-electron emitters

One-dimensional ZnO materials have been promising for field-emission (FE) application, but how to facially control the alignment of ZnO emitters is still a great challenge especially for patterned display application. Here, we report the fabrication of novel ZnO nanowire (NW) line and bundle arrays for patterned field-electron emitters. The effects of PS template size and heating time on the resulted ZnO nanoarrays were systematically studied. The deformation degree of PS templates was controlled and hence utilized to adjust the alignment of electrochemically deposited ZnO arrays. It was found that the length of NW lines and the density of NW bundles can effectively tuned by the PS template heating time. The optimal FE performance with turn-on electric field as low as of 4.4 V μm⁻¹ and the field-enhancement factor as high as of 1450 were achieved through decreasing the screening effect among the patterned field-electron emitters.     

Self-assembly of Ag nanopowder on OTS-patterned glass

Ag ink was spontaneously patterned on glass substrate by using the surface energy difference of a pre-patterned octadecyltrichlorosilane (OTS) layer. Ag ink was confined into the hydrophilic area, where OTS layer was not formed. OTS layer was selectively transferred by micro-contact printing (μCP) method and significantly decreased surface energy. As a result, surface of glass substrate was separated as hydrophobic and hydrophilic with and without OTS layer, respectively. Ag line could be successfully patterned with the width of below 10 μm on the glass. The patterned Ag line was dense and abrupt on the edge and the thickness was about 0.25 μm. Ag film showed good adhesion on a glass substrate after anneal above 200 °C. The minimum resistivity was about 4 μΩ cm.     

Substrateless micrometric metal mesh for mid-infrared plasmonic sensors

We report on the fabrication and optical properties of thin metal films periodically patterned with square hole arrays of 2 micron pitch, which behave as substrateless plasmonic devices at mid-infrared frequencies. Large (3×3 mm²) meshes were fabricated by metallizing a patterned silicon nitride membrane. The mid-infrared spectra display resonant absorption lines with a Q-factor up to 22 in both transmission and reflection, due to the interaction of the radiation with surface plasmon modes on both faces of the film, allowed by substrate removal. The devices can be used to fabricate surface plasmon-based chemical sensors employing mid-infrared radiation.     

Influence of patterning on the nucleation of Ge islands on Si and SiO2 surfaces

Surface patterning is expected to influence the nucleation site of deposited nanostructures. In the present study, clean Si and SiO₂ surfaces were patterned by a nanolithographic process using a Focused Ion Beam (FIB). Ge was evaporated in ultra high vacuum at 873 K on these substrates, resulting in the formation of island arrays. Based on scanning tunneling microscopy and atomic force microscopy images, a statistical analysis was performed in order to highlight the effect of patterning on the size distribution of islands compared to a non-patterned surface. We find that the self-organization mechanism on patterned substrates results in a very good arrangement and positioning of Ge nanostructures, depending on growth conditions and holes distance, both on Si and SiO₂ surfaces.     

Transport properties of high-quality epitaxial graphene on 6H-SiC(0001)

We have extensively studied the electronic properties of epitaxial graphene grown on the Si face of a 6H silicon carbide substrate by thermal decomposition in an argon atmosphere. Using e-beam lithography, large van der Pauw structures as well as Hall bars were patterned. Their size ranged from millimeters down to submicrometer-sized Hall bars, the latter entirely placed on atomically flat substrate terraces. We found reproducible electronic properties, independent of the sample size and orientation, over a broad temperature range. A comparison of the mobility values indicated no enhanced scattering at the macroscopic step edges of the SiC substrate and due to adsorbed molecules. However, the strong coupling to the substrate results in an elevated charge carrier density n and a reduced mobility μ compared to exfoliated graphene. If n is decreased the mobility rises substantially (up to 29 000 cm²/V s at 25 K), and Shubnikov-de Haas oscillations and the graphene-like quantum Hall effect become visible. This leads to the conclusion that the electrons in epitaxial graphene have the same quasi-relativistic properties previously shown in exfoliated graphene and expected from theory.     

Undercut structures fabricated by microtransfer printing combined with UV exposure and their applications

In this paper, the undercut structures were fabricated by microtransfer printing of metal films on the surface of photoresist combined with UV exposure and photoresist film developing. The patterned metal films were used as mask to realize the selective UV exposure of photoresist firstly. The undercut structures, which consist of the top metal films and the patterned bottom photoresist, formed in the subsequent developing process because of the lateral dissolving of photoresist at the edge of the unexposed regions. The method proposed in this paper has wider tolerance to the changing of the patterning parameters, but without effect on the patterning resolution since the metal film was used as the top layer. The undercut structures were used as separators to pattern passive-matrix display of organic light-emitting diodes (OLEDs). No visible difference of the device performance was observed compared with the OLEDs patterned by the shadow mask.     

Low temperature nanoparticle sintering with continuous wave and pulse lasers

New manufacturing methods are being sought for electronics production. Printable electronics is a promising method for producing low cost and large-scale electronics. In printable electronics nanoparticle inks printed on the surface of substrate contain additives, such as dispersing agent and carrier fluids that provide good printing properties by changing the viscosity and separating the nanoparticles of the ink. In the sintering process ink particles are heated to a certain, ink-specific temperature. During the sintering process the carrier fluid and dispersing agents are evaporated from the ink. Additional heating after evaporation causes the nanoparticles to start to agglomerate. A small particle size allows the use of a considerably lower sintering temperature than with bulk silver, for example 220 °C. The sintering process is usually utilized with a convection oven, with a long sintering time, and the thermal load on the surrounding material can become too great as components and patterns are formed from layers of different type inks. Hence, alternative sintering methods are sought. This paper describes tests done with two different types of laser; pulsed and continuous wave lasers. Laser sintering enables short sintering times and selective sintering, making it possible for printed structures to contain fragile active components produced with other technologies.     

Laser micro/nano patterning of hydrophobic surface by contact particle lens array

Direct laser surface micro/nanopatterning by using Contact Particle Lens Array (CPLA) has been widely utilized. The method involves laser scanning of a monolayer of transparent particles arranged on the substrate to be patterned. Despite the different techniques available for CPLA deposition; the particles monolayer can only be formed on hydrophilic surfaces, which restrict the range of substrates that could be patterned by this method. In this study, a technique for patterning of hydrophobic surfaces by using CPLA has been proposed. In the proposed technique, monolayer of CPLA is formed on a hydrophilic substrate and then transported to a hydrophobic substrate by using a flexible sticky plastic. The transported CPLA is then scanned by a laser for patterning the hydrophobic substrate. The plastic pre-selected for this work was transparent to the laser. Experimental investigations were carried out to generate bumps and bowl shaped patterns using transported particles. Features smaller than the diffraction limit have been generated. The optical near field and associated temperatures around the particles were numerically simulated with a coupled electromagnetic and thermal modelling technique.